Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/1997
09/16/1997US5668053 Method for fabricating multilayer semiconductor device
09/16/1997US5668052 Method of manufacturing semiconductor device
09/16/1997US5668051 Method of forming poly plug to reduce buried contact series resistance
09/16/1997US5668048 Method of making a semiconductor device utilizing crystal orientation dependence of impurity concentration
09/16/1997US5668046 Method of producing a semiconductor on insulating substrate, and a method of forming transistor thereon
09/16/1997US5668045 Process for stripping outer edge of BESOI wafers
09/16/1997US5668044 Method of forming element isolating region in a semiconductor device
09/16/1997US5668043 Method for forming isolated regions in a semiconductor device
09/16/1997US5668042 Method for aligning micro patterns of a semiconductor device
09/16/1997US5668041 Method of manufacturing a semiconductor device having a capacitor
09/16/1997US5668040 Method for forming a semiconductor device electrode which also serves as a diffusion barrier
09/16/1997US5668039 Method for forming crown-shape capacitor node with tapered etching
09/16/1997US5668038 One step smooth cylinder surface formation process in stacked cylindrical DRAM products
09/16/1997US5668037 Method of forming a resistor and integrated circuitry having a resistor construction
09/16/1997US5668036 Planarization layers of borophosphosilicate glass or tetraethylsilicate films are deposited followed by chemical mechanical polishing
09/16/1997US5668034 Process for fabricating a high voltage MOS transistor for flash EEPROM applications having a uni-sided lightly doped drain
09/16/1997US5668033 Method for manufacturing a semiconductor acceleration sensor device
09/16/1997US5668031 Method of fabricating high density flat cell mask ROM
09/16/1997US5668030 Process for making identification alphanumeric code markings for mask ROM devices
09/16/1997US5668029 Process for fabricating multi-level read-only memory device
09/16/1997US5668028 Method of depositing thin nitride layer on gate oxide dielectric
09/16/1997US5668027 Method of manufacturing a MOS transistor semiconductor device
09/16/1997US5668026 DMOS fabrication process implemented with reduced number of masks
09/16/1997US5668025 Method of making a FET with dielectrically isolated sources and drains
09/16/1997US5668024 CMOS device structure with reduced risk of salicide bridging and reduced resistance via use of a ultra shallow, junction extension, ion implantation process
09/16/1997US5668023 Epitaxial growth of polar semiconductors
09/16/1997US5668022 Increasing a maximum oscillation frequency by depositing metal silicide, nitrides dielectric films, oxidized conductive film, etching and forming a contact hole for wiring
09/16/1997US5668021 Process for fabricating a semiconductor device having a segmented channel region
09/16/1997US5668020 Method for forming impurity junction regions of semiconductor device
09/16/1997US5668019 Offset ldd structure, liquid crystal display switch
09/16/1997US5668018 Method for defining a region on a wall of a semiconductor structure
09/16/1997US5667942 Carboxylic acid-forming photoresist
09/16/1997US5667941 Photolithography, resolution
09/16/1997US5667940 Process for creating high density integrated circuits utilizing double coating photoresist mask
09/16/1997US5667934 Solder mask for printed circuits, epoxidized bisphenol a novolak, cationic photopolymerization catalyst
09/16/1997US5667932 Positive photoresist composition
09/16/1997US5667923 Charged particle beam exposure compensating proximity effect
09/16/1997US5667905 Electro-luminescent material, solid state electro-luminescent device and process for fabrication thereof
09/16/1997US5667884 Area bonding conductive adhesive preforms
09/16/1997US5667701 Method of measuring the amount of capacitive coupling of RF power in an inductively coupled plasma
09/16/1997US5667700 Process for the fabrication of a structural and optical element
09/16/1997US5667632 Method of defining a line width
09/16/1997US5667631 Striking a plasma from etchant gas including one or more selected from hydrogen bromide, hydrogen chloride, hydrogen iodide, chlorine, bromine and iodine in low pressure plasma reactor and etching indium tin oxide layer
09/16/1997US5667630 Low charge-up reactive ion metal etch process
09/16/1997US5667629 Method and apparatus for determination of the end point in chemical mechanical polishing
09/16/1997US5667622 In-situ wafer temperature control apparatus for single wafer tools
09/16/1997US5667595 Process for manufacturing a solar module and the solar module prepared thereby
09/16/1997US5667592 Process chamber sleeve with ring seals for isolating individual process modules in a common cluster
09/16/1997US5667588 Single crystal pulling apparatus
09/16/1997US5667586 Method for forming a single crystal semiconductor on a substrate
09/16/1997US5667584 Method for the preparation of a single crystal of silicon with decreased crystal defects
09/16/1997US5667567 Ethyl silicate monomer and/or polymer
09/16/1997US5667535 Wafer drying apparatus with balancing mechanism for turntable therein
09/16/1997US5667424 New chemical mechanical planarization (CMP) end point detection apparatus
09/16/1997US5667300 Non-contact photothermal method for measuring thermal diffusivity and electronic defect properties of solids
09/16/1997US5667164 Device and method for feeding a sheet
09/16/1997US5667132 Method for solder-bonding contact pad arrays
09/16/1997US5667130 Ultrasonic wire bonding apparatus and method
09/16/1997US5667129 IC component mounting method and apparatus
09/16/1997US5667128 Workstation for processing a flexible membrane
09/16/1997US5666985 Programmable apparatus for cleaning semiconductor elements
09/16/1997CA2126121C Chip carrier with protective coating for circuitized surface
09/16/1997CA2095449C Supersaturated rare earth doped semiconductor layers by chemical vapor deposition
09/16/1997CA2080080C Multiple narrow-line-channel fet having improved noise characteristics
09/16/1997CA2062840C Method of fabricating glass substrate for disk
09/15/1997CA2199878A1 Dry etching method
09/14/1997CA2199897A1 Solid-state image sensing device, method for driving thereof and camera employing the same
09/12/1997WO1997033322A1 Power field effect transistor
09/12/1997WO1997033321A1 Fermi-threshold field effect transistors including source/drain pocket implants and methods of fabricating same
09/12/1997WO1997033320A1 Trenched dmos transistor with lightly doped tub
09/12/1997WO1997033319A1 Bipolar soi device having a tilted pn-junction, and a method for producing such a device
09/12/1997WO1997033318A1 E2prom device having erase gate in oxide isolation region in shallow trench and method of manufacture thereof
09/12/1997WO1997033316A1 Semiconductor device and its manufacture
09/12/1997WO1997033315A1 Method of manufacturing a pic (power integrated circuit) device, and a pic device manufactured by such a method
09/12/1997WO1997033314A1 Method for fabricating mesa interconnect structures
09/12/1997WO1997033313A1 Semiconductor device and process for producing the same
09/12/1997WO1997033312A1 Method of encapsulating a semiconductor package
09/12/1997WO1997033311A1 Method for making electrical connections
09/12/1997WO1997033310A1 Methods and apparatus for material deposition using primer
09/12/1997WO1997033309A1 Method of forming a semiconductor device having trenches
09/12/1997WO1997033308A1 Os RECTIFYING SCHOTTKY AND OHMIC JUNCTION AND W/WC/TiC OHMIC CONTACTS ON SiC
09/12/1997WO1997033307A1 Method for formation of thin film transistors on plastic substrates
09/12/1997WO1997033306A1 Heat treatment method and single-crystal semiconductor substrate
09/12/1997WO1997033305A1 Silicon single crystal and process for producing single-crystal silicon thin film
09/12/1997WO1997033304A2 Applying encapsulating material to substrates
09/12/1997WO1997033299A1 Device for generating powerful microwave plasmas
09/12/1997WO1997033205A1 Differential interferometer system and lithographic step-and-scan apparatus provided with such a system
09/12/1997WO1997033204A1 Lithopraphic apparatus for step-and-scan imaging of a mask pattern
09/12/1997WO1997033203A1 Imaging system and apparatus for ultraviolet lithography
09/12/1997WO1997033201A1 Bottom antireflective coatings through refractive index modification by anomalous dispersion
09/12/1997WO1997033200A1 Light-absorbing antireflective layers with improved performance due to refractive index optimization
09/12/1997WO1997033198A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
09/12/1997WO1997033013A1 Misted precursor deposition apparatus and method with improved mist and mist flow
09/12/1997WO1997023902A3 Process for producing an mos transistor
09/12/1997WO1997015699A3 Method and apparatus for the deposition of parylene af4 onto semiconductor wafers
09/12/1997CA2248803A1 Os rectifying schottky and ohmic junction and w/wc/tic ohmic contacts on sic
09/12/1997CA2243998A1 Bipolar soi device having a tilted pn-junction, and a method for producing such a device
09/11/1997DE3250096C2 Semiconductor dynamic random access memory
09/11/1997DE19705302A1 Complementary double-poly:silicon@ bipolar-CMOS process
09/11/1997DE19702109A1 Recrystallising crystalline component especially thin film semiconductor