Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2004
04/15/2004US20040070077 Semiconductor device and method of manufacturing the same
04/15/2004US20040070075 Integrated circuit and method for producing a composite comprising a tested integrated circuit and an electrical device
04/15/2004US20040070074 Hybrid integrated circuit device
04/15/2004US20040070068 Semiconductor package insulation film and manufacturing method thereof
04/15/2004US20040070063 Three dimensional structure integrated circuit
04/15/2004US20040070059 Semiconductor device having sealing structure for wide gap type semiconductor chip
04/15/2004US20040070057 COF tape carrier, semiconductor element, COF semiconductor device, and method for manufacturing of COF semiconductor device
04/15/2004US20040070056 Having a shape adapted to reduce the number of leads connected to power and ground terminals
04/15/2004US20040070054 IC chip and semiconductor device
04/15/2004US20040070053 Semiconductor device, semiconductor device module, manufacturing method of semiconductor device, and manufacturing method of semiconductor device module
04/15/2004US20040070052 Integrated circuit configuration comprising a sheet-like substrate
04/15/2004US20040070051 Semiconductor device and method of manufacturing substrate
04/15/2004US20040070048 Etch-back or undercutting of the thin film resistor associated with wet etching reduced or eliminated completely, resulting in decreased width reduction and decreased variation in the overall width
04/15/2004US20040070047 Power semiconductor device
04/15/2004US20040070046 Reliable dual gate dielectrics for MOS transistors
04/15/2004US20040070045 Semiconductor device and method for manufacturing the same
04/15/2004US20040070044 High voltage power MOSFET having low on-resistance
04/15/2004US20040070039 Reduce the in-plane photoelectric conversion portion characteristic distribution that is created in forming color filters by a common photolithography; good uniformity between exposure regions in image
04/15/2004US20040070037 Semiconductor device and method of manufacturing the same
04/15/2004US20040070036 ULSI MOS with high dielectric constant gate insulator
04/15/2004US20040070035 Semiconductor transistor having a stressed channel
04/15/2004US20040070034 Semiconductor device and method of forming the same
04/15/2004US20040070033 Semiconductor device with resistor pattern and method of fabricating the same
04/15/2004US20040070032 LSI device and manufacturing method of the above
04/15/2004US20040070030 Non-volatile memory device and method for forming
04/15/2004US20040070028 Method of forming a low resistance semiconductor device and structure therefor
04/15/2004US20040070026 Semiconductor integrated circuit
04/15/2004US20040070025 NROM memory cell
04/15/2004US20040070024 MOSFET with a thin gate insulating film
04/15/2004US20040070023 Semiconductor device and method of manufacturing the same
04/15/2004US20040070022 EEPROM and EEPROM manufacturing method
04/15/2004US20040070021 Flash memory array with increased coupling between floating and control gates
04/15/2004US20040070020 Nonvolatile semiconductor memory device and method for operating the same
04/15/2004US20040070019 Integrated circuit metal-insulator-metal capacitors including hemispherical grain lumps
04/15/2004US20040070018 Semiconductor memory circuitry
04/15/2004US20040070017 Metal oxynitride capacitor barrier layer
04/15/2004US20040070016 Methods of forming semiconductor constructions
04/15/2004US20040070015 Ferroelectric device and method for making
04/15/2004US20040070012 Low defect density silicon
04/15/2004US20040070010 Contactor, a method of manufacturing the contactor and a device and method of testing electronic component using the contactor
04/15/2004US20040070008 High speed dual-port memory cell having capacitive coupling isolation and layout design
04/15/2004US20040070007 Vertical field effect transistors including conformal monocrystalline silicon layer on trench sidewall
04/15/2004US20040070002 Semiconductor device
04/15/2004US20040069991 Perovskite cuprate electronic device structure and process
04/15/2004US20040069990 Charge storage region comprises a tunneling dielectric located adjacent to the active layer, a blocking dielectric located adjacent to the gate electrode and a charge storage dielectric located between the tunneling and blocking dielectrics
04/15/2004US20040069989 With vertical transistors; also detecting word lines in a wafer with a scribe line region and a memory region
04/15/2004US20040069878 Method and apparatus for reuse of abrasive fluid used in the manufacture of semiconductors
04/15/2004US20040069840 Method and apparatus for filling a mask with solder paste
04/15/2004US20040069757 Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same
04/15/2004US20040069751 Irradiating second harmonic of CW laser and a fundamental wave of CW laser at the same time to the same portion to improve annealing efficiency
04/15/2004US20040069745 Method for preventing the etch transfer of sidelobes in contact hole patterns
04/15/2004US20040069744 Method for homogenizing the thickness of a coating on a patterned layer
04/15/2004US20040069732 Supporting column and cassette using the same
04/15/2004US20040069728 Cassette
04/15/2004US20040069727 Stopper rod and cassette using the same
04/15/2004US20040069680 Cassette device for accepting substrates
04/15/2004US20040069647 Plating apparatus, cartridge and copper dissolution tank for use in the plating apparatus, and plating method
04/15/2004US20040069646 Electrolytic treatment, such as plating or etching; providing a high resistance structure having an electrical conductivity lower than that of the electrolytic solution in the solution filled between a substrate in contact with an electrode
04/15/2004US20040069644 Spin, rinse and dry process performed on the wafer prior to electroplating either in a standalone tool or in a preclean module integrated into an electroplating tool; for semiconductors
04/15/2004US20040069624 Continuous coating system
04/15/2004US20040069612 Substrate processing apparatus and substrate processing method
04/15/2004US20040069608 Switch and method for manufacturing the same
04/15/2004US20040069452 Thermal interface wafer and method of making and using the same
04/15/2004US20040069448 Exhaust heat utilization system, exhaust heat utilization method, and semiconductor production facility
04/15/2004US20040069412 Dry etching apparatus, dry etching method, and cleaning method adopted in dry etching apparatus
04/15/2004US20040069410 Cluster tool for E-beam treated films
04/15/2004US20040069409 Front opening unified pod door opener with dust-proof device
04/15/2004US20040069408 Dual-port end point window for plasma etcher
04/15/2004US20040069407 Method and apparatus for detecting backside contamination during fabrication of a semiconductor wafer
04/15/2004US20040069400 ACF tape feeder machine, and method for feeding ACF tape
04/15/2004US20040069397 Method and apparatus for determining processing size of bonding material
04/15/2004US20040069330 Pumping a processing liquid through a degasifier, exposing the semiconductor wafer to the degasified processing liquid; and optionally recirculating the processing liquid through the degasifier and back into the vessel.
04/15/2004US20040069329 Method and apparatus for drying semiconductor wafer surfaces using a plurality of inlets and outlets held in close proximity to the wafer surfaces
04/15/2004US20040069326 Edge roller having mounted on it a proximity head capable of forming a meniscus and including a concave portion with ports opening into it including a process liquid injection port, a vacuum port and a surface tension control port
04/15/2004US20040069321 Wet chemical etching to remove an oxide layer and to provide a hydrophobic surface; and exposing the etched surface to a gaseous ozone atmosphere to provide a dry hydrophilic surface.
04/15/2004US20040069320 Rotating articles within a chamber; applying a heated aqueous liquid; introducing ozone gas and carbon dioxide gas; introducing ozone gas and carbon dioxide gas into the chamber to effect cleaning
04/15/2004US20040069319 Method and apparatus for cleaning a substrate using megasonic power
04/15/2004US20040069318 Prior to cleaning with XeF2, contacting XeF2 gas with an article to be cleaned, such as a semiconductor, in a reduced-pressure or vacuum atmosphere containing a required amount of water to form HFto be
04/15/2004US20040069234 Sheet-type treating device
04/15/2004US20040069231 Chemical vapor deposition process and apparatus thereof
04/15/2004US20040069226 Substrate processing method and substrate processing system
04/15/2004US20040069225 Tandem process chamber
04/15/2004US20040069223 Wall liner and slot liner for process chamber
04/15/2004US20040069215 Gas spray arm for spin coating apparatus
04/15/2004US20040069212 Lateral movement of screw dislocations during homoepitaxial growth and devices yielded therefrom free of the detrimental effects of screw dislocations
04/15/2004US20040069112 Machine for punching out electronic circuitry parts, method for replacing tape supply reels, and method for producing electronic circuitry parts from tape
04/15/2004US20040069111 High-pressure processing apparatus
04/15/2004US20040068997 Electrode cooler of processing device
04/15/2004US20040068869 Mounting spring elements on semiconductor devices, and wafer-level testing methodology
04/15/2004US20040068866 Heat sink hand placement tool
04/15/2004US20040068864 Web fabrication of devices
04/15/2004US20040068818 Cleaning apparatus and roller
04/15/2004DE4407250B4 Verfahren zur Herstellung eines PMOS-Feleffekttransistors, in einem Halbleiterbauelement, PMOS-Feldeffekttransistor, Polysiliziumschicht in einem Halbleiterbauelement und Verfahren zu deren Herstellung A method for producing a PMOS Feleffekttransistors, in a semiconductor device, PMOS field effect transistor, polysilicon layer in a semiconductor device and process for their preparation
04/15/2004DE4344285B4 Verfahren zur Herstellung eines Transistors A method of manufacturing a transistor
04/15/2004DE3736379B4 Gepulster Komparator hoher Verstärkung Pulsed high-gain comparator
04/15/2004DE19734837B4 Verfahren zur Herstellung eines selbstausrichtenden Silicids A method for producing a self-aligned silicide
04/15/2004DE19702531B4 IPG-Transistor mit vertikalem Gate-Komplex und Verfahren zu dessen Herstellung IPG transistor with vertical gate complex and process for its preparation
04/15/2004DE10346002A1 Etching resist layer, e.g. to make capacitor, forms intermediate layer and opening, coats resist over them and patterns resist in shape of opening for etching
04/15/2004DE10344862A1 Verfahren zur Herstellung eines dicken Isolationskragens mit reduzierter Länge A method for producing a thick insulating collar with reduced length
04/15/2004DE10342548A1 Schnelle Abscheidung von Borsilicatglasfilmen Rapid separation of Borsilicatglasfilmen