Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2011
04/21/2011US20110093082 Enhanced bonding layers on titanium materials
04/21/2011US20110092079 Method and installation for producing an anti-reflection and/or passivation coating for semiconductor devices
04/21/2011US20110092072 Heating plate with planar heating zones for semiconductor processing
04/21/2011US20110091817 Sensor with layered electrodes
04/21/2011US20110091816 Sensor with layered electrodes
04/21/2011US20110091717 Method for in situ formation of metal nanoclusters within a porous substrate field
04/21/2011US20110091662 Coating method and device using a plasma-enhanced chemical reaction
04/21/2011US20110091661 Apparatus for producing multilayer sheet and method of producing the multilayer sheet
04/21/2011US20110091645 Nozzle plate of inkjet printhead and method of manufacturing the nozzle plate
04/21/2011US20110089940 MAGNETORESISTIVE SENSOR EMPLOYING NITROGENATED Cu/Ag UNDER-LAYERS WITH (100) TEXTURED GROWTH AS TEMPLATES FOR CoFe, CoFeX, AND Co2(MnFe)X ALLOYS
04/21/2011US20110089559 Method and installation for producing a semiconductor device, and semiconductor device
04/21/2011US20110089537 Growing process for group iii nitride elements
04/21/2011US20110089222 Filler metal with flux for brazing and soldering and method of making and using same
04/21/2011US20110089031 Sputtering System with Normal Target and Slant Targets on the Side
04/21/2011US20110089026 Touch panel manufacturing method and film formation apparatus
04/21/2011US20110089025 Method for manufacturing a chip resistor having a low resistance
04/21/2011US20110089024 Method and apparatus for improved high power impulse magnetron sputtering
04/21/2011US20110089023 Plasma processing apparatus and electronic device manufacturing method
04/21/2011US20110089022 Method and apparatus for surface processing of a substrate
04/21/2011US20110088771 Process of manufacturing tco substrate with light trapping feature and the device thereof
04/21/2011US20110088763 Method and apparatus for improving photovoltaic efficiency
04/21/2011DE112009001622T5 Lagenbeschichtung und Verfahren zu ihrer Ausbildung Layer coating and process for their education
04/21/2011DE102009049811A1 Verfahren zum Herstellen einer Elektrode A method for manufacturing an electrode
04/21/2011DE102009040997A1 High pressure vaporizing cell for coating a substrate, comprises an interior area that is suited to reject steam of coating materials and is formed in such a way that steam atoms do not strike down itself in the operation of the cell
04/21/2011DE102006048409B4 Vorrichtung und Verfahren zur Herstellung von Schichten und/oder Kristallen aus Nitriden von Metallen der Gruppe III des PSE Device and method for the production of layers and / or crystals of nitrides of metals of group III of the PSE
04/20/2011EP2312015A2 Functional film and method for producing the same
04/20/2011EP2311122A1 Electrochemical cell including functionally graded components
04/20/2011EP2310550A1 Evaporator
04/20/2011EP2310549A1 Coating system, coated workpiece and method for manufacturing the same
04/20/2011EP1851354B1 Method of making low-e coating using ceramic zinc inclusive target, and target used in same
04/20/2011EP1609881B1 Method of manufacturing a tantalum sputtering target
04/20/2011EP0989202B1 Power supply device for sputtering and sputtering device using the same
04/20/2011CN201801592U Thin-film solar-cell panel deposition fixture
04/20/2011CN201801587U Film plating machine with vacuum loading and unloading chamber
04/20/2011CN201801586U Supporting plate adjusting component used for evaporation bracket
04/20/2011CN201801585U Conductive device of plug connectors used on evaporation plating bracket
04/20/2011CN201801584U Evaporation plating bracket for group directional glass shell evaporation plating device
04/20/2011CN201801583U Bearing plate adjusting device for vapor deposition bracket
04/20/2011CN201801582U Magnetron sputtering vacuum coating unit
04/20/2011CN201801581U Flange for connection of magnetron sputtering working box bodies
04/20/2011CN201801580U Ion-plating machine provided with electric arc-magnetic control coexisting target
04/20/2011CN201801579U Conductive electrode used on group orientation glass envelope evaporation plating device
04/20/2011CN201801578U Group oriented glass shell aluminum evaporation equipment
04/20/2011CN201801577U Evaporation chamber for group-oriented glass shell evaporation equipment
04/20/2011CN201801576U Glass-shell aluminum evaporation component for group-oriented glass-shell evaporation device
04/20/2011CN201801575U Door body used in group directional glass shell vapor deposition equipment
04/20/2011CN201801574U Grating valve control device of vacuum film coating machine
04/20/2011CN102027667A Bipolar pulse power source and power source device formed by a plurality of bipolar pulse power sources
04/20/2011CN102027564A Device and method for pretreating and coating bodies
04/20/2011CN102027563A Reactive sputtering with HIPIMS
04/20/2011CN102027154A Sputtering method
04/20/2011CN102027152A Water-reactive Al composite material, water-reactive Al film, process for production of the Al film, and constituent member for film deposition chamber
04/20/2011CN102027151A Water-reactive Al composite material, water-reactive Al film, method for production of the Al film, and structural member for film-forming chamber
04/20/2011CN102024914A Method for manufacturing top electrode of organic electroluminescent display
04/20/2011CN102024864A Method for manufacturing solar module
04/20/2011CN102023474A Mask assembly, fabrication method of the same and deposition apparatus using the same for flat panel display device
04/20/2011CN102023330A Shading element array, method for manufacturing shading element array and lens module array
04/20/2011CN102021577A High-temperature solid lubricating coating for foil air bearing and preparation method thereof
04/20/2011CN102021576A Method for continuously producing flexible copper clad laminates
04/20/2011CN102021539A Film deposition method
04/20/2011CN102021529A Vacuum deposition turning roller bed device
04/20/2011CN102021528A Film coating device
04/20/2011CN102021527A Strip film plating machine
04/20/2011CN102021526A Target and method for setting element ratio of target
04/20/2011CN102021525A Colored stainless steel based on ion implantation and preparation method thereof
04/20/2011CN102021524A Device for separating ions of different masses during plasma immersion ion implantation
04/20/2011CN102021523A Method for eliminating edge effect of coated glass
04/20/2011CN102021522A Sputtering-type film coating device
04/20/2011CN102021521A Vacuum sputtering device
04/20/2011CN102021520A Vacuum ion plating process
04/20/2011CN102021519A Preparation method of stannous oxide polycrystalline film
04/20/2011CN102021518A Method and device for coating film on surface of inner cavity by using pulse laser process
04/20/2011CN102021517A Screen mesh type evaporating source in OLED preparing process and evaporating method
04/20/2011CN102021516A Surface-coated cutting tool
04/20/2011CN102021515A Glass coated target material and preparation method thereof
04/20/2011CN102021514A Plasma device and manufacturing method of nano-crystalline silicon thin film
04/20/2011CN102021513A High-tenacity oxidation-resistant anti-friction coating on substrate surface and preparation method thereof
04/20/2011CN102021512A Encore Ta device part cleaning regeneration protective jig and related cleaning regeneration method
04/20/2011CN102021460A Method for preparing W-10Ti alloy target material by using cool isostatic pressing and liquid-phase sintering
04/20/2011CN102019420A Composite particulate preparing apparatus and method
04/20/2011CN101724820B Method for magnetron sputtering deposition of aluminum film for surface protection of NdFeB workpiece
04/20/2011CN101724811B Electromagnetic perfect absorber based on sub-wavelength metallic hole array
04/20/2011CN101710525B Ultra-high sensitive magneto-resistance film material and preparation method thereof
04/20/2011CN101709470B Preparation method of composite coating containing in situ generated diffusion barrier
04/20/2011CN101691650B Degreasing agent for vacuum plating
04/20/2011CN101665916B Method for preparing sputtering target of phase-change material
04/20/2011CN101636519B Arc evaporation source
04/20/2011CN101565818B Sputter coating method
04/20/2011CN101481791B Preparation of high tenacity nanocrystalline silicide coating
04/20/2011CN101469399B Erbium oxide hydrogen resistance coating and preparation thereof
04/20/2011CN101451228B Hard coating excellent in sliding property and method for forming same
04/20/2011CN101419902B Multi-chamber vacuum processing apparatus
04/20/2011CN101389784B Sintered sputtering target made of high-melting metals
04/20/2011CN101361164B Apparatus for degassing a disc-like substrate
04/20/2011CN101348897B Magnetron sputtering apparatus manufactured by magnetic confinement magnetron sputtering method
04/20/2011CN101270466B Sputting film-plating apparatus and method
04/20/2011CN101254674B Hard laminated film
04/20/2011CN101075500B Solid electrolyte and method of producing the same
04/19/2011US7929261 Suppressing arc discharges
04/19/2011US7928575 Electronic device, method of manufacture of the same, and sputtering target