Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2011
03/09/2011CN101984133A Plunger surface self-lubricating carbon based coating and preparation method thereof
03/09/2011CN101660131B Method for preparing hydrogenated silicon film by utilizing magnetron sputtering
03/09/2011CN101597753B Forward and reverse spiral flow cooling structure of wide flexible magnetic-control spurting film coating roller
03/09/2011CN101448970B Use of magnesium-copper compositions for the evaporation of magnesium and magnesium dispensers
03/09/2011CN101356297B Spattering device and film forming method
03/09/2011CN101171350B High performance alloys with improved metal dusting corrosion resistance
03/09/2011CN101092687B Sputtering apparatus, method of operating the same, and method of manufacturing substrate using the same
03/08/2011US7901796 Coated cutting tool and manufacturing method thereof
03/08/2011US7901786 Method for manufacturing ultra-hydrophilic thin film coated metal product, and ultra-hydrophilic thin film coated metal product
03/08/2011US7901598 Solid electrolyte and method of producing the same
03/08/2011US7901552 Sputtering target with grooves and intersecting channels
03/08/2011US7901545 deposition of uniform barrier layers into high aspect ratio nanostructure patterns on semiconductor substrates: radio frequency energy is coupled into the chamber to form a high density plasma, and a biasing voltage can be applied to aid in enhancing surface coverage
03/08/2011US7901539 Apparatus and methods for transporting and processing substrates
03/08/2011US7900576 Process and device for treating and consolidating stone blocks and slabs
03/03/2011WO2011025882A1 Methods to fabricate non-metal films on semiconductor substrates using physical vapor deposition
03/03/2011WO2011025729A2 Improved plasma ignition performance for low pressure physical vapor deposition (pvd) processes
03/03/2011WO2011024909A1 Copper material for use in a sputtering target, and manufacturing method therefor
03/03/2011WO2011024853A1 Film-forming apparatus
03/03/2011WO2011024764A1 Photocatalytic multilayer metal compound thin film and method for producing same
03/03/2011WO2011024411A1 Magnetron sputtering electrode and sputtering device
03/03/2011WO2011024343A1 El light emitting device and method for manufacturing same
03/03/2011WO2010149790A3 Method for coating a substrate in a vacuum chamber having a rotating magnetron
03/03/2011WO2010115128A4 High pressure rf-dc sputtering and methods to improve film uniformity and step-coverage of this process
03/03/2011WO2010114823A4 Sputtering target for pvd chamber
03/03/2011US20110053057 Mask blank, transfer mask, and methods of manufacturing the same
03/03/2011US20110053045 Solid oxide fuel cell and method of manufacturing the same
03/03/2011US20110052934 Slide part
03/03/2011US20110052894 Decorative substrate, especially an artificial jewellery stone with a colour effect, and method for achieving the colour effect for a decorative transparent substrate
03/03/2011US20110052796 Method and device for producing stoichiometry gradients and layer systems
03/03/2011US20110049506 Stable p-type semiconducting behaviour in li and ni codoped zno
03/03/2011US20110049383 Ion implanter and ion implant method thereof
03/03/2011US20110048954 Enhanced solderability using a substantially pure nickel layer deposited by physical vapor deposition
03/03/2011US20110048937 Carrier and sputtering device using the same
03/03/2011US20110048936 AL-Ni-RARE EARTH ELEMENT ALLOY SPUTTERING TARGET
03/03/2011US20110048935 Sputtering Target with Low Generation of Particles
03/03/2011US20110048934 System and apparatus to facilitate physical vapor deposition to modify non-metal films on semiconductor substrates
03/03/2011US20110048933 Gas-inputting device for vacuum sputtering apparatus
03/03/2011US20110048928 Methods to fabricate non-metal films on semiconductor substrates using physical vapor deposition
03/03/2011US20110048927 Sputtering apparatus and sputtering method
03/03/2011US20110048926 Magnetron sputtering apparatus and magnetron sputtering method
03/03/2011US20110048925 Coated article with sputter-deposited transparent conductive coating capable of surviving harsh environments, and method of making the same
03/03/2011US20110048924 Plasma ignition performance for low pressure physical vapor deposition (pvd) processes
03/03/2011US20110048515 Passivation layer for wafer based solar cells and method of manufacturing thereof
03/03/2011DE202010016853U1 Handinstrument für den Dentalbereich Hand tool for dental applications
03/03/2011DE102009038519A1 Verfahren und Vorrichtung zur Herstellung von Stöchiometriegradientenschichten und Schichtsystemen Method and apparatus for producing and coating systems Stöchiometriegradientenschichten
03/03/2011DE102009038369A1 Substrate holder for disc- or plate-shaped substrate, comprises a basic structure with at least one substrate recorder, which exhibits a recording medium for at least one substrate, with a lower guide element and an upper guide element
03/03/2011DE102007020800B4 Modifizierte Multikanalstrukturen und deren Verwendung Modified multi-channel structures and their use
03/02/2011EP2290678A1 Vacuum processing apparatus, vacuum processing method, and electronic device manufacturing method
03/02/2011EP2290136A1 Method for achieving improved epitaxy quality (surface texture and defect densitity) on free-standing (aluminum, indium, gallium) nitride ((Al, In, Ga)N) substrates for opto-electronic and electronic devices
03/02/2011EP2290135A1 Method for achieving improved epitaxy quality (surface texture and defect densitity) on free-standing (aluminum, indium, gallium) nitride ((Al, In, Ga)N) substrates for opto-electronic and electronic devices
03/02/2011EP2290122A1 Nickel alloy sputtering target and nickel silicide film
03/02/2011EP2290121A1 Cylindrical sputtering target and method for manufacturing the same
03/02/2011EP2290120A2 High temperature evaporator cell having parallel-connected heating zones
03/02/2011EP2290119A1 Slide part
03/02/2011EP2290118A2 Thin film deposition apparatus and method of manufacturing organic light-emitting display apparatus using the same
03/02/2011EP2289696A2 Decorative part and process for producing the same
03/02/2011EP2288740A1 High volume manufacture of electrochecmicals cells using physical vapor deposition
03/02/2011EP2288739A1 Transparent barrier layer system
03/02/2011CN101983413A Ion implanter, ion implantation method and program
03/02/2011CN101983255A Sputtering system and method including an arc detection system
03/02/2011CN101983254A Method for depositing a film onto a substrate
03/02/2011CN101983253A Apparatus for sputtering and a method of fabricating a metallization structure
03/02/2011CN101982561A CIGS thin film material with chalcopyrite structure and high light absorption coefficient and preparation method thereof
03/02/2011CN101572280B Deposition apparatus for manufacturing metal electrode layer of thin film solar cell
03/02/2011CN101568669B Method of surface treatment for metal glass part, and metal glass part with its surface treated by the method
03/02/2011CN101398123B WS2/MoS2 solid lubrication multilayer film and method for making same
03/02/2011CN101381859B Vapor deposition system and vapor deposition method
03/02/2011CN101289736B Partial pressure measuring method and partial pressure measuring apparatus
03/02/2011CN101037766B Sputtering target and manufacturing method therefor, and recordable optical recording medium
03/01/2011USRE42175 Electrostatic chucking stage and substrate processing apparatus
03/01/2011US7899308 Evaporation device with receptacle for receiving material to be evaporated
03/01/2011US7897972 Electronic circuit
03/01/2011US7897210 Device and method for organic vapor jet deposition
03/01/2011US7897068 Sputtering target, thin film for optical information recording medium and process for producing the same
03/01/2011US7897067 Amorphous transparent conductive film, sputtering target as its raw material, amorphous transparent electrode substrate, process for producing the same and color filter for liquid crystal display
03/01/2011US7897065 Polycrystalline aluminum thin film and optical recording medium
03/01/2011US7897025 Method and apparatus for forming thin film
03/01/2011US7897020 Method for alkali doping of thin film photovoltaic materials
03/01/2011US7895971 Microwave plasma processing apparatus
02/2011
02/24/2011WO2011021669A1 Thin film transistor
02/24/2011WO2011021622A1 Method for forming pattern thin film
02/24/2011WO2011021281A1 Arc evaporation source, and vacuum evaporation apparatus
02/24/2011WO2011021007A1 Production of flake particles
02/24/2011WO2011020964A1 Method for ion implantation for producing an anti-icing surface
02/24/2011US20110045674 Method and apparatus for inline deposition of materials on a non-planar surface
02/24/2011US20110045282 Graphene/(multilayer) boron nitride heteroepitaxy for electronic device applications
02/24/2011US20110045258 Laminate and composite layer comprising a substrate and a coating, and a process and apparatus for preparation thereof
02/24/2011US20110045245 Oxide coated cutting insert
02/24/2011US20110045244 Engineering flat surfaces on materials doped via pulsed laser irradiation
02/24/2011US20110045202 Formation of Carbon-Containing Material
02/24/2011US20110045193 Backing Sheet for Photovoltaic Modules
02/24/2011US20110044838 Iron Silicide Sputtering Target and Method for Production Thereof
02/24/2011US20110044779 Work piece with a hard film of alcr-containing material, and process for its production
02/24/2011US20110044775 Oxide coated cutting insert
02/24/2011US20110042696 Organic Electroluminescent Device
02/24/2011US20110042578 Ion beam monitoring arrangement
02/24/2011US20110042209 Sputtering apparatus and recording medium for recording control program thereof
02/24/2011US20110042208 Film forming source, vapor deposition apparatus, and apparatus for manufacturing an organic el element
02/24/2011US20110042200 Method of depositing amorphus aluminium oxynitride layer by reactive sputtering of an aluminium target in a nitrogen/oxygen atmosphere
02/24/2011US20110042135 Ag base alloy thin film and sputtering target for forming ag base alloy thin film