Patents for H01L 29 - Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier; Capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. pn-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof (218,143) |
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09/06/1983 | US4403241 Method for etching III-V semiconductors and devices made by this method |
09/06/1983 | US4403237 Charge transfer device having a bent charge transfer channel |
09/06/1983 | US4402762 Method of making highly stable modified amorphous silicon and germanium films |
09/06/1983 | US4402761 Method of making self-aligned gate MOS device having small channel lengths |
09/06/1983 | US4402127 Method of manufacturing a logic circuit including at least one field-effect transistor structure of the normally-off type and at least one saturable resistor |
09/06/1983 | US4402126 Method for fabrication of a non-volatile JRAM cell |
09/06/1983 | CA1153480A1 Thin film transistor |
09/06/1983 | CA1153479A1 Semiconductor devices controlled by depletion regions |
09/06/1983 | CA1153478A1 Gate turn-off thyristor |
09/01/1983 | WO1983003032A1 Semiconductor device and method of fabricating the same |
09/01/1983 | WO1983003029A1 Diffusion of shallow regions |
08/31/1983 | EP0087264A2 Force sensors |
08/31/1983 | EP0087251A2 Process for manufacturing a buried gate field effect transistor |
08/31/1983 | EP0087155A2 Means for preventing the breakdown of an insulation layer in semiconductor devices |
08/31/1983 | EP0087007A2 Dynamic RAM with non-volatile back-up storage and method of operation thereof |
08/30/1983 | US4402014 Circuit arrangement for discharging a capacity |
08/30/1983 | US4402004 High current press pack semiconductor device having a mesa structure |
08/30/1983 | US4402002 Gate can be silicon-doped aluminum |
08/30/1983 | US4402001 Semiconductor element capable of withstanding high voltage |
08/30/1983 | US4400869 Process for producing high temperature pressure transducers and semiconductors |
08/30/1983 | US4400866 Self-aligned schottky metal semi-conductor field effect transistor where oxidation rate is determined by doping level of polysilicon |
08/30/1983 | US4400865 Self-aligned metal process for integrated circuit metallization |
08/30/1983 | CA1153129A1 Method of fabricating self-aligned lateral bipolar transistor |
08/24/1983 | EP0086462A2 Pressure sensor employing semiconductor strain gauge |
08/24/1983 | EP0086372A2 Tunneling gate semiconductor device |
08/24/1983 | EP0086210A1 Diode for monolithic integrated circuit. |
08/24/1983 | EP0086209A1 A planar transistor with an integrated overvoltage guard |
08/23/1983 | US4400797 Read only memory using static induction transistor |
08/23/1983 | US4400716 Semiconductor device with glass layer contacting outer periphery of guard ring and adjacent substrate |
08/23/1983 | US4400715 Thin film semiconductor device and method for manufacture |
08/23/1983 | US4400710 Semiconductor device |
08/23/1983 | US4400681 Semiconductor pressure sensor with slanted resistors |
08/23/1983 | US4400221 Doping with sodium, potassium or, lithium |
08/23/1983 | US4399605 Method of making dense complementary transistors |
08/23/1983 | CA1152647A1 Non-destructive read-out of a signal from a ccd shift register |
08/23/1983 | CA1152620A1 Equilibrium growth technique for preparing pbs.sub.xse in1-x xx epilayers |
08/18/1983 | WO1983002852A1 Field-effect controlled bi-directional lateral thyristor |
08/17/1983 | EP0086010A1 Semiconductor device having a reduced surface field strength |
08/17/1983 | EP0085988A2 Semiconductor memory and method for fabricating the same |
08/17/1983 | EP0085916A2 Method of fabricating field effect transistors |
08/17/1983 | EP0085777A2 Fabrication of devices including selective formation of titanium disilicide by direct reaction |
08/16/1983 | US4399523 Non-volatile, electrically erasable and reprogrammable memory element |
08/16/1983 | US4399522 Non-volatile static RAM cell with enhanced conduction insulators |
08/16/1983 | US4399450 ROM With poly-Si to mono-Si diodes |
08/16/1983 | US4399449 Composite metal and polysilicon field plate structure for high voltage semiconductor devices |
08/16/1983 | US4398964 Method of forming ion implants self-aligned with a cut |
08/16/1983 | US4398963 Method for making non-alloyed heterojunction ohmic contacts |
08/16/1983 | US4398962 Method of controlling base contact regions by forming a blocking layer contiguous to a doped poly-si emitter source |
08/16/1983 | US4398833 Electronic timepiece |
08/16/1983 | US4398344 Depositing platinum encapsulated in palladium on silicon wafer, sintering |
08/16/1983 | US4398343 Method of making semi-amorphous semiconductor device |
08/16/1983 | US4398341 Depositing layers of metals and silicon, annealing to form silicides |
08/16/1983 | US4398340 Method for making thin film field effect transistors |
08/16/1983 | US4398339 Fabrication method for high power MOS device |
08/16/1983 | US4398338 Fabrication of high speed, nonvolatile, electrically erasable memory cell and system utilizing selective masking, deposition and etching techniques |
08/16/1983 | US4398335 Multilayer metal silicide interconnections for integrated circuits |
08/16/1983 | CA1152229A1 Silicon on sapphire laser process |
08/16/1983 | CA1152228A1 Barrier-free, low-resistant electrical contact on iii- v semiconductor material |
08/16/1983 | CA1152227A1 Process of reducing density of fast surface states in mos devices |
08/16/1983 | CA1152213A1 Charge-coupled device |
08/10/1983 | EP0085624A2 Schottky shunt integrated injection logic circuit |
08/10/1983 | EP0085607A2 Process for the simultaneous production of hyperfrequency diodes having an incorported encapsulation and diodes made by said process |
08/10/1983 | EP0085550A2 Electrically-programmable and electrically-erasable MOS memory device |
08/10/1983 | EP0085434A2 Semiconductor devices and method for making the same |
08/10/1983 | EP0085395A2 High density memory cell |
08/10/1983 | EP0085168A2 High-voltage CMOS process |
08/10/1983 | EP0085123A1 Isolated gate field effect transistor circuit for sensing the voltage of a knot |
08/09/1983 | US4398301 Multiple preamplifiers with intervening overflow cell for charge coupled imaging devices |
08/09/1983 | US4398267 Semiconductor memory device |
08/09/1983 | US4398205 Gate turn-off device with high turn-off gain |
08/09/1983 | US4397695 Method for stabilizing the current gain of NPN -silicon transistors |
08/09/1983 | US4397079 Process for improving the yield of integrated devices including Schottky barrier diodes |
08/09/1983 | US4397077 Method of fabricating self-aligned MOS devices and independently formed gate dielectrics and insulating layers |
08/09/1983 | US4397076 Method for making low leakage polycrystalline silicon-to-substrate contacts |
08/09/1983 | US4397075 Vertical capacitor |
08/09/1983 | CA1151774A2 Field effect semiconductor device |
08/04/1983 | WO1983002678A1 Shift register |
08/03/1983 | EP0084985A2 Laser induced flow Ge-O based materials |
08/03/1983 | EP0084558A1 Monolithically merged field effect transistor and bipolar junction transistor. |
08/02/1983 | US4396932 Method for making a light-activated line-operable zero-crossing switch including two lateral transistors, the emitter of one lying between the emitter and collector of the other |
08/02/1983 | US4396931 Tunnel emitter upper valley transistor |
08/02/1983 | US4396930 Compact MOSFET device with reduced plurality of wire contacts |
08/02/1983 | US4395812 Forming an integrated circuit |
08/02/1983 | CA1151295A1 Dual resistivity mos devices and method of fabrication |
07/27/1983 | EP0084465A2 Oxide isolation process for standard RAM/PROM and lateral PNP cell RAM |
07/27/1983 | EP0084399A2 Self-aligned oxide isolated process and device |
07/27/1983 | EP0084393A2 Semiconductor device of the heterojunction transistor type |
07/27/1983 | EP0084178A2 Resistive element formed in a semiconductor substrate |
07/26/1983 | US4395727 Barrier-free, low-resistant electrical contact on III-V semiconductor material |
07/26/1983 | US4395726 Semiconductor device of silicon on sapphire structure having FETs with different thickness polycrystalline silicon films |
07/26/1983 | US4395725 Segmented channel field effect transistors |
07/26/1983 | US4395724 Nonvolatile semiconductor memory device |
07/26/1983 | US4395723 Floating substrate dynamic RAM cell with lower punch-through means |
07/26/1983 | US4395722 Heterojunction transistor |
07/26/1983 | US4395433 Method for manufacturing a semiconductor device having regions of different thermal conductivity |
07/26/1983 | EP0037401A4 OHMIC CONTACT TO P-TYPE InP OR InGaAsP. |
07/26/1983 | CA1150855A1 Method of manufacturing a semiconductor device |
07/26/1983 | CA1150854A1 Junction field effect transistor |
07/26/1983 | CA1150853A1 Insulated-gate field-effect transistor and method of manufacturing same |
07/26/1983 | CA1150852A1 Series-connected two-terminal semiconductor devices and their fabrication |