Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2004
10/07/2004US20040195659 Hydrogenated oxidized silicon carbon material
10/07/2004US20040195658 Chamfered freestanding nitride semiconductor wafer and method of chamfering nitride semiconductor wafer
10/07/2004US20040195657 Semiconductor wafer
10/07/2004US20040195656 Forming structures that include a relaxed or pseudo-relaxed layer on a substrate
10/07/2004US20040195655 Bipolar transistor and method for fabricating the same
10/07/2004US20040195653 Capacitor structure and film forming method and apparatus
10/07/2004US20040195652 Semiconductor device having inductor
10/07/2004US20040195650 High-Q inductor device with a shielding pattern embedded in a substrate
10/07/2004US20040195648 Semiconductor device
10/07/2004US20040195647 Magnetic layer processing
10/07/2004US20040195646 Silicon-on-insulator chip with multiple crystal orientations
10/07/2004US20040195645 Bipolar junction transistor and fabricating method
10/07/2004US20040195637 Method of generating multiple oxides by plasma nitridation on oxide
10/07/2004US20040195636 Semiconductor device and manufacturing method thereof
10/07/2004US20040195635 Semiconductor device and method for manufacturing the same
10/07/2004US20040195634 Semiconductor device with constricted current passage
10/07/2004US20040195633 Gate edge diode leakage reduction
10/07/2004US20040195632 Semiconductor device and method of manufacturing the same
10/07/2004US20040195631 Gate edge diode leakage reduction
10/07/2004US20040195630 ESD protection device and method of making the same
10/07/2004US20040195628 Method of forming an N channel and P channel finfet device on the same semiconductor substrate
10/07/2004US20040195627 Strained channel FinFET
10/07/2004US20040195626 Semiconductor chip which combines bulk and SOI regions and separates same with plural isolation regions
10/07/2004US20040195625 Semiconductor apparatus
10/07/2004US20040195624 Strained silicon fin field effect transistor
10/07/2004US20040195623 Strained channel on insulator device
10/07/2004US20040195622 Semiconductor structure with silicon on insulator
10/07/2004US20040195621 On chip decap trench capacitor (dtc) for ultra high performance silicon on insulator (soi) systems microprocessors
10/07/2004US20040195620 Termination structure of DMOS device
10/07/2004US20040195617 Nonvolatile semiconductor memory device and nonvolatile semiconductor memory system
10/07/2004US20040195616 Floating gates having improved coupling ratios and fabrication method thereof
10/07/2004US20040195615 Bi-directional read/program non-volatile floating gate memory cell and array thereof, and method of formation
10/07/2004US20040195614 A non-volatile floating gate memory cell with floating gates formed in cavities, and array thereof, and method of formation
10/07/2004US20040195613 Semiconductor memory device capable of preventing oxidation of plug and method for fabricating the same
10/07/2004US20040195612 Method of creating deep trench capacitor using a p+ metal electrode
10/07/2004US20040195611 Semiconductor integrated circuit device and manufacturing method thereof
10/07/2004US20040195610 Fin semiconductor device and method for fabricating the same
10/07/2004US20040195609 Minimally spaced MRAM structures
10/07/2004US20040195608 Recess transistor (TR) gate to obtain large self-aligned contact (SAC) open margin and method of forming the same
10/07/2004US20040195607 Method of reducing erosion of a nitride gate cap layer during reactive ion etch of nitride liner layer for bit line contact of DRAM device
10/07/2004US20040195606 Semiconductor manufacturing process and apparatus for modifying in-film stress of thin films, and product formed thereby
10/07/2004US20040195605 Electronic device with electrode and its manufacture
10/07/2004US20040195604 Phase-change memory devices and methods for forming the same
10/07/2004US20040195603 Ferroelectric capacitor and semiconductor device having a ferroelectric capacitor
10/07/2004US20040195602 Magnetic random access memory device having high-heat disturbance resistance and high write efficiency
10/07/2004US20040195601 Semiconductor memory device having ferroelectric capacitor and method of manufacturing the same
10/07/2004US20040195597 Heterojunction bipolar transistor containing at least one silicon carbide layer
10/07/2004US20040195596 Method for fabricating contacts for integrated circuits, and semiconductor component having such contacts
10/07/2004US20040195595 Passivation planarization
10/07/2004US20040195592 Two-transistor pixel with buried reset channel and method of formation
10/07/2004US20040195590 Semiconductor device and manufacturing method thereof
10/07/2004US20040195589 Cmos-compatible read only memory and method for fabricating the same
10/07/2004US20040195588 Semiconductor device
10/07/2004US20040195587 Elimination of implant damage during manufacture of HBT
10/07/2004US20040195586 Semiconductor device and method of fabricating same
10/07/2004US20040195582 Semiconductor device with guard ring for preventing water from entering circuit region from outside
10/07/2004US20040195579 Nitride semiconductor element
10/07/2004US20040195574 Liquid crystal display of horizontal electric field applying type and fabricating method thereof
10/07/2004US20040195573 Liquid crystal display, thin film transistor array panel therefor, and manufacturing method thereof
10/07/2004US20040195572 Semiconductor device
10/07/2004US20040195571 Method of patterning transparent conductive film, thin film transistor substrate using the same and fabricating method thereof
10/07/2004US20040195570 Flat panel display with thin film transistor
10/07/2004US20040195569 Device manufacturing method and device, electro-optic device, and electronic equipment
10/07/2004US20040195568 Thin film transistor substrate and method for manufacturing the same
10/07/2004US20040195563 Electrical detection of selected species
10/07/2004US20040195562 Super lattice modification of overlying transistor
10/07/2004US20040195548 Forming an aqueous solution containing soluble precursors of a sulfur-containing phosphor; generating an aerosol of droplets from above solution, heating droplets to form a particulate intermediate compound capable of being post-treated to form said sulfur-containing phosphor powder
10/07/2004US20040195530 Apparatus for measuring gap between mask and substrate using laser displacement sensor, and method thereof
10/07/2004US20040195528 Ion beam incident angle detector for ion implant systems
10/07/2004US20040195527 Lithographic apparatus, device manufacturing method and device manufacturing thereby
10/07/2004US20040195526 Energy beam irradiating apparatus
10/07/2004US20040195524 Ion doping apparatus, and multi-apertured electrode for the same
10/07/2004US20040195516 Indium features on multi-contact chips
10/07/2004US20040195365 Edge remover having a gas sprayer to prevent a chemical solvent from splashing
10/07/2004US20040195295 Diebond strip
10/07/2004US20040195274 Dispenser
10/07/2004US20040195230 Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulator
10/07/2004US20040195229 Method for thermally treating substrates
10/07/2004US20040195223 Finishing machine using laser beam
10/07/2004US20040195222 Laser irradiation method, laser irradiation apparatus, and method for manufacturing semiconductor device
10/07/2004US20040195221 Method and apparatus for laser ablative modification of dielectric surfaces
10/07/2004US20040195216 Apparatus and method for plasma processing
10/07/2004US20040195209 Applying caustic solution then nitric acid; without damage to base metal from used turbine engine blade having a metal-based substrate and an aluminide coating
10/07/2004US20040195208 Method and apparatus for performing hydrogen optical emission endpoint detection for photoresist strip and residue removal
10/07/2004US20040195207 Substrate cleaning device and a method for manufacturing electronic devices
10/07/2004US20040195111 Performs uniform electrodeposition and electroetching
10/07/2004US20040195110 Method and apparatus for electrochemical planarization of a workpiece
10/07/2004US20040195106 Plating method and plating apparatus
10/07/2004US20040195094 used as a high dielectric gate insulation film, superior in embrittlement resistance, having a low generation of particles, and which is not likely to cause ignition of sintering powder or explosion of powder dust during the manufacturing process
10/07/2004US20040195088 Application of dense plasmas generated at atmospheric pressure for treating gas effluents
10/07/2004US20040194937 Heat exchanger
10/07/2004US20040194924 Heat sink
10/07/2004US20040194920 Apparatus for and method of heat-treating a wafer
10/07/2004US20040194888 Processing apparatus and method
10/07/2004US20040194887 Process for producing semiconductor device
10/07/2004US20040194886 Microelectronic device manufacturing in coordinated carbon dioxide processing chambers
10/07/2004US20040194885 Degas chamber particle shield
10/07/2004US20040194884 High-pressure process
10/07/2004US20040194883 Delivery of dissolved ozone
10/07/2004US20040194856 Powder containing soft and hard ferromagnetic crystalline phases; heat treatment, rapid cooling; uniformity, performance