C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2011
04/06/2011	CN101238237B Initial wetting auxiliary material for a vaporizer body
04/06/2011	CN101181848B Gravure edition as well as making method and vacuum deposition film-plating apparatus thereof
04/05/2011	US7919142 Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the same
04/05/2011	US7918944 Surface carburization technique of medical titanium alloy femoral head in hip arthroplasty
04/05/2011	US7918014 Method of manufacturing a CPP structure with enhanced GMR ratio
04/05/2011	CA2620721C Sputtering target with bonding layer of varying thickness under target material
03/2011
03/31/2011	WO2011037847A1 Synthesis of high-purity bulk copper indium gallium selenide materials
03/31/2011	WO2011037831A2 Articles including a porous substrate having a conformal layer thereon
03/31/2011	WO2011037330A2 Sputtering device having a dual chamber
03/31/2011	WO2011037107A1 Placing table structure and plasma film forming apparatus
03/31/2011	WO2011037010A1 Semiconductor element and method for manufacturing the same
03/31/2011	WO2011037008A1 Method for manufacturing oxide semiconductor film and method for manufacturing semiconductor device
03/31/2011	WO2011036246A2 Method for producing cubic zirconia layers
03/31/2011	WO2011036022A1 Tool coating
03/31/2011	WO2011011129A3 Coated tooling
03/31/2011	WO2011006128A3 Curved microwave plasma line source for coating of three-dimensional substrates
03/31/2011	WO2010129180A3 Lift-off deposition system featuring a density optimized hula substrate holder in a conical dep0sition chamber
03/31/2011	US20110076848 Semiconductor process chamber and seal
03/31/2011	US20110076567 Method for forming a thin-film lithium-ion battery
03/31/2011	US20110076484 Method for producing core-shell particles, core-shell particles, method for producing hollow particles, coating composition and article
03/31/2011	US20110075299 Magnetic write heads for hard disk drives and method of forming same
03/31/2011	US20110073472 Coating apparatus
03/31/2011	US20110073471 Method and apparatus for cathodic arc ion plasma deposition
03/31/2011	US20110073463 Methods for stable process in a reactive sputtering process using zinc or doped zinc target
03/31/2011	US20110073186 Target for a sputtering process for making a compound film layer of a thin solar cell, method of making the thin film solar cell, and thin film solar cell made thereby
03/31/2011	DE102009037853B3 Gasflusssputterquelle Gas flow sputtering source
03/31/2011	CA2775044A1 Method for producing cubic zirconia layers
03/30/2011	EP2302695A1 Gas barrier composite, back sheet for solar cell module and solar cell module
03/30/2011	EP2302110A1 Method of manufacturing a si(1-v-w-x)cwalxnv substrate, method of manufacturing an epitaxial wafer, si(1-v-w-x)cwalxnv substrate, and epitaxial wafer
03/30/2011	EP2302093A1 Manufacturing method for vapor deposition device and thin-film device
03/30/2011	EP2302092A1 Bias sputtering apparatus
03/30/2011	EP2302091A2 Method for making an ultra low residual reflection, low stress lens coating
03/30/2011	EP2301904A1 Sintered complex oxide, method for producing sintered complex oxide, sputtering target and method for producing thin film
03/30/2011	EP2300657A1 Metal-coated polyolefin fibres for wovens and nonwovens
03/30/2011	EP2300636A1 Coated cutting tool for metal cutting applications generating high temperatures
03/30/2011	EP2300632A2 Magnetron with electromagnets and permanent magnets
03/30/2011	EP2300631A1 Method for producing a transparent and conductive metal oxide layer by highly ionized pulsed magnetron sputtering
03/30/2011	EP2300389A1 Glass product
03/30/2011	EP2300225A1 A laminate and composite layer comprising a substrate and a coating, and a process and apparatus for preparation thereof
03/30/2011	EP2032734B1 Method for the production of a coated object by sputtering a ceramic target
03/30/2011	EP1727406B1 Plasma generator
03/30/2011	EP1602747B1 Process for producing copper alloy sputtering target
03/30/2011	EP1459644B1 Decorative article having white coating and method for manufacture thereof
03/30/2011	CN201778109U Metallic-texture non-gel wire-drawing adhesion film producing device
03/30/2011	CN201778108U Producing device for coiled band-shaped indium tin oxide (ITO) conductive films
03/30/2011	CN201778107U Coated substrate preprocessing device
03/30/2011	CN201778106U Rectangular plane magnetic control cathode structure in vacuum coating equipment
03/30/2011	CN201778105U Novel magnetic control sputtering cylindrical target
03/30/2011	CN201778104U On-line treatment device for vacuum sputtering ribbon conductive film
03/30/2011	CN201778103U Evaporation source device of organic light emitting diode (OLED) evaporator
03/30/2011	CN201778102U Equipment for carrying out local vacuum vapor deposition on printed materials
03/30/2011	CN201778101U Structure of coating process chamber
03/30/2011	CN201778100U Cover board on coating process chamber
03/30/2011	CN101999012A 渗透阻挡层 Permeation barrier
03/30/2011	CN101997057A Method and equipment for manufacturing solar cell
03/30/2011	CN101997056A Preparation method of sulfide material for thin film solar cell absorption layer
03/30/2011	CN101996919A Substrate holding apparatus, mask alignment method, and vacuum processing apparatus
03/30/2011	CN101996871A Method for uniformly implanting a wafer with an ion beam
03/30/2011	CN101996838A Container
03/30/2011	CN101995588A Method for producing optical article
03/30/2011	CN101995424A Plastic potentiometric ion-selective sensor and fabrication thereof
03/30/2011	CN101994097A Film coating device
03/30/2011	CN101994096A Vacuum film coater
03/30/2011	CN101994095A Coated umbrella stand
03/30/2011	CN101994094A Method for preparing rutile-type TiO2 thin film at room temperature
03/30/2011	CN101994093A Magnetron sputtering device
03/30/2011	CN101994092A Magnetron device
03/30/2011	CN101994091A Gas supply device and vacuum processing apparatus
03/30/2011	CN101994090A Sputtering carrier and sputtering device comprising sputtering carrier
03/30/2011	CN101994089A Method for forming antifouling layers of workpieces by utilizing continuous vacuum sputtering coating equipment
03/30/2011	CN101994088A Hollow columnar target material and assembly thereof
03/30/2011	CN101994087A Evaporating deposition device
03/30/2011	CN101994086A High-conductivity high-hardness copper-refractory metal film and preparation method thereof
03/30/2011	CN101994085A High-heat stability amorphous film of copper-refractory metal and preparation method thereof
03/30/2011	CN101994084A Color electroplating structure and manufacturing method thereof
03/30/2011	CN101992472A Self-lubricating golden yellow razor blade and manufacturing method thereof
03/30/2011	CN101752407B OLED display, mask and mask alignment method thereof
03/30/2011	CN101638774B Rotatable sample position of magnetron sputtering device
03/30/2011	CN101638772B Method for preparing fluorine doped tin oxide transparent conductive film
03/30/2011	CN101457359B Method for preparing Ti-Si-N nanocrystalline-amorphous composite superhard coating
03/30/2011	CN101416294B Method of forming micro metal bump
03/30/2011	CN101395711B Vertical substrate conveyance device and film deposition equipment
03/30/2011	CN101356296B Vapor deposition apparatus for organic vapor deposition material and process for producing organic thin film
03/30/2011	CN101323982B Preparation of high quality cubic boron nitride film
03/30/2011	CN101100954B Exhaust pipe for internal combustion engines
03/30/2011	CN101083223B Ring assembly for substrate processing chamber
03/29/2011	USRE42248 Cleaning method, cleaning apparatus and electro optical device
03/29/2011	US7916986 Erbium-doped silicon nanocrystalline embedded silicon oxide waveguide
03/29/2011	US7914857 Forming a protective film on a glass substrate over the DLC, performing thermal tempering, heat strengthening, and/or heat bending, the protective tin oxide film prevents burnoff of the DSC layer during heat treating
03/29/2011	US7914848 Tape-manufacturing system having extended operational capabilities
03/29/2011	US7914654 Method and apparatus for depositing a magnetoresistive multilayer film
03/29/2011	US7913752 Cooling device for vacuum treatment device
03/29/2011	CA2425409C Process of formation of a ceramic coating on a substrate by electron-beam physical vapor deposition
03/29/2011	CA2424746C Transparent laminate having low emissivity
03/24/2011	WO2011034492A1 A pvd method for depositing a coating onto a body and coated bodies made thereof
03/24/2011	WO2011034143A1 Transparent conductive film and device comprising same
03/24/2011	WO2011034127A1 Copper material for use as sputtering target and process for producing same
03/24/2011	WO2011034110A1 Metal oxide-metal composite sputtering target
03/24/2011	WO2011034092A1 Method for forming barrier metal film
03/24/2011	WO2011034089A1 Film formation method

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