| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/22/2004 | DE10246718A1 Field effect transistor comprises a semiconductor substrate, a source recess and a drain recess formed in the substrate, a recessed insulating layer, an electrically conducting filler layer, a gate dielectric, and a gate layer |
| 04/22/2004 | DE10246389A1 Production of a trench semiconductor component used as a power semiconductor component comprises completely filling the trench with a further material before ion implantation is carried out |
| 04/22/2004 | DE10246343A1 Semiconductor memory cell field used in SONOS and NPROM technology has isolation regions formed by recesses filled with dielectric material in a semiconductor body arranged between the bit lines and between the word lines |
| 04/22/2004 | DE10246063A1 Anisotropic etching of structures defined by etching mask in silicon substrate involves periodic deposition of fluoropolymer from exotic fluorocarbon by plasma polymerization, alternating with plasma etching |
| 04/22/2004 | DE10197206T5 System und Verfahren zur Aufteilung einer Strömung System and method for allocating a flow |
| 04/22/2004 | DE10196678T5 Herstellungsverfahren für einen Dünnfilmstrukturkörper Manufacturing method of a thin-film structure body |
| 04/22/2004 | DE10196677T5 Elektrodenstruktur und Verfahren zum Herstellen eines Dünnschicht-Strukturkörpers Electrode structure and method of manufacturing a thin-film structure body |
| 04/22/2004 | DE10196676T5 Substrat und Herstellungsverfahren dafür sowie Dünnschicht-Strukturkörper Substrate and manufacturing method thereof as well as thin-film structural body |
| 04/22/2004 | DE10196643T5 Herstellungsverfahren für einen Dünnschicht-Strukturkörper Manufacturing method of a thin-film structure body |
| 04/22/2004 | DE10196368T5 Kontaktstruktur und Verfahren zu dessen Herstellung und eine Prüfkontaktanordnung, die diese verwendet Contact structure and method for its preparation and a test contact, which uses this |
| 04/22/2004 | DE10195494T5 Halbleiterbauteil und Verfahren zu dessen Herstellung Semiconductor device and process for its preparation |
| 04/22/2004 | CA2501420A1 Semiconductor photodetector with internal reflector |
| 04/21/2004 | EP1411616A2 Electronic apparatus and power supplying method |
| 04/21/2004 | EP1411555A2 Nonvolatile silicon/oxide/nitride/silicon/nitride/oxide/silicon memory |
| 04/21/2004 | EP1411554A1 Field-effect transistor constituting channel by carbon nano tubes |
| 04/21/2004 | EP1411548A2 Providing high precision resistance in an integrated circuit using a thin film resistor of controlled dimension |
| 04/21/2004 | EP1411547A2 Dicing/die-bonding-film, method of fixing semiconductor chips and semiconductor device |
| 04/21/2004 | EP1411546A2 Improving nickel silicide - silicon nitride adhesion through surface passivation |
| 04/21/2004 | EP1411545A1 Vapor growth method and vapor growth device |
| 04/21/2004 | EP1411544A1 Method and apparatus for doping etched resistance pattern |
| 04/21/2004 | EP1411538A1 Method and device for focussed electron beam induced etching |
| 04/21/2004 | EP1411525A1 Magnetic memory array, its fabrication and write/read methods |
| 04/21/2004 | EP1411393A2 Determination of stray radiation in a lithographic projection apparatus |
| 04/21/2004 | EP1411391A2 Method and apparatus for cooling a reticle during lithographic exposure |
| 04/21/2004 | EP1411389A1 Photoresists with hydroxylated, photoacid-cleavable groups |
| 04/21/2004 | EP1411375A1 Optical element having lanthanum fluoride film |
| 04/21/2004 | EP1411363A2 Prober |
| 04/21/2004 | EP1411153A1 METHOD FOR PREPARING GaN BASED COMPOUND SEMICONDUCTOR CRYSTAL |
| 04/21/2004 | EP1411146A2 Method of forming cobalt silicide film and method of manufacturing semiconductor device having cobalt silicide film |
| 04/21/2004 | EP1411081A1 Curable compounds containing reactive groups: triazine/isocyanurates, cyanate esters and blocked isocyanates |
| 04/21/2004 | EP1411031A1 Ceramic and method for preparation thereof, and dielectric capacitor, semiconductor and element |
| 04/21/2004 | EP1411028A1 Ceramics film and production method therefor, and ferroelectric capacitor, semiconductor device, other elements |
| 04/21/2004 | EP1411025A2 Metal wiring method for an undercut |
| 04/21/2004 | EP1411006A1 Cover body for sheet supporting container and sheet supporting container |
| 04/21/2004 | EP1410701A1 Method of manufacturing an integrated circuit carrier |
| 04/21/2004 | EP1410552A2 Hybrid circuit having nanotube electromechanical memory |
| 04/21/2004 | EP1410444A2 INSULTING GATE A1GaN/GaN HEMT |
| 04/21/2004 | EP1410442A1 Electronic component and method for producing an electronic component |
| 04/21/2004 | EP1410441A2 Method for producing a vertical transistor in a trench and a corresponding vertical transistor |
| 04/21/2004 | EP1410440A2 Layered dielectric nanoporous material and methods of producing same |
| 04/21/2004 | EP1410439A2 Semiconductive device and method of formation |
| 04/21/2004 | EP1410436A2 Parallel, individually addressable probes for nanolithography |
| 04/21/2004 | EP1410435A2 Lateral shift measurement using an optical technique |
| 04/21/2004 | EP1410434A1 Method and apparatus for removing a carrier part from a carrier with a single operation, and a product removed from a carrier |
| 04/21/2004 | EP1410433A2 Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices |
| 04/21/2004 | EP1410432A1 Al processing for impurity gettering in silicon |
| 04/21/2004 | EP1410431A1 Plasma curing of msq-based porous low-k film materials |
| 04/21/2004 | EP1410430A2 Planar metal electroprocessing |
| 04/21/2004 | EP1410429A2 Electromechanical memory array using nanotube ribbons and method for making same |
| 04/21/2004 | EP1410428A1 Method of forming strained silicon on insulator (ssoi) and structures formed thereby |
| 04/21/2004 | EP1410427A1 Epitaxial sio x? barrier/insulation layer---------------------- |
| 04/21/2004 | EP1410425A1 Topside active optical device apparatus and method |
| 04/21/2004 | EP1410424A1 Opto-electronic device integration |
| 04/21/2004 | EP1410423A2 Flash anneal |
| 04/21/2004 | EP1410418A2 Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing |
| 04/21/2004 | EP1410417A2 Shallow-angle interference process and apparatus for determining real-time etching rate |
| 04/21/2004 | EP1410416A2 Slit lens arrangement for particle beams |
| 04/21/2004 | EP1410398A2 Electromechanical memory having cell selection circuitry constructed with nanotube technology |
| 04/21/2004 | EP1410397A2 Nanotube films and articles |
| 04/21/2004 | EP1410395A2 Pair wise programming method for dual cell eeprom |
| 04/21/2004 | EP1410110A2 Real time analysis of periodic structures on semiconductors |
| 04/21/2004 | EP1410109A1 Photosensitive resin composition |
| 04/21/2004 | EP1410106A1 Method of preparing optically imaged high performance photomasks |
| 04/21/2004 | EP1410105A2 Alleviating line end shortening in transistor endcaps by extending phase shifters |
| 04/21/2004 | EP1410095A2 Optical element with full complex modulation |
| 04/21/2004 | EP1410053A2 Integrated testing of serializer/deserializer in fpga |
| 04/21/2004 | EP1410048A2 Test head docking system and method |
| 04/21/2004 | EP1409766A1 Systems and methods for delivering an ultrapure chemical |
| 04/21/2004 | EP1409765A1 Method for cvd of bpsg films |
| 04/21/2004 | EP1409764A1 Method and apparatus for bpsg deposition |
| 04/21/2004 | EP1409237A2 Dual-cell soft programming for virtual-ground memory arrays |
| 04/21/2004 | EP1409201A1 Fixed abrasive articles with wear indicators |
| 04/21/2004 | EP1409156A2 Methods of nanotube films and articles |
| 04/21/2004 | EP1255677B1 Method and apparatus of immobilizing solder spheres |
| 04/21/2004 | EP1250215B1 System and method for controlled polishing and planarization of semiconductor wafers |
| 04/21/2004 | EP1124882A4 PREPARATION OF CROSS-LINKED 2-DIMENSIONAL POLYMERS WITH SIDEDNESS FROM $g(a),$g(b)-LACTONES |
| 04/21/2004 | EP1076835B1 Broadband diffractive diffuser and associated methods |
| 04/21/2004 | EP1028904A4 Disk container |
| 04/21/2004 | EP0993627B1 Device for transferring structures |
| 04/21/2004 | EP0948816B1 Self-aligned non-volatile storage cell |
| 04/21/2004 | CN2613045Y SOI single crystal chip structure |
| 04/21/2004 | CN2613044Y SOI single crystal chip structure |
| 04/21/2004 | CN2613043Y Infrared detector aging device with automatic liquid nitrogen supply |
| 04/21/2004 | CN1491484A In service programmable logic arrays with ultra thin vertical body transistors |
| 04/21/2004 | CN1491483A Monotonic dynamic-static pseudo-NMOS logic circuit and method of forming logic gate array |
| 04/21/2004 | CN1491467A Processing memory link with set of at least two laser pulses |
| 04/21/2004 | CN1491448A Circuit board device and its manufacturing mehtod |
| 04/21/2004 | CN1491442A Contact portion of semiconductor device and thin film transistor array panel for display device including the contact portion |
| 04/21/2004 | CN1491441A Semiconductor device and its driving method |
| 04/21/2004 | CN1491439A Multi-chip circuit module and method for producing the same |
| 04/21/2004 | CN1491436A Chip transfer method and apparatus |
| 04/21/2004 | CN1491435A Method and apparatus for transferring heat from substrate to chuck |
| 04/21/2004 | CN1491434A Method and apparatus for controlling etch selectivity |
| 04/21/2004 | CN1491433A Lead-free solder structure and method for high fatigue life |
| 04/21/2004 | CN1491432A Bonded structure using reacted borosilicate mixture |
| 04/21/2004 | CN1491431A Substrate treating device and substrate treating method |
| 04/21/2004 | CN1491430A Plasma apparatus and production method thereof |
| 04/21/2004 | CN1491429A Work treating method and treating device |
| 04/21/2004 | CN1491428A Flash memory with ultra thin vertical body transistors |
| 04/21/2004 | CN1491426A Integrated system for processing semiconductor wafers |