| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
|---|
| 02/24/2011 | DE112009000280T5 Polykristalliner MgO-Sinterkörper, Verfahren zu seiner Herstellung und MgO-Sputtertarget The polycrystalline MgO sintered body, method of producing the sputtering target and MgO |
| 02/24/2011 | DE102005057359B4 Verfahren und Vorrichtung zur Innenbeschichtung von Glas-Hohlkörpern Method and apparatus for the internal coating of hollow glass bodies |
| 02/23/2011 | EP2287356A1 Sputter target, method and apparatus for manufacturing sputter targets |
| 02/23/2011 | EP2287355A1 Fine grained cemented carbide with refined structure |
| 02/23/2011 | EP2287354A1 WATER-REACTIVE Al COMPOSITE MATERIAL, WATER-REACTIVE Al FILM, PROCESS FOR PRODUCTION OF THE Al FILM, AND CONSTITUENT MEMBER FOR FILM DEPOSTION CHAMBER |
| 02/23/2011 | EP2286000A1 Method and system for manufacturing nanostructures |
| 02/23/2011 | EP1996744B1 Antimicrobial coating methods |
| 02/23/2011 | EP1612853B1 Cooling device for vacuum treatment device |
| 02/23/2011 | CN201751428U Vacuum evaporation device with heating mantle |
| 02/23/2011 | CN201751427U Linear evaporation source |
| 02/23/2011 | CN101981718A Piezoelectric thin film, method for manufacturing the same, angular velocity sensor, method for measuring angular velocity by the angular velocity sensor, piezoelectric element, and method for generating electricity by piezoelectric element |
| 02/23/2011 | CN101981224A Sputtering target of nonmagnetic-in-ferromagnetic dispersion type material |
| 02/23/2011 | CN101981223A Vacuum deposition apparatus and method for adjusting temperature |
| 02/23/2011 | CN101981222A Coating process, workpiece or tool and its use |
| 02/23/2011 | CN101980986A Transparent conductive oxide coating for thin film photovoltaic applications and methods of making the same |
| 02/23/2011 | CN101980935A Method and device for fixing and transporting impact-sensitive sheets in sputter feed systems |
| 02/23/2011 | CN101979706A Vaporizer |
| 02/23/2011 | CN101979705A 改进的pvd靶 Improved pvd target |
| 02/23/2011 | CN101979704A Method for preparing ZnS/SnS double-layer membrane by vacuum evaporation |
| 02/23/2011 | CN101979703A Method for performing surface treatment on golf head by aluminium -titanium nitride composite coating |
| 02/23/2011 | CN101231431B Indium tin oxide target, method of manufacturing the same and transparent electrode manufactured by using the same |
| 02/22/2011 | US7892979 Columnar structured material and method of manufacturing the same |
| 02/22/2011 | US7892917 Method for forming bismuth titanium silicon oxide thin film |
| 02/22/2011 | US7892660 Wetting resistant materials and articles made therewith |
| 02/22/2011 | US7892457 Sputtering target, thin film for optical information recording medium and process for producing the same |
| 02/22/2011 | US7892406 Ionized physical vapor deposition (iPVD) process |
| 02/22/2011 | US7892405 Methods and apparatus for magnetron sputtering |
| 02/22/2011 | US7892367 Tantalum sputtering target |
| 02/22/2011 | US7891537 Sputter target and backing plate assembly |
| 02/22/2011 | CA2538081C Heat treatable coated article with niobium zirconium inclusive ir reflecting layer and method of making same |
| 02/22/2011 | CA2505027C Method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide |
| 02/17/2011 | WO2011019566A2 Process kit for rf physical vapor deposition |
| 02/17/2011 | WO2011019040A1 Substrate having transparent conductive film attached thereto, and substrate for plasma display panel |
| 02/17/2011 | WO2011019039A1 Substrate having transparent conductive film attached thereto, and substrate for plasma display panel |
| 02/17/2011 | WO2011018971A1 Tantalum sputtering target |
| 02/17/2011 | WO2011018970A1 Tantalum sputtering target |
| 02/17/2011 | WO2011018895A1 Sputtering target and method for manufacturing a sputtering target |
| 02/17/2011 | WO2011017758A1 Reflective heatshrinkable film |
| 02/17/2011 | WO2010127866A3 Sanitary objects |
| 02/17/2011 | WO2010096327A3 Cutting tool components with wear-resistant cladding layer |
| 02/17/2011 | US20110039403 Method for Implanting Ions In Semiconductor Device |
| 02/17/2011 | US20110039116 Colored plating structure and method thereof |
| 02/17/2011 | US20110039112 Optical component using composite substrate and process for producing same |
| 02/17/2011 | US20110039071 METHOD OF MANUFACTURING A Si(1-v-w-x)CwAlxNv SUBSTRATE, METHOD OF MANUFACTURING AN EPITAXIAL WAFER, Si(1-v-w-x)CwAlxNv SUBSTRATE, AND EPITAXIAL WAFER |
| 02/17/2011 | US20110039039 Wetting a surface of a solid substrate with a liquid metal |
| 02/17/2011 | US20110039038 Method for decorating perfume bottle, and decorating device |
| 02/17/2011 | US20110039035 Tunable variable emissivity materials and methods for controlling the temperature of spacecraft using tunable variable emissivity materials |
| 02/17/2011 | US20110039034 Pulsed deposition and recrystallization and tandem solar cell design utilizing crystallized/amorphous material |
| 02/17/2011 | US20110039026 Film deposition apparatus, film deposition method, and computer readable storage medium |
| 02/17/2011 | US20110039020 Magnetic Materials Having Superparamagnetic Particles |
| 02/17/2011 | US20110038052 Prismatic Laminate and Method for Making The Same |
| 02/17/2011 | US20110037976 Flexible surface enhanced raman spectroscopy (sers) substrates, methods of making, and methods of use |
| 02/17/2011 | US20110037658 Multi-layer thin film internal antenna, terminal having the same, and method for manufacturing multi-layer thin film internal antenna |
| 02/17/2011 | US20110036711 Sputtering device |
| 02/17/2011 | US20110036710 Ge-Cr Alloy Sputtering Target |
| 02/17/2011 | US20110036709 Process kit for rf physical vapor deposition |
| 02/17/2011 | US20110036708 Magnetron sputtering device |
| 02/17/2011 | US20110036707 Sputtering method |
| 02/17/2011 | US20110036395 Methods for forming nanostructures and photovoltaic cells implementing same |
| 02/17/2011 | US20110036392 Thin-film solar cell module and a manufacturing method thereof |
| 02/17/2011 | DE112009000123T5 Substratauflage, mit dieser versehene Zerstäubungsvorrichtung, und Dünnschichtbildungsverfahren Substrate support provided with this sputtering apparatus and film formation method |
| 02/17/2011 | DE102009049954A1 Einrichtung zur Temperaturführung von Substraten Means for controlling the temperature of substrates |
| 02/17/2011 | DE102009037326A1 Method for the vacuum deposition of substrates comprises forming an active electrode surface of an electrode of an electrode arrangement in the process chamber whilst the electrode surface is added and removed |
| 02/17/2011 | DE102009036982A1 Apparatus for plasma-enhanced deposition of amorphous layer on silicon photovoltaic substrate from gas phase, comprises partially transparent electrode for components of plasma disposed between photovoltaic substrate and another electrode |
| 02/17/2011 | DE102007019982B4 Anordnung zur Ausbildung von Beschichtungen auf Substraten im Vakuum Arrangement for the formation of coatings on substrates in vacuum |
| 02/16/2011 | EP2284297A1 Method for achieving improved epitaxy quality (surface texture and defect density) on free-standing (aluminium, indium, gallium) nitride ((AI, In,Ga)N) substrates for opto-electronic and electronic devices |
| 02/16/2011 | EP2284293A1 Sintered-oxide target for sputtering and process for producing the same |
| 02/16/2011 | EP2284292A1 Vacuum vapor deposition apparatus |
| 02/16/2011 | EP2284291A1 WATER-REACTIVE Al COMPOSITE MATERIAL, WATER-REACTIVE Al FILM, METHOD FOR PRODUCTION OF THE AL FILM, AND STRUCTURAL MEMBER FOR FILM-FORMING CHAMBER |
| 02/16/2011 | EP2284290A1 Water-reactive al composite material, water-reactive al film, method for production of the al film, and structural member for film-forming chamber |
| 02/16/2011 | EP2284289A1 Tungsten sintered material sputtering target |
| 02/16/2011 | EP2167699B1 Method for masking cooling holes and device for using in a masking process for masking cooling holes |
| 02/16/2011 | EP1771602B1 Highly oxidation resistant hard coating materials for cutting tools |
| 02/16/2011 | EP1584706B1 Copper alloy sputtering target and semiconductor element wiring |
| 02/16/2011 | EP1307907B1 Method for depositing a fluorine-doped silica film |
| 02/16/2011 | CN201746585U Rotating cathode driving device for vacuum magnetron sputtering coating |
| 02/16/2011 | CN201746584U Novel vacuum coating equipment |
| 02/16/2011 | CN201746583U Penning discharge ion source flexible material vacuum coating electrode |
| 02/16/2011 | CN1776524B Method of descaling a mask |
| 02/16/2011 | CN101978431A Electric conductor and process for its production |
| 02/16/2011 | CN101978095A Coaxial microwave assisted deposition and etch systems |
| 02/16/2011 | CN101978094A Magnetron sputtering apparatus and magnetron sputtering method |
| 02/16/2011 | CN101978093A Deposition apparatus and electronic device manufacturing method |
| 02/16/2011 | CN101978092A Vaporizor body |
| 02/16/2011 | CN101978091A Reel-to-reel reaction of a precursor film to form solar cell absorber |
| 02/16/2011 | CN101976725A SiO2/Sb80Te20 nano composite multi-layered phase-change film material with adjustable crystallization temperature and preparation method thereof |
| 02/16/2011 | CN101975384A Manufacturing method of radiating structure of LED (Light Emitting Diode) lamp |
| 02/16/2011 | CN101974733A Rotary mechanism for vacuum continuous coating production line |
| 02/16/2011 | CN101974732A System and method for controlling ion density and energy using modulated power signals |
| 02/16/2011 | CN101974731A Vacuum magnetic control coating process |
| 02/16/2011 | CN101974730A Method for plating easily-oxidized film on micro-size granules through magnetic control sputtering |
| 02/16/2011 | CN101974729A Adjustable film plating die |
| 02/16/2011 | CN101591754B High-obdurability low-alloy cold stamping die steel and hot chemical treatment process |
| 02/16/2011 | CN101410931B Coating apparatus |
| 02/16/2011 | CN101294270B Equipment and method for producing nichrome composite plate with vacuum arc ion plating |
| 02/16/2011 | CN101148329B Low radiation coated glass with double-silver composite structure and technique |
| 02/15/2011 | US7890220 Low overhead closed loop control system |
| 02/15/2011 | US7890217 Integrated real-time power and solar farm control system |
| 02/15/2011 | US7887934 Wetting resistant materials and articles made therewith |
| 02/15/2011 | US7887890 Method of manufacturing plastic substrate using plasma process and plastic substrate manufactured using the method |