Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2004
03/11/2004WO2004021085A1 Optical subsystem, particularly for a projection exposure system comprising at least one optical element that can be brought into at least two positions
03/11/2004WO2004021083A1 Device for transferring a pattern to an object
03/11/2004WO2004021082A2 Improved photomask having an intermediate inspection film layer
03/11/2004WO2004021023A1 Method and apparatus for endpoint detection in electron beam assisted etching
03/11/2004WO2004021022A2 Integrated circuit with embedded identification code
03/11/2004WO2004020969A2 Production of nanoparticles having a defined number of ligands
03/11/2004WO2004020961A1 Hermetic packaging
03/11/2004WO2004020706A1 Lightly doped silicon carbide wafer and use thereof in high power devices
03/11/2004WO2004020705A1 Epitaxial wafer and its manufacturing method
03/11/2004WO2004020695A1 Substrate processing unit, method of detecting end point of cleaning of substrate processing unit, and method of detecting end point of substrate processing
03/11/2004WO2004020693A1 Cleaning method for substrate-processing device and the device
03/11/2004WO2004020692A1 Substrate treating apparatus
03/11/2004WO2004020691A2 Systems and methods for forming zirconium and/or hafnium-containing layers
03/11/2004WO2004020690A1 Systems and methods for forming metal oxides using alcohols
03/11/2004WO2004020689A2 Systems and methods for forming metal oxides using metal organo-amines and metal organo-oxides
03/11/2004WO2004020686A2 A hybrid beam deposition system and methods for fabricating zno films, p-type zno films, and zno-based ii-vi compound semiconductor devices
03/11/2004WO2004020682A2 Improvements to oxide films
03/11/2004WO2004020551A1 Etching pastes for titanium oxide surfaces
03/11/2004WO2004020545A1 Method and apparatus for chemically, mechanically, and/or electrolytically removing material from microelectronic substrates
03/11/2004WO2004020148A1 Method and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate
03/11/2004WO2004020137A1 Wedge-bonding of wires in electronic device manufacture with a reversible wedge bonding tool
03/11/2004WO2004012257A9 Method and apparatus for manufacturing net shape semiconductor wafers
03/11/2004WO2004001842A3 Layer assembly and method for producing a layer assembly
03/11/2004WO2003103050A3 Variable capacitances for memory cells within a cell group
03/11/2004WO2003096412A3 Method for the production of an integrated circuit and integrated circuit with a bipolar transistor and a hetero bipolar transistor
03/11/2004WO2003094170A3 Layout for thermally selected cross-point mram cell
03/11/2004WO2003093902A3 Lighting system, particularly for use in extreme ultraviolet (euv) lithography
03/11/2004WO2003091173A3 Capping layer for crystallizing germanium, and substrate having thin crystallized germanium layer
03/11/2004WO2003089680A3 Process modules for transport polymerization of low dieletric constant thin films
03/11/2004WO2003081640A3 Strained fin fets structure and method
03/11/2004WO2003079434A3 Semiconductor device having a wire bond pad and method therefor
03/11/2004WO2003072673A3 Adhesive compositions containing organic spacers and methods for use thereof
03/11/2004WO2003069655A3 Electronic micro component including a capacitive structure
03/11/2004WO2003065416A3 Enhanced photodetector
03/11/2004WO2003062922A3 Photomask and method for manufacturing the same
03/11/2004WO2003060982A3 Ideal oxygen precipitating silicon wafers with nitrogen/carbon stabilized oxygen precipitate nucleation centers and process for making the same
03/11/2004WO2003054911A8 Plasma process apparatus
03/11/2004WO2003050850A3 Contacting of a semiconductor chip on a substrate using flip-chip-like technology
03/11/2004WO2003041160A3 Two-step ion implantation method with active wafer cooling for buried oxide formation
03/11/2004WO2003040734A3 Method and system for compensating thermally induced motion of probe cards
03/11/2004WO2003038862A3 Pads for cmp and polishing substrates
03/11/2004WO2003030245A3 Method for assembly of complementary-shaped receptacle site and device microstructures
03/11/2004WO2003030226A3 End effector assembly
03/11/2004WO2003021360A3 Phase-shift-moire focus monitor
03/11/2004WO2003017014A3 Tool services layer for providing tool service functions in conjunction with tool functions
03/11/2004WO2003015153A3 Process to allow electrical and mechanical connection of an electrical device with a face equipped with contact pads
03/11/2004WO2003015137A3 Pedestal with integral shield
03/11/2004WO2003010833A3 Flip chip bonding of light emitting devices and light emitting devices suitable for flip-chip bonding
03/11/2004WO2003010806A3 Semiconductor substrate bonding by mass transport growth fusion
03/11/2004WO2003007338A3 Method for attaching an electronic component to a substrate
03/11/2004WO2002097869A8 Method and apparatus to correct wafer drift
03/11/2004WO2002091483A3 Improved photovoltaic device
03/11/2004WO2002089176A3 Method for separating electronic components from a composite
03/11/2004US20040049762 Method for monitoring matched machine overlay
03/11/2004US20040049755 Semiconductor integrated circuit, method of manufacturing semiconductor integrated circuit, charge pump circuit, layout designing apparatus, and layout designing program
03/11/2004US20040049753 System for estimating performance of integrated circuit in register transfer level
03/11/2004US20040049752 Method for designing semiconductor integrated circuit
03/11/2004US20040049747 Verification apparatus
03/11/2004US20040049723 Semiconductor integrated circuit with a test circuit
03/11/2004US20040049722 Failure analysis system, failure analysis method, a computer program product and a manufacturing method for a semiconductor device
03/11/2004US20040049318 Article holders with sensors detecting a type of article held by the holder
03/11/2004US20040049308 Assembly for processing substrates
03/11/2004US20040049301 Apparatus and method for preparing and supplying slurry for CMP machine
03/11/2004US20040048960 Compositions for preparing low dielectric materials
03/11/2004US20040048761 Cleaning composition
03/11/2004US20040048559 Chemical mechanical polishing pad with micro-holes
03/11/2004US20040048557 Abrasive cloth dresser and method for dressing an abrasive cloth with the same
03/11/2004US20040048554 Method for polishing surface of semiconductor device substrate
03/11/2004US20040048553 Polishing head of chemical mechanical polishing apparatus
03/11/2004US20040048550 Modular method for chemical mechanical planarization
03/11/2004US20040048493 Method and device for heat treatment
03/11/2004US20040048492 Apparatus for reducing plasma charge damage for plasma processes
03/11/2004US20040048491 Post thermal treatment methods of forming high dielectric layers in integrated circuit devices
03/11/2004US20040048490 Interlayer insulation film used for multilayer interconnect of semiconductor integrated circuit and method of manufacturing the same
03/11/2004US20040048489 Semiconductor device having opening and method of fabricating the same
03/11/2004US20040048488 Methods of forming vertical power devices having deep and shallow trenches therein
03/11/2004US20040048487 geotextile multilayer fabrics or yarns joined using spacers, having compressive strength
03/11/2004US20040048485 In-situ sequential high density plasma deposition and etch processing for gap fill
03/11/2004US20040048483 Method to etch poly Si gate stacks with raised STI structure
03/11/2004US20040048482 Method of forming flash memories with high coupling ratio and the structure of the same
03/11/2004US20040048481 Method for fabricating non-volatile memory device having sidewall gate structure and SONOS cell structure
03/11/2004US20040048480 Method of planarization of semiconductor devices
03/11/2004US20040048479 Process for producing and removing a mask layer
03/11/2004US20040048478 Novel chemical-mechanical polishing (CMP) process for shallow trench isolation
03/11/2004US20040048477 Method for manufacturing semiconductor device
03/11/2004US20040048476 Method of manufacturing semiconductor device having metal interconnections of different thickness
03/11/2004US20040048475 Method for forming a storage node of a capacitor
03/11/2004US20040048474 Wafer holding
03/11/2004US20040048473 Method for producing an integrated circuit, at least partially transforming an oxide layer into a conductive layer
03/11/2004US20040048472 Semiconductor device having T-shaped gate structure comprising in situ sidewall spacers and method of forming the semiconductor device
03/11/2004US20040048471 Semiconductor base material and method of manufacturing the material
03/11/2004US20040048470 Interconnection devices for ultrasonic matrix array transducers
03/11/2004US20040048469 Hole forming by cross-shape image exposure
03/11/2004US20040048468 Barrier metal cap structure on copper lines and vias
03/11/2004US20040048467 Devices containing platinum-iridium films and methods of preparing such films and devices
03/11/2004US20040048465 Method of forming conductor wiring pattern
03/11/2004US20040048464 Semiconductor device having a planarized structure and the method for producing the same
03/11/2004US20040048463 Semiconductor device and manufacturing method thereof
03/11/2004US20040048462 Method for fabricating semiconductor device
03/11/2004US20040048461 Methods and apparatus for forming barrier layers in high aspect ratio vias