| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/13/1993 | US5201991 Stacking multiple polysilicon layers, useful in high density memory device |
| 04/13/1993 | US5201990 Process for treating aluminum surfaces in a vacuum apparatus |
| 04/13/1993 | US5201989 Anisotropic niobium pentoxide etch |
| 04/13/1993 | US5201987 Chemcial vapor deposition of masking silcon nitride and protective polycrystalline silicon layers on all sides of wafer, patterning both layers on one side of wafer, etching exposed surface of wafer, removal of protective layer |
| 04/13/1993 | US5201960 Method for removing photoresist and other adherent materials from substrates |
| 04/13/1993 | US5201841 Thermal delay non-destructive bond integrity inspection |
| 04/13/1993 | US5201804 Semiconductor manufacturing apparatus having a movable-area covering mechanism |
| 04/13/1993 | US5201653 Substrate heat-treating apparatus |
| 04/13/1993 | US5201456 Process for assembly of a metal can on a substrate bearing an integrated circuit |
| 04/13/1993 | US5201454 Bonding using high frequency ultrasonic energy source |
| 04/13/1993 | US5201453 Linear, direct-drive microelectronic bonding apparatus and method |
| 04/13/1993 | US5201451 Method and apparatus for mounting a flexible film semiconductor chip carrier on a circuitized substrate |
| 04/13/1993 | US5201450 Heat block of wire bonding machine |
| 04/13/1993 | US5201114 Analytic method for use in electronic circuit assembly operations |
| 04/13/1993 | CA1316273C Method of storing semiconductor substrate |
| 04/13/1993 | CA1315923C Non-contacting method of cleaning surfaces with a planar gas bearing |
| 04/11/1993 | CA2080056A1 Charge-coupled device |
| 04/08/1993 | DE4233271A1 Semiconductor integrated circuit with fault detection function - has switching function blocks whose error states can be detected using defined combinations of input-output signals |
| 04/08/1993 | DE4218685A1 Semiconductor device with long-lasting getter region - comprises sec. defect layer etched in semiconductor substrate |
| 04/08/1993 | DE4133195A1 Assembling and contacting components in hybrid integrated circuit - inserting components and/or circuit modules into support depressions with conductive tracks over edges |
| 04/08/1993 | DE4132565A1 Downstream plasma etching with microwave excitation - involves using gas pressure levels, so eliminating local dependence of etching rates for mfg. integrated semiconductor circuits |
| 04/08/1993 | DE4132564A1 Plasma etching with microwave pre-excitation of the etching gas for mfr. of integrated semiconductor circuits - involves using excited, electrically neutral gas particles which are produced by plasma discharge and enter an etching reactor |
| 04/08/1993 | DE4132562A1 In-situ determn. of thin electrically conductive films resistance - includes elimination of distorting plasma effects |
| 04/08/1993 | DE4132561A1 Microwave energy stimulated plasma discharge to purify semiconductor wafers - by prodn. of excited intermediates from halogen(s) and noble gases which react with impurities, forming volatile cpds. |
| 04/08/1993 | DE4132559A1 Plasma etching in-situ cleaning process for vacuum deposition chambers - with separate plasma discharge excitation of etch gas and admission of activated etch gas to chamber |
| 04/07/1993 | EP0536076A1 Apparatus and methods for making simultaneous electrical connections |
| 04/07/1993 | EP0536075A1 Direct distribution repair and engineering change system |
| 04/07/1993 | EP0535996A1 Ceramic coated plastic package |
| 04/07/1993 | EP0535979A2 A thin film transistor and a method for producing the same |
| 04/07/1993 | EP0535961A1 Patterning process |
| 04/07/1993 | EP0535917A2 Method for fabricating integrated circuit transistors |
| 04/07/1993 | EP0535882A1 Method of processing a semiconductor chip package |
| 04/07/1993 | EP0535864A1 Fabrication of a conductive region in electronic devices |
| 04/07/1993 | EP0535859A1 Devices having repetitive layers |
| 04/07/1993 | EP0535814A1 Integrated circuit transistor structure and method |
| 04/07/1993 | EP0535776A1 Integrated circuit |
| 04/07/1993 | EP0535736A1 Semiconductor device |
| 04/07/1993 | EP0535711A2 Method for producing multilayered ceramic substrate |
| 04/07/1993 | EP0535694A2 Semiconductor memory device and method of manufacturing the same |
| 04/07/1993 | EP0535681A2 Semiconductor body, its manufacturing method, and semiconductor device using the body |
| 04/07/1993 | EP0535680A1 System and method for precision cleaning by jet spray |
| 04/07/1993 | EP0535677A1 Insulation layer forming method |
| 04/07/1993 | EP0535674A2 Method for fabricating a LDD-mosfet |
| 04/07/1993 | EP0535653A1 Light-sensitive composition |
| 04/07/1993 | EP0535633A1 Method of fabricating nano-size thin wires and devices made of such thin wires |
| 04/07/1993 | EP0535553A2 Process for plugging defects in a dielectric layer of a semiconductor device |
| 04/07/1993 | EP0535541A1 Method of fabricating a groove structure in a substrate |
| 04/07/1993 | EP0535540A2 Etching process for aluminium-containing coatings |
| 04/07/1993 | EP0535536A1 Depletion controlled isolation stage |
| 04/07/1993 | EP0535433A2 Ultrasonic bonding process beyond 125 kHz |
| 04/07/1993 | EP0535354A1 Method for forming a nitride layer using preheated ammonia |
| 04/07/1993 | EP0535350A2 Process for the manufacture of a side-limited monocrytalline region on a substrate and its use in the manufacture of MOS and bipolar transistor |
| 04/07/1993 | EP0535325A2 Voltage generator for a memory array |
| 04/07/1993 | EP0535310A1 Field-effect transistor |
| 04/07/1993 | EP0535296A1 Slicing machine |
| 04/07/1993 | EP0535293A1 A method of fabricating a compositional semiconductor device |
| 04/07/1993 | EP0396707B1 A latch up free, high voltage, cmos process for sub-half-micron devices |
| 04/07/1993 | CN1070602A Method for making injection molded soft magnetic material |
| 04/07/1993 | CN1070601A Method for making high strength injection molded ferrous material |
| 04/07/1993 | CN1020245C Input/output circuits |
| 04/06/1993 | USH1174 Wafer bonded dielectrically isolated structures |
| 04/06/1993 | US5200959 Device and method for defect handling in semi-conductor memory |
| 04/06/1993 | US5200908 Placement optimizing method/apparatus and apparatus for designing semiconductor devices |
| 04/06/1993 | US5200880 Method for forming interconnect for integrated circuits |
| 04/06/1993 | US5200846 Electro-optical device having a ratio controlling means for providing gradated display levels |
| 04/06/1993 | US5200808 Semiconductor device having smooth contact holes formed through multi-layer insulators of different etching speeds |
| 04/06/1993 | US5200807 Wiring connection structure for a semiconductor integrated circuit device |
| 04/06/1993 | US5200805 Silicon carbide:metal carbide alloy semiconductor and method of making the same |
| 04/06/1993 | US5200803 Integrated circuit having a lateral multicollector transistor |
| 04/06/1993 | US5200693 Method for determining characteristics of pn semiconductor structures |
| 04/06/1993 | US5200639 Semiconductor device with isolating groove containing single crystalline aluminum wiring |
| 04/06/1993 | US5200638 A semiconductor device for extracting a signal used to monitor potential of a high voltage island at a low voltage island and method of manufacturing the same |
| 04/06/1993 | US5200636 Semiconductor device having E2 PROM and EPROM in one chip |
| 04/06/1993 | US5200632 Conductivity modulation mosfet |
| 04/06/1993 | US5200367 Method for assembling packages of semi-conductor elements |
| 04/06/1993 | US5200366 Semiconductor device, its fabrication method and molding apparatus used therefor |
| 04/06/1993 | US5200363 Silicon chip bonded to glass having bores filled with conductive paste |
| 04/06/1993 | US5200362 Method of attaching conductive traces to an encapsulated semiconductor die using a removable transfer film |
| 04/06/1993 | US5200361 Process for preparing a semiconductor device using hydrogen fluoride and nitrogen to remove deposits |
| 04/06/1993 | US5200360 Method for reducing selectivity loss in selective tungsten deposition |
| 04/06/1993 | US5200359 Oxidizing aluminum layer, covering with dielectric and titanium; selective etching, forming titania |
| 04/06/1993 | US5200358 Integrated circuit with planar dielectric layer |
| 04/06/1993 | US5200357 Method for the self-alignment of metal contacts on a semiconductor device, and self-aligned semiconductors |
| 04/06/1993 | US5200356 Method of forming a static random access memory device |
| 04/06/1993 | US5200355 Method for manufacturing a mask read only memory device |
| 04/06/1993 | US5200354 Having sidewall-doped trench capacitor; storage device |
| 04/06/1993 | US5200352 Transistor having a lightly doped region and method of formation |
| 04/06/1993 | US5200351 Selective etching of deposited silicon nitride and oxide layers, forming and removing spacers |
| 04/06/1993 | US5200349 Semiconductor device including schotky gate of silicide and method for the manufacture of the same |
| 04/06/1993 | US5200348 Method of manufacturing semiconductor device with constant width deep groove isolation |
| 04/06/1993 | US5200300 Manufacturing integrated circuit structures |
| 04/06/1993 | US5200249 Aluminum nitride and tungsten and/or molybdenum; hermetic |
| 04/06/1993 | US5200232 Maintaining the line of sight surface of plasma shield and surrounding area at a constant temperature |
| 04/06/1993 | US5200202 Head unit for a semiconductor lead frame loader |
| 04/06/1993 | US5200032 Using compound containing chlorine and oxygen; producing volatile copper chlorates; low temperature; reduces formation of copper oxide film |
| 04/06/1993 | US5200031 Method for removal of photoresist over metal which also removes or inactivates corrosion-forming materials remaining from one or more previous metal etch steps |
| 04/06/1993 | US5200030 Method for manufacturing a planarized metal layer for semiconductor device |
| 04/06/1993 | US5200028 Using two gaseous mixtures having different ratios of hydrogen bromide gas and a fluorine radical-donating gas; precise detection of end-point |
| 04/06/1993 | US5200025 Method of forming small through-holes in thin metal plate |
| 04/06/1993 | US5200017 Sample processing method and apparatus |