Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2004
04/20/2004US6724026 Formation of capacitors using a single etch process instead of two
04/20/2004US6724025 MOSFET having high and low dielectric materials
04/20/2004US6724024 Field effect transistor pull-up/load element
04/20/2004US6724021 Semiconductor devices and their peripheral termination
04/20/2004US6724020 Semiconductor device and power amplifier using the same
04/20/2004US6724019 Multi-layered, single crystal field effect transistor
04/20/2004US6724009 Semiconductor integrated electronic device and corresponding manufacturing method
04/20/2004US6724008 Relaxed silicon germanium platform for high speed CMOS electronics and high speed analog circuits
04/20/2004US6724005 Substrate defect inspection method and substrate defect inspection system
04/20/2004US6724004 Method and apparatus for elimination of high energy ion from EUV radiating device
04/20/2004US6723998 Faraday system for ion implanters
04/20/2004US6723987 Method of inspecting holes using charged-particle beam
04/20/2004US6723981 Self contained sensing apparatus and system
04/20/2004US6723973 Lithographically formed on a semiconductor wafer, a liquid crystal panel, a mask
04/20/2004US6723964 Apparatus for heating and cooling semiconductor device in handler for testing semiconductor device
04/20/2004US6723952 Laser cutting apparatus and method
04/20/2004US6723927 High-reliability interposer for low cost and high reliability applications
04/20/2004US6723780 Novolac polymer planarization films with high temperature stability
04/20/2004US6723691 Comprising a tetralkylammonium hydroxide, an organic amine such as ethanolamine, gallic acid, a corrosion inhibitor such as ascorbic acid, and water; given alkalinity; cleaning copper containing microelectronics
04/20/2004US6723666 Method for reducing gate oxide surface irregularities
04/20/2004US6723665 Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the process
04/20/2004US6723664 Method and apparatus for depositing a thin film, and semiconductor device having a semiconductor-insulator junction
04/20/2004US6723663 Technique for forming an oxide/nitride layer stack by controlling the nitrogen ion concentration in a nitridation plasma
04/20/2004US6723662 Methods of forming gate oxide films in integrated circuit devices using wet or dry oxidization processes with reduced chloride
04/20/2004US6723661 Relaxed silicon germanium platform for high speed CMOS electronics and high speed analog circuits
04/20/2004US6723660 Thin-film forming apparatus and thin-film forming method
04/20/2004US6723658 Gate structure and method
04/20/2004US6723657 Method for fabricating a gate stack in very large scale integrated semiconductor memories
04/20/2004US6723656 Method and apparatus for etching a semiconductor die
04/20/2004US6723655 Methods for fabricating a semiconductor device
04/20/2004US6723654 Method and apparatus for in-situ descum/hot bake/dry etch photoresist/polyimide layer
04/20/2004US6723653 Process for reducing defects in copper-filled vias and/or trenches formed in porous low-k dielectric material
04/20/2004US6723652 Dry etching method and method of manufacturing semiconductor apparatus
04/20/2004US6723651 Plasma processing method
04/20/2004US6723649 Method of fabricating a semiconductor memory device
04/20/2004US6723648 Fabricating ferroelectric memory device
04/20/2004US6723647 Method for manufacturing semiconductor device
04/20/2004US6723646 Method for controlling and monitoring a chemical mechanical polishing process
04/20/2004US6723645 Method of forming a metal wiring in a semiconductor device
04/20/2004US6723644 Method of fabricating a semiconductor device using two chemical mechanical polishing processes to polish regions having different conductive pattern densities
04/20/2004US6723643 Method for chemical mechanical polishing of thin films using end-point indicator structures
04/20/2004US6723642 Method for forming nitrogen-containing oxide thin film using plasma enhanced atomic layer deposition
04/20/2004US6723641 Method of manufacturing semiconductor device and method of determining film formation time, chamber, chemical vapor deposition apparatus and boat thereof, etching apparatus, and film formation process system
04/20/2004US6723640 Method for forming contact plug of semiconductor device
04/20/2004US6723639 Prevention of post CMP defects in Cu/FSG process
04/20/2004US6723638 Performance in flash memory devices
04/20/2004US6723637 Semiconductor device and method for fabricating the same
04/20/2004US6723636 Methods for forming multiple damascene layers
04/20/2004US6723635 Protection low-k ILD during damascene processing with thin liner
04/20/2004US6723634 Method of forming interconnects with improved barrier layer adhesion
04/20/2004US6723633 Method for forming multi-layer wiring structure
04/20/2004US6723631 Fabrication method of semiconductor integrated circuit device
04/20/2004US6723630 Solder ball fabrication process
04/20/2004US6723629 Method and apparatus for attaching solder members to a substrate
04/20/2004US6723628 Method for forming bonding pad structures in semiconductor devices
04/20/2004US6723627 Method for manufacturing semiconductor devices
04/20/2004US6723626 Method of manufacturing semiconductor device
04/20/2004US6723625 Semiconductor device having thin electrode laye adjacent gate insulator and method of manufacture
04/20/2004US6723624 Method for fabricating n-type carbon nanotube device
04/20/2004US6723623 Methods of forming implant regions relative to transistor gates
04/20/2004US6723622 Method of forming a germanium film on a semiconductor substrate that includes the formation of a graded silicon-germanium buffer layer prior to the formation of a germanium layer
04/20/2004US6723621 Abrupt delta-like doping in Si and SiGe films by UHV-CVD
04/20/2004US6723620 Power semiconductor die attach process using conductive adhesive film
04/20/2004US6723619 Pressure sensitive adhesive sheet for semiconductor wafer processing
04/20/2004US6723618 Methods of forming field isolation structures
04/20/2004US6723617 Method of manufacturing a semiconductor device
04/20/2004US6723616 Process of increasing screen dielectric thickness
04/20/2004US6723615 Semiconductor device and method of fabricating the same
04/20/2004US6723614 Semiconductor device comprising layered positional detection marks and manufacturing method thereof
04/20/2004US6723613 Method of forming an isolated-grain rugged polysilicon surface via a temperature ramping step
04/20/2004US6723612 Semiconductor integrated circuit device and method of manufacturing the same
04/20/2004US6723611 Vertical hard mask
04/20/2004US6723610 Vertical bipolar transistor including an extrinsic base with reduced roughness, and fabrication process
04/20/2004US6723609 Method of preventing leakage current of a metal-oxide semiconductor transistor
04/20/2004US6723608 Method for manufacturing a semiconductor device having a layered gate electrode
04/20/2004US6723607 Method of forming fine patterns of semiconductor device
04/20/2004US6723606 Aerosol process for fabricating discontinuous floating gate microelectronic devices
04/20/2004US6723604 Non-volatile memory cell array having discontinuous source and drain diffusions contacted by continuous bit line conductors and methods of forming
04/20/2004US6723603 Method of utilizing fabrication process of poly-Si spacer to build flash memory with 2bit/cell
04/20/2004US6723602 Method for spacer patterned, high dielectric constant capacitor
04/20/2004US6723601 Method for manufacturing semiconductor memory device using hemispherical grain silicon
04/20/2004US6723600 Method for making a metal-insulator-metal capacitor using plate-through mask techniques
04/20/2004US6723599 Methods of forming capacitors and methods of forming capacitor dielectric layers
04/20/2004US6723598 Method for manufacturing aluminum oxide films for use in semiconductor devices
04/20/2004US6723597 Method of using high-k dielectric materials to reduce soft errors in SRAM memory cells, and a device comprising same
04/20/2004US6723595 Thin film deposition method including using atomic layer deposition without purging between introducing the gaseous reactants
04/20/2004US6723593 Deep submicron MOS transistor with increased threshold voltage
04/20/2004US6723592 Method of fabricating an X-ray detector array element
04/20/2004US6723590 Method for laser-processing semiconductor device
04/20/2004US6723589 Method of manufacturing thin film transistor in semiconductor device
04/20/2004US6723588 Method for fabricating SRAM cell
04/20/2004US6723587 Ultra small-sized SOI MOSFET and method of fabricating the same
04/20/2004US6723584 Methods of making microelectronic assemblies including compliant interfaces
04/20/2004US6723583 Method of manufacturing a semiconductor device using a mold
04/20/2004US6723581 Semiconductor device having a high-K gate dielectric and method of manufacture thereof
04/20/2004US6723578 Method for the sulphidation treatment of III-V compound semiconductor surfaces
04/20/2004US6723574 Method for quantifying uniformity patterns and including expert knowledge for tool development and control
04/20/2004US6723572 Method for monitoring the shape of the processed surfaces of semiconductor devices and equipment for manufacturing the semiconductor devices
04/20/2004US6723571 Semiconductor device manufacturing method
04/20/2004US6723541 Method of producing semiconductor device and semiconductor substrate