| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 01/19/2011 | CN201713570U Carrying tool for reducing temperature in sputtering |
| 01/19/2011 | CN201713569U Disposable shield cover for magnetron sputtering device |
| 01/19/2011 | CN201713568U Sputtering device provided with cooling sunshade |
| 01/19/2011 | CN201713567U Driving device of duplicature thickness uniformity modification board |
| 01/19/2011 | CN201713566U Evaporation coating device |
| 01/19/2011 | CN201713565U Vacuum machine |
| 01/19/2011 | CN201713564U Izao transparent conductive film |
| 01/19/2011 | CN201712227U Optical anti-counterfeiting film |
| 01/19/2011 | CN1985345B Cylindrical target obtained by hot isostatic pressing |
| 01/19/2011 | CN1861835B Method of using a sputtering cathode together with a target |
| 01/19/2011 | CN101952984A Semiconductor substrate, semiconductor element, light emitting element and electronic element |
| 01/19/2011 | CN101952935A Vacuum processing device, method for maintaining vacuum processing device and vacuum processing factory |
| 01/19/2011 | CN101952482A Multilayered coated cutting tool |
| 01/19/2011 | CN101952477A Method for coating a metal strip and equipment for implementing said method |
| 01/19/2011 | CN101952070A Cutting tool |
| 01/19/2011 | CN101950092A Terahertz wave band vanadium oxide optical switch and preparation method thereof |
| 01/19/2011 | CN101949006A Method for preparing copper nitride film, copper nitride/copper and copper two-dimensional ordered array |
| 01/19/2011 | CN101949005A Champagne gold target for vacuum magnetron sputtering and preparation method thereof |
| 01/19/2011 | CN101949004A Preparation method of nano copper film-based copper nano structure |
| 01/19/2011 | CN101949003A High-reflectivity nano film layer for high-power LED lamps and film coating method thereof |
| 01/19/2011 | CN101949002A Coating device, evaporation source device and evaporation source container |
| 01/19/2011 | CN101949001A Vacuum vapor deposition apparatus |
| 01/19/2011 | CN101949000A Vacuum magnetron sputtering multi-arc ion composite coating machine |
| 01/19/2011 | CN101948999A Low-temperature-doped luminescent aluminum nitride thin film and preparation method thereof |
| 01/19/2011 | CN101948998A Pre-treatment process of welding tool before physical vapour deposition coating |
| 01/19/2011 | CN101948995A Ceramic composite thermal barrier coating material |
| 01/19/2011 | CN101620286B Film system of cutting optical filter film and plating method thereof |
| 01/19/2011 | CN101613848B Equiaxial method of ultrahigh pure aluminum employing grain refinement and grain deformation |
| 01/19/2011 | CN101560645B Large vacuum coating equipment |
| 01/19/2011 | CN101550542B Multifunctional magnetron sputtering continuous film plating machine |
| 01/19/2011 | CN101520247B Inner tube of heat collector tube for use in trough type solar power generation and method for preparing same |
| 01/19/2011 | CN101403100B Method of manufacturing magnetic microscope probe with ultrahigh resolution |
| 01/19/2011 | CN101343724B Method for functional decoration film coating on engineering plastic rubber surface |
| 01/19/2011 | CN101338040B Method for preparing porous conductive coating on plastic surface |
| 01/19/2011 | CN101213603B Process and device for coating disk-shaped substrates for optical data carriers |
| 01/19/2011 | CN101191843B Heat-resisting shading sheet, manufacturing method thereof, and diaphragm and light quantity adjusting device using the same |
| 01/19/2011 | CN101146936B Magnesium oxide single crystal and method for producing same |
| 01/19/2011 | CN101096594B Zinc oxide film transmitting blue light and purple light under room temperature and preparation method thereof |
| 01/18/2011 | US7871686 Ag base alloy thin film and sputtering target for forming Ag base alloy thin film |
| 01/18/2011 | US7871679 not encumbered with noble gas inclusions and is a deposition product from a noble-gas-free getter metal alloy plasma; high take-up capacity for residual gases and permits a high number of pumping cycles before the volume is filled with reactive residual gases; alloy of titanium, zirconium and vanadium |
| 01/18/2011 | US7871663 yttrium-barium-copper oxides (YBCO); superconductors; thin films; metal-organic chemical vapor deposition, metal-organic deposition, pulsed laser deposition, sol-gel and sputtering and/or electrolytic deposition |
| 01/18/2011 | US7871506 Continuous ARC deposition apparatus and method with multiple available targets |
| 01/18/2011 | US7871505 Sputtering target transport box |
| 01/18/2011 | US7871502 forming onto Mo electrode layer a precursor including an In metal layer and a Cu Ga alloy layer by sputterining, coating by dipping an alkali layer containing sodium sulfide, or sodium tetraborate, or sodium aluminum sulfate on alloy layer, heat-treating the substrate by flowing H2Se gas to form CuGaSe |
| 01/18/2011 | US7871078 Piston ring and method for the production thereof |
| 01/13/2011 | WO2011006128A2 Curved microwave plasma line source for coating of three-dimensional substrates |
| 01/13/2011 | WO2011006109A2 High efficiency low energy microwave ion/electron source |
| 01/13/2011 | WO2011005021A2 Substrate for the deposition of a deposition apparatus, film-forming method, and method for manufacturing an organic electroluminescence display device using the substrate for deposition |
| 01/13/2011 | WO2011005008A2 Substrate for the deposition of a deposition apparatus, film-forming method, and method for manufacturing an organic electroluminescence display device using the substrate for deposition |
| 01/13/2011 | WO2011004631A1 Manufacturing method for photoelectric conversion device |
| 01/13/2011 | WO2011004601A1 Phosphor crystal film and process for making same |
| 01/13/2011 | WO2011003974A1 Method for deposition by sputtering, resulting product, and sputtering target |
| 01/13/2011 | WO2010123680A3 Wafer processing deposition shielding components |
| 01/13/2011 | WO2010115128A3 High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process |
| 01/13/2011 | WO2010114823A3 Sputtering target for pvd chamber |
| 01/13/2011 | US20110008641 Film-coated glazing |
| 01/13/2011 | US20110008640 Display device, process for producing the display device, and sputtering target |
| 01/13/2011 | US20110007422 Protected Transducer for Dead Layer Reduction |
| 01/13/2011 | US20110006659 Hybrid interference coatings, lamps, and methods |
| 01/13/2011 | US20110005926 Magnetron assembly |
| 01/13/2011 | US20110005925 Target backing tube, cylindrical target assembly and sputtering system |
| 01/13/2011 | US20110005924 Target backing tube, cylindrical target, and cylindrical target assembly |
| 01/13/2011 | US20110005923 Sputtering system, rotatable cylindrical target assembly, backing tube, target element and cooling shield |
| 01/13/2011 | US20110005922 Methods and Apparatus for Protecting Plasma Chamber Surfaces |
| 01/13/2011 | US20110005921 Method for making a thin layer solid oxide fuel cell, a so-called sofc |
| 01/13/2011 | US20110005920 Low Temperature Deposition of Amorphous Thin Films |
| 01/13/2011 | US20110005919 Sputtering target temperature control utilizing layers having predetermined emissivity coefficients |
| 01/13/2011 | US20110005587 Made to elements capable of collecting light |
| 01/13/2011 | US20110005462 Vacuum vapor deposition apparatus |
| 01/13/2011 | US20110005460 Vacuum vapor deposition apparatus |
| 01/13/2011 | DE102009031768A1 Deposition of thin layers such as multi-layer coatings, nanolayers, nanostructures and nanocomposites by laser deposition from target materials on a substrate surface, comprises dividing the target into segments with materials |
| 01/13/2011 | DE102006004394B4 Hartfilm, Mehrschichthartfilm und Herstellungsverfahren dafür Hard film, multilayer hard film and production method thereof |
| 01/12/2011 | EP2272080A2 Device and method for pretreating and coating bodies |
| 01/12/2011 | EP2271787A1 Evaporator body |
| 01/12/2011 | EP2271786A1 Method for treating a metal oxide layer |
| 01/12/2011 | EP2271785A1 Erosion protection coating |
| 01/12/2011 | EP2271784A1 Sherardizing method |
| 01/12/2011 | EP2044609B1 Ion deposition apparatus |
| 01/12/2011 | CN201708179U Susceptor of semiconductor solar coating process chamber |
| 01/12/2011 | CN201704401U Rectangular planar magnetic control target with alternating electromagnetic field |
| 01/12/2011 | CN201704400U Magnetron sputtering device combination unit |
| 01/12/2011 | CN201704399U Vacuum sputtering and coating equipment with vacuum pump protection structure |
| 01/12/2011 | CN201704398U Vacuum sputtering coating equipment |
| 01/12/2011 | CN201704397U Automatic integrative device for sand blasting, washing and drying |
| 01/12/2011 | CN1932081B Method for restoring portion of turbine component |
| 01/12/2011 | CN1537318B Sputtering magnetron arrangements with adjustable magnetic field strength |
| 01/12/2011 | CN101946562A Vapor generator and vapor deposition apparatus |
| 01/12/2011 | CN101946022A Take-up type vacuum deposition apparatus |
| 01/12/2011 | CN101946021A Thin film forming apparatus and thin film forming method |
| 01/12/2011 | CN101946020A Method of metal coating and coating produced thereby |
| 01/12/2011 | CN101945546A Manufacturing method of shell and shell obtained by same |
| 01/12/2011 | CN101944482A Process for forming dielectric films |
| 01/12/2011 | CN101944439A Preparation method for TiO2 nanometer rod array of dye sensitized solar cell |
| 01/12/2011 | CN101943214A Low frictional sliding member and low frictional sliding mechanism by using the same |
| 01/12/2011 | CN101942647A Structure of coated process chamber |
| 01/12/2011 | CN101942646A Film making equipment |
| 01/12/2011 | CN101942645A Film plating machine |
| 01/12/2011 | CN101942644A Translucent reflective film and reflective film for optical recording medium, and ag alloy sputtering target for forming such translucent reflective film and reflective film |
| 01/12/2011 | CN101942643A Method for continuously producing non-centralized positioning workpieces by using single-inlet and outlet sputtering machine |
| 01/12/2011 | CN101942642A P-type semiconductor zinc oxide films process for preparation thereof, and pulsed laser deposition method using transparent substrates |