| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 05/03/2011 | US7935232 Sputtering apparatus and method, and sputtering control program |
| 05/03/2011 | US7935187 Film forming apparatus |
| 05/03/2011 | CA2610979C Coated article with transparent conductive oxide film doped to adjust fermi level, and method of making same |
| 04/28/2011 | WO2011050291A2 Materials and device stack for market viable electrochromic devices |
| 04/28/2011 | WO2011049816A2 Processes for passivating dielectric films |
| 04/28/2011 | WO2011049719A2 Ceramic surface coatings for dental applications |
| 04/28/2011 | WO2011049303A2 In-line vacuum deposition system which is connectable to a coating process, and deposition method using same |
| 04/28/2011 | WO2011049245A1 Catalyst for nox removal |
| 04/28/2011 | WO2011048996A1 Transparent conductive film |
| 04/28/2011 | WO2011048961A1 Vacuum treatment apparatus and graph presentation method |
| 04/28/2011 | WO2011047891A1 Sputtering target assembly |
| 04/28/2011 | WO2011013936A3 Roll-to-roll sputter system comprising a plurality of chambers, and method for using same |
| 04/28/2011 | US20110097609 Method and apparatus for integrated-circuit battery devices |
| 04/28/2011 | US20110097550 Light induced patterning |
| 04/28/2011 | US20110097528 Packaging element and method for its production |
| 04/28/2011 | US20110097511 Deposition apparatus and manufacturing method of thin film device |
| 04/28/2011 | US20110097510 Plasma processing apparatus and plasma processing method |
| 04/28/2011 | US20110097507 Method for generating charged particles |
| 04/28/2011 | US20110097236 Methods of making molybdenum titanium sputtering plates and targets |
| 04/28/2011 | US20110096443 MTJ incorporating CoFe/Ni multilayer film with perpendicular magnetic anisotropy for MRAM application |
| 04/28/2011 | US20110095226 hydrotalcite for p.v.c. stabilizer and a method of thereof |
| 04/28/2011 | US20110095194 Neutron detector with neutron converter, method for manufacturing the neutron detector and neutron imaging apparatus |
| 04/28/2011 | US20110094879 Tungsten Sintered Sputtering Target |
| 04/28/2011 | US20110094876 Germanium-containing vacuum coating for noble-metal components |
| 04/28/2011 | US20110094875 Magnetoresistance effect device and method of production of the same |
| 04/28/2011 | DE112009001534T5 Sputter-Vorrichtung und Sputter-Verfahren Sputtering apparatus and sputtering method |
| 04/28/2011 | DE112009001533T5 Katodeneinheit und mit derselben versehene Sputter-Vorrichtung Cathode and provided with the same sputtering apparatus |
| 04/28/2011 | DE112009001457T5 Sputter-Vorrichtung Sputtering apparatus |
| 04/28/2011 | DE112009001396T5 Hartbeschichtungsschicht und Verfahren zu deren Bildung Hard coat layer, and methods for their formation |
| 04/28/2011 | DE102010048947A1 Diamantähnliches Kohlenstofffilmmaterial und Verfahren zu dessen Herstellung Diamond-like carbon film material and process for its preparation |
| 04/28/2011 | DE102010048270A1 Sputtersystem mit normalen Target und seitlichen schrägen Targets A sputtering target with normal and lateral oblique targets |
| 04/28/2011 | DE102010041380A1 Verdampfereinrichtung für eine Beschichtungsanlage Evaporator device for coating plant |
| 04/28/2011 | DE102009050565A1 Sputtertargetanordnung Sputtertargetanordnung |
| 04/28/2011 | DE102009048170B3 Probenaufnahmevorrichtung für Probenmaterialien in Ultrahochvakuumkammern Sample collection device for sample materials in ultra-high vacuum chambers |
| 04/27/2011 | EP2314733A1 Apparatus |
| 04/27/2011 | EP2314732A1 Method for coating a substrate with a TCO coating and thin film solar cell |
| 04/27/2011 | EP2313539A1 Method of protection of silver and copper surfaces against corrosion |
| 04/27/2011 | EP2111479B1 Optical lens holder |
| 04/27/2011 | CN201812841U Thin film solar battery coating device |
| 04/27/2011 | CN201809436U Fixtures for eliminating edge effect of coated glass |
| 04/27/2011 | CN201809435U Target device |
| 04/27/2011 | CN201809434U NiCr cathode sputtering baffle plate |
| 04/27/2011 | CN201809433U ITO-Zr (indium tin oxide-zirconium) transparent conductive film |
| 04/27/2011 | CN1997768B Multi-track magnetron exhibiting more uniform deposition and reduced rotational asymmetry |
| 04/27/2011 | CN102037586A Thin film batteries and methods for manufacturing same |
| 04/27/2011 | CN102037547A Method of forming a nanocluster-comprising dielectric layer and device comprising such a layer |
| 04/27/2011 | CN102037155A Thin film manufacturing method |
| 04/27/2011 | CN102037154A Magnet unit, and magnetron sputtering device |
| 04/27/2011 | CN102037153A Monolithic aluminum alloy target and method of manufacturing |
| 04/27/2011 | CN102037152A Improved junctions in substrate solar cells |
| 04/27/2011 | CN102037151A Tool having a metal oxide coating |
| 04/27/2011 | CN102034901A 透明导电薄膜及其制备方法 Transparent conductive film and preparation method |
| 04/27/2011 | CN102033361A Manufacture method of liquid crystal orientation layer |
| 04/27/2011 | CN102033255A Method for preparing broad-spectrum wide-angle antireflection sub-wave length structure |
| 04/27/2011 | CN102031561A Base material for growing single crystal diamond and method for producing single crystal diamond substrate |
| 04/27/2011 | CN102031522A Neodymium-iron-boron magnet of aluminum or aluminum alloy composite coating and preparation method thereof |
| 04/27/2011 | CN102031494A Vacuum plating roller transmission device |
| 04/27/2011 | CN102031493A Film coating device |
| 04/27/2011 | CN102031492A Vacuum machine introducing device |
| 04/27/2011 | CN102031491A Continuous pulse laser coating device |
| 04/27/2011 | CN102031490A High-strength high-conductivity nanocrystal copper material and preparation method thereof |
| 04/27/2011 | CN102031489A AZO anti-reflecting film preparation method |
| 04/27/2011 | CN102031488A Crucible for increasing film damage threshold |
| 04/27/2011 | CN102031487A Hexagonal MgZnO film with high magnesium content and preparation method thereof |
| 04/27/2011 | CN102031486A Apparatus and method for manufacturing organic EL device, and apparatus and method for forming film |
| 04/27/2011 | CN102031485A Evaporation source and evaporation device using same |
| 04/27/2011 | CN102031484A Method for improving activation efficiency of magnesium-doped nitrides under catalytic dehydrogenation of metals |
| 04/27/2011 | CN102031483A Method for performing surface treatment on golf head by forming carbon, nitrogen, titanium, chromium composite coating |
| 04/27/2011 | CN102030328A Method for preparing Si nanowires through pulsed laser ablation |
| 04/27/2011 | CN102030327A Method for preparing silicon nano-wire by pulsed laser ablation |
| 04/27/2011 | CN102029570A Method and device for machining tungsten and titanium alloy target material |
| 04/27/2011 | CN101740448B Plasma processing equipment and substrate support plate thereof |
| 04/27/2011 | CN101713064B Preparation process for depositing discontinuous NiTi SMA film on PZT base body |
| 04/27/2011 | CN101698932B Method for preparing P type cobalt-doped zinc oxide film |
| 04/27/2011 | CN101634011B Magnetic control sputtering device and method for uniformly coating film on outer surface of workpiece |
| 04/27/2011 | CN101619442B Electron beam evaporation source device |
| 04/27/2011 | CN101565820B Device for preparing textured ZnO transparent conductive coated glass by plasma bombardment |
| 04/27/2011 | CN101555588B Low-temperature plasma system based on atmosphere pressure glow discharge |
| 04/27/2011 | CN101554543B Distributed exhaust device for exhausting gas of microfluid device and preparation method thereof |
| 04/27/2011 | CN101551541B Substrate for display and manufacturing method thereof and display device |
| 04/27/2011 | CN101457338B Cleaning of native oxide with hydrogen-containing radicals |
| 04/27/2011 | CN101441937B Method for manufacturing end electrode of sheet-type capacitor |
| 04/27/2011 | CN101438429B III nitride compound semiconductor laminated structure |
| 04/27/2011 | CN101407906B Vacuum film plating apparatus |
| 04/27/2011 | CN101375366B Improved sputter target utilization |
| 04/27/2011 | CN101148102B Carbon-base tungsten coating and its preparation method |
| 04/27/2011 | CN101068449B Bi-directional filtered arc plasma source |
| 04/27/2011 | CN101052738B Controlling the application of vaporized organic material |
| 04/27/2011 | CN101006751B Apparatus and method for levitation of an amount of conductive material |
| 04/26/2011 | US7932678 Magnetic mirror plasma source and method using same |
| 04/26/2011 | US7931943 Enhanced bonding layers on native oxide surfaces |
| 04/26/2011 | US7931787 Energetic vapor deposition means are addressed through the introduction of a novel means of vapor deposition, namely, an Electron-Assisted Deposition (EAD) process and apparatus. The EAD mode of film growth disclosed is generally achieved by |
| 04/26/2011 | US7931750 Sealing lock for a deposition line in vacuum on a flat product |
| 04/26/2011 | CA2545269C Solid electrolyte, in particular for a thin layer electrochemical cell and production method |
| 04/21/2011 | WO2011046094A1 Transparent conductive laminate film |
| 04/21/2011 | WO2011046050A1 Manufacturing device and manufacturing method for transparent conductive film |
| 04/21/2011 | WO2011046033A1 Bi-ge-o sintered sputtering target, manufacturing method therefor, and optical recording medium |
| 04/21/2011 | WO2011045304A1 Method and apparatus for production of rotatable sputtering targets |
| 04/21/2011 | WO2011044985A1 Tin oxide ceramic sputtering target and method of producing it |
| 04/21/2011 | WO2008060926A3 Alloy casting apparatuses and chalcogenide compound synthesis methods |