Patents for C09G 1 - Polishing compositions (7,846) |
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08/22/2012 | CN102648258A Process for removing bulk material layer from substrate and chemical mechanical polishing agent suitable for this process |
08/22/2012 | CN102643614A Efficient glass polishing powder and preparation method thereof |
08/22/2012 | CN102643613A Grinding liquid for sapphire substrate and preparation method of grinding liquid |
08/22/2012 | CN102228421B Method for preparing novel crocodile-based oily raw material of daily chemical products and application thereof |
08/22/2012 | CN101555387B Rare-earth polishing material with a core shell structure and preparation method thereof |
08/15/2012 | EP2125985B1 Cmp slurry composition for forming metal wiring line |
08/15/2012 | CN1902353B Stabilized body care products, household products, textiles and fabrics |
08/15/2012 | CN102640275A Process for removing a bulk material layer from a substrate and a chemical mechanical polishing agent suitable for this process |
08/15/2012 | CN102634285A Fur brightener composition and preparation method and application thereof |
08/15/2012 | CN102634284A Polishing solution and preparation method thereof |
08/09/2012 | US20120201913 Methods and products using grass of the genus triodia |
08/08/2012 | CN102627917A Polishing accelerating agent for glass and silicon-containing compound and production method and application thereof |
08/08/2012 | CN102627916A Glass polishing solution with reinforcement function |
08/08/2012 | CN102627915A Efficient alumina sapphire polishing solution and its preparation method |
08/08/2012 | CN102627914A Polishing agent, concentrated one-pack type polishing agent, two-pack type polishing agent and method for polishing substrate |
08/08/2012 | CN102627310A Liquid suspension and powder of cerium oxide particles, methods for making the same and uses thereof in polishing |
08/08/2012 | CN101954775B Method for preparing metal plate base for ink-jet printing computer to plate |
08/08/2012 | CN101333421B Chemical mechanical polishing slurry composition and polishing method |
08/07/2012 | US8236695 Method of passivating chemical mechanical polishing compositions for copper film planarization processes |
08/01/2012 | EP2109648B1 Chemical mechanical planarization composition, system, and method of use |
08/01/2012 | CN102618176A Brightening agent for leather surface |
08/01/2012 | CN102618175A Alkaline storage hard disk polishing composition |
08/01/2012 | CN102618174A Silicon wafer chemical-mechanical polishing composition with high dilution ratio and high stability |
08/01/2012 | CN102618173A Sapphire polishing composition |
08/01/2012 | CN102618172A Slurry and method for chemical mechanical polishing |
07/31/2012 | US8231735 slurries comprising cerium oxide particles, a water soluble polymer selected from acrylic polymers, polyvinyl acetate, polyvinyl imidazole and polyvinyl pyrrolidone, and an acetylenic organic compound such as ethoxylated tetramethyl-5-decyne-4,7-diol; polishes for dielectrics; semiconductors |
07/25/2012 | CN102604544A Water-based brightening agent for leather |
07/25/2012 | CN102604543A Preparation method of high-stability nano cerium dioxide aqueous slurry for polishing solution |
07/25/2012 | CN102604542A Polishing solution used in polishing process with metal ruthenium as adhesive barrier layer in copper interconnection |
07/25/2012 | CN102604541A Composition and method to polish silicon nitride |
07/25/2012 | CN101864247B Abrasive material-free polishing fluid for chemical mechanical polishing of rigid fragile material |
07/25/2012 | CN101818029B Mixed polishing solution |
07/24/2012 | US8226849 a mixture of oxidizers, oxidized-metal etchants, protective film-forming agents and diluents, used for polishing semiconductors |
07/18/2012 | EP2071615B1 Aqueous dispersion for chemical mechanical polishing and chemical mechanical polishing method for semiconductor device |
07/18/2012 | CN102597142A A chemical mechanical polishing (CMP) composition comprising inorganic particles and polymer particles |
07/18/2012 | CN102586783A Corrosion inhibitor, preparation method thereof and chemico-mechanical polishing composition |
07/18/2012 | CN102586036A Non-washing type automobile essence and preparation method thereof |
07/18/2012 | CN102585765A Cmp研磨剂以及衬底的研磨方法 Cmp abrasive polishing method and substrate |
07/18/2012 | CN102585708A Rare earth polishing material and preparation method thereof |
07/18/2012 | CN102585707A Preparation method of cerium-based mixed rare earth polishing powder |
07/18/2012 | CN102585706A Acidic chemical and mechanical polishing composition |
07/18/2012 | CN102585705A CMP (chemical mechanical polishing) liquid with high polishing rate for sapphire supporting base |
07/18/2012 | CN102585704A Chemical mechanical polishing slurry composition and method for producing semiconductor device using the same |
07/18/2012 | CN102585072A Room temperature self-crosslinking acrylic ester emulsion |
07/18/2012 | CN101016440B Multi-component barrier polishing solution |
07/12/2012 | DE102011113732A1 Stabilisierte, konzentrierbare chemisch-mechanische Polierzusammensetzung und Verfahren zum Polieren eines Substrats Stabilized konzentrierbare chemical-mechanical polishing composition and methods for polishing a substrate |
07/11/2012 | CN202329117U 用于熬制抛光胶和粘接胶的电热炉 Brewed for polishing plastic and adhesive glue electric furnace |
07/11/2012 | CN202322710U 一种用于化学机械抛光液的复合磨料 A method for chemical mechanical polishing liquid abrasive composite |
07/11/2012 | CN102559068A Vibration burnishing agent for steel plate stamped pieces and production method for vibration burnishing agent |
07/11/2012 | CN102559067A Nanometer self-cleaning shoe polish for leather shoes |
07/11/2012 | CN102559066A Production method of ceria powder polishing size |
07/11/2012 | CN102559065A Formula of chemical mechanical polishing slurry for silicon wafers |
07/11/2012 | CN102559064A Cerium-zirconium praseodymium sosoloid and preparation method thereof |
07/11/2012 | CN102559063A Slurry composition having tunable dielectric polishing selectivity and method of polishing a substrate |
07/11/2012 | CN102559062A Stabilized, concentratable chemical mechanical polishing composition and method of polishing a substrate |
07/11/2012 | CN102559061A Silicon-and-copper chemical-mechanical planarization slurry containing organic acid |
07/11/2012 | CN102559060A Chemical-mechanical planarization sizing agent for polishing silicon and copper |
07/11/2012 | CN102559059A Chemical-mechanical polishing liquid |
07/11/2012 | CN102559058A Chemical-mechanical polishing liquid |
07/11/2012 | CN102559057A Organic acidic matter-containing chemical mechanical polishing solution |
07/11/2012 | CN102559056A Chemical mechanical polishing liquid for polishing alloy phase change materials |
07/11/2012 | CN102551635A Novel portable shoe cleaning towel |
07/05/2012 | WO2012088756A1 Chemical mechanical polishing slurry for polishing tungsten |
07/05/2012 | WO2012088755A1 Chemical mechanical planarization slurry containing organic acid for silicon and copper |
07/05/2012 | WO2012088754A1 Chemical mechanical planarization slurry for polishing silicon and copper |
07/05/2012 | US20120171936 Polishing slurry including zirconia particles and a method of using the polishing slurry |
07/04/2012 | CN102533129A Vibration grinding polishing agent of stainless steel workpieces and production method |
07/04/2012 | CN102533128A Copper and copper alloy workpiece vibrating and polishing burnishing agent and manufacturing method thereof |
07/04/2012 | CN102533127A Polishing liquid composition |
07/04/2012 | CN102533126A Grinding component and the use thereof |
07/04/2012 | CN102533125A Chemically mechanical polishing solution |
07/04/2012 | CN102533124A Polishing solution for silicon carbide substrate |
07/04/2012 | CN102533123A Chemi-mechanical polishing fluid for polishing semiconductor wafer |
07/04/2012 | CN102533122A Polishing slurry for polishing titanium-containing substrates |
07/04/2012 | CN102533121A Chemically mechanical polishing solution for polishing tungsten |
07/04/2012 | CN102533120A Chemi-mechanical polishing fluid |
07/04/2012 | CN102533119A Chemical-mechanical polishing liquid containing nitrogen-containing amine compounds |
07/04/2012 | CN102533118A Chemical mechanical polishing size |
07/04/2012 | CN102533117A Chemical mechanical polishing solution for TSV (Through Silicon Via) silicon polishing of 3D (Three-Dimensional) packaging |
07/04/2012 | CN102533116A Chemical mechanical polishing solution |
07/04/2012 | CN102525829A Compositions comprising metathesized unsaturated polyol esters |
07/04/2012 | CN101490734B Polishing slurry for low dielectric material |
07/04/2012 | CN101358110B Novel sensitizer |
06/28/2012 | WO2012087813A2 Glossy improved appearance auto-deposition coating, and methods of applying same |
06/28/2012 | US20120164924 Compositions and methods for removing scratches from plastic surfaces |
06/28/2012 | CA2819506A1 Glossy improved appearance auto-deposition coating, and methods of applying same |
06/27/2012 | EP1991623B1 Low foaming pvoh aerosol spray coatings |
06/27/2012 | EP1369906B1 Polishing compound and method for polishing substrate |
06/27/2012 | CN1735670B Composition and method used for chemical mechanical planarization of metals |
06/27/2012 | CN102516887A Polishing solution and plasma polishing process |
06/27/2012 | CN102516886A Aqueous automobile film-plating solution and its preparation method |
06/27/2012 | CN102516885A Method for making solid shoe cream |
06/27/2012 | CN102516884A Preparation method of pasty shoe polish |
06/27/2012 | CN102516883A Leather cleaning, nourishing and care cream and production method thereof |
06/27/2012 | CN102516882A Method for making resin lens polishing solution of alumina matrix |
06/27/2012 | CN102516881A Manufacturing method of resin eyeglass polishing powder with alumina matrix |
06/27/2012 | CN102516880A Preparation method of cerium oxide matrix glass lens polishing powder |
06/27/2012 | CN102516879A Polishing solution for inhibiting electrochemical corrosion of phase change material |
06/27/2012 | CN102516878A Polishing solution capable of improving surface quality of polished phase transition material |
06/27/2012 | CN102516877A Metal kitchen ware polishing agent |