Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
---|
04/12/2011 | US7922862 Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method |
04/12/2011 | US7922821 Source, an arrangement for installing a source, and a method for installing and removing a source |
04/12/2011 | US7922820 Heating crucible and deposition apparatus including the same |
04/12/2011 | US7922428 Coated bore cutting tools |
04/12/2011 | US7922066 Method of manufacturing a rotary sputtering target using a mold |
04/07/2011 | WO2011041223A1 Method for ion source component cleaning |
04/07/2011 | WO2011041135A2 Method of making coated metal articles |
04/07/2011 | WO2011041063A2 Aluminum titanium nitride coating and method of making same |
04/07/2011 | WO2011040538A1 Substrate processing system |
04/07/2011 | WO2011040028A1 SINTERED In-Ga-Zn-O-TYPE OXIDE |
04/07/2011 | WO2011039488A1 Thin film deposition method |
04/07/2011 | WO2011039192A1 Magnet arrangement for a target backing tube and target backing tube comprising the same |
04/07/2011 | WO2011039191A1 Coating thickness measuring device and method |
04/07/2011 | WO2011038561A1 Treatment device for vacuum deposition |
04/07/2011 | WO2011005008A3 Substrate for the deposition of a deposition apparatus, film-forming method, and method for manufacturing an organic electroluminescence display device using the substrate for deposition |
04/07/2011 | WO2010144126A3 System and method for vapor phase reflow of a conductive coating |
04/07/2011 | US20110081732 Method of Manufacturing Magnetic Tunnel Junction Device and Apparatus for Manufacturing the Same |
04/07/2011 | US20110081557 Adhesiveless copper clad laminates and method for manufacturing thereof |
04/07/2011 | US20110081542 Substrate with antimicrobial properties |
04/07/2011 | US20110081532 Silicon titanium oxide coating, coated article including silicon titanium oxide coating, and method of making the same |
04/07/2011 | US20110081503 Method of depositing stable and adhesive interface between fluorine-based low-k material and metal barrier layer |
04/07/2011 | US20110081485 method for the application of a filter on a web |
04/07/2011 | US20110081477 Plasma Activated Chemical Vapour Deposition Method and Apparatus Therefor |
04/07/2011 | US20110080630 Glass type electrochemical/electrically controllable device with variable optical and/or energetic characteristic |
04/07/2011 | US20110079764 Information recording medium, manufacturing method therefor, and sputtering target |
04/07/2011 | US20110079511 Magnet arrangement for a target backing tube and target backing tube comprising the same |
04/07/2011 | US20110079509 Sputtering system for depositing thin film and method for depositing thin film |
04/07/2011 | US20110079508 Method for coating a substrate and coater |
04/07/2011 | US20110079507 Manufacturing method of semiconductor element |
04/07/2011 | US20110079418 Ceramic wiring board and method of manufacturing thereof |
04/07/2011 | US20110079069 Hard film, plastic working die, plastic working method, and target for hard film |
04/07/2011 | US20110078993 Sliver for spinning, method for producing the same, and spun yarn and fiber product using the same |
04/07/2011 | DE202011002012U1 Vakuumbeschichtungsanlage mit Pump- und Magnetronanordnung Vacuum coating system with pumping and magnetron |
04/07/2011 | DE202011001479U1 Vorrichtung zum Erkennen von Störfällen An apparatus for detecting incidents |
04/07/2011 | DE102010041376A1 Linear evaporating device for the deposition of sputtering materials on substrates, comprises a heatable primary evaporator and/or a long stretched heatable steam distributor conductively connected with the primary evaporator |
04/07/2011 | DE102009048397A1 Atmosphärendruckplasmaverfahren zur Herstellung oberflächenmodifizierter Partikel und von Beschichtungen Atmospheric pressure plasma process for the preparation of surface-modified particles, and of coatings |
04/07/2011 | DE102009044927A1 Werkzeugbeschichtung Tool coating |
04/07/2011 | CA2774937A1 Thin film deposition method |
04/07/2011 | CA2773655A1 Aluminum titanium nitride coating and method of making same |
04/06/2011 | EP2306490A1 Magnet arrangement for a target backing tube and target backing tube comprising the same |
04/06/2011 | EP2305855A1 Manufacturing method for vapor deposition device and thin-film device |
04/06/2011 | EP2305854A1 Evaporation source and vapor deposition apparatus using the same |
04/06/2011 | EP2305405A1 Coated member |
04/06/2011 | EP2304479A1 Reflective optical element and method for the production thereof |
04/06/2011 | EP2304071A1 A film depositing apparatus and method |
04/06/2011 | EP2304070A1 Sputtering system and method including an arc detection system |
04/06/2011 | EP2304069A2 Method of making inorganic or inorganic/organic hybrid barrier films |
04/06/2011 | EP1872417B1 Method and device for producing electronic components |
04/06/2011 | EP1486695B1 High friction sliding member |
04/06/2011 | EP1476300B1 Solar control coating |
04/06/2011 | CN201785485U Vacuum electric leading-in device |
04/06/2011 | CN201785484U Clapboard device for plasma immersion ion implantation with double chamber structure |
04/06/2011 | CN201785483U Plasma immersion ion implantation system |
04/06/2011 | CN201785482U Plasma immersion ion implantation device |
04/06/2011 | CN201785481U Columnar electrode |
04/06/2011 | CN201785480U Cathode coating equipment |
04/06/2011 | CN201785479U Improved flat target |
04/06/2011 | CN201785478U Evaporation plating device |
04/06/2011 | CN1982501B Target and process kit components for sputtering chamber |
04/06/2011 | CN1867693B 溅射靶材 Sputtering Targets |
04/06/2011 | CN1842878B Superconducting film and method of manufacturing the same |
04/06/2011 | CN102007583A Processes for producing dielectric film and semiconductor device, dielectric film, and recording medium |
04/06/2011 | CN102007575A Chamber and manufacturing method therefor |
04/06/2011 | CN102005699A Nitride semiconductor light emitting device and method of fabricating nitride semiconductor laser device |
04/06/2011 | CN102005487A Light absorption layer material for flexible thin film solar cell and preparation method thereof |
04/06/2011 | CN102005362A Calibration system and calibration method for dual-Faraday cup measuring ratios of ion implantation machine |
04/06/2011 | CN102005212A 真空处理设备以及衬底转移方法 The vacuum processing apparatus and a substrate transfer method |
04/06/2011 | CN102004499A Thickness control method of infrared optical thin film in production process of infrared optical filter |
04/06/2011 | CN102002681A Application method of a model base plate |
04/06/2011 | CN102002680A Bearing plate and ejection fixture with bearing plate |
04/06/2011 | CN102002679A Autorotation type work frame mechanism of vacuum evaporation coating |
04/06/2011 | CN102002678A Sputtering material rack |
04/06/2011 | CN102002677A Novel power transmission high-voltage isolation linkage shaft |
04/06/2011 | CN102002676A Vacuum shock protection method for process of feeding gas into ion source cavity |
04/06/2011 | CN102002675A Gas intake device of vacuum sputtering equipment |
04/06/2011 | CN102002674A Surface vacuum coating process of transparent plastics |
04/06/2011 | CN102002673A Preparation method of nanocrystalline silicon-aluminum oxide/silicon oxide thermoelectric film material |
04/06/2011 | CN102002672A Method for metallizing infrared focal plane encapsulated window |
04/06/2011 | CN102002671A Method for preventing NdFeB permanent magnet from being corroded |
04/06/2011 | CN102002670A Method for preparing surface plasma resonance chip |
04/06/2011 | CN102002669A Method for plating stainless-steel protective coating on surface of sintered NdFeB magnet through magnetron sputtering |
04/06/2011 | CN102002668A Polysilicon film low-temperature physical vapor deposition device and method thereof |
04/06/2011 | CN102002667A Method and equipment for preparing high-repeatability vanadium oxide film |
04/06/2011 | CN102002666A Preparation method of tantalum nitride diffusion impervious layer for copper interconnection |
04/06/2011 | CN102002653A Method for preparing superhigh-purity aluminum fine grain high-orientation target |
04/06/2011 | CN102002605A Preparation method of tungsten titanium alloy plate for sputtering target |
04/06/2011 | CN102000702A Processing technology of high-purity tantalum sputtering target material |
04/06/2011 | CN101613091B CIGS powder, CIGS target, CIGS film and preparation method thereof |
04/06/2011 | CN101597751B Zr-Al-Si-N hard composite coating and preparation method thereof |
04/06/2011 | CN101572208B Plasma processing apparatus and method |
04/06/2011 | CN101550540B Method and device for vertical production of double-sided plasma surface metallurgic sheet metal |
04/06/2011 | CN101542604B Method for manufacturing magnetic recording medium and magnetic recording and reproducing apparatus |
04/06/2011 | CN101509124B Cavity structure of ECR plasma sputtering apparatus |
04/06/2011 | CN101496148B Interrupted deposition process for selective deposition of si-containing films |
04/06/2011 | CN101492810B Wafer support assembly |
04/06/2011 | CN101460651B Transparent conductive film, process for production of the film, and sputtering target for use in the production of the film |
04/06/2011 | CN101458355B CF display panel and processing method |
04/06/2011 | CN101372041B Coated cutting tool for turning of heat resistant super alloys (HRSA) |
04/06/2011 | CN101286429B Single walled carbon nanotube membrane for cathode of field emission display and method of manufacture and test |
04/06/2011 | CN101260513B Preparation method of solar energy battery copper-indium-gallium-selenium film key target material |