Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2013
01/29/2013US8361870 Self-aligned silicidation for replacement gate process
01/29/2013US8361869 Method for manufacturing suspended fin and gate-all-around field effect transistor
01/29/2013US8361868 Transistor with longitudinal strain in channel induced by buried stressor relaxed by implantation
01/29/2013US8361867 Biaxial strained field effect transistor devices
01/29/2013US8361866 Modifying work function in PMOS devices by counter-doping
01/29/2013US8361865 Method of manufacturing a semiconductor device having vertical MOSFET
01/29/2013US8361864 Semiconductor device having a saddle fin shaped gate and method for manufacturing the same
01/29/2013US8361863 Embedded DRAM with multiple gate oxide thicknesses
01/29/2013US8361862 Method for manufacturing nonvolatile semiconductor memory device and nonvolatile semiconductor memory device
01/29/2013US8361861 Semiconductor device and method of manufacturing the same
01/29/2013US8361860 Method of manufacturing semiconductor device
01/29/2013US8361859 Stressed transistor with improved metastability
01/29/2013US8361858 Reduction of thickness variations of a threshold semiconductor alloy by reducing patterning non-uniformities prior to depositing the semiconductor alloy
01/29/2013US8361857 Semiconductor device having a simplified stack and method for manufacturing thereof
01/29/2013US8361856 Memory cells, arrays of memory cells, and methods of forming memory cells
01/29/2013US8361855 Method for fabricating a gate structure
01/29/2013US8361854 Fin field-effect transistor structure and manufacturing process thereof
01/29/2013US8361853 Graphene nanoribbons, method of fabrication and their use in electronic devices
01/29/2013US8361852 Methods of manufacturing CMOS transistors
01/29/2013US8361851 Method for manufacturing an NMOS with improved carrier mobility
01/29/2013US8361850 Metal oxide semiconductor having epitaxial source drain regions and a method of manufacturing same using dummy gate process
01/29/2013US8361849 Method of fabricating semiconductor device
01/29/2013US8361847 Stressed channel FET with source/drain buffers
01/29/2013US8361846 Array substrate for display device and method of fabricating the same
01/29/2013US8361845 Method for manufacturing semiconductor device
01/29/2013US8361844 Method for adjusting the height of a gate electrode in a semiconductor device
01/29/2013US8361842 Embedded wafer-level bonding approaches
01/29/2013US8361841 Mold array process method to encapsulate substrate cut edges
01/29/2013US8361840 Thermal barrier layer for integrated circuit manufacture
01/29/2013US8361839 Structure and method for power field effect transistor
01/29/2013US8361838 Semiconductor package and method for manufacturing the same via holes in semiconductor chip for plurality stack chips
01/29/2013US8361837 Multiple integrated circuit die package with thermal performance
01/29/2013US8361836 Method for manufacturing photoelectric conversion element and photoelectric conversion element
01/29/2013US8361835 Method for forming transparent conductive oxide
01/29/2013US8361834 Methods of forming a low resistance silicon-metal contact
01/29/2013US8361833 Upwardly tapering heaters for phase change memories
01/29/2013US8361832 Contact for memory cell
01/29/2013US8361831 Zinc oxide film forming method and apparatus
01/29/2013US8361830 Image sensor module and method of manufacturing the same
01/29/2013US8361828 Aligned frontside backside laser dicing of semiconductor films
01/29/2013US8361827 Assembly techniques for solar cell arrays and solar cells formed therefrom
01/29/2013US8361825 Mechanical switch with a curved bilayer background
01/29/2013US8361824 Method for forming lens, method for manufacturing semiconductor apparatus, and electronic information device
01/29/2013US8361823 Light-emitting nanocomposite particles
01/29/2013US8361822 Light-emitting device and method for producing light emitting device
01/29/2013US8361821 Pixel designs of improving the aperture ratio in an LCD
01/29/2013US8361820 Manufacturing method of a liquid crystal display device
01/29/2013US8361819 Methods of fabricating a light-emitting device
01/29/2013US8361818 Method of forming optical sensor
01/29/2013US8361817 Method for manufacturing surface-emitting laser device, optical scanner, image forming apparatus, and oxidation apparatus
01/29/2013US8361816 Method of manufacturing vertical gallium nitride based light emitting diode
01/29/2013US8361815 Substrate processing method and method for manufacturing liquid ejection head
01/29/2013US8361814 Method for monitoring chamber cleanliness
01/29/2013US8361813 Method for generating graphene structures
01/29/2013US8361811 Electronic component with reactive barrier and hermetic passivation layer
01/29/2013US8361757 Semiconductor device assembly and method thereof
01/29/2013US8361692 Negative resist composition and patterning process using the same
01/29/2013US8361691 Radiation-sensitive composition and process for producing low-molecular compound for use therein
01/29/2013US8361349 Fabrication of light emitting film coated fullerenes and their application for in-vivo light emission
01/29/2013US8361335 Methods for fabricating semiconductor devices
01/29/2013US8361331 MEMS mirror system for laser printing applications
01/29/2013US8361276 Large area, atmospheric pressure plasma for downstream processing
01/29/2013US8361275 Etching apparatus
01/29/2013US8361274 Etching apparatus and etching method
01/29/2013US8361268 Method of transferring device
01/29/2013US8361230 Magnetic mask holder
01/29/2013US8361177 Polishing slurry, method of producing same, and method of polishing substrate
01/29/2013US8360557 Method for laser drilling fluid ports in multiple layers
01/29/2013US8360303 Forming low stress joints using thermal compress bonding
01/29/2013US8360003 Plasma reactor with uniform process rate distribution by improved RF ground return path
01/29/2013US8360002 In-situ flux measurement devices, methods, and systems
01/29/2013US8360001 Process for deposition of semiconductor films
01/26/2013CA2783438A1 A silicon-carbide mosfet cell structure and method for forming same
01/24/2013WO2013012879A1 Techniques and structures for testing integrated circuits in flip-chip assemblies background
01/24/2013WO2013012800A2 Magneto-electronic devices and methods of production
01/24/2013WO2013012693A1 Dual phase cleaning chambers and assemblies comprising the same
01/24/2013WO2013012682A2 Copper interconnects separated by air gaps and method of making thereof
01/24/2013WO2013012675A2 Methods and apparatus for processing substrates using model-based control
01/24/2013WO2013012620A1 Atomic layer etching using metastables formed from an inert gas
01/24/2013WO2013012562A2 Methods and apparatus for controlling power distribution in substrate processing systems
01/24/2013WO2013012549A2 Multi-chamber cvd processing system
01/24/2013WO2013012536A2 Surface treatment and deposition for reduced outgassing
01/24/2013WO2013012454A1 Method of stabilizing hydrogenated amorphous silicon and amorphous hydrogenated silicon alloys
01/24/2013WO2013012450A1 Inductive structure formed using through silicon vias
01/24/2013WO2013012423A1 Memristor structure with a dopant source
01/24/2013WO2013012299A2 Mask, and optical filter manufacturing apparatus comprising same
01/24/2013WO2013012246A2 Power generating apparatus using effluent gases exhausted from process chamber
01/24/2013WO2013012226A2 Cmp pad conditioner
01/24/2013WO2013012210A2 Tray for loading substrates
01/24/2013WO2013012195A2 Method for manufacturing substrate and method or manufacturing electronic device using same
01/24/2013WO2013012162A1 Horizontal and vertical moving device having improved mechanical strength
01/24/2013WO2013012139A1 Method and apparatus for connecting an electronic component using a high frequency electromagnetic field
01/24/2013WO2013012068A1 Thin film formation composition for lithography which contains titanium and silicon
01/24/2013WO2013012050A1 Semiconductor element and method for manufacturing semiconductor element
01/24/2013WO2013012032A1 Exposure device, exposure method, method for manufacturing device, program and recording medium
01/24/2013WO2013012025A1 Stage temperature control device and substrate processing device
01/24/2013WO2013011986A1 Composition that forms n-type diffusion layer, n-type diffusion layer manufacturing method and solar cell element manufacturing method
01/24/2013WO2013011974A1 Method for producing substrate with metal body
01/24/2013WO2013011953A1 Manufacturing method for molds for nanoimprinting
01/24/2013WO2013011923A1 Sic epitaxial wafer and method for producing same, and device for producing sic epitaxial wafer