| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 06/09/2011 | WO2011067820A1 Sputtering apparatus and method for manufacturing electronic device |
| 06/09/2011 | WO2011067480A1 Cathode sputter deposition of a cu(in, ga)x2 thin film |
| 06/09/2011 | WO2011066984A1 Chemical media sensor, method for producing same and intended uses thereof |
| 06/09/2011 | WO2011066594A1 Method for coating minted disk-shaped objects, in particular coins |
| 06/09/2011 | US20110135955 Low emissivity coating with low solar heat gain coefficient, enhanced chemical and mechanical properties and method of making the same |
| 06/09/2011 | US20110135948 Composition for making metal matrix composites |
| 06/09/2011 | US20110135942 Nickel Alloy Sputtering Target and Nickel Silicide Film |
| 06/09/2011 | US20110135915 Methods of Coating Substrate With Plasma Resistant Coatings and Related Coated Substrates |
| 06/09/2011 | US20110135914 Scratch resistant coated glass article including carbide layer(s) resistant to fluoride-based etchant(s) |
| 06/09/2011 | US20110135910 Information recording medium, process for producing the information recording medium, sputtering target and film forming apparatus |
| 06/09/2011 | US20110135880 Textured substrate provided with a stack having thermal properties |
| 06/09/2011 | US20110135848 Transparent conducting oxides |
| 06/09/2011 | US20110135837 Electrochromic devices having improved ion conducting layers |
| 06/09/2011 | US20110135807 Multi-layer, substantially polyvinyl chloride- and polyolefin-free composite film |
| 06/09/2011 | US20110133326 Reducing Plating Stub Reflections in a Chip Package Using Resistive Coupling |
| 06/09/2011 | US20110133201 Electronic circuit |
| 06/09/2011 | US20110132758 Structure for increasing utilization rate of target |
| 06/09/2011 | US20110132757 Sputtering Target with Few Surface Defects, and Surface Processing Method Thereof |
| 06/09/2011 | US20110132756 Sputtering device |
| 06/09/2011 | US20110132755 In-line system for manufacturing solar cell |
| 06/09/2011 | US20110132745 Method of fabricating variable resistance layer for resistance memory |
| 06/09/2011 | US20110132444 Solar cell including sputtered reflective layer and method of manufacture thereof |
| 06/09/2011 | US20110132260 Manufacturing apparatus |
| 06/09/2011 | DE112008003721T5 Vakuumabscheidungsvorrichtung des aufwickelnden Typs Vacuum deposition apparatus of the type-winding |
| 06/09/2011 | DE102010062113A1 Abscheidungsquelle, Abscheidungsvorrichtung, die diese aufweist, und Verfahren zur Ausbildung eines Dünnfilms Deposition source, the deposition apparatus having these, and methods for forming a thin film |
| 06/09/2011 | DE102009057697A1 Chemischer Mediensensor, Verfahren zu dessen Herstellung sowie Verwendungszwecke Chemical media sensor, to processes for its preparation and uses |
| 06/09/2011 | DE102009056240A1 Antriebsendblock für eine Magnetronanordnung mit einem rotierenden Target Drive end block for a magnetron with a rotating target |
| 06/09/2011 | DE102009046986A1 Tiegel für einen Elektronenstrahlverdampfer und Betriebsverfahren für den Elektronenstrahlverdampfer Crucible for an electron beam evaporator and operating procedures for the electron beam evaporator |
| 06/08/2011 | EP2330653A1 Composite organic electroluminescent material |
| 06/08/2011 | EP2330231A1 High-purity copper or high-purity copper alloy sputtering target, process for manufacturing the sputtering target, and high-purity copper or high-purity copper alloy sputtered film |
| 06/08/2011 | EP2330230A1 Masking material, masking device, method for masking a substrate and method for coating a substrate |
| 06/08/2011 | EP2330224A1 High-purity copper and process for electrolytically producing high-purity copper |
| 06/08/2011 | CN201857425U Signal interference prevention device and sputtering machine table comprising same |
| 06/08/2011 | CN201857424U Novel vacuum coating machine |
| 06/08/2011 | CN201857423U High-cleanness vacuum pumping system for vacuum coating machine |
| 06/08/2011 | CN201857422U Positioning pin and pre-cleaning cavity comprising same |
| 06/08/2011 | CN1870863B Casing of portable electronic device and its manufacturing method |
| 06/08/2011 | CN1676445B Substrate moving device |
| 06/08/2011 | CN102089684A Method of making thin film structure and compositions thereof |
| 06/08/2011 | CN102089683A Reflective optical element and method for the production thereof |
| 06/08/2011 | CN102089455A A method to manufacture an oxide sputter target comprising a first and second phase |
| 06/08/2011 | CN102089454A 表面处理铜箔 Surface treated copper foil |
| 06/08/2011 | CN102089258A Lanthanum oxide-based sintered object, sputtering target comprising the sintered object, process for producing lanthanum oxide-based sintered object, and process for sputtering target production using the process |
| 06/08/2011 | CN102089257A Sintered complex oxide, method for producing sintered complex oxide, sputtering target and method for producing thin film |
| 06/08/2011 | CN102089256A Oxide sintered object, sputtering target comprising the sintered object, process for producing the sintered object, and process for producing sputtering target comprising the sintered object |
| 06/08/2011 | CN102086512A Substrate processing apparatus and vacuum formation method thereof |
| 06/08/2011 | CN102086511A Imitation plating processing method for surface of automobile exterior decoration |
| 06/08/2011 | CN102086510A Magnet unit and spray plating device employing the same |
| 06/08/2011 | CN102086509A Process kit component for sputtering chamber |
| 06/08/2011 | CN102086508A Film coating device |
| 06/08/2011 | CN102086507A Sputtering device |
| 06/08/2011 | CN102086506A Target cooling device and target cooling method |
| 06/08/2011 | CN102086505A Correction mask for coating film |
| 06/08/2011 | CN102086504A Method for manufacturing high-density magnesium oxide target |
| 06/08/2011 | CN102086503A Masking material, masking layer, method for masking a substrate and method for coating a substrate |
| 06/08/2011 | CN102086502A Plating method for increasing laser damage threshold of high-reflectivity optical thin film |
| 06/08/2011 | CN102085672A Self-lubricating fluorinated diamond-like carbon electric massage antibacterial shaver |
| 06/08/2011 | CN101838791B Method for depositing amorphous carbon film by modifying surface of magnesium alloy |
| 06/08/2011 | CN101748374B Method for growing high density and fine self-assembled Ge quantum dot with ion beam sputtering technology |
| 06/08/2011 | CN101636518B Vapor deposition material and optical thin film obtained from the same |
| 06/08/2011 | CN101578387B Sputtering target |
| 06/08/2011 | CN101490811B Method for manufacturing semiconductor device |
| 06/08/2011 | CN101469407B Sputtering equipment with close packing tip anode |
| 06/08/2011 | CN101351573B Stephanoporate valve metallic thin-film and manufacturing method thereof as well as thin-film capacitor |
| 06/08/2011 | CN101164931B Die produced glass model core and producing method thereof |
| 06/07/2011 | US7956519 Piezoelectric device having a ferroelectric film including a solid solution |
| 06/07/2011 | US7955754 Enhanced stability bipolar plate |
| 06/07/2011 | US7955722 Protective alumina film and production method thereof |
| 06/07/2011 | US7955712 High tensile strength inorganic fibers uniformly embedded in titanium metal or alloy matrix material; torsional and transversal stress resistance; aircraft engine shafts |
| 06/07/2011 | US7955581 Method of producing silicon oxide, negative electrode active material for lithium ion secondary battery and lithium ion secondary battery using the same |
| 06/07/2011 | US7955480 Sputtering apparatus and film deposition method |
| 06/07/2011 | CA2519944C Method of making coated articles and coated articles made thereby |
| 06/03/2011 | WO2011066375A2 Low melting point sputter targets for chalcogenide photovoltaic applications and methods of manufacturing the same |
| 06/03/2011 | WO2011065999A1 Linear deposition source |
| 06/03/2011 | WO2011065998A1 Linear deposition source |
| 06/03/2011 | WO2011065404A1 Gas barrier film, device, and process for production of gas barrier film |
| 06/03/2011 | WO2011064958A1 Power-supply device |
| 06/03/2011 | WO2011064957A1 Method for forming insulating film |
| 06/02/2011 | US20110129664 Organic glass for automobile and process for producing the same |
| 06/02/2011 | US20110128649 Magnetic recording medium having non-magnetic separating regions and methods of manufacturing the same |
| 06/02/2011 | US20110127579 Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device |
| 06/02/2011 | US20110127521 Stacked oxide material, semiconductor device, and method for manufacturing the semiconductor device |
| 06/02/2011 | US20110127162 Process for the Manufacture of a High Density ITO Sputtering Target |
| 06/02/2011 | US20110127158 Manufacturing method of semiconductor integrated circuit device |
| 06/02/2011 | US20110127157 Low impedance plasma |
| 06/02/2011 | US20110127156 Chamber for processing hard disk drive substrates |
| 06/02/2011 | US20110126875 Conductive contact layer formed on a transparent conductive layer by a reactive sputter deposition |
| 06/02/2011 | US20110126766 Coating apparatus |
| 06/01/2011 | EP2327673A1 Oxide sintered compact for producing transparent conductive film |
| 06/01/2011 | EP2327668A1 Coating with cellular structure |
| 06/01/2011 | EP2326742A1 Use of a target for spark evaporation, and method for producing a target suitable for said use |
| 06/01/2011 | EP2326741A2 Equipment and method for physical vapor deposition |
| 06/01/2011 | EP2231893B1 Method and system for galvanizing by plasma evaporation |
| 06/01/2011 | DE19541014B4 Antireflexschichtsystem und Verfahren zur Herstellung eines Antireflexschichtsystems Anti-reflective coating system and process for the preparation of an anti-reflection layer system |
| 06/01/2011 | DE102009055992A1 Beschichtung mit Zellstruktur Coating with a cell structure |
| 06/01/2011 | DE102009055946B3 Method for measuring thickness of deposited layers in continuous process by means of vacuum evaporation, comprises measuring a first temperature change of a discrete substrate or substrate portion |
| 06/01/2011 | DE102009049811B4 Verfahren zum Herstellen einer Elektrode A method for manufacturing an electrode |
| 06/01/2011 | DE102009007587B4 Verfahren und Vorrichtung zur Beschichtung von Substraten aus der Dampfphase Method and apparatus for coating substrates from the vapor phase |
| 06/01/2011 | DE102006020004B4 Vorrichtung und Verfahren zur homogenen PVD-Beschichtung Apparatus and method for homogeneous PVD coating |
| 06/01/2011 | DE102004006849B4 Vorrichtung zum Beschichten von Substraten Apparatus for coating substrates |