Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2013
01/22/2013US8357550 Occupancy sensor
01/22/2013US8357549 Method for identifying an incorrect position of a semiconductor wafer during a thermal treatment
01/22/2013US8357548 Semiconductor wafer metrology apparatus and method
01/22/2013US8357547 Semiconductor bio-sensors and methods of manufacturing the same
01/22/2013US8357484 Multilayer dry film resist, method of manufacturing the resist, and method of manufacturing display plate for liquid crystal display panel using the resist
01/22/2013US8357275 Potentiometric cholesterol sensor for the quantitative estimation of total cholesterol in human blood serum
01/22/2013US8357265 Cleaning method and a vacuum processing apparatus
01/22/2013US8357264 Plasma reactor with plasma load impedance tuning for engineered transients by synchronized modulation of a source power or bias power RF generator
01/22/2013US8357263 Apparatus and methods for electrical measurements in a plasma etcher
01/22/2013US8357262 Corrosion-resistant member, treatment apparatus and sample treatment method using the member, and method for manufacture of corrosion-resistant member
01/22/2013US8357124 Catheter securement device
01/22/2013US8357027 Polishing pad and method of manufacture
01/22/2013US8356968 Methods and apparatus for an efficient handshake between material handling and material processing devices for safe material transfer
01/22/2013CA2520992C Method for manufacturing an electronic module and an electronic module
01/19/2013CA2783075A1 Power supply arrangement for a reactor for producing polysilicon with a frequency converter
01/18/2013DE202011109510U1 Prozesshaube für flache Substrate und Anlage zur einseitigen Behandlung flacher Substrate Process hood for flat substrates and plant for the one-sided treatment of flat substrates
01/17/2013WO2013010111A2 Nanoimprint lithography
01/17/2013WO2013010067A2 Etching method and devices produced using the etching method
01/17/2013WO2013009833A1 Integrated circuit manufacturing for low-profile and flexible devices
01/17/2013WO2013009772A1 Solid state energy storage devices
01/17/2013WO2013009757A1 Wafer inspection
01/17/2013WO2013009575A2 Wafer dicing using hybrid split-beam laser scribing process with plasma etch
01/17/2013WO2013009505A2 Methods of manufacturing thin film transistor devices
01/17/2013WO2013009433A1 Method of growing heteroepitaxial single crystal or large grained semiconductor films on glass substrates and devices thereon
01/17/2013WO2013009316A1 Memristors having mixed oxide phases
01/17/2013WO2013009222A1 Method of laser separation of the epitaxial film or of the epitaxial film layer from the growth substrate of the epitaxial semiconductor structure (variations)
01/17/2013WO2013009219A1 Method for producing a mask on a substrate surface
01/17/2013WO2013009184A1 Floating substrate monitoring and control device, and method for the same
01/17/2013WO2013009087A2 Non-contact thin plate transfer device
01/17/2013WO2013009067A2 Flash memory device
01/17/2013WO2013009064A2 Apparatus for filling a wafer via with solder and having a pressure unit, and method for filling a wafer via with solder using same
01/17/2013WO2013009026A2 Method for evaluating wafer defects
01/17/2013WO2013009000A2 Led production device
01/17/2013WO2013008940A1 Curable composition for imprints, patterning method and pattern
01/17/2013WO2013008912A1 Composition for forming fine pattern and method for forming fined pattern using same
01/17/2013WO2013008880A1 Method for manufacturing organic semiconductor element, and semiconductor element
01/17/2013WO2013008878A1 Etching method and device
01/17/2013WO2013008850A1 Heat generation point detection method and heat generation point detection device
01/17/2013WO2013008824A1 Plasma etching method
01/17/2013WO2013008759A1 Fluid pressure imprinting device provided with pressurization unit securing tool
01/17/2013WO2013008757A1 Dicing-tape-integrated adhesive sheet, semiconductor device, multilayered circuit board and electronic component
01/17/2013WO2013008708A1 Substrate processing device
01/17/2013WO2013008700A1 Actinic ray-sensitive or radiation-sensitive resin composition, resist film and pattern forming method each using the composition, manufacturing method of electronic device and electronic device
01/17/2013WO2013008663A1 Adhesive sheet for dicing, and semiconductor device manufacturing method using adhesive sheet for dicing
01/17/2013WO2013008605A1 Method for cleaning metal gate semiconductor
01/17/2013WO2013008587A1 Semiconductor integrated circuit and module mounting same
01/17/2013WO2013008579A1 Method for manufacturing organic thin film solar cell
01/17/2013WO2013008542A1 Ultrasonic cleaning device and ultrasonic cleaning method
01/17/2013WO2013008461A1 Iii nitride epitaxial substrate and method for manufacturing same
01/17/2013WO2013008441A1 Active matrix substrate and method for manufacturing same
01/17/2013WO2013008422A1 Nitride semiconductor device and method for manufacturing same
01/17/2013WO2013008421A1 Membrane structure and method for producing same
01/17/2013WO2013008419A1 Method for manufacturing oxide semiconductor film, method for manufacturing semiconductor device, and semiconductor device
01/17/2013WO2013008407A1 Semiconductor device
01/17/2013WO2013008403A1 Thin film transistor substrate and method for producing same
01/17/2013WO2013008391A1 Method for detecting crystal defects
01/17/2013WO2013008382A1 Nitride semiconductor device
01/17/2013WO2013008372A1 Raw material gas supply device for semiconductor manufacturing device
01/17/2013WO2013008369A1 Treatment tank for production process and method for producing same
01/17/2013WO2013008360A1 Display device, thin-film transistor used in display device, and thin-film transistor manufacturing method
01/17/2013WO2013008344A1 Plasma processing apparatus
01/17/2013WO2013008336A1 Method for manufacturing organic semiconductor element
01/17/2013WO2013008269A1 Organic thin film transistor and production method for organic thin film transistor
01/17/2013WO2013007897A2 Hybrid contact/contactless integrated circuit card, the strength of the electronic module of which is reinforced
01/17/2013WO2013007705A1 Electronic device based on a gallium compound over a silicon substrate, and manufacturing method thereof
01/17/2013WO2013007311A1 A method of assembling a solar panel and assembly line therefore
01/17/2013WO2013007229A1 Monolithic integrated semiconductor structure
01/17/2013WO2013007093A1 Film deposition method
01/17/2013WO2013007073A1 Method for preparing vertical silicon nanowire field effect transistor
01/17/2013WO2013007066A1 Thin film transistor manufacturing method and thin film transistor
01/17/2013WO2013006992A1 Transistor and semiconductor device and method for manufacturing same
01/17/2013WO2013006991A1 Semiconductor device and manufacturing method thereof
01/17/2013WO2013006990A1 Method for forming isolation structure and semiconductor structure
01/17/2013WO2013006989A1 Method for preparing fully silicided metal gate bulk silicon multi-gate fin field effect transistor
01/17/2013WO2012162185A3 Method for etching gate stack
01/17/2013WO2012154747A3 High pressure bevel etch process
01/17/2013WO2012153855A8 POLY α-AMINO ACID AND FERROELECTRIC MEMORY ELEMENT USING SAME
01/17/2013WO2012148967A3 Cleaning lead-frames to improve wirebonding process
01/17/2013WO2012148826A3 High sensitivity eddy current monitoring system
01/17/2013WO2012148085A3 Antimony amino alkoxide compound and method for preparing same, and method for forming a thin film containing antimony using the antimony amino alkoxide compound and an atomic layer deposition technique
01/17/2013WO2012145492A3 Apparatus for deposition of materials on a substrate
01/17/2013WO2012142035A3 Method and apparatus for refurbishing gas distribution plate surfaces
01/17/2013WO2012118896A3 Apparatus and methods related to wire bond pads and reducing impact of high rf loss plating
01/17/2013WO2012096909A3 Alignment marks to enable 3d integration
01/17/2013WO2012094183A3 Methods of forming a patterned, silicon-enriched developable antireflective material and semiconductor device structures including the same
01/17/2013WO2012092496A3 Memory with extended charge trapping layer
01/17/2013WO2012087714A3 Cobalt metal barrier layers
01/17/2013WO2012083115A3 Composition and method for polishing polysilicon
01/17/2013US20130018599 Design of ultra-fast suspended graphene nano-sensors suitable for large scale production
01/17/2013US20130017769 Polishing pad
01/17/2013US20130017690 Plasma nitriding method and plasma nitriding apparatus
01/17/2013US20130017689 Digital oxide deposition of sio2 layers on wafers
01/17/2013US20130017688 Reduction Of Pore Fill Material Dewetting
01/17/2013US20130017687 Method for forming openings in semiconductor device
01/17/2013US20130017686 Plasma processing apparatus and plasma processing method
01/17/2013US20130017685 Method of manufacturing semiconductor device and substrate processing apparatus
01/17/2013US20130017684 Process of forming slit in substrate
01/17/2013US20130017683 Method of manufacturing silicon carbide substrate and method of manufacturing silicon carbide semiconductor device
01/17/2013US20130017682 Overburden Removal For Pore Fill Integration Approach
01/17/2013US20130017681 Solder Bump Cleaning Before Reflow