Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2013
08/06/2013US8502372 Low-cost 3D face-to-face out assembly
08/06/2013US8502371 Integrated circuit package system with extended corner leads
08/06/2013US8502363 Semiconductor device packages with solder joint enhancement element and related methods
08/06/2013US8502347 Bipolar junction transistor with epitaxial contacts
08/06/2013US8502340 High density three-dimensional integrated capacitors
08/06/2013US8502339 System-in-package having integrated passive devices and method therefor
08/06/2013US8502334 Image sensor and method for manufacturing the same
08/06/2013US8502326 Gate dielectric formation for high-voltage MOS devices
08/06/2013US8502325 Metal high-K transistor having silicon sidewalls for reduced parasitic capacitance
08/06/2013US8502323 Reliable normally-off III-nitride active device structures, and related methods and systems
08/06/2013US8502322 Nonvolatile memory device and manufacturing method thereof
08/06/2013US8502320 Zener diode structure and process
08/06/2013US8502302 Integrating Schottky diode into power MOSFET
08/06/2013US8502293 Capacitor with recessed plate portion for dynamic random access memory (DRAM) and method to form the same
08/06/2013US8502282 Normally-off integrated JFET power switches in wide bandgap semiconductors and methods of making
08/06/2013US8502279 Nano-electro-mechanical system (NEMS) structures with actuatable semiconductor fin on bulk substrates
08/06/2013US8502273 Group III-nitride HEMT having a well region formed on the surface of substrate and contacted the buffer layer to increase breakdown voltage and the method for forming the same
08/06/2013US8502249 Semiconductor light-emitting device having groove in P-type semiconductor layer and method for manufacturing the same
08/06/2013US8502241 Method of driving a light emitting device
08/06/2013US8502238 Nitride-composite semiconductor laser element, its manufacturing method, and semiconductor optical device
08/06/2013US8502232 Capacitor, semiconductor device and manufacturing method thereof
08/06/2013US8502231 Semiconductor device
08/06/2013US8502221 Semiconductor device with two metal oxide films and an oxide semiconductor film
08/06/2013US8502215 Semiconductor element and display device using the same
08/06/2013US8502208 Organic light-emitting device
08/06/2013US8502199 Blue-shifted triarylamine polymer
08/06/2013US8502192 LED with uniform current spreading and method of fabrication
08/06/2013US8502191 Semiconductor device, manufacturing method therefor, and solar cell
08/06/2013US8502190 Device of light-emitting diode
08/06/2013US8502182 Memory device having self-aligned cell structure
08/06/2013US8502151 Optical proximity sensor package with lead frame
08/06/2013US8502112 System and method for cutting using a variable astigmatic focal beam spot
08/06/2013US8502082 Circuitized substrate utilizing three smooth-sided conductive layers as part thereof and electrical assemblies and information handling systems utilizing same
08/06/2013US8501976 Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material
08/06/2013US8501638 Laser annealing scanning methods with reduced annealing non-uniformities
08/06/2013US8501637 Silicon dioxide thin films by ALD
08/06/2013US8501636 Method for fabricating silicon dioxide layer
08/06/2013US8501635 Modification of REO by subsequent III-N EPI process
08/06/2013US8501634 Method for fabricating gate structure
08/06/2013US8501633 Forming substrate structure by filling recesses with deposition material
08/06/2013US8501632 Methods of fabricating isolation regions of semiconductor devices and structures thereof
08/06/2013US8501631 Plasma processing system control based on RF voltage
08/06/2013US8501630 Selective etch process for silicon nitride
08/06/2013US8501629 Smooth SiConi etch for silicon-containing films
08/06/2013US8501628 Differential metal gate etching process
08/06/2013US8501627 Profile control in dielectric etch
08/06/2013US8501626 Methods for high temperature etching a high-K material gate structure
08/06/2013US8501624 Excited gas injection for ion implant control
08/06/2013US8501623 Method of forming a semiconductor device having a metal silicide and alloy layers as electrode
08/06/2013US8501622 Semiconductor device with two or more bond pad connections for each input/output cell and method of manufacture thereof
08/06/2013US8501621 Method of fabrication of the memristive device
08/06/2013US8501620 Method for depositing tungsten film having low resistivity, low roughness and high reflectivity
08/06/2013US8501619 Methods for forming a plurality of contact holes in a microelectronic device
08/06/2013US8501618 Semiconductor device and method of forming RDL wider than contact pad along first axis and narrower than contact pad along second axis
08/06/2013US8501617 Semiconductor devices including a topmost metal layer with at least one opening and their methods of fabrication
08/06/2013US8501616 Self-aligned protection layer for copper post structure
08/06/2013US8501615 Metal bump formation
08/06/2013US8501614 Method for manufacturing fine-pitch bumps and structure thereof
08/06/2013US8501613 UBM etching methods for eliminating undercut
08/06/2013US8501612 Flip chip structure and method of manufacture
08/06/2013US8501611 Methods of forming integrated circuit devices having electrically conductive layers therein with partially nitridated sidewalls
08/06/2013US8501610 Non-volatile memories and methods of fabrication thereof
08/06/2013US8501609 Method for generating a three-dimensional NAND memory with mono-crystalline channels using sacrificial material
08/06/2013US8501608 Method for processing semiconductor device
08/06/2013US8501607 FinFET alignment structures using a double trench flow
08/06/2013US8501606 Methods of forming wiring structures
08/06/2013US8501605 Methods and apparatus for conformal doping
08/06/2013US8501604 Method for forming a doped region in a semiconductor layer of a substrate and use of such method
08/06/2013US8501603 Method for fabricating high voltage transistor
08/06/2013US8501602 Method of manufacturing devices having vertical junction edge
08/06/2013US8501601 Drive current increase in field effect transistors by asymmetric concentration profile of alloy species of a channel semiconductor alloy
08/06/2013US8501600 Methods for depositing germanium-containing layers
08/06/2013US8501599 Substrate processing apparatus and substrate processing method
08/06/2013US8501598 Semiconductor substrate, semiconductor device, and method of producing semiconductor substrate
08/06/2013US8501597 Method for fabricating group III-nitride semiconductor
08/06/2013US8501596 Method for fabricating a micro-electronic device equipped with semi-conductor zones on an insulator with a horizontal GE concentration gradient
08/06/2013US8501595 Thin film containing nanocrystal particles and method for preparing the same
08/06/2013US8501594 Methods for forming silicon germanium layers
08/06/2013US8501592 Freestanding III-nitride single-crystal substrate and method of manufacturing semiconductor device utilizing the substrate
08/06/2013US8501591 Method for manufacturing a multiple-bit-per-cell memory
08/06/2013US8501590 Apparatus and methods for dicing interposer assembly
08/06/2013US8501589 Method in the microelectronics fields of forming a monocrystalline layer
08/06/2013US8501588 Method for making a semiconductor structure with a buried ground plane
08/06/2013US8501587 Stacked integrated chips and methods of fabrication thereof
08/06/2013US8501586 Power semiconductor
08/06/2013US8501585 Manufacturing method of semiconductor device
08/06/2013US8501584 Method of manufacturing multi-level, silicon, micromechanical parts and parts thereby obtained
08/06/2013US8501583 Method for connecting between substrates, flip-chip mounting structure, and connection structure between substrates
08/06/2013US8501582 Semiconductor structure having low thermal stress and method for manufacturing thereof
08/06/2013US8501581 Methods of forming semiconductor constructions
08/06/2013US8501580 Process of fabricating semiconductor device with low capacitance for high-frequency circuit protection
08/06/2013US8501579 Process of fabricating chip
08/06/2013US8501578 Semiconductor structure formed without requiring thermal oxidation
08/06/2013US8501577 Preparation method for full-isolated SOI with hybrid crystal orientations
08/06/2013US8501574 Resistive memory device and manufacturing method thereof and operating method thereof
08/06/2013US8501572 Spacer structure for transistor device and method of manufacturing same
08/06/2013US8501571 Method of manufacturing semiconductor device having silicon carbide layers containing phosphorus
08/06/2013US8501570 Method of manufacturing source/drain structures
08/06/2013US8501569 Semiconductor device having gradient doping profile
08/06/2013US8501568 Method of forming flash memory with ultraviolet treatment