Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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01/02/1997 | EP0730532A4 Topology induced plasma enhancement for etched uniformity improvement |
01/02/1997 | EP0683921A4 Microstructures and single mask, single-crystal process for fabrication thereof. |
01/02/1997 | EP0635875B1 Apparatus for heat treatment |
01/02/1997 | EP0610425B1 Process for preparing a polyimide film with a preselected value for cte |
01/02/1997 | EP0531292B1 Photoresist stripper |
01/02/1997 | DE19626386A1 Prodn. of semiconductor element |
01/02/1997 | DE19625894A1 Lithographic photomask production apparatus for LSI semiconductor manufacture |
01/02/1997 | DE19625669A1 Compatibility precision measurement mark for semiconductor photomask manufacture |
01/02/1997 | DE19625661A1 Circuit element value, e.g. resistance, adjusting control apparatus for integrated circuit |
01/02/1997 | DE19625638A1 Vertically movable ultrasound bonding head apparatus for semiconductor chip connection |
01/02/1997 | DE19625598A1 Sputter installation and method for exchanging one of its inner chambers |
01/02/1997 | DE19625595A1 Verfahren zur Bildung feiner Muster eines Halbleiterelements A method for forming fine patterns of a semiconductor element |
01/02/1997 | DE19625404A1 Verfahren zur Herstellung einer Feldoxidschicht in einer Halbleitervorrichtung A process for producing a field oxide layer in a semiconductor device |
01/02/1997 | DE19624698A1 Semiconductor memory device |
01/02/1997 | DE19608883A1 Semiconductor device with spin-on glass interlayer |
01/02/1997 | DE19605787A1 Verfahren zur Herstellung eines Bor-Phosphor-Silikatglasfilmes A method for producing a boron-phosphorus-silicate glass film |
01/02/1997 | DE19547453A1 Microcomputer system with synchronisation facility |
01/02/1997 | DE19522936A1 Verfahren und Vorrichtung zum Strukturieren einer photolithographischen Schicht Method and device for structuring a photolithographic layer |
01/02/1997 | DE19522338A1 Deformable substrate through-contact production method for chip carrier |
01/02/1997 | DE19522004A1 Method for producing partly movable micro structure(s) |
01/01/1997 | CN2243953Y Quartz crystal multple cutter cutting machine tool |
01/01/1997 | CN1139497A Method and pellet for encapsulating lead frames and device for manufacturing pellets |
01/01/1997 | CN1139460A Epitaxial reactor, susceptor and gas-flow system |
01/01/1997 | CN1139297A Structure and method of coupling substrates |
01/01/1997 | CN1139296A insulated gate semiconductor device and of manufacture |
01/01/1997 | CN1139295A Method for fabricating vertical bipolar transistor |
01/01/1997 | CN1139294A Semiconductor device and production thereof |
01/01/1997 | CN1139292A Apparatus and method for cleaning semiconductor wafers |
01/01/1997 | CN1139277A Flash eeprom cell and method of making the same |
01/01/1997 | CN1139231A Propagation delay measuring circuit of signal for measuring |
12/31/1996 | US5590385 Compressing oxide powders; sintering; pulverization |
12/31/1996 | US5590361 Microprocessor having an effective BiCMOS extra multiple input complex logic circuit |
12/31/1996 | US5590273 Microcontroller integrated circuit with read only memory containing a generic program |
12/31/1996 | US5590239 Planar uniform heating surface with additional circumscribing ring |
12/31/1996 | US5590072 Nonvolatile semiconductor memory device |
12/31/1996 | US5590068 Ultra-high density alternate metal virtual ground ROM |
12/31/1996 | US5590051 Process simulation method, process simulator and chemical vapor deposition system employing the same |
12/31/1996 | US5590050 Device for aid in integrated circuit design that reduces the number of cells in a circuit representation |
12/31/1996 | US5589962 Active matrix display device using aluminum alloy in scanning signal line or video signal line |
12/31/1996 | US5589847 Switched capacitor analog circuits using polysilicon thin film technology |
12/31/1996 | US5589761 Dual polarity voltage regulator circuits and methods for providing voltage regulation |
12/31/1996 | US5589737 Plasma processor for large workpieces |
12/31/1996 | US5589713 Contact holes filled with aluminum |
12/31/1996 | US5589712 Metal wiring including a first layer with aluminum as main component and a second layer having titanium and nitrogen as main components in a given ratio; lower reflectance relative to exposure light |
12/31/1996 | US5589709 Lead frame capacitor and capacitively-coupled isolator circuit using same |
12/31/1996 | US5589708 Radiation hard integrated circuits with implanted silicon in gate oxide layer, field oxide region, and interlevel dielectric layer |
12/31/1996 | US5589707 Semiconductor chip |
12/31/1996 | US5589706 Fuse link structures through the addition of dummy structures |
12/31/1996 | US5589702 High value gate leakage resistor |
12/31/1996 | US5589701 Process for realizing P-channel MOS transistors having a low threshold voltage in semiconductor integrated circuits for analog applications |
12/31/1996 | US5589700 Semiconductor nonvolatile memory |
12/31/1996 | US5589699 Electrically erasable programmable non-volatile semiconductor memory device having select gates and small number of contact holes |
12/31/1996 | US5589698 Solid state imaging device having sliding potential gradient |
12/31/1996 | US5589697 Charge pump circuit with capacitors |
12/31/1996 | US5589694 Semiconductor device having a thin film transistor and thin film diode |
12/31/1996 | US5589693 Substrates and methods for gas phase deposition of semiconductors and other materials |
12/31/1996 | US5589425 Process of selective area chemical vapor deposition of metal films |
12/31/1996 | US5589423 Masking first part of silicide blocking layer overlying dielectric layer, etching exposed portion, removing mask, etching blocking layer and dielectric layer, forming silicide layer on exposed portion of substrate |
12/31/1996 | US5589422 Etching very thin layers of a semiconductor surface; oxidation |
12/31/1996 | US5589421 Method of manufacturing annealed films |
12/31/1996 | US5589419 Process for fabricating semiconductor device having a multilevel interconnection |
12/31/1996 | US5589418 Method of forming a polysilicon buried contact |
12/31/1996 | US5589417 TiSi2 /TiN clad interconnect technology |
12/31/1996 | US5589416 Process for forming integrated capacitors |
12/31/1996 | US5589415 Method for forming a semiconductor structure with self-aligned contacts |
12/31/1996 | US5589414 Method of making mask ROM with two layer gate electrode |
12/31/1996 | US5589413 Method of manufacturing self-aligned bit-line during EPROM fabrication |
12/31/1996 | US5589412 Method of making increased-density flash EPROM that utilizes a series of planarized, self-aligned, intermediate strips of conductive material to contact the drain regions |
12/31/1996 | US5589411 Process for fabricating a high-voltage MOSFET |
12/31/1996 | US5589410 An integrated semiconductor device having a buried semiconductor layer and fabrication method thereof |
12/31/1996 | US5589409 Fabrication of bipolar transistors with improved output current-voltage characteristics |
12/31/1996 | US5589408 Thermally annealing a metal-semiconductor contact with semiconductor substrate |
12/31/1996 | US5589407 Doping, annealing, diffusion |
12/31/1996 | US5589406 Method of making TFT display |
12/31/1996 | US5589405 Method for fabricating VDMOS transistor with improved breakdown characteristics |
12/31/1996 | US5589402 Process for manufacturing a package for mating with a bare semiconductor die |
12/31/1996 | US5589304 Photomask comprising a holding frame and reinforcing member with a ceramic oxide bond |
12/31/1996 | US5589303 Substrate with optical mask, photoresists pattern for multilayer element and etching |
12/31/1996 | US5589270 Electroconductive polymer, semiconductors |
12/31/1996 | US5589233 Single chamber CVD process for thin film transistors |
12/31/1996 | US5589110 Container for liquid metal organic compound |
12/31/1996 | US5589083 Method of manufacturing microstructure by the anisotropic etching and bonding of substrates |
12/31/1996 | US5589041 Plasma sputter etching system with reduced particle contamination |
12/31/1996 | US5589029 Semiconductor chip-supply method and apparatus |
12/31/1996 | US5589007 Photovoltaic elements and process and apparatus for their formation |
12/31/1996 | US5589005 System for supplying ultrapure water and method of washing substrate, and system for producing ultrapure water and method of producing ultrapure water |
12/31/1996 | US5589003 Shielded substrate support for processing chamber |
12/31/1996 | US5589002 Gas distribution plate for semiconductor wafer processing apparatus with means for inhibiting arcing |
12/31/1996 | US5589001 Apparatus for forming a film on a wafer |
12/31/1996 | US5588999 Thin film forming device |
12/31/1996 | US5588994 Method of producing sheets of crystalline material and devices made therefrom |
12/31/1996 | US5588993 Method for preparing molten silicon melt from polycrystalline silicon charge |
12/31/1996 | US5588902 Apparatus for polishing wafers |
12/31/1996 | US5588831 Furnace system equipped with protected combustion nozzle used in fabrication of semiconductor device |
12/31/1996 | US5588827 Passive gas substrate thermal conditioning apparatus and method |
12/31/1996 | US5588789 Load arm for load lock |
12/31/1996 | US5588531 Glass substrate transport box |
12/31/1996 | US5588205 Method of manufacturing a high density integrated circuit module having complex electrical interconnect rails |
12/31/1996 | CA2110782C Method of creating detachable solder connections |
12/27/1996 | WO1996042112A1 Semiconductor integrated circuit device, production thereof, and semiconductor wafer |