| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/30/2013 | CN102903633A Methods for fabricating anode shorted field stop insulated gate bipolar transistor |
| 01/30/2013 | CN102903632A Manufacture method of Schottky diode NiCr barrier low-temperature alloy |
| 01/30/2013 | CN102903631A Annealing technology for transferring graphene by GaN substrate and device manufactured thereby |
| 01/30/2013 | CN102903630A Method for curing defects in a semiconductor layer |
| 01/30/2013 | CN102903629A Photoactive compound gradient photoresist |
| 01/30/2013 | CN102903628A Manufacturing method of semiconductor device |
| 01/30/2013 | CN102903627A Masking method for deep etching based on buffer layer |
| 01/30/2013 | CN102903626A Silicon nitride coating method with silicon wafer surface cleaning function |
| 01/30/2013 | CN102903625A Germanium-base substrate surface passivation method |
| 01/30/2013 | CN102903624A Temperature-controlled semiconductor processing device |
| 01/30/2013 | CN102903623A Method for manufacturing gate structure |
| 01/30/2013 | CN102903622A Manufacturing method of memory |
| 01/30/2013 | CN102903621A Production method of semiconductor device |
| 01/30/2013 | CN102903620A Method for forming dielectric layer |
| 01/30/2013 | CN102903619A Crystalline silicon diffusion process for realizing deep-freeze low surface concentration |
| 01/30/2013 | CN102903618A AlN substrate-based graphene CVD direct epitaxial growth method and manufactured device |
| 01/30/2013 | CN102903617A GaN substrate-based graphene CVD direct epitaxial growth method and manufactured device |
| 01/30/2013 | CN102903616A ZnO substrate-based graphene CVD direct epitaxial growth method and manufactured device |
| 01/30/2013 | CN102903615A Preparation method of p type GaN and AlGaN semiconductor material |
| 01/30/2013 | CN102903614A Method for preparing non-polar A face GaN thin film |
| 01/30/2013 | CN102903613A Method for eliminating bridging in contact hole technique |
| 01/30/2013 | CN102903612A Manufacture method of metal-oxide-metal capacitor |
| 01/30/2013 | CN102903611A Metal-dielectric-metal capacitor and manufacturing method thereof |
| 01/30/2013 | CN102903610A Process for manufacturing a semiconductor structure comprising a functionalized layer on a support substrate |
| 01/30/2013 | CN102903609A Method of hard mask CD control by Ar sputtering |
| 01/30/2013 | CN102903608A Preparation method of nano patterned sapphire substrate |
| 01/30/2013 | CN102903607A Method for preparing substrate with buried insulation layers by selective etching |
| 01/30/2013 | CN102903606A Multi-cavity semiconductor processing device |
| 01/30/2013 | CN102903605A Semiconductor processing device and control method |
| 01/30/2013 | CN102903604A Opening type semiconductor processing device |
| 01/30/2013 | CN102903592A Baffle and substrate treating apparatus including the same |
| 01/30/2013 | CN102902165A Device for laminated virtual mask and integration method of silicon photonics integrated chip |
| 01/30/2013 | CN102902123A Solar liquid crystal panel and manufacturing method thereof |
| 01/30/2013 | CN102902118A In-plane switching mode liquid crystal display device and method of fabricating the same |
| 01/30/2013 | CN102902111A Method of forming transparent electrode and fabricating array substrate for liquid crystal display device |
| 01/30/2013 | CN102899723A One hundred millimeter high purity semi-insulating single crystal silicon carbide wafer |
| 01/30/2013 | CN102898951A Polishing reagent liquid composition for semiconductor chip, polishing reagent liquid and preparation method thereof |
| 01/30/2013 | CN102896714A Molding die set and resin molding apparatus having same |
| 01/30/2013 | CN102896703A Processing apparatus |
| 01/30/2013 | CN102896114A Novel flat-mouth type equipment for cleaning by atmospheric-pressure double-dielectric barrier active radicals |
| 01/30/2013 | CN102315177B Processing method of high pressure resistant passivation protection diode chip |
| 01/30/2013 | CN102304700B Preparation method of nitrogen-doped zinc oxide film |
| 01/30/2013 | CN102280487B Power MOSFET (Metal-Oxide -Semiconductor Field Effect Transistor) device of novel groove structure and manufacture method thereof |
| 01/30/2013 | CN102270645B Display device and manufacturing method thereof |
| 01/30/2013 | CN102254940B Low-capacitance transistor power device and manufacturing method thereof |
| 01/30/2013 | CN102225874B 湿蚀刻溶液 Wet etch solution |
| 01/30/2013 | CN102208451B Metal insulated gate field effect transistor structure for high-voltage integrated circuit and preparation method thereof |
| 01/30/2013 | CN102205522B Gas path positive pressure system used for chemico-mechanical polishing and chemico-mechanical polishing equipment |
| 01/30/2013 | CN102169819B Method of preparing nanometer metal structure |
| 01/30/2013 | CN102163559B Manufacturing method of stack device and device chip process method |
| 01/30/2013 | CN102163540B Three-plate heating plate scanning device for annealing deep ultraviolet laser |
| 01/30/2013 | CN102157435B Contact hole forming method |
| 01/30/2013 | CN102157347B High-yield laser heat treatment device and method |
| 01/30/2013 | CN102157344B Heating-stage scanner for deep ultraviolet laser annealing and annealing process |
| 01/30/2013 | CN102142461B Grid controlled Schottky junction tunneling field effect transistor and forming method thereof |
| 01/30/2013 | CN102136439B Method for detecting square resistance of alloy |
| 01/30/2013 | CN102122615B Method for pretreating solution for wet etching |
| 01/30/2013 | CN102088036B 集成电路结构 Integrated circuit structure |
| 01/30/2013 | CN102084475B Plasma-facing probe arrangement including vacuum gap for use in a plasma processing chamber |
| 01/30/2013 | CN102077330B Rapid thermal processing chamber with shower head |
| 01/30/2013 | CN102074572B 集成电路结构 Integrated circuit structure |
| 01/30/2013 | CN102067278B High efficiency photovoltaic cell and manufacturing method free of metal disulfide barrier material |
| 01/30/2013 | CN102054745B Method for forming contact hole |
| 01/30/2013 | CN102054742B Semiconductor porefilling method for three-step power deposition aluminum |
| 01/30/2013 | CN102054734B Method for improving filling capacity of wafer channel |
| 01/30/2013 | CN102047400B Wire payout measurement and calibration techniques for a wire bonding machine |
| 01/30/2013 | CN102047394B Process for cleaning semiconductor element |
| 01/30/2013 | CN102044485B Metalizing method and method for preventing corrosive defects of copper-aluminum alloy |
| 01/30/2013 | CN102044478B Method for making metal plug |
| 01/30/2013 | CN102034725B Automatic substrate positioning and loading device |
| 01/30/2013 | CN102024788B Semiconductor device for interconnection process and manufacturing method thereof |
| 01/30/2013 | CN102024786B Semiconductor device for interconnection process and manufacturing method thereof |
| 01/30/2013 | CN102024754B Method for manufacturing semiconductor device |
| 01/30/2013 | CN102017098B Method for formation of oxide film for silicon wafer |
| 01/30/2013 | CN102017069B Silicon monocrystal wafer, method for manufacturing the silicon monocrystal wafer and method for evaluating the silicon monocrystal wafer |
| 01/30/2013 | CN102013403B Wafer level chip size packaging structure and manufacturing method thereof |
| 01/30/2013 | CN101996901B Method for manufacturing aluminum pad |
| 01/30/2013 | CN101990710B High aspect ratio openings |
| 01/30/2013 | CN101989532B Method for processing products by machine |
| 01/30/2013 | CN101981684B Methods and apparatuses for large diameter wafer handling |
| 01/30/2013 | CN101970728B Single-crystal manufacturing apparatus and method for manufacturing single crystal |
| 01/30/2013 | CN101952952B Wafer-supporting member, method for producing the same, and electrostatic chuck using the same |
| 01/30/2013 | CN101939821B Plasma immersion ion implantation method using a pure or nearly pure silicon seasoning layer on the chamber interior surfaces |
| 01/30/2013 | CN101937144B Method of manufacturing liquid crystal display device |
| 01/30/2013 | CN101924129B Field effect transistor |
| 01/30/2013 | CN101922611B Gas delivery device and dry etching device |
| 01/30/2013 | CN101901744B Circular ring-shaped member for plasma process and plasma processing apparatus |
| 01/30/2013 | CN101894868B Gallium nitride semiconductor device with improved forward conduction |
| 01/30/2013 | CN101889334B High density FET with integrated schottky |
| 01/30/2013 | CN101874309B Nitride semiconductor optical device, epitaxial wafer for nitride semiconductor optical device, and method for manufacturing semiconductor light-emitting device |
| 01/30/2013 | CN101872753B Restoration of electrical and mechanical connectability to an electrical device with a face equipped with contact studs |
| 01/30/2013 | CN101868561B Sputtering apparatus, and filming method |
| 01/30/2013 | CN101847590B Method for packaging multi-laminated multi-chip on flexible circuit board and packaging chipset |
| 01/30/2013 | CN101842712B Insert, tray and electronic component testing apparatus |
| 01/30/2013 | CN101840938B Gallium nitride heterojunction schottky diode |
| 01/30/2013 | CN101816061B Parasitic particle suppression in the growth of III-V nitride films using MOCVD and HVPE |
| 01/30/2013 | CN101771053B Nonvolatile memory device and method of fabricating the same |
| 01/30/2013 | CN101743626B Method for fabricating a 3-D integrated circuit using a hard mask of silicon-oxynitride on amorphous carbon |
| 01/30/2013 | CN101728239B Removal method of water vapor on crystal wafer surface |
| 01/30/2013 | CN101714517B Inspecting apparatus and method |