Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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01/26/2011 | CN201722424U Tube target component |
01/26/2011 | CN201722423U Quartz crystal-coating clamp |
01/26/2011 | CN1938449B Ionized physical vapor deposition(IPVD) process |
01/26/2011 | CN1898406B Tool with abrasive coating and its production method |
01/26/2011 | CN101960061A Strand-like material composite with cnt yarns and method for the manufacture thereof |
01/26/2011 | CN101960053A Oxide coated cutting inser |
01/26/2011 | CN101960052A Oxide coated cutting insert |
01/26/2011 | CN101960051A Thermally stabilized (Ti, Si)n layer for cutting tool insert |
01/26/2011 | CN101960043A Target structure and method for manufacturing target structure |
01/26/2011 | CN101960042A Metallic sputtering target material |
01/26/2011 | CN101960041A Film forming source, deposition apparatus and apparatus for manufacturing organic el element |
01/26/2011 | CN101960040A Corrosion resistant object with alloying zone |
01/26/2011 | CN101959821A Textured substrate including a stack with thermal properties |
01/26/2011 | CN101959795A Thin film of metal silicon compound and process for producing the thin film of metal silicon compound |
01/26/2011 | CN101958236A Semiconductor substrate and preparation method thereof |
01/26/2011 | CN101956177A Rotary bin for vacuum continuous coating production line |
01/26/2011 | CN101956176A Continuous evaporation apparatus |
01/26/2011 | CN101956175A Vacuum continuous coating system and method for assembling and disassembling masks by using same |
01/26/2011 | CN101956174A Circulating evaporation device |
01/26/2011 | CN101956173A Bearing assembly and coating device utilizing same |
01/26/2011 | CN101956172A Baffle plate mechanism of observing window |
01/26/2011 | CN101956171A Ion injection and plasma deposition equipment and method for processing films by using plasmas |
01/26/2011 | CN101956170A Magnetron sputtering target |
01/26/2011 | CN101956169A Rotating target for vacuum sputtering equipment |
01/26/2011 | CN101956168A Method for manufacturing tungsten titanium alloy target structure |
01/26/2011 | CN101956167A Method for preparing target structure |
01/26/2011 | CN101956166A Method for preparing plumbum magnesium niobate-plumbum titanate ferroelectric film |
01/26/2011 | CN101956165A Method for preparing antibacterial and wear-resistant stainless steel permeation layer |
01/26/2011 | CN101956164A Method for preparing copper indium gallium selenide film and photovoltaic film battery based on selenium plasma |
01/26/2011 | CN101956163A Vacuum vapor deposition apparatus |
01/26/2011 | CN101956162A Heating platform |
01/26/2011 | CN101956161A 离子镀膜装置 Ion plating apparatus |
01/26/2011 | CN101956160A Method for evaporating metal film on surface of flexible substance in gas scattering way |
01/26/2011 | CN101956159A Method for preparing high-purity molybdenum titanium sputtering target |
01/26/2011 | CN101956158A Preparation method of rare earth doped Bi2Te3 based thermoelectric film material |
01/26/2011 | CN101956157A Film plating method of large-caliber ZnS infrared window |
01/26/2011 | CN101956156A Processing method of physical vapor deposition coil and physical vapor deposition coil structure |
01/26/2011 | CN101640234B Method for producing CdS/CdTe solar cell by magnetron sputtering method |
01/26/2011 | CN101624694B Target heat treatment method |
01/26/2011 | CN101620280B Film system of infrared double-waveband antireflection film system and plating method thereof |
01/26/2011 | CN101598824B Soft light enhancement anti-dazzle reflecting mirror |
01/26/2011 | CN101542696B Al alloy film for display device, display device, and sputtering target |
01/26/2011 | CN101403095B Workpiece clamping head structure |
01/26/2011 | CN101370957B Cathode evaporator |
01/26/2011 | CN101359732B Preparation of lithium ionic secondary cell barrier negative pole |
01/26/2011 | CN101359716B Co(x)C(1-x)/Co/Si multilayered structure granule film material having room temperature low field large magnetic resistance effect |
01/26/2011 | CN101300372B Magnet structure for magnetron sputtering system, cathode electrode unit and magnetron sputtering system |
01/25/2011 | US7877120 Battery-operated wireless-communication apparatus and method |
01/25/2011 | US7875324 Biological laser printing via indirect photon-biomaterial interactions |
01/25/2011 | US7875199 Radical generating method, etching method and apparatus for use in these methods |
01/25/2011 | US7875156 Probe storage container, prober apparatus, probe arranging method and manufacturing method of probe storage container |
01/25/2011 | US7875155 Transparent electrically conductive film and method for production thereof |
01/25/2011 | US7875154 Preparation method of palladium alloy composite membrane for hydrogen separation |
01/20/2011 | WO2011008539A2 Passivation film for solid electrolyte interface of three dimensional copper containing electrode in energy storage device |
01/20/2011 | WO2011007848A1 Hard film-coated tool and manufacturing method for the same |
01/20/2011 | WO2011007834A1 Film-forming apparatus and film-forming method |
01/20/2011 | WO2011007832A1 Film-forming apparatus |
01/20/2011 | WO2011007831A1 Film-forming apparatus |
01/20/2011 | WO2011007830A1 Film-forming apparatus |
01/20/2011 | WO2011007770A1 Coated-surface sliding part having excellent coating adhesion and method for producing the same |
01/20/2011 | WO2011007580A1 Substrate processing method |
01/20/2011 | WO2011007412A1 Method for producing positive electrode active material layer |
01/20/2011 | WO2011006940A1 Method for producing indexable inserts |
01/20/2011 | WO2010090504A4 Apparatus for vacuum coating |
01/20/2011 | WO2010076421A3 Cathode spraying module |
01/20/2011 | US20110014778 Boron-10 coating process for neutron detector integrated circuit with high aspect ratio trenches |
01/20/2011 | US20110014767 LOW-TEMPERATURE GROWN HIGH QUALITY ULTRA-THIN CoTiO3 GATE DIELECTRICS |
01/20/2011 | US20110014500 Structure and method to fabricate high performance MTJ devices for spin-transfer torque (STT)-RAM application |
01/20/2011 | US20110014442 Polymeric based lens comprising hardening layer, an interferential multi-layer and a hard layer sandwiched between both, and corresponding manufacturing method |
01/20/2011 | US20110014400 Method and system for making thin metal films |
01/20/2011 | US20110014372 Passivation of thermal cracking furnace conduit |
01/20/2011 | US20110014353 Corrosion resistant neutron absorbing coatings |
01/20/2011 | US20110014115 Silver selenide sputtered films and method and apparatus for controlling defect formation in silver selenide sputtered films |
01/20/2011 | US20110013108 Sputtering apparatus and method of preventing damage thereof |
01/20/2011 | US20110012168 Compound semiconductor light-emitting element and illumination device using the same, and method for manufacturing compound semiconductor light-emitting element |
01/20/2011 | US20110011828 Organically modified etch chemistry for zno tco texturing |
01/20/2011 | US20110011737 High-power pulse magnetron sputtering apparatus and surface treatment apparatus using the same |
01/20/2011 | US20110011734 Plasma Gun and Plasma Gun Deposition System Including the Same |
01/20/2011 | US20110011733 Buffer layers for l10 thin film perpendicular media |
01/20/2011 | US20110011732 Method of repairing a molding die for molding glass |
01/20/2011 | US20110011731 Process for producing indium oxide-type transparent electroconductive film |
01/20/2011 | US20110011730 System and method for plasma arc detection, isolation and prevention |
01/20/2011 | US20110011632 Electric conductor and process for its production |
01/20/2011 | US20110011460 Chalcogenide-Based Photovoltaic Devices and Methods of Manufacturing the Same |
01/19/2011 | EP2276061A1 PROCESS FOR PRODUCING SI(1-V-W-X)CWALXNV BASE MATERIAL, PROCESS FOR PRODUCING EPITAXIAL WAFER, SI(1-V-W-X)CWALXNV BASE MATERIAL, AND EPITAXIAL WAFER& xA; |
01/19/2011 | EP2276060A1 PROCESS FOR PRODUCING SI(1-V-W-X)CWALXNV BASE MATERIAL, PROCESS FOR PRODUCING EPITAXIAL WAFER, SI(1-V-W-X)CWALXNVBASE MATERIAL, AND EPITAXIAL WAFER & xA; |
01/19/2011 | EP2275588A1 Vacuum vapor deposition apparatus |
01/19/2011 | EP2275587A1 Process for organic vapor jet deposition |
01/19/2011 | EP2275586A2 Method for producing optically transparent noble metal films |
01/19/2011 | EP2275585A1 Workpiece comprising an alcr-containing hard material layer and production method |
01/19/2011 | EP2274771A1 A method for fabricating thin films |
01/19/2011 | EP2274456A1 Improved junctions in substrate solar cells |
01/19/2011 | EP2274163A1 Inorganic graded barrier film and methods for their manufacture |
01/19/2011 | EP1442154B1 Method for producing a continuous coating at the surface of a component |
01/19/2011 | EP1390558B1 Penning discharge plasma source |
01/19/2011 | CN201713575U Vacuum continuous film plating system |
01/19/2011 | CN201713574U Circulation loop of vacuum chamber |
01/19/2011 | CN201713573U Transmission structure of horizontal film coating production line |
01/19/2011 | CN201713572U Multilayer film deposition device |
01/19/2011 | CN201713571U Infrared optical fiber cooling device |