Patents for C09G 1 - Polishing compositions (7,846) |
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06/27/2012 | CN102516876A Polishing composition for silicon wafer polishing and preparation method thereof |
06/27/2012 | CN102516875A Polishing solution based on polishing process of metal Co and application thereof |
06/27/2012 | CN102516874A Polishing liquid for ultra-precision sharpening of diamond cutting tool and preparation method thereof |
06/27/2012 | CN102516873A Silicon wafer polishing composition and preparation method thereof |
06/27/2012 | CN102516872A Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same |
06/27/2012 | CN102515230A Method for manufacturing aluminum oxide substrate polishing material for automobile painting surface |
06/27/2012 | CN102513916A Micropore polishing method for ultraprecise optical element |
06/27/2012 | CN101961852B Chemical mechanical grinding method for interlayer dielectric layer |
06/27/2012 | CN101515546B Method of polishing copper-containing patterned semiconductor chip |
06/21/2012 | US20120152148 Non-buffing wax emulsion composition |
06/20/2012 | CN102504706A Rare earth paint surface care solution |
06/20/2012 | CN102504705A Polishing solution used for precision machining of optical communication ZrO2 ceramic stub and preparation method thereof |
06/20/2012 | CN101418188B Coloring glazing emulsifiable paste and preparation method, leather coloring glazing agent and canning method |
06/20/2012 | CN101044221B Leveling agent for floor polish and aqueous floor polish composition |
06/20/2012 | CN101040021B Cmp composition with a polymer additive for polishing noble metals |
06/14/2012 | WO2012077063A1 Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films |
06/14/2012 | WO2012077001A2 Wipe coated with a botanical emulsion having anitmicrobial properties |
06/14/2012 | WO2012075687A1 Chemical mechanical polishing slurry |
06/13/2012 | CN102492366A Method for preparing polishing solution by utilizing tailings recovered from crystal silicon cutting waste mortar |
06/13/2012 | CN102492233A Composite abrasive grain as well as preparation method and application thereof |
06/13/2012 | CN101885959B Cerium grinding agent |
06/13/2012 | CN101117548B Polishing composition and polishing process |
06/07/2012 | WO2012073452A1 Aqueous floor polishing composition |
06/07/2012 | WO2012071780A1 Chemical mechanical polishing slurry |
06/07/2012 | US20120142258 Polishing Composition and Polishing Method Using The Same |
06/07/2012 | US20120138851 Polishing composition and polishing method |
06/06/2012 | CN101328390B Abrasive cleaning agent, method for manufacturing the same, and method for polishing using abrasive cleaning agent |
05/31/2012 | WO2012068775A1 Chemical mechanical polishing slurry |
05/31/2012 | US20120132103 Fluorine-containing compound, fluorine-containing surfactant and compositions containing same |
05/30/2012 | CN102477262A 一种化学机械抛光浆料 A chemical mechanical polishing slurry of |
05/30/2012 | CN102477261A 一种化学机械抛光液 A chemical mechanical polishing solution |
05/30/2012 | CN102477260A 一种化学机械抛光液 A chemical mechanical polishing solution |
05/30/2012 | CN102477259A 一种化学机械抛光浆料 A chemical mechanical polishing slurry of |
05/30/2012 | CN102477258A Chemically mechanical polishing liquid |
05/30/2012 | CN101880453B Polyurethane blasting sand and preparation method thereof |
05/30/2012 | CN101664970B Monocrystal silicon-rod butting technique |
05/30/2012 | CN101389723B Iodate-containing chemical-mechanical polishing compositions and methods |
05/24/2012 | US20120130003 Aqueous floor polishing composition |
05/23/2012 | CN1733856B Slurry, chemical mechanical polishing method using the slurry, and method of forming metal wiring using the slurry |
05/23/2012 | CN102471641A 水性树脂乳液及地板抛光组合物 The aqueous resin emulsion and floor polishing composition |
05/23/2012 | CN102464949A 皮革表面处理剂 Leather surface treatment agent |
05/23/2012 | CN102464948A 一种黑鞋油及其制备方法 One kind of black shoe polish and preparation method |
05/23/2012 | CN102464947A 一种化学机械抛光液 A chemical mechanical polishing solution |
05/23/2012 | CN102464946A 一种化学机械抛光液及其应用 A chemical mechanical polishing liquid and its application |
05/23/2012 | CN102464945A 一种化学机械抛光液 A chemical mechanical polishing solution |
05/23/2012 | CN102464944A 一种化学机械抛光液及其使用方法 A chemical mechanical polishing solution and method of use |
05/23/2012 | CN101767295B Chemical mechanical polishing composition and methods relating thereto |
05/23/2012 | CN101670541B Fast polishing traversing processing method of heavy-calibre planar optical elements |
05/23/2012 | CN101475778B Polishing composite for gallium arsenide wafer and preparation thereof |
05/16/2012 | EP2451613A1 Dispersion comprising cerium oxide and silicon dioxide |
05/16/2012 | CN1849378B Chemical-mechanical polishing composition and method for using the same |
05/16/2012 | CN102453444A Polishing solution used for amorphous alloy and polishing method of amorphous alloy |
05/16/2012 | CN102453443A Household electrical appliance and furniture maintenance liquid |
05/16/2012 | CN102453442A Aeroengine turbine guide vane polishing protection wax and polishing method |
05/16/2012 | CN102453441A Glazing protective agent for stone materials and preparation method thereof |
05/16/2012 | CN102453440A Chemical mechanical polishing liquid |
05/16/2012 | CN102453439A Chemical mechanical polishing liquid |
05/16/2012 | CN102453438A Polishing composition |
05/16/2012 | CN102453437A Polishing composition |
05/16/2012 | CN102453436A Polishing composition |
05/09/2012 | EP1130630B1 Abrasive composition for polishing lsi device |
05/09/2012 | CN1837320B Polishing composition and polishing method |
05/09/2012 | CN102449747A Polishing solution for cmp and polishing method |
05/09/2012 | CN102443352A Emulsifiable paste for maintaining leather garment |
05/09/2012 | CN102443351A Chemical-mechanical planarization sizing agent |
05/09/2012 | CN102441819A Chemical and mechanical polishing method and solution for sulfur phase-change material |
05/03/2012 | WO2012055153A1 Chemical mechanical polishing method of tungsten |
05/03/2012 | US20120108064 Polishing composition for silicon wafers |
05/02/2012 | CN102433074A Floor wax |
05/02/2012 | CN102433073A Aluminum alloy polishing solution and polishing method and equipment |
05/01/2012 | US8168578 Water-based silicone dispersion containing low level of silicone oils |
05/01/2012 | US8168541 CMP polishing slurry and polishing method |
05/01/2012 | US8167684 Chemical mechanical polishing slurry, its preparation method, and use for the same |
04/26/2012 | WO2012051787A1 Chemical mechanical polishing liquid |
04/26/2012 | WO2012051786A1 Chemical-mechanical polishing slurry |
04/25/2012 | EP2444996A1 Polishing liquid composition for silicon wafers |
04/25/2012 | EP2106426B1 Composition for polishing surface made of silicon dioxide |
04/25/2012 | EP1934300B1 Abrasive particulate material, and method of planarizing a workpiece using the abrasive particulate material |
04/25/2012 | CN1826397B 用于化学机械抛光的二氧化铈研磨剂 Ceria abrasive for chemical mechanical polishing |
04/25/2012 | CN102427034A Method of carrying out mirror polishing and thinning on GaAs wafer with ultrathin thickness |
04/25/2012 | CN101103089B Polishing slurries and methods for chemical mechanical polishing |
04/19/2012 | WO2012048517A1 Chemical-mechanical planarization slurry |
04/18/2012 | EP2441819A1 Stable Aqueous Slurry Suspensions |
04/18/2012 | EP2441791A1 Stable aqueous wax dispersions |
04/18/2012 | CN102417811A 一种用于化学机械抛光液的复合磨料及其制备方法和应用 Composite abrasive and its preparation method and application for chemical mechanical polishing solution |
04/18/2012 | CN102417793A 释放微量元素负离子防电磁波的纳米芳香光亮剂 Release of trace elements Nano anion anti-electromagnetic aromatic brightener |
04/12/2012 | WO2012046183A1 Chemical mechanical polishing (cmp) composition |
04/12/2012 | WO2012046179A1 Aqueous polishing composition and process for chemically mechanically polishing substrates having patterned or unpatterned low-k dielectric layers |
04/11/2012 | EP2439248A2 Chemical-mechanical polishing slurry composition comprising nonionized heat-activated nanocatalyst, and polishing method using same |
04/11/2012 | CN102408871A 含抛光活性元素的多孔纳米复合磨粒、抛光液组合物及其制备方法 Polishing active elements containing nano-composite abrasive porous polishing liquid composition and its preparation method |
04/11/2012 | CN102408837A 一种可提高硅晶片抛光精度的抛光组合物及其制备方法 Capable of improving the accuracy of the silicon wafer polishing polishing composition and preparation method |
04/11/2012 | CN102408836A 一种用于氧化钛薄膜化学机械平坦化的纳米抛光液及应用 A thin film of titanium oxide nano-chemical mechanical planarization polishing liquid and Applications |
04/11/2012 | CN102408835A 一种用于氧化镍薄膜化学机械平坦化的纳米抛光液及应用 A nickel oxide thin film nano-chemical mechanical planarization polishing liquid and Applications |
04/11/2012 | CN102408834A 一种化学机械抛光液 A chemical mechanical polishing solution |
04/05/2012 | WO2012044502A1 Removable polyurethane floor coating |
04/05/2012 | WO2012042040A1 Low free formaldehyde phenolic resins for abrasive products |
04/05/2012 | CA2813110A1 Low free formaldehyde phenolic resins for abrasive products |
04/05/2012 | CA2810926A1 Removable polyurethane floor coating |
04/04/2012 | EP2437285A2 Chemical mechanical polishing method for semiconductor device using an aqueous dispersion |
04/04/2012 | CN102403212A 硅通孔晶片的抛光方法和用于该方法的抛光组合物 TSV wafer polishing method and a polishing composition used in the process of |