C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material

Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/2011
06/01/2011	CN201850308U Workpiece turntable of vacuum vertical coating machine
06/01/2011	CN201850307U Ion film plating machine with hollow horizontal type vacuum chamber
06/01/2011	CN201850306U Mini type plasma film coating device for stomatological department
06/01/2011	CN1965431B Fuel cell separator and method for manufacturing the same
06/01/2011	CN102084275A Wire grid type polarizer, and method for manufacturing the polarizer
06/01/2011	CN102084025A Film-forming method and oil repellent base
06/01/2011	CN102084024A Power source device
06/01/2011	CN102084023A Magnetron sputtering method, and magnetron sputtering device
06/01/2011	CN102084022A Thin film manufacturing method and silicon material that can be used with said method
06/01/2011	CN102084015A Al-Ni-based alloy wiring electrode material
06/01/2011	CN102082228A Nano compound phase-change material and application thereof to phase-change storage
06/01/2011	CN102082109A Susceptor unit and apparatus for processing substrate by using the susceptor unit
06/01/2011	CN102081408A Ion concentration monitoring system
06/01/2011	CN102080215A Vacuum deposition sealing device
06/01/2011	CN102080214A Coating device
06/01/2011	CN102080213A Multi-motion mode planetary workpiece rest of vacuum coating machine
06/01/2011	CN102080212A Low-temperature manufacturing method and special target of ZnO transparent conductive film
06/01/2011	CN102080211A Shielding baffle plate mechanism used for vertical multi-target vacuum coating machine
06/01/2011	CN102080210A Evaporation plating device
06/01/2011	CN102080209A Vacuum coating device
06/01/2011	CN102080208A Ti-Ni-Hf-Cu quaternary high-temperature shape memory alloy film and preparation method thereof
06/01/2011	CN102080207A DLC (diamond-like carbon)/TiAlN (titanium aluminium nitride)/CrN (chromium nitride)/Cr (chromium) multilayer superhard film coating and preparation method thereof
06/01/2011	CN102080206A Mask plate bearing device
06/01/2011	CN102080205A Vacuum processing chamber formed by the casting of aluminum
06/01/2011	CN102079818A Electroactive polymer material and preparation method thereof
06/01/2011	CN101671808B Method for preparing ultralow elasticity modulus high-wearing feature shell microstructural membrane on surface of titanium
06/01/2011	CN101660132B Method for preparing silicon-carbon hydride film by magnetron sputtering
06/01/2011	CN101660130B Method for preparing niobium sputtering target
06/01/2011	CN101451230B Metal evaporation equipment
06/01/2011	CN101403089B Batch production type film vapor deposition device using multi-layer substrate fixer
06/01/2011	CN101130857B Auxiliary control device for physical vapor deposition equipment and method thereof
06/01/2011	CN101078107B Insulation multilayer thin film manufacturing device
05/2011
05/31/2011	US7951463 Water collapsible aluminum film
05/31/2011	US7951459 Oxidation resistant coatings, processes for coating articles, and their coated articles
05/31/2011	US7951276 Cluster generator
05/31/2011	US7951275 Sputtering target and method for finishing surface of such target
05/31/2011	US7951272 Thin film producing method
05/26/2011	WO2011063310A2 Physical vapor deposition (pvd) and cold anodization metal coloring
05/26/2011	WO2011062945A1 Apparatus and method for controllably implanting workpieces
05/26/2011	WO2011062943A2 Planar magnetron sputtering source producing high target utilization and stable coating uniformity over lifetime
05/26/2011	WO2011062450A2 Sputtering target of multi-component single body and method for preparation thereof, and method for producing multi-component alloy-based nanostructured thin films using same
05/26/2011	WO2011062271A1 Aromatic polyimide film, laminate, and solar cell
05/26/2011	WO2011062192A1 Ag alloy thermal diffusion control film used in magnetic recording medium for thermally assisted recording, magnetic recording medium for thermally assisted recording, and sputtering target
05/26/2011	WO2011062134A1 In-line type film forming apparatus and method for manufacturing magnetic recording medium
05/26/2011	WO2011062058A1 Semiconductor device
05/26/2011	WO2011062050A1 Method of manufacturing piezoelectric thin film, and piezoelectric thin film and piezoelectric element
05/26/2011	WO2011062021A1 Bi-ge-o sintered body sputtering target, method for producing same, and optical recording medium
05/26/2011	WO2011062003A1 Method for storing lanthanum oxide target, and vacuum-packed lanthanum oxide target
05/26/2011	WO2011062002A1 (sputtering target)-(bucking plate) joint body, and process for production thereof
05/26/2011	WO2011061939A1 Sputtering target and thin film transistor equipped with same
05/26/2011	WO2011061938A1 In-Ga-Zn-O-BASED OXIDE SINTERED BODY SPUTTERING TARGET WITH EXCELLENT STABILITY DURING LONG-TERM DEPOSITION
05/26/2011	WO2011061936A1 In-Ga-Zn TYPE OXIDE SPUTTERING TARGET
05/26/2011	WO2011061930A1 In-ga-zn-type oxide, oxide sintered body, and sputtering target
05/26/2011	WO2011061923A1 In-ga-zn-o type sputtering target
05/26/2011	WO2011061922A1 Manufacturing method and device for transparent conductive film, sputtering target and transparent conductive film
05/26/2011	WO2011061916A1 Method for producing ito sintered body and method for producing ito sputtering target
05/26/2011	WO2011061897A1 Tantalum sputtering target, method for manufacturing tantalum sputtering target, and method for manufacturing semiconductor device
05/26/2011	WO2011061288A1 Device and method for coating a substrate
05/26/2011	WO2011061013A1 Crucible for an electron stream evaporator and operating method for said electron stream evaporator
05/26/2011	WO2011060905A2 Device and method for thermal evaporation of silicon
05/26/2011	WO2011060748A1 Pvd method and apparatus
05/26/2011	WO2011025729A3 Improved plasma ignition performance for low pressure physical vapor deposition (pvd) processes
05/26/2011	WO2011013939A3 Roll-to-roll sputter apparatus for carrying out continuous sputtering, and continuous sputtering method
05/26/2011	WO2011011129A4 Coated tooling
05/26/2011	US20110123930 Ceramic substrate preparation process
05/26/2011	US20110123729 Display substrate and method of manufacturing the same
05/26/2011	US20110123724 Dielectric composite and a method of manufacturing a dielectric composite
05/26/2011	US20110121927 Magnetic field generating apparatus and plasma processing apparatus
05/26/2011	US20110121244 Sputtering target, transparent conductive film and transparent electrode
05/26/2011	US20110120971 Micromachined transducers and method of fabrication
05/26/2011	US20110120878 Method for manufacturing a perpendicular magnetic write head having a tapered write pole and non-magnetic bump structure
05/26/2011	US20110120862 Anode rod for a sputtering system
05/26/2011	US20110120861 Power supply apparatus
05/26/2011	US20110120860 Bipolar pulsed power supply and power supply apparatus having plurality of bipolar pulsed power supplies connected in parallel with each other
05/26/2011	US20110120859 Sputtering apparatus
05/26/2011	US20110120858 Vacuum processing apparatus and optical component manufacturing method
05/26/2011	US20110120855 Vanadium oxide thin films
05/26/2011	US20110120763 Structure and method of forming a film that both prevents electromagnetic interference and transmits and receives signals
05/26/2011	DE112008003935T5 Hartstoffbeschichtung und mit Hartstoffbeschichtung beschichtetes Arbeitswerkzeug Hard coating and coated with hard coating work tool
05/26/2011	DE102009054060A1 Vorrichtung und Verfahren zum Beschichten eines Substrates Apparatus and method for coating a substrate
05/26/2011	CA2780893A1 Method of creating pvd layers using a cylindrical rotating cathode and apparatus for carrying out this method
05/25/2011	EP2325350A1 Anode rod for a sputtering system
05/25/2011	EP2325349A1 Sputter device
05/25/2011	EP2325348A1 Device and method for thermal evaporation of silicon
05/25/2011	EP2324141A2 Wear and corrosion resistant layered composite
05/25/2011	EP2324139A1 Apparatus and method for deposition of material to form a coating
05/25/2011	EP2323932A1 Conveyor assembly and method for conveying a substrate carrier
05/25/2011	EP2323788A1 Biaxially oriented polylactic acid film with high barrier
05/25/2011	EP2214493B1 Process for limiting the growth of microorganisms
05/25/2011	EP1786954B1 Pvd coated ruthenium featured cutting tools
05/25/2011	EP1060285B1 Apparatus and method for depositing a semiconductor material
05/25/2011	CN201842887U Clamp for ion plating machine
05/25/2011	CN201842886U Tantalum sputtering ring
05/25/2011	CN201842885U Tantalum sputtering ring structure
05/25/2011	CN201842884U Ceramic white film product
05/25/2011	CN1920262B Variable-throat exhaust turbocharger and method for manufacturing constituent members of variable throat mechanism
05/25/2011	CN102077377A System and method to fabricate magnetic random access memory
05/25/2011	CN102077325A Film forming method and processing system
05/25/2011	CN102076954A Coating for a high pressure components
05/25/2011	CN102076880A Manufacturing method for vapor deposition device and thin-film device

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