Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/2011
05/11/2011CN101575696B Preparation method of chromium-aluminum-nitrogen film by closed field unbalanced magnetron sputtering
05/11/2011CN101560642B Method for preparing In2O3 transparent conductive film with high mobility doped with Mo
05/11/2011CN101532125B Vacuum annealing device synchronously annealing at multiple temperature sections
05/11/2011CN101525738B Internal surface ion implantation modification device and method of inductively coupled plasmatube barrel
05/11/2011CN101447274B Magnetic circuit mechanism, magnetron sputtering cathode therewith and production method thereof
05/11/2011CN101403102B Continuous vacuum transition chamber with linear vacuum motive seal and X-ray radiation protection function
05/11/2011CN101237027B Method for depositing air light-sensitive material on substrate
05/11/2011CN101236817B Magnetic sensitive material and its making method
05/11/2011CN101130452B Star type double-turn magnetron sputtering conducting glass plated film product line and processing technique thereof
05/10/2011US7938943 Supply end block for rotary magnetron
05/10/2011US7938936 Organic electro-luminescence device
05/10/2011US7938918 High-purity Ni-V alloy, target therefrom, high-purity Ni-V alloy thin film and process for producing high-purity Ni-V alloy
05/10/2011US7938907 Device for fabricating a mask by plasma etching a semiconductor substrate
05/05/2011WO2011052764A1 Process for producing multilayer film
05/05/2011WO2011052640A1 Water-reactive al composite material, water-reactive al film, process for producing the al film, and constituent member for film-deposition chamber
05/05/2011WO2011052574A1 Method for manufacturing chalcopyrite type compound thin film and method for manufacturing thin film solar cell using the method
05/05/2011WO2011052375A1 Indium oxide sintered body and indium oxide transparent conductive film
05/05/2011WO2011052355A1 Reactive sputtering film-forming apparatus and method for manufacturing film using same
05/05/2011WO2011052171A1 Method of manufacturing titanium-containing sputtering target
05/05/2011WO2011052160A1 Method for producing ito sintered body and method for producing ito sputtering target
05/05/2011WO2011051294A1 Sputter deposition system and method
05/05/2011WO2011016015A3 Method for producing a metallised fabric, and resulting fabric
05/05/2011WO2010132591A3 Pecvd coating using an organosilicon precursor
05/05/2011US20110107473 Diamond-like carbon coated nanoprobes
05/05/2011US20110104902 Plasma processing apparatus and plasma processing method
05/05/2011US20110104618 Self-aligned masking for solar cell manufacture
05/05/2011US20110104393 Plasma ion implantation process for patterned disc media applications
05/05/2011US20110103967 Abrasive single-crystal turbine blade
05/05/2011US20110102968 Multilayer structure, capacitor including the multilayer structure and method of forming the same
05/05/2011US20110102926 Mirror and process for obtaining a mirror
05/05/2011US20110102722 Indium tin oxide sputtering target and transparent conductive film fabricated using the same
05/05/2011US20110102292 Device housing and method for making the same
05/05/2011US20110101670 Security element with optically variable element
05/05/2011US20110100809 Method to manufacture an oxide sputter target comprising a first and second phase
05/05/2011US20110100808 Cylindrical sputtering target and process for producing the same
05/05/2011US20110100807 Power supply apparatus
05/05/2011US20110100806 Bias sputtering device
05/05/2011US20110100801 Transparent conductive film and method for producing same
05/05/2011US20110100800 Rectangular Filtered Vapor Plasma Source and Method of Controlling Vapor Plasma Flow
05/05/2011US20110100799 Sputter deposition system and method
05/05/2011US20110100798 Charged Particle Extraction Device And Method Of Design There for
05/05/2011US20110100797 Procedure for obtaining films of intermediate band semiconductor materials
05/05/2011US20110100460 Manufacture of n-type chalcogenide compositions and their uses in photovoltaic devices
05/05/2011US20110100446 High haze transparent contact including ion-beam treated layer for solar cells, and/or method of making the same
05/05/2011US20110100445 High haze transparent contact including insertion layer for solar cells, and/or method of making the same
05/05/2011US20110100424 Transparent substrate with anti-reflection coating
05/05/2011DE102009050234A1 Verfahren zur Beschichtung eines Substrats mit einer TCO-Schicht und Dünnschichtsolarzelle A method of coating a substrate with a TCO layer, and thin film solar cell
05/05/2011DE102007004844B4 Verfahren zur Herstellung eines Bauteils und Bauteil A method for producing a component and component
05/05/2011DE102004014466B4 Verwendung einer Hartstoffschicht als beschichtung eines Gleitbauteils für eine Hydraulikkomponente in wässriger Umgebung Use of a hard material as a coating layer of a sliding member for a hydraulic component in an aqueous environment
05/04/2011EP2317537A1 Sputter deposition system and method
05/04/2011EP2316985A2 Apparatus for producing multilayer sheet and method of producing the multilayer sheet
05/04/2011EP2316984A1 Hard film, plastic working die, plastic working method, and target for hard film
05/04/2011EP2316983A1 Nitrogen-containing amorphous carbon film, amorphous carbon layered film, and sliding member
05/04/2011EP2316595A1 Methods of making molybdenum titanium sputtering plates and targets
05/04/2011EP2316123A1 Arrangement and method for generating a plasma having a defined and stable ionization state
05/04/2011EP1660848B1 Method for application of a filter on a foil
05/04/2011EP1336069B2 Plastic pipe with a barrier lager
05/04/2011CN201817544U Movable magnetic control device of sputtering equipment
05/04/2011CN201817543U Lifting movable magnet set
05/04/2011CN201817542U Ion plating device
05/04/2011CN201816254U Film laminated structure with metal nano particle interlayer
05/04/2011CN1965100B Sputtering target, optical information recording medium and method for producing same
05/04/2011CN102047548A Bipolar pulse power source and power source device formed by connecting a plurality of bipolar pulse power sources in parallel
05/04/2011CN102047406A Vacuum processing apparatus, vacuum processing method, and manufacturing method of an electronic device
05/04/2011CN102047364A Device having and method for providing a gemstone keymat
05/04/2011CN102046837A Sputtering apparatus
05/04/2011CN102046836A Sintered Cu-Ga sputtering target and method for producing the target
05/04/2011CN102046835A Sputtering target and non-crystalline optical thin film
05/04/2011CN102046834A Evaporation system
05/04/2011CN102046833A Arrangement and method for removing alkali- or alkaline earth-metals from a vacuum coating chamber
05/04/2011CN102046832A Arrangement for coating a substrate
05/04/2011CN102046822A Tungsten sintered material sputtering target
05/04/2011CN102043294A Liquid crystal on silicon (LCOS) and method for manufacturing reflecting mirror for same
05/04/2011CN102041551A Base material for growing single crystal diamond and method for producing single crystal diamond substrate
05/04/2011CN102041481A Method of making durable articles
05/04/2011CN102041480A Process to apply heater function to plastic glass
05/04/2011CN102041479A Al-based alloy sputtering target
05/04/2011CN102041478A Method of forming organic polymer thin film and an appartus for forming the organic polymer thin film
05/04/2011CN102041477A Method for preparing titanium dioxide thin film with large specific surface area
05/04/2011CN102041476A Method for preparing cobalt titanate film by dual-target magnetron sputtering method
05/04/2011CN102041475A Method for preparing cobalt titanate film by using hybrid target magnetron sputtering process
05/04/2011CN102041474A Preparation method for nano precious metal particle modified tin dioxide gas sensitive material
05/04/2011CN102041473A Diamond-like carbon film-formed material and method for producing the same
05/04/2011CN102041414A Aluminum alloy reflection film for optical recording media and sputtering target material for forming the reflection film
05/04/2011CN102039605A Self-lubricating jade coated metal type electronic massaging sterilizing shaver
05/04/2011CN102039421A Preparation method of organic film monodisperse silver quantum dots
05/04/2011CN102039265A Treatment method for exterior decoration effect
05/04/2011CN101760721B Method for plating chromium on surface of plastic material
05/04/2011CN101571606B Large-size micro-prism type reflecting material die and preparation method thereof
05/04/2011CN101570850B Sputtering method and sputtering apparatus, and electronic device manufacturing method
05/04/2011CN101550536B High-purity nickel target for magnetron sputtering
05/04/2011CN101542013B Sputtering apparatus for film forming
05/04/2011CN101497991B Method for manufacturing aluminum nitride silicon tip and grids structure
05/04/2011CN101463471B Continuous thin film vacuum deposition method and apparatus
05/04/2011CN101358333B Clamping device of sputtering substrate
05/04/2011CN101326304B Gallium oxide/zinc oxide sputtering target, method of forming transparent conductive film and transparent conductive film
05/04/2011CN101209606B Self-lubricating abrasion-proof graphite//TiC gradient composite thin film
05/03/2011US7935426 Layer arrangement for the formation of a coating on a surface of a substrate, coating method, and substrate with a layer arrangement
05/03/2011US7935416 Nanoporous membrane, process of fabricating the same and device for controlled release of biopharmaceuticals comprising the same
05/03/2011US7935393 Method and system for improving sidewall coverage in a deposition system