Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2011
04/19/2011US7927709 Wear-resistant coating and a component having a wear-resistant coating
04/19/2011US7927651 Biosensor having nano wire for detecting food additive mono sodium glutamate and manufacturing method thereof
04/19/2011US7927473 Substrate holder, deposition method using substrate holder, hard disk manufacturing method, deposition apparatus, and program
04/19/2011US7927472 Optical film thickness controlling method, optical film thickness controlling apparatus, dielectric multilayer film manufacturing apparatus, and dielectric multilayer film manufactured using the same controlling apparatus or manufacturing apparatus
04/19/2011US7927467 Method of manufacturing discrete track recording medium and discrete track recording medium
04/19/2011US7927466 Pulsed magnetron sputtering deposition with preionization
04/19/2011US7927434 Co-Cr-Pt-B alloy sputtering target
04/19/2011US7927424 Padded clamp ring with edge exclusion for deposition of thick AlCu/AlSiCu/Cu metal alloy layers
04/19/2011US7926446 Multi-place coating apparatus and process for plasma coating
04/14/2011WO2011043486A1 Silver alloy target for forming reflection electrode film for organic el element, and method for manufacturing the silver alloy target
04/14/2011WO2011043409A1 Underlying layer of alignment film for oxide superconductor, method of forming same, and device for forming same
04/14/2011WO2011043407A1 Ion beam assisted sputtering device and ion beam assisted sputtering method
04/14/2011WO2011043353A1 Filament for electron gun and method for producing same
04/14/2011WO2011043235A1 Indium oxide sintered body, indium oxide transparent conductive film, and method for manufacturing the transparent conductive film
04/14/2011WO2011043163A1 Semiconductor device and manufacturing method thereof
04/14/2011WO2011043063A1 Substrate cooling device, sputtering device, and method for producing an electronic device
04/14/2011WO2011042459A1 Atmospheric pressure plasma method for producing surface-modified particles and coatings
04/14/2011WO2011042328A1 Method of coating a substrate
04/14/2011WO2011006109A3 High efficiency low energy microwave ion/electron source
04/14/2011WO2011005021A3 Substrate for the deposition of a deposition apparatus, film-forming method, and method for manufacturing an organic electroluminescence display device using the substrate for deposition
04/14/2011US20110086233 Hard coating layer and method for forming the same
04/14/2011US20110086231 Dispersion for applying a metal layer
04/14/2011US20110084239 Transparent Conducting Oxides and Production Thereof
04/14/2011US20110084198 Interior rearview mirror information display system for a vehicle
04/14/2011US20110083960 Sputtering apparatus
04/14/2011US20110083892 Electronic component-embedded printed circuit board and method of manufacturing the same
04/14/2011DE102010007796B3 Röntgenopakes bariumfreies Glas und dessen Verwendung Radiopaque barium glass and its use
04/13/2011EP2309220A1 Coating thickness measuring device and method
04/13/2011EP2309021A1 Copper alloy sputtering target and semiconductor element wiring
04/13/2011EP2309020A1 Use of nitrogen based compounds in beam-induced processing
04/13/2011EP2308621A1 Surface-coated cutting tool made of hard metal and manufacturing method for same
04/13/2011EP2307588A1 Method for producing a layer system on a substrate and layer system
04/13/2011EP2307584A1 Anti- tarnish silver alloy
04/13/2011EP1851355B1 Effusion cell valve
04/13/2011EP1528120B1 Hafnium silicide target and method for preparation thereof
04/13/2011EP1114290B1 Continuous pusher furnace having traveling gas barrier
04/13/2011CN201793730U Evaporation plating equipment
04/13/2011CN201793729U Cluster type continuous coating device
04/13/2011CN201793728U Wafer position calibrating device
04/13/2011CN201793727U Planet gear mouse cage type work rest
04/13/2011CN201793726U Vacuum magnetron sputtering and multi-arc ion recombination film plating machine
04/13/2011CN201793725U Vacuum magnetron sputtering film plating machine
04/13/2011CN201793724U Magnetron sputtering target device for preparing optical disc film
04/13/2011CN201793723U Sputtering target with long service life
04/13/2011CN201793722U Vacuum multi-arc ion plating machine
04/13/2011CN201793721U Vacuum electronic gun coating machine
04/13/2011CN201793720U Resistive vacuum evaporation coating machine
04/13/2011CN201793719U Improved structure for evaporation boat system of aluminizing machine
04/13/2011CN201793718U Evaporation electrode
04/13/2011CN201793717U Film-coating umbrella
04/13/2011CN1957106B Film forming apparatus and film forming method
04/13/2011CN1926258B Sputtering target, optical information recording medium and process for producing the same
04/13/2011CN102017080A Method of manufacturing Si(1-v-w-x)CwAlxNv substrate, method of manufacturing epitaxial wafer, Si(1-v-w-x)CwAlxNv substrate, and epitaxial wafer
04/13/2011CN102017079A Process for producing Si(1-v-w-x)CwAlxNv base material, process for producing epitaxial wafer, Si(1-v-w-x)CwAlxNv base material, and epitaxial wafer
04/13/2011CN102016135A Method of manufacturing Si(1-v-w-x)CwAlxNv substrate, method of manufacturing epitaxial wafer, Si(1-v-w-x)CwAlxNv substrate, and epitaxial wafer
04/13/2011CN102016112A Sintered-oxide target for sputtering and process for producing the same
04/13/2011CN102016111A Cylindrical sputtering target and method for manufacturing the same
04/13/2011CN102016110A Sputtering target material for manufacturing Ni-W-P,zr-based intermediate layer film in perpendicular magnetic recording medium and thin film manufactured by using the target material
04/13/2011CN102016109A Magnetron sputtering apparatus and magnetron sputtering method
04/13/2011CN102016108A Method for producing metal oxide layers having a pre-defined structure by way of arc evaporation
04/13/2011CN102016107A Heat equalizer and organic film forming apparatus
04/13/2011CN102016106A Film-forming method and film-forming apparatus
04/13/2011CN102016105A Method of diffusion zinc coating
04/13/2011CN102016104A Method for producing metal oxide layers by way of arc evaporation
04/13/2011CN102016103A Thin film forming method and film forming apparatus
04/13/2011CN102016102A Water-reactive Al composite material, water-reactive Al film, method for production of the Al film, and structural member for film-forming chamber
04/13/2011CN102016101A Water-reactive Al composite material, water-reactive Al film, process for production of the Al film, and constituent member for film depostion chamber
04/13/2011CN102016100A Process for production of water-reactive Al film and constituent members for film deposition chambers
04/13/2011CN102016099A Method for production of water-reactive Al film, and structural member for film-forming chamber
04/13/2011CN102015289A A laminate and composite layer comprising a substrate and a coating, and a process and apparatus for preparation thereof
04/13/2011CN102013279A Method for preparing indium tin oxide target material slurry
04/13/2011CN102011096A Vacuum evaporation system capable of controlling evaporating airflow distribution and components
04/13/2011CN102011095A Antibiosis polycarbonate film prepared by magnetron sputtering technology
04/13/2011CN102011094A Optical evaporation material and preparation method thereof
04/13/2011CN102011093A High-hardness and high-elastic modulus CrAlN/AlON nano multilayer coating material and preparation method thereof
04/13/2011CN102011092A High-hardness high-elastic-modulus CrAlN/SiO2 nano multilayer coating material and preparation method thereof
04/13/2011CN102011091A CrAlN protective coating with high hardness and high elastic modulus and preparation method thereof
04/13/2011CN102011090A TiAlN/TiAlCN multilayer coating of substrate surface and preparing method thereof
04/13/2011CN102011089A Method for preparing nanocrystalline resistance conversion material
04/13/2011CN102011088A Mask adsorption structure and method for attaching mask
04/13/2011CN102011083A Vacuum photoconductive molecular/atomic gas micro-injection device
04/13/2011CN101724810B Evaporation method and evaporation equipment
04/13/2011CN101705473B Physical vapor deposition equipment for use in study on light trapping structure of silicon thin-film battery
04/13/2011CN101660117B Solar selective absorbing coating and preparation method thereof
04/13/2011CN101638770B Method for improving aluminum solderability of vacuum coating film
04/13/2011CN101570851B Method for applying magnetic field to sputtering coated cathode
04/13/2011CN101550533B Antistatic optical substrate preparation method
04/13/2011CN101512038B Thin film forming method and thin film forming apparatus
04/13/2011CN101501237B Winding vacuum film forming process and apparatus
04/13/2011CN101469406B Sputtering apparatus
04/13/2011CN101405432B Edge coating in continuous deposition line
04/13/2011CN101313204B Vaccum measuring meter with shield device
04/13/2011CN101268211B Sputtering target, transparent conductive film and transparent electrode
04/13/2011CN101138052B Amorphous transparent conductive film and production method for amorphous conductive film
04/13/2011CN101133182B Metal double layer structure and method for manufacturing the same and regeneration method of sputtering target employing that method
04/12/2011US7924489 Hidden micromirror support structure
04/12/2011US7923055 Method of manufacturing a drug delivery system
04/12/2011US7922882 Substrate holding device, substrate processing system and liquid crystal display device
04/12/2011US7922881 Sputtering target with an insulating ring and a gap between the ring and the target
04/12/2011US7922880 Method and apparatus for increasing local plasma density in magnetically confined plasma