Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
---|
03/09/2011 | CN101984133A Plunger surface self-lubricating carbon based coating and preparation method thereof |
03/09/2011 | CN101660131B Method for preparing hydrogenated silicon film by utilizing magnetron sputtering |
03/09/2011 | CN101597753B Forward and reverse spiral flow cooling structure of wide flexible magnetic-control spurting film coating roller |
03/09/2011 | CN101448970B Use of magnesium-copper compositions for the evaporation of magnesium and magnesium dispensers |
03/09/2011 | CN101356297B Spattering device and film forming method |
03/09/2011 | CN101171350B High performance alloys with improved metal dusting corrosion resistance |
03/09/2011 | CN101092687B Sputtering apparatus, method of operating the same, and method of manufacturing substrate using the same |
03/08/2011 | US7901796 Coated cutting tool and manufacturing method thereof |
03/08/2011 | US7901786 Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product |
03/08/2011 | US7901598 Solid electrolyte and method of producing the same |
03/08/2011 | US7901552 Sputtering target with grooves and intersecting channels |
03/08/2011 | US7901545 deposition of uniform barrier layers into high aspect ratio nanostructure patterns on semiconductor substrates: radio frequency energy is coupled into the chamber to form a high density plasma, and a biasing voltage can be applied to aid in enhancing surface coverage |
03/08/2011 | US7901539 Apparatus and methods for transporting and processing substrates |
03/08/2011 | US7900576 Process and device for treating and consolidating stone blocks and slabs |
03/03/2011 | WO2011025882A1 Methods to fabricate non-metal films on semiconductor substrates using physical vapor deposition |
03/03/2011 | WO2011025729A2 Improved plasma ignition performance for low pressure physical vapor deposition (pvd) processes |
03/03/2011 | WO2011024909A1 Copper material for use in a sputtering target, and manufacturing method therefor |
03/03/2011 | WO2011024853A1 Film-forming apparatus |
03/03/2011 | WO2011024764A1 Photocatalytic multilayer metal compound thin film and method for producing same |
03/03/2011 | WO2011024411A1 Magnetron sputtering electrode and sputtering device |
03/03/2011 | WO2011024343A1 El light emitting device and method for manufacturing same |
03/03/2011 | WO2010149790A3 Method for coating a substrate in a vacuum chamber having a rotating magnetron |
03/03/2011 | WO2010115128A4 High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process |
03/03/2011 | WO2010114823A4 Sputtering target for pvd chamber |
03/03/2011 | US20110053057 Mask blank, transfer mask, and methods of manufacturing the same |
03/03/2011 | US20110053045 Solid oxide fuel cell and method of manufacturing the same |
03/03/2011 | US20110052934 Slide part |
03/03/2011 | US20110052894 Decorative substrate, especially an artificial jewellery stone with a colour effect, and method for achieving the colour effect for a decorative transparent substrate |
03/03/2011 | US20110052796 Method and device for producing stoichiometry gradients and layer systems |
03/03/2011 | US20110049506 Stable p-type semiconducting behaviour in li and ni codoped zno |
03/03/2011 | US20110049383 Ion implanter and ion implant method thereof |
03/03/2011 | US20110048954 Enhanced solderability using a substantially pure nickel layer deposited by physical vapor deposition |
03/03/2011 | US20110048937 Carrier and sputtering device using the same |
03/03/2011 | US20110048936 AL-Ni-RARE EARTH ELEMENT ALLOY SPUTTERING TARGET |
03/03/2011 | US20110048935 Sputtering Target with Low Generation of Particles |
03/03/2011 | US20110048934 System and apparatus to facilitate physical vapor deposition to modify non-metal films on semiconductor substrates |
03/03/2011 | US20110048933 Gas-inputting device for vacuum sputtering apparatus |
03/03/2011 | US20110048928 Methods to fabricate non-metal films on semiconductor substrates using physical vapor deposition |
03/03/2011 | US20110048927 Sputtering apparatus and sputtering method |
03/03/2011 | US20110048926 Magnetron sputtering apparatus and magnetron sputtering method |
03/03/2011 | US20110048925 Coated article with sputter-deposited transparent conductive coating capable of surviving harsh environments, and method of making the same |
03/03/2011 | US20110048924 Plasma ignition performance for low pressure physical vapor deposition (pvd) processes |
03/03/2011 | US20110048515 Passivation layer for wafer based solar cells and method of manufacturing thereof |
03/03/2011 | DE202010016853U1 Handinstrument für den Dentalbereich Hand tool for dental applications |
03/03/2011 | DE102009038519A1 Verfahren und Vorrichtung zur Herstellung von Stöchiometriegradientenschichten und Schichtsystemen Method and apparatus for producing and coating systems Stöchiometriegradientenschichten |
03/03/2011 | DE102009038369A1 Substrate holder for disc- or plate-shaped substrate, comprises a basic structure with at least one substrate recorder, which exhibits a recording medium for at least one substrate, with a lower guide element and an upper guide element |
03/03/2011 | DE102007020800B4 Modifizierte Multikanalstrukturen und deren Verwendung Modified multi-channel structures and their use |
03/02/2011 | EP2290678A1 Vacuum processing apparatus, vacuum processing method, and electronic device manufacturing method |
03/02/2011 | EP2290136A1 Method for achieving improved epitaxy quality (surface texture and defect densitity) on free-standing (aluminum, indium, gallium) nitride ((Al, In, Ga)N) substrates for opto-electronic and electronic devices |
03/02/2011 | EP2290135A1 Method for achieving improved epitaxy quality (surface texture and defect densitity) on free-standing (aluminum, indium, gallium) nitride ((Al, In, Ga)N) substrates for opto-electronic and electronic devices |
03/02/2011 | EP2290122A1 Nickel alloy sputtering target and nickel silicide film |
03/02/2011 | EP2290121A1 Cylindrical sputtering target and method for manufacturing the same |
03/02/2011 | EP2290120A2 High temperature evaporator cell having parallel-connected heating zones |
03/02/2011 | EP2290119A1 Slide part |
03/02/2011 | EP2290118A2 Thin film deposition apparatus and method of manufacturing organic light-emitting display apparatus using the same |
03/02/2011 | EP2289696A2 Decorative part and process for producing the same |
03/02/2011 | EP2288740A1 High volume manufacture of electrochecmicals cells using physical vapor deposition |
03/02/2011 | EP2288739A1 Transparent barrier layer system |
03/02/2011 | CN101983413A Ion implanter, ion implantation method and program |
03/02/2011 | CN101983255A Sputtering system and method including an arc detection system |
03/02/2011 | CN101983254A Method for depositing a film onto a substrate |
03/02/2011 | CN101983253A Apparatus for sputtering and a method of fabricating a metallization structure |
03/02/2011 | CN101982561A CIGS thin film material with chalcopyrite structure and high light absorption coefficient and preparation method thereof |
03/02/2011 | CN101572280B Deposition apparatus for manufacturing metal electrode layer of thin film solar cell |
03/02/2011 | CN101568669B Method of surface treatment for metal glass part, and metal glass part with its surface treated by the method |
03/02/2011 | CN101398123B WS2/MoS2 solid lubrication multilayer film and method for making same |
03/02/2011 | CN101381859B Vapor deposition system and vapor deposition method |
03/02/2011 | CN101289736B Partial pressure measuring method and partial pressure measuring apparatus |
03/02/2011 | CN101037766B Sputtering target and manufacturing method therefor, and recordable optical recording medium |
03/01/2011 | USRE42175 Electrostatic chucking stage and substrate processing apparatus |
03/01/2011 | US7899308 Evaporation device with receptacle for receiving material to be evaporated |
03/01/2011 | US7897972 Electronic circuit |
03/01/2011 | US7897210 Device and method for organic vapor jet deposition |
03/01/2011 | US7897068 Sputtering target, thin film for optical information recording medium and process for producing the same |
03/01/2011 | US7897067 Amorphous transparent conductive film, sputtering target as its raw material, amorphous transparent electrode substrate, process for producing the same and color filter for liquid crystal display |
03/01/2011 | US7897065 Polycrystalline aluminum thin film and optical recording medium |
03/01/2011 | US7897025 Method and apparatus for forming thin film |
03/01/2011 | US7897020 Method for alkali doping of thin film photovoltaic materials |
03/01/2011 | US7895971 Microwave plasma processing apparatus |
02/24/2011 | WO2011021669A1 Thin film transistor |
02/24/2011 | WO2011021622A1 Method for forming pattern thin film |
02/24/2011 | WO2011021281A1 Arc evaporation source, and vacuum evaporation apparatus |
02/24/2011 | WO2011021007A1 Production of flake particles |
02/24/2011 | WO2011020964A1 Method for ion implantation for producing an anti-icing surface |
02/24/2011 | US20110045674 Method and apparatus for inline deposition of materials on a non-planar surface |
02/24/2011 | US20110045282 Graphene/(multilayer) boron nitride heteroepitaxy for electronic device applications |
02/24/2011 | US20110045258 Laminate and composite layer comprising a substrate and a coating, and a process and apparatus for preparation thereof |
02/24/2011 | US20110045245 Oxide coated cutting insert |
02/24/2011 | US20110045244 Engineering flat surfaces on materials doped via pulsed laser irradiation |
02/24/2011 | US20110045202 Formation of Carbon-Containing Material |
02/24/2011 | US20110045193 Backing Sheet for Photovoltaic Modules |
02/24/2011 | US20110044838 Iron Silicide Sputtering Target and Method for Production Thereof |
02/24/2011 | US20110044779 Work piece with a hard film of alcr-containing material, and process for its production |
02/24/2011 | US20110044775 Oxide coated cutting insert |
02/24/2011 | US20110042696 Organic Electroluminescent Device |
02/24/2011 | US20110042578 Ion beam monitoring arrangement |
02/24/2011 | US20110042209 Sputtering apparatus and recording medium for recording control program thereof |
02/24/2011 | US20110042208 Film forming source, vapor deposition apparatus, and apparatus for manufacturing an organic el element |
02/24/2011 | US20110042200 Method of depositing amorphus aluminium oxynitride layer by reactive sputtering of an aluminium target in a nitrogen/oxygen atmosphere |
02/24/2011 | US20110042135 Ag base alloy thin film and sputtering target for forming ag base alloy thin film |