Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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02/18/1997 | US5604018 Ceramic oxide circuit board |
02/18/1997 | US5603981 Forming low melting alloy of indium and gallium |
02/18/1997 | US5603879 Method of molding resin to seal electronic parts using two evacuation steps |
02/18/1997 | US5603849 Immersing wafer in upper layer of etchant-containing, nonpolar liquid immiscible with etchant-containing, lower polar layer that replenishes consumed etchant by equilibrium while eliminating oxides and metals from upper layer |
02/18/1997 | US5603793 Method of fabricating ceramic green sheets with supporting films |
02/18/1997 | US5603779 Bonded wafer and method of fabrication thereof |
02/18/1997 | US5603777 Providing surface treatment for plurality of substrates arranged with optimal spacing in each processing cassette without being governed by storage spacing in transport cassette |
02/18/1997 | US5603772 Furnace equipped with independently controllable heater elements for uniformly heating semiconductor wafers |
02/18/1997 | US5603765 Performing high energy electron diffraction analysis of the substrate to obtain a diffracted electron beam pattern, monitoring the pattern while adjusting the temperature |
02/18/1997 | US5603764 Process for crystal growth of III-V group compound semiconductor |
02/18/1997 | US5603762 Epitaxial growth |
02/18/1997 | US5603761 Liquid phase epitaxial growth method for carrying out the same |
02/18/1997 | US5603654 Method for supplying a polishing liquid and polishing method using the same |
02/18/1997 | US5603446 Bonding apparatus |
02/18/1997 | US5603169 Bubbler for solid metal-organic percursors |
02/13/1997 | WO1997005757A1 Diamond electronic packages featuring bonded metal |
02/13/1997 | WO1997005665A1 Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom |
02/13/1997 | WO1997005662A1 Nonvolatile reprogrammable interconnect cell with fn tunneling and programming method thereof |
02/13/1997 | WO1997005656A1 Method for making a flat screen active matrix, liquid crystal screen comprising the resulting active matrix, and screen addressing method therefor |
02/13/1997 | WO1997005655A1 Three-dimensional non-volatile memory |
02/13/1997 | WO1997005652A1 Sram device and production method thereof |
02/13/1997 | WO1997005650A1 ETCHING OF FILMS OF CdSe |
02/13/1997 | WO1997005649A1 Process for manufacturing a self-aligned contact and doped region |
02/13/1997 | WO1997005648A1 Method of forming self-aligned thin film transistor |
02/13/1997 | WO1997005624A1 Programmable non-volatile bidirectional switch for programmable logic |
02/13/1997 | WO1997005527A1 Method and apparatus for curing photoresist |
02/13/1997 | WO1997005497A1 Method and apparatus for automated wafer level testing and reliability data analysis |
02/13/1997 | WO1997005495A1 Semiconductor device tester |
02/13/1997 | WO1997005298A1 Titanium-based films formed by chemical vapor deposition |
02/13/1997 | WO1997005228A1 Method for treating surface of substrate and surface treatment composition therefor |
02/13/1997 | WO1997004910A1 Fluxless contacting of components |
02/13/1997 | WO1997004906A1 Method of producing metal quantum dots |
02/13/1997 | DE19529490A1 Chipkontaktierungsverfahren, damit hergestellte elektronische Schaltung und Trägersubstrat zur Kontaktierung von Chips Chipkontaktierungsverfahren so manufactured electronic circuit and the carrier substrate for contacting chips |
02/13/1997 | CA2228037A1 Method of forming self-aligned thin film transistor |
02/12/1997 | EP0758148A2 Method and apparatus for forming electrical contacts in multi-layer integrated circuits |
02/12/1997 | EP0758147A2 Method of inspecting particles on wafers |
02/12/1997 | EP0758146A2 Flip chip semiconductor device |
02/12/1997 | EP0758145A2 Method of manufacturing circuit module |
02/12/1997 | EP0758144A1 Semiconductor device and method of fabrication |
02/12/1997 | EP0758143A1 Improved masking method during semiconductor device fabrication |
02/12/1997 | EP0757918A2 Gas recovery unit |
02/12/1997 | EP0757884A1 Method of forming a fluorinated silicon oxide layer using plasma chemical vapor deposition |
02/12/1997 | EP0757847A1 Configuration and fabrication of semiconductor structure having two levels of buried regions |
02/12/1997 | EP0757846A1 Electronic component comprising a thin-film structure with passive elements |
02/12/1997 | EP0757845A1 Method for passivating the sides of a thin film semiconductor component |
02/12/1997 | EP0757844A1 Semiconductor processing systems |
02/12/1997 | EP0757843A1 Semiconductor processing system with wafer container docking and loading station |
02/12/1997 | EP0757842A1 Semiconductor wafer processing system |
02/12/1997 | EP0757835A1 High-speed, non-volatile electrically programmable and erasable cell and method |
02/12/1997 | EP0757598A1 Pulsed ion beam assisted deposition |
02/12/1997 | EP0724652A4 Method and apparatus for sputtering magnetic target materials |
02/12/1997 | EP0457876B1 Improving cleaving of diode arrays |
02/12/1997 | CN1142875A 多孔半导体材料 Porous semiconductor material |
02/12/1997 | CN1142688A Semiconductor device and manufacturing method thereof |
02/12/1997 | CN1142686A Apparatus and method for manufacturing electronic components with project electrodes |
02/12/1997 | CN1142685A Apparatus and method for semiconductor wafer edge inspection |
02/12/1997 | CN1142684A Method for fabricating metal oxide field effect transistors |
02/12/1997 | CN1142683A Method for fabricating metal oxide semiconductor field effect transistor |
02/12/1997 | CN1142682A Method for forming fine patterns of semiconductor device |
02/12/1997 | CN1142681A Method of forming charge-storage electrode of semiconductor device |
02/12/1997 | CN1142673A Membrane forming material and circuit layout forming method |
02/12/1997 | CN1142499A Tricyclic 5,6-dihydro-9H-pyrazolo|3,4-c¨-1,2,4,-triaolo (4,3-alpha¨ pyridines |
02/12/1997 | CN1142476A Semiconductor ceramics and manufacturing method thereof |
02/11/1997 | US5602987 Flash EEprom system |
02/11/1997 | US5602965 Laser programmable integrated curcuit for forming synapses in neural networks |
02/11/1997 | US5602855 Integrated test circuit |
02/11/1997 | US5602792 Semiconductor device having supply voltage converting circuits |
02/11/1997 | US5602791 Memory material and method of its manufacture |
02/11/1997 | US5602777 Semiconductor memory device having floating gate transistors and data holding means |
02/11/1997 | US5602683 Lens system with lens elements arranged in a gas-filled holder and photolithographic apparatus including such a system |
02/11/1997 | US5602645 Pattern evaluation apparatus and a method of pattern evaluation |
02/11/1997 | US5602620 Scanning exposure apparatus and exposure method |
02/11/1997 | US5602576 Ink-jet type recording head and monolithic integrated circuit suitable therfor |
02/11/1997 | US5602551 Analog-to-digital converter with silicon-on-insulator structure |
02/11/1997 | US5602506 Back bias voltage generator |
02/11/1997 | US5602493 Bias circuit for an input terminal |
02/11/1997 | US5602492 Electrical test structure and method for measuring the relative locations of conducting features on an insulating substrate |
02/11/1997 | US5602491 Integrated circuit testing board having constrained thermal expansion characteristics |
02/11/1997 | US5602424 Semiconductor circuit device wiring with F.C.C. structure, plane oriention (100) and aligned with the current direction |
02/11/1997 | US5602423 Damascene conductors with embedded pillars |
02/11/1997 | US5602422 Flexible leads for tape ball grid array circuit |
02/11/1997 | US5602418 Nitride based semiconductor device and manufacture thereof |
02/11/1997 | US5602417 Low-noise bipolar transistor operating predominantly in the bulk region |
02/11/1997 | US5602416 Power integrated circuit ("PIC") structure |
02/11/1997 | US5602411 Micromechanical component with a dielectric movable structure, and microsystem |
02/11/1997 | US5602410 Off-state gate-oxide field reduction in CMOS |
02/11/1997 | US5602408 Semiconductor device having polycrystalline silicon load devices |
02/11/1997 | US5602406 Semiconductor integrated circuit device with reduced clock signal line noise |
02/11/1997 | US5602405 Semiconductor device with base formed by the junction of two semiconductors of the same conductive type |
02/11/1997 | US5602403 Ion Implantation buried gate insulator field effect transistor |
02/11/1997 | US5602061 Process and apparatus for manufacturing MOS device |
02/11/1997 | US5602060 Applying solution of polycarbosilane in solvent onto substrate bearing electrically conductive components, curing in oxidizing atmosphere to covert to silicon oxide layer |
02/11/1997 | US5602059 Semiconductor device and method for manufacturing same |
02/11/1997 | US5602058 Method and apparatus for applying a wafer to a mount plate |
02/11/1997 | US5602057 Process of making a semiconductor device using crystal growth by a nucleation site in a recessed substrate and planarization |
02/11/1997 | US5602056 Method for forming reliable MOS devices using silicon rich plasma oxide film |
02/11/1997 | US5602055 Method of manufacturing a semiconductor device incorporating a selectively deposited contact |
02/11/1997 | US5602054 Method for formation of a well in a dielectrically isolated island |
02/11/1997 | US5602053 Method of making a dual damascene antifuse structure |
02/11/1997 | US5602051 Method of making stacked electrical device having regions of electrical isolation and electrical connection on a given stack level |