Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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04/19/2011 | US7927709 Wear-resistant coating and a component having a wear-resistant coating |
04/19/2011 | US7927651 Biosensor having nano wire for detecting food additive mono sodium glutamate and manufacturing method thereof |
04/19/2011 | US7927473 Substrate holder, deposition method using substrate holder, hard disk manufacturing method, deposition apparatus, and program |
04/19/2011 | US7927472 Optical film thickness controlling method, optical film thickness controlling apparatus, dielectric multilayer film manufacturing apparatus, and dielectric multilayer film manufactured using the same controlling apparatus or manufacturing apparatus |
04/19/2011 | US7927467 Method of manufacturing discrete track recording medium and discrete track recording medium |
04/19/2011 | US7927466 Pulsed magnetron sputtering deposition with preionization |
04/19/2011 | US7927434 Co-Cr-Pt-B alloy sputtering target |
04/19/2011 | US7927424 Padded clamp ring with edge exclusion for deposition of thick AlCu/AlSiCu/Cu metal alloy layers |
04/19/2011 | US7926446 Multi-place coating apparatus and process for plasma coating |
04/14/2011 | WO2011043486A1 Silver alloy target for forming reflection electrode film for organic el element, and method for manufacturing the silver alloy target |
04/14/2011 | WO2011043409A1 Underlying layer of alignment film for oxide superconductor, method of forming same, and device for forming same |
04/14/2011 | WO2011043407A1 Ion beam assisted sputtering device and ion beam assisted sputtering method |
04/14/2011 | WO2011043353A1 Filament for electron gun and method for producing same |
04/14/2011 | WO2011043235A1 Indium oxide sintered body, indium oxide transparent conductive film, and method for manufacturing the transparent conductive film |
04/14/2011 | WO2011043163A1 Semiconductor device and manufacturing method thereof |
04/14/2011 | WO2011043063A1 Substrate cooling device, sputtering device, and method for producing an electronic device |
04/14/2011 | WO2011042459A1 Atmospheric pressure plasma method for producing surface-modified particles and coatings |
04/14/2011 | WO2011042328A1 Method of coating a substrate |
04/14/2011 | WO2011006109A3 High efficiency low energy microwave ion/electron source |
04/14/2011 | WO2011005021A3 Substrate for the deposition of a deposition apparatus, film-forming method, and method for manufacturing an organic electroluminescence display device using the substrate for deposition |
04/14/2011 | US20110086233 Hard coating layer and method for forming the same |
04/14/2011 | US20110086231 Dispersion for applying a metal layer |
04/14/2011 | US20110084239 Transparent Conducting Oxides and Production Thereof |
04/14/2011 | US20110084198 Interior rearview mirror information display system for a vehicle |
04/14/2011 | US20110083960 Sputtering apparatus |
04/14/2011 | US20110083892 Electronic component-embedded printed circuit board and method of manufacturing the same |
04/14/2011 | DE102010007796B3 Röntgenopakes bariumfreies Glas und dessen Verwendung Radiopaque barium glass and its use |
04/13/2011 | EP2309220A1 Coating thickness measuring device and method |
04/13/2011 | EP2309021A1 Copper alloy sputtering target and semiconductor element wiring |
04/13/2011 | EP2309020A1 Use of nitrogen based compounds in beam-induced processing |
04/13/2011 | EP2308621A1 Surface-coated cutting tool made of hard metal and manufacturing method for same |
04/13/2011 | EP2307588A1 Method for producing a layer system on a substrate and layer system |
04/13/2011 | EP2307584A1 Anti- tarnish silver alloy |
04/13/2011 | EP1851355B1 Effusion cell valve |
04/13/2011 | EP1528120B1 Hafnium silicide target and method for preparation thereof |
04/13/2011 | EP1114290B1 Continuous pusher furnace having traveling gas barrier |
04/13/2011 | CN201793730U Evaporation plating equipment |
04/13/2011 | CN201793729U Cluster type continuous coating device |
04/13/2011 | CN201793728U Wafer position calibrating device |
04/13/2011 | CN201793727U Planet gear mouse cage type work rest |
04/13/2011 | CN201793726U Vacuum magnetron sputtering and multi-arc ion recombination film plating machine |
04/13/2011 | CN201793725U Vacuum magnetron sputtering film plating machine |
04/13/2011 | CN201793724U Magnetron sputtering target device for preparing optical disc film |
04/13/2011 | CN201793723U Sputtering target with long service life |
04/13/2011 | CN201793722U Vacuum multi-arc ion plating machine |
04/13/2011 | CN201793721U Vacuum electronic gun coating machine |
04/13/2011 | CN201793720U Resistive vacuum evaporation coating machine |
04/13/2011 | CN201793719U Improved structure for evaporation boat system of aluminizing machine |
04/13/2011 | CN201793718U Evaporation electrode |
04/13/2011 | CN201793717U Film-coating umbrella |
04/13/2011 | CN1957106B Film forming apparatus and film forming method |
04/13/2011 | CN1926258B Sputtering target, optical information recording medium and process for producing the same |
04/13/2011 | CN102017080A Method of manufacturing Si(1-v-w-x)CwAlxNv substrate, method of manufacturing epitaxial wafer, Si(1-v-w-x)CwAlxNv substrate, and epitaxial wafer |
04/13/2011 | CN102017079A Process for producing Si(1-v-w-x)CwAlxNv base material, process for producing epitaxial wafer, Si(1-v-w-x)CwAlxNv base material, and epitaxial wafer |
04/13/2011 | CN102016135A Method of manufacturing Si(1-v-w-x)CwAlxNv substrate, method of manufacturing epitaxial wafer, Si(1-v-w-x)CwAlxNv substrate, and epitaxial wafer |
04/13/2011 | CN102016112A Sintered-oxide target for sputtering and process for producing the same |
04/13/2011 | CN102016111A Cylindrical sputtering target and method for manufacturing the same |
04/13/2011 | CN102016110A Sputtering target material for manufacturing Ni-W-P,zr-based intermediate layer film in perpendicular magnetic recording medium and thin film manufactured by using the target material |
04/13/2011 | CN102016109A Magnetron sputtering apparatus and magnetron sputtering method |
04/13/2011 | CN102016108A Method for producing metal oxide layers having a pre-defined structure by way of arc evaporation |
04/13/2011 | CN102016107A Heat equalizer and organic film forming apparatus |
04/13/2011 | CN102016106A Film-forming method and film-forming apparatus |
04/13/2011 | CN102016105A Method of diffusion zinc coating |
04/13/2011 | CN102016104A Method for producing metal oxide layers by way of arc evaporation |
04/13/2011 | CN102016103A Thin film forming method and film forming apparatus |
04/13/2011 | CN102016102A Water-reactive Al composite material, water-reactive Al film, method for production of the Al film, and structural member for film-forming chamber |
04/13/2011 | CN102016101A Water-reactive Al composite material, water-reactive Al film, process for production of the Al film, and constituent member for film depostion chamber |
04/13/2011 | CN102016100A Process for production of water-reactive Al film and constituent members for film deposition chambers |
04/13/2011 | CN102016099A Method for production of water-reactive Al film, and structural member for film-forming chamber |
04/13/2011 | CN102015289A A laminate and composite layer comprising a substrate and a coating, and a process and apparatus for preparation thereof |
04/13/2011 | CN102013279A Method for preparing indium tin oxide target material slurry |
04/13/2011 | CN102011096A Vacuum evaporation system capable of controlling evaporating airflow distribution and components |
04/13/2011 | CN102011095A Antibiosis polycarbonate film prepared by magnetron sputtering technology |
04/13/2011 | CN102011094A Optical evaporation material and preparation method thereof |
04/13/2011 | CN102011093A High-hardness and high-elastic modulus CrAlN/AlON nano multilayer coating material and preparation method thereof |
04/13/2011 | CN102011092A High-hardness high-elastic-modulus CrAlN/SiO2 nano multilayer coating material and preparation method thereof |
04/13/2011 | CN102011091A CrAlN protective coating with high hardness and high elastic modulus and preparation method thereof |
04/13/2011 | CN102011090A TiAlN/TiAlCN multilayer coating of substrate surface and preparing method thereof |
04/13/2011 | CN102011089A Method for preparing nanocrystalline resistance conversion material |
04/13/2011 | CN102011088A Mask adsorption structure and method for attaching mask |
04/13/2011 | CN102011083A Vacuum photoconductive molecular/atomic gas micro-injection device |
04/13/2011 | CN101724810B Evaporation method and evaporation equipment |
04/13/2011 | CN101705473B Physical vapor deposition equipment for use in study on light trapping structure of silicon thin-film battery |
04/13/2011 | CN101660117B Solar selective absorbing coating and preparation method thereof |
04/13/2011 | CN101638770B Method for improving aluminum solderability of vacuum coating film |
04/13/2011 | CN101570851B Method for applying magnetic field to sputtering coated cathode |
04/13/2011 | CN101550533B Antistatic optical substrate preparation method |
04/13/2011 | CN101512038B Thin film forming method and thin film forming apparatus |
04/13/2011 | CN101501237B Winding vacuum film forming process and apparatus |
04/13/2011 | CN101469406B Sputtering apparatus |
04/13/2011 | CN101405432B Edge coating in continuous deposition line |
04/13/2011 | CN101313204B Vaccum measuring meter with shield device |
04/13/2011 | CN101268211B Sputtering target, transparent conductive film and transparent electrode |
04/13/2011 | CN101138052B Amorphous transparent conductive film and production method for amorphous conductive film |
04/13/2011 | CN101133182B Metal double layer structure and method for manufacturing the same and regeneration method of sputtering target employing that method |
04/12/2011 | US7924489 Hidden micromirror support structure |
04/12/2011 | US7923055 Method of manufacturing a drug delivery system |
04/12/2011 | US7922882 Substrate holding device, substrate processing system and liquid crystal display device |
04/12/2011 | US7922881 Sputtering target with an insulating ring and a gap between the ring and the target |
04/12/2011 | US7922880 Method and apparatus for increasing local plasma density in magnetically confined plasma |