Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
02/2011
02/03/2011US20110024284 Sputtering apparatus including cathode with rotatable targets, and related methods
02/03/2011DE102010028734A1 Gas separation arrangement comprises vacuum coating system designed as longitudinally extended flow through system
02/03/2011DE102009034532A1 Verfahren zum Herstellen einer strukturierten Beschichtung auf einem Substrat, beschichtetes Substrat sowie Halbzeug mit einem beschichteten Substrat A method for producing a patterned coating on a substrate, coated substrate as well as semi-finished with a coated substrate
02/03/2011DE10123554B4 Verfahren zur Erhöhung der Druckspannung oder zur Erniedrigung der Zugeigenspannung einer CVD-, PCVD- oder PVD-Schicht und Schneideinsatz zum Zerspanen A process for increasing the compressive stress or tensile stress to lower the a CVD, PCVD, or PVD-layer and cutting insert for chip removal
02/03/2011CA2769196A1 Part comprising a substrate supporting a ceramic coating layer
02/02/2011EP2280407A2 Sputtering apparatus including cathode with rotatable targets, and related methods
02/02/2011EP2280093A1 Method of manufacturing enhanced finish sputtering targets
02/02/2011EP2280092A1 Sputtering target, transparent conductive film, and their manufacturing method
02/02/2011EP2280091A1 METHOD FOR PRODUCTION OF WATER-REACTIVE Al FILM, AND STRUCTURAL MEMBER FOR FILM-FORMING CHAMBER
02/02/2011EP2279514A1 Device having and method for providing a gemstone keymat
02/02/2011EP2279283A1 Method for producing a multicomponent, polymer- and metal-containing layer system, device and coated article
02/02/2011EP1763592B1 Fastening unit for ignition units, and device for eliminating carbon
02/02/2011EP1673490B1 Component with a protective layer for the protection of the component against corrosion and oxidation at elevated temperatures
02/02/2011CN201733566U Sputtering film structure for conducting through holes
02/02/2011CN201733529U Plastic shell structure beneficial to sputtering and conducting film
02/02/2011CN201733219U Digitalized magnetron sputtering power control system based on DSP
02/02/2011CN201729876U Proportion regulator for obtaining alloy films on multi-arc ion coating machine by controlling
02/02/2011CN201729875U Protective hood capable of preventing radio frequency and thermal radiation in PVD cavity chamber from leaking
02/02/2011CN201729874U Baffle plate structure of magnetic transmission observation window
02/02/2011CN201729873U Integral type observation window mechanism
02/02/2011CN201729872U Planetary workpiece carrier
02/02/2011CN201729871U Shielding device of magnetically-controlled sputtering target
02/02/2011CN201729870U Protection mask of metal deposition chamber
02/02/2011CN201729869U Heat shield device for vacuum coating machine
02/02/2011CN201729868U Reversible vacuum substrate surface temperature measuring device
02/02/2011CN1960839B Colored razor blades
02/02/2011CN1789508B Opening device for spinning machines
02/02/2011CN1778731B Moulded glass mould core, its production and producer thereof
02/02/2011CN101964368A Laminated solar battery and manufacturing method thereof
02/02/2011CN101962769A Method for preparing hydrophobic film on surface of material
02/02/2011CN101962755A Continuous multiple sputter coating chamber atmosphere isolation system
02/02/2011CN101962754A Film coating device
02/02/2011CN101962753A Film coating device
02/02/2011CN101962752A Method for preparing ZnS/SnS double-layer film by vacuum evaporation
02/02/2011CN101962751A Multistep physical vapor deposition equipment
02/02/2011CN101962750A Vacuum evaporation method and device
02/02/2011CN101962749A Film forming device and film forming method
02/02/2011CN101962748A Method for plating conductive film on surface of polytetrafluoroethylene by adopting arc ion plating technology
02/02/2011CN101962747A Method for arc ion plating of CN thin film
02/02/2011CN101962746A Method for preparing high-adhesion Ta/TaN laminated film on surface of metal part
02/02/2011CN101545098B High-speed vacuum coating online cutting device
02/02/2011CN101532123B Method for preparing non-hydrogen amorphous carbonated germanium film by magnetron cosputtering
02/02/2011CN101522940B Sb-te base alloy sinter sputtering target
02/02/2011CN101457348B 9Cr18 steel precision bearing surface plasma base nitrogen ion and silver ion injection method
02/02/2011CN101451232B Method for preparing nano composite multiple layer hard film
02/02/2011CN101445927B Method for preparing multi-color luminescent pattern by selective photobleaching
02/02/2011CN101307424B Process for preparing zirconia coating
02/02/2011CN101074474B Hard laminated film manufacturing method and film-forming device
02/01/2011US7879448 vehicle windshields, insulating glass; mechanically and chemically durable; improved optical and/or solar characteristics
02/01/2011US7879412 Diamond thin film coating method and diamond-coated cemented carbide member
02/01/2011US7879411 Method and apparatus for efficient application of substrate coating
02/01/2011US7879410 Method of fabricating an electrochemical device using ultrafast pulsed laser deposition
02/01/2011US7879210 Partially suspended rolling magnetron
02/01/2011US7879209 Cathode for sputter coating
02/01/2011US7879203 Hollow cathode of coating material; subject cathode, anode and substrate to a vacuum; cool the hollow cathode; connect a power source to cathode; apply a current to form an arc to remove coating material from the outer circumference; form a cloud of coating in the vacuum, deposit on substrate
02/01/2011US7879202 Scratch resistant coated glass article including carbide layer(s) resistant to fluoride-based etchant(s)
02/01/2011US7879201 Method and apparatus for surface processing of a substrate
01/2011
01/27/2011WO2011011129A2 Coated tooling
01/27/2011WO2011010661A1 Treatment device and method for operating same
01/27/2011WO2011010655A1 Method for forming coating film which is composed of α-tantalum, and the coating film
01/27/2011WO2011010603A1 TARGET FOR ZnO-BASED TRANSPARENT CONDUCTIVE FILM AND METHOD FOR PRODUCING SAME
01/27/2011WO2011010546A1 Semiconductor device
01/27/2011WO2011010529A1 Sintered cu-ga alloy sputtering target, method for producing the target, light-absorbing layer formed from sintered cu-ga alloy sputtering target, and cigs solar cell using the light-absorbing layer
01/27/2011WO2011010430A1 Deposition quantity measuring apparatus, deposition quantity measuring method, and method for manufacturing electrode for electrochemical element
01/27/2011WO2011009573A1 Method for producing coatings with a single composite target
01/27/2011WO2011009444A1 Method for producing a structured coating on a substrate, coated substrate, and semi-finished product having a coated substrate
01/27/2011US20110020702 Iron-doped vanadium(v) oxides
01/27/2011US20110020668 Tmr sensor with a multilayered reference layer
01/27/2011US20110020667 Reflective Coating for an Optical Disc
01/27/2011US20110020623 Method and Apparatus for Repairing an Optical Component Substrate Through Coating
01/27/2011US20110020582 Information recording medium and method for producing the same
01/27/2011US20110020169 Sputtering Target Material for Producing Intermediate Layer Film of Perpendicular Magnetic Recording Medium and Thin Film Produced by Using the Same
01/27/2011US20110020079 Coating process, workpiece or tool and its use
01/27/2011US20110019527 Dual sided optical storage media and method for making same
01/27/2011US20110019350 Al alloy film for display device, display device, and sputtering target
01/27/2011US20110019332 Methods And Apparatus For Generating Strongly-Ionized Plasmas With Ionizational Instabilities
01/27/2011US20110017659 Oxide Compounds as a Coating Composition
01/27/2011US20110017591 Method of making sputtering target
01/27/2011US20110017590 Sintered Compact Target and Method of Producing Sintered Compact
01/27/2011US20110017588 Fabrication process for a thick film by magnetron sputtering
01/27/2011US20110017283 Method and apparatus for deposition of a layer of an indium chalcogenide onto a substrate
01/27/2011DE102009048341A1 Substrate carrier for a vertical sputter-coating apparatus, comprises a substrate to be coated, where the substrate carrier is held through a sputter-coating chamber, where the substrate carrier is formed as rear support plate
01/27/2011DE102009033546A1 Supply endblock to supply sputter cathode with coolant, comprises housing with connection opening, fastening area for introducing housing on first supporting surface and bearing opening, supporting component, shaft, and supporting unit
01/26/2011EP2278045A1 methods for rejuvenating tantalum sputtering targets and rejuvenated tantalum sputtering targets
01/26/2011EP2278044A1 Controlling the application of vaporized organic material
01/26/2011EP2278043A1 Controlling the application of vaporized organic material
01/26/2011EP2278042A1 Controlling the application of vaporized organic material
01/26/2011EP2278041A1 Sputtering target, transparent conductive film, and their manufacturing method
01/26/2011EP2278040A2 Coating system including a mixed gadolinium pyrochlor phase
01/26/2011EP2278039A2 Coating system including a mixed gadolinium pyrochlor phase
01/26/2011EP2276874A1 A coated cutting tool and a method of making thereof
01/26/2011EP2276870A2 Cylindrical magnetron
01/26/2011EP2276869A1 Vapour permeable, water-tight and reflecting foil
01/26/2011EP2276868A2 Localized plasmon transducers and methods of fabrication thereof
01/26/2011EP2276712A1 A process for the manufacture of a high density ito sputtering target
01/26/2011EP1861924B8 Piezoelectric thin film resonator and method for making same
01/26/2011EP1381703B1 A method for determining a critical size of an inclusion in aluminum or aluminum alloy sputtering target
01/26/2011CN201725788U Novel radiator
01/26/2011CN201722426U Automatic substrate loading and unloading mechanism of horizontal vacuum coating machine
01/26/2011CN201722425U Vacuum magnetron sputtering precious metal thin-film plating equipment