| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/15/2004 | DE10340147A1 Verfahren und Vorrichtung zum Verarbeiten eines Substrats und darin verwendete Platte Method and apparatus for processing a substrate used therein and plate |
| 04/15/2004 | DE10339940A1 System und Verfahren zum heterogenen Mehrstellentesten System and method for heterogeneous multi-site testing |
| 04/15/2004 | DE10334836A1 Halbleiterwafer und ein entsprechendes Herstellungsverfahren Semiconductor wafer, and a corresponding production method |
| 04/15/2004 | DE10328386A1 Maskendatenprozessor Mask data processor |
| 04/15/2004 | DE10323304A1 Composite comprises thin substrate (e.g. glass) less than 0.3 mm thick releasably bound to carrier substrate through adhesive force, useful e.g. in display industry, in polymer electronics, photovoltaic industry, sensors and biotechnology |
| 04/15/2004 | DE10323303A1 Composite comprises thin substrate (e.g. glass) having less than 0.3 mm thickness releasably bound to carrier substrate through bonding material, useful in e.g. display industry, polymer electronics, in sensors, biotechnology and medicine |
| 04/15/2004 | DE10323302A1 Composite comprises thin substrate (e.g. glass) less than 0.3 mm thick releasably bound to carrier substrate having fine structuring with open, infinitesimal cavities, useful in e.g. display industry, polymer electronics, and biotechnology |
| 04/15/2004 | DE10323301A1 Composite comprises thin substrate (e.g. glass) less than 0.3 mm thick releasably bound to carrier substrate by electrostatic force, useful e.g. in display industry, in polymer electronics, photovoltaic industry, sensors and biotechnology |
| 04/15/2004 | DE10311824A1 Periphere Schaltkreisstruktur eines Halbleiterbauelements Peripheral circuit structure of a semiconductor device |
| 04/15/2004 | DE10296545T5 Verfahren zur Herstellung von Bauteilen mit MOS-Gatesteuerung mit verringerter Maskenzahl Process for the production of components with MOS gated with a reduced number of masks |
| 04/15/2004 | DE10296522T5 Verfahren zur Herstellung eines Halbleiterchips A process for producing a semiconductor chip |
| 04/15/2004 | DE10296464T5 Verfahren und Gerät zur Validierung des Entwurfes einer komplexen integrierten Schaltungen Method and apparatus for validation of the design of complex integrated circuits |
| 04/15/2004 | DE10296448T5 Verfahren zum Abscheiden einer Schicht mit einer verhältnismässig hohen Dielektrizitätskonstante auf ein Substrat A method for depositing a layer with a relatively high dielectric constant onto a substrate |
| 04/15/2004 | DE10296328T5 Verfahren und Vorrichtung zum Steuern der Ätzselektivität Method and apparatus for controlling the etching selectivity |
| 04/15/2004 | DE10295972T5 Nicht in einer Form hergestellte Packung für eine Halbleiteranordnung Not manufactured in a mold package for a semiconductor device |
| 04/15/2004 | DE10250541B3 Electronic component used in electronic devices has an intermediate chamber formed by flip-chip contacts between substrate and semiconductor chip filled with thermoplastic material |
| 04/15/2004 | DE10247735B3 Layer arrangement used in the production of thin layer solar cells comprises a substrate, a metal film, a metal dichalcogenide separating layer and a chalcogenide semiconductor layer |
| 04/15/2004 | DE10247179A1 Haltering zum Halten von Halbleiterwafern in einer chemisch-mechanischen Poliervorrichtung Retaining ring for holding semiconductor wafers in a chemical mechanical polishing apparatus |
| 04/15/2004 | DE10246282A1 Substrate testing apparatus, has substrate carrier to receive and hold substrate in releasable thermal contact, and directly cooled thermal radiation shield protecting substrate from thermal radiation |
| 04/15/2004 | DE10245610A1 Verfahren zum selektiven Entfernen von Metallresten von einer dielektrischen Schicht mittels chemischen mechanischen Polierens A method for the selective removal of metal residues from a dielectric layer by chemical mechanical polishing |
| 04/15/2004 | DE10245608A1 Halbleiterelement mit verbesserten Halo-Strukturen und Verfahren zur Herstellung der Halo-Strukturen eines Halbleiterelements Semiconductor element with improved Halo structures and methods of making of the Halo structures of a semiconductor element |
| 04/15/2004 | DE10245607A1 Schaltungselement mit Metallsilizidgebiet, das durch ein Barrierdiffusionsmaterial thermisch stabilisiert ist Circuit element with metal silicide, which is thermally stabilized by a diffusion barrier material |
| 04/15/2004 | DE10245590A1 Halbleiterbauelement mit Praseodymoxid-Dielektrikum A semiconductor device comprising praseodymium oxide dielectric |
| 04/15/2004 | DE10245249A1 Trench transistor includes insulation layer projecting over spacer along surface of semiconductor region, serving as dopant source |
| 04/15/2004 | DE10245153A1 Integrierter Feldeffekttransistor mit zwei Steuerbereichen, Verwendung dieses Feldeffekttranistors und Herstellungsverfahren Integrated field-effect transistor having two control areas, the use of this manufacturing method and Feldeffekttranistors |
| 04/15/2004 | DE10242054B3 Teststruktur Test structure |
| 04/15/2004 | DE10240085A1 Process for structuring a masking layer for semiconductor production uses ideal and correcting mask patterns to allow for lateral distortion |
| 04/15/2004 | DE10196819T5 Implantierte verdeckte Verbindungen in einer Halbleitervorrichtung zum Schutz gegen reverse engineering Implanted hidden connections in a semiconductor device for protection against reverse engineering |
| 04/15/2004 | DE10149725B4 Anisotroper Herstellungsprozess von Oxidschichten in einem Substratgraben Anisotropic manufacturing process of oxide films in a substrate trench |
| 04/15/2004 | DE10147789B4 Vorrichtung zum Verlöten von Kontakten auf Halbleiterchips Apparatus for soldering contacts on semiconductor chips |
| 04/15/2004 | DE10059777B4 Transportvorrichtung und Verfahren zum Transport von zu prozessierenden Elementen durch eine Hochtemperaturzone Transport Device and method for transport of elements to be processed through a high temperature zone |
| 04/15/2004 | CA2501592A1 Ultrasonic washing equipment and ultrasonic washing method |
| 04/15/2004 | CA2499965A1 Large-area nanoenabled macroelectronic substrates and uses therefor |
| 04/15/2004 | CA2499950A1 Applications of nano-enabled large area macroelectronic substrates incorporating nanowires and nanowire composites |
| 04/15/2004 | CA2499944A1 Integrated displays using nanowire transistors |
| 04/14/2004 | EP1408612A1 Integrated circuit driver with stable bootstrap power supply |
| 04/14/2004 | EP1408555A2 Method of fabricating variable length vertical CMOS transistors |
| 04/14/2004 | EP1408554A2 Field effect controlled semiconductor component |
| 04/14/2004 | EP1408553A2 Semiconductor device and method for fabricating the same |
| 04/14/2004 | EP1408551A1 Method for producing bonding wafer |
| 04/14/2004 | EP1408548A2 Electronic component with a lead frame |
| 04/14/2004 | EP1408547A2 Semiconductor device and manufacturing method thereof |
| 04/14/2004 | EP1408546A1 Semiconductor device and production method therefor |
| 04/14/2004 | EP1408545A2 A method of producing a substrate by transferring a donor wafer comprising foreign species, and an associated donor wafer |
| 04/14/2004 | EP1408544A1 Film thichness measuring monitor wafer |
| 04/14/2004 | EP1408543A2 Formation of solder balls having resin member as reinforcement |
| 04/14/2004 | EP1408542A2 High-speed MOS-technology power device integrated structure, and related manufacturing process |
| 04/14/2004 | EP1408541A1 Hafnium silicide target for forming gate oxide film and method for preparation thereof |
| 04/14/2004 | EP1408540A1 Production method for anneal wafer and anneal wafer |
| 04/14/2004 | EP1408539A1 Semiconductor device and production method therefor |
| 04/14/2004 | EP1408538A1 Polishing element, cmp polishing device and productions method for semiconductor device |
| 04/14/2004 | EP1408537A2 Multi-layer film capacitor structures and method |
| 04/14/2004 | EP1408536A2 MIM capacitor structures and fabrication methods in dual-damascene structures |
| 04/14/2004 | EP1408535A2 Heating element CVD system |
| 04/14/2004 | EP1408534A1 A method and a device for producing an adhesive surface of a substrate |
| 04/14/2004 | EP1408511A1 Single bit nonvolatile memory cell and methods for programming and erasing thereof |
| 04/14/2004 | EP1408481A2 Bias potential generating apparatus |
| 04/14/2004 | EP1408442A2 Fingerprint detector with improved sensing surface layer |
| 04/14/2004 | EP1408365A2 Circuit board and method of manufacturing the same |
| 04/14/2004 | EP1408364A1 Liquid crystal display device |
| 04/14/2004 | EP1408338A2 Method for making a probe card with multiple contact tips for testing integrated circuit |
| 04/14/2004 | EP1408337A2 Probe card assembly |
| 04/14/2004 | EP1408326A2 Surface inspection method and apparatus |
| 04/14/2004 | EP1408140A1 A high-density plasma process for depositing a layer of Silicon Nitride |
| 04/14/2004 | EP1407828A2 Installation for continuous coating |
| 04/14/2004 | EP1407496A1 Gallium nitride-based led and a production method therefor |
| 04/14/2004 | EP1407488A2 A method of selectively alloying interconnect regions by depostion process |
| 04/14/2004 | EP1407487A2 Sol solution for producing glass coatings for electrically conductive materials that can be used in anodic bonding |
| 04/14/2004 | EP1407486A2 Transistor and method for making a transistor on a sige/soi substrate |
| 04/14/2004 | EP1407485A2 Manufacture of trench-gate field-effect transistors |
| 04/14/2004 | EP1407484A2 Method for producing a bipolar transistor comprising a polysilicon emitter |
| 04/14/2004 | EP1407483A1 Method for enhancing surface condition of a semiconductor wafer |
| 04/14/2004 | EP1407482A1 Method for chemical mechanical polishing (cmp) with altering the concentration of oxidizing agent in slurry |
| 04/14/2004 | EP1407481A2 Apparatus and method for controlling galvanic corrosion effects on a single-wafer cleaning system |
| 04/14/2004 | EP1407480A1 Manufacturing of a low-noise mos device |
| 04/14/2004 | EP1407479A2 Wafer transport apparatus |
| 04/14/2004 | EP1407478A2 Device for performing surface treatment on semiconductor wafers |
| 04/14/2004 | EP1407477A2 Improved connection assembly for integrated circuit sensors |
| 04/14/2004 | EP1407475A2 Tunable radiation source providing a planar irradiation pattern for processing semiconductor wafers |
| 04/14/2004 | EP1407472A1 Self contained sensing apparatus and system |
| 04/14/2004 | EP1407394A1 A method and apparatus for generating a solid state circuit layout with in-design variability associated to the setting of analog signal processing parameters, and an integrated circuit design and an integrated circuit produced by applying such method |
| 04/14/2004 | EP1407326A1 Sulfoxide pyrrolid(in)one alkanolamine stripping and cleaning composition |
| 04/14/2004 | EP1407325A1 Compensation of birefringence in a lens composed of crystal lenses |
| 04/14/2004 | EP1407324A1 Photoimageable composition |
| 04/14/2004 | EP1407317A2 A method of forming a reflective electrode and a liquid crystal display device |
| 04/14/2004 | EP1407299A1 Delay element made from a cubic crystal and corresponding optical system |
| 04/14/2004 | EP1407280A1 Method of manufacturing a probe card |
| 04/14/2004 | EP1407192A2 Fabrication of an electrically conductive silicon carbide article |
| 04/14/2004 | EP1407179A1 Single-handed cord/cable management device |
| 04/14/2004 | EP1407148A1 Apparatus for controlling the pressure in a process chamber and method of operating same |
| 04/14/2004 | EP1406837A1 Production and use of tetrafluorosilane |
| 04/14/2004 | EP1406823A1 300mm single stackable film frame carrier |
| 04/14/2004 | EP1305744A4 Method and system for hierarchical metal-end, enclosure and exposure checking |
| 04/14/2004 | EP1055014A4 Free floating shield and semiconductor processing system |
| 04/14/2004 | EP1000363A4 Spreading resistance profiling system |
| 04/14/2004 | EP0963458B1 Process for low temperature cvd using bi-carboxylates |
| 04/14/2004 | EP0963419B1 Composition for oxide cmp |
| 04/14/2004 | EP0934433B1 Method for depositing fluorine doped silicon dioxide films |
| 04/14/2004 | EP0878025B1 Semiconductor device with a high-frequency bipolar transistor on an insulating substrate |
| 04/14/2004 | CN2611088Y Resistance welding spot welding machine with three welding parameter gang control |