H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2004
12/14/2004	US6830838 High step coverage metal layers; reduced device contact resistance
12/14/2004	US6830823 Gold powders, methods for producing powders and devices fabricated from same
12/14/2004	US6830820 Chemical vapor deposition of titanium
12/14/2004	US6830786 Silicon oxide film, method of forming the silicon oxide film, and apparatus for depositing the silicon oxide film
12/14/2004	US6830780 Depositing layer of chromium onto diamond component; depositing metal selected from tungsten, molybdenum, tantalum, niobium, or their alloy with chromium; depositing layer of silver or gold or copper; heating
12/14/2004	US6830779 Coating method for coating liquid
12/14/2004	US6830778 Direct printing of thin-film conductors using metal-chelate inks
12/14/2004	US6830774 Coating method
12/14/2004	US6830679 Filtration device
12/14/2004	US6830667 Cathode cartridge and anode cartridge of testing device for electroplating
12/14/2004	US6830653 Generating plasma in vacuum; controlling distribution
12/14/2004	US6830651 Load port capable of coping with different types of cassette containing substrates to be processed
12/14/2004	US6830650 Wafer probe for measuring plasma and surface characteristics in plasma processing environments
12/14/2004	US6830649 Apparatus and method for producing semiconductors
12/14/2004	US6830631 Removing water, desorption by feeding second polar gas molecules, inert gas, nitrogen, or ammonia; processing semiconductor and microelectronics
12/14/2004	US6830628 Methods for cleaning semiconductor surfaces
12/14/2004	US6830625 System for fabricating a bipolar transistor
12/14/2004	US6830623 Method of liquid deposition by selection of liquid viscosity and other precursor properties
12/14/2004	US6830622 Corrosion resistant component of semiconductor processing equipment such as a plasma chamber
12/14/2004	US6830619 Method and apparatus for controlling a temperature of a microelectronic substrate
12/14/2004	US6830617 Method for manufacturing semiconductor device
12/14/2004	US6830616 Manufacturing method of semiconductor and manufacturing method of semiconductor device
12/14/2004	US6830505 Polishing machine
12/14/2004	US6830504 Barrier-slurry-free copper CMP process
12/14/2004	US6830503 Chemical-mechanical polishing with abrasive and/or polishing pad, liquid carrier, peroxy-type oxidizer, and metal compound
12/14/2004	US6830500 Copper is oxidized at same or higher speed than tungsten barrier; chemical mechanical polishing
12/14/2004	US6830494 Electro-optical device and manufacturing method thereof
12/14/2004	US6830463 Ball grid array connection device
12/14/2004	US6830449 Injector robot for replacing a gas injector in a furnace
12/14/2004	US6830189 Method of and system for producing digital images of objects with subtantially reduced speckle-noise patterns by illuminating said objects with spatially and/or temporally coherent-reduced planar laser illumination
12/14/2004	US6830057 Wafer container cleaning system
12/14/2004	US6830007 Apparatus and method for forming low dielectric constant film
12/14/2004	US6829824 Method for producing a structural member from plates stacked on top of each other and soldered together
12/14/2004	US6829823 Forming plated through hole; surface roughness facilitates deposition of conductive metal; shrinkage inhibition
12/14/2004	US6829814 Process of making an all-silicon microphone
12/09/2004	WO2004107516A1 Nitride semiconductor light-emitting device
12/09/2004	WO2004107515A1 Method of assembling light-emitting apparatus
12/09/2004	WO2004107453A1 Method for annealing silicon thin films and polycrystalline silicon thin films prepared therefrom
12/09/2004	WO2004107452A1 Semiconductor device and method for manufacturing same
12/09/2004	WO2004107451A1 Semiconductor device fitted with mis type field-effect transistor, process for producing the same and method of forming metal oxide film
12/09/2004	WO2004107450A1 Semiconductor and its manufacturing method
12/09/2004	WO2004107448A1 Semiconductor device having an edge termination structure and method of manufacture thereof
12/09/2004	WO2004107447A1 Solid-state image sensing apparatus and method of manufacturing the same
12/09/2004	WO2004107446A1 Semiconductor device and process for producing the same
12/09/2004	WO2004107445A1 Method for fabricating a self-aligned bipolar transistor with planarizing layer and related structure
12/09/2004	WO2004107444A1 Semiconductor device
12/09/2004	WO2004107435A1 Nrom semiconductor memory device and production method
12/09/2004	WO2004107434A1 Wiring structure and method for producing same
12/09/2004	WO2004107433A1 Apparatus and method for photo-thermal dopant activation in semiconductors
12/09/2004	WO2004107431A1 Method for modifying insulating film
12/09/2004	WO2004107430A1 Plasma processing apparatus and plasma processing method
12/09/2004	WO2004107429A1 Abrasive and method of polishing
12/09/2004	WO2004107428A1 Production method for semiconductor wafer
12/09/2004	WO2004107427A1 Substrate cleaning apparatus and method
12/09/2004	WO2004107426A1 Substrate processing apparatus having magnet and processing method
12/09/2004	WO2004107424A1 Method of processing silicon wafer
12/09/2004	WO2004107423A1 Method of producing film-thinning circuit board having penetrated structure and protecting adhesive tape
12/09/2004	WO2004107422A2 Plating apparatus and plating method
12/09/2004	WO2004107421A1 Formation of junctions and silicides with reduced thermal budget
12/09/2004	WO2004107420A1 Method and apparatus for plasma nitridation of gate dielectrics using amplitude modulated radio-frequency energy
12/09/2004	WO2004107419A1 Method for production of group iii nitride semiconductor device
12/09/2004	WO2004107418A1 Method for removing photoresist in semiconductor manufacturing process
12/09/2004	WO2004107413A2 Plasma ashing apparatus and endpoint detection process
12/09/2004	WO2004107412A2 Wafer treatment system having load lock and buffer
12/09/2004	WO2004107410A2 Self-aligned bipolar transistor having recessed spacers and method for fabricating same
12/09/2004	WO2004107409A2 Method for fabricating a self-aligned bipolar transistor having increased manufacturabily and related structure
12/09/2004	WO2004107406A2 Semiconductor electronic devices and methods
12/09/2004	WO2004107399A2 Transistor with independant gate structures
12/09/2004	WO2004107398A2 Semiconductor device with an air gap formed using a photosensitive material
12/09/2004	WO2004107394A2 Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method
12/09/2004	WO2004107393A2 Inducing semiconductor crystallization using a capillary structure
12/09/2004	WO2004107387A2 Apparatus and methods for compensating plasma sheath non-uniformities at the substrate in a plasma processing system
12/09/2004	WO2004107383A1 Misfet
12/09/2004	WO2004107378A2 Tuned bandwidth photocathode for transmission electron affinity devices
12/09/2004	WO2004107352A2 Use of voids between elements in semiconductor structures for isolation
12/09/2004	WO2004107351A1 Memory with charge storage locations
12/09/2004	WO2004107056A1 Compositions suitable for removing photoresist, photoresist byproducts and etching residue, and use thereof
12/09/2004	WO2004107047A1 Local flare correction
12/09/2004	WO2004106986A2 Maskless fabrication of waveguide mirrors
12/09/2004	WO2004106949A1 Board for probe card, inspection apparatus, photo-fabrication apparatus and photo-fabrication method
12/09/2004	WO2004106596A1 Single crystal of silicon carbide, and method and apparatus for producing the same
12/09/2004	WO2004106584A1 Method and apparatus for generating a precursor for a semiconductor processing system
12/09/2004	WO2004106582A2 Physical vapor deposition of titanium-based films
12/09/2004	WO2004106580A1 Mask retaining device
12/09/2004	WO2004106454A2 Foamable underfill encapsulant
12/09/2004	WO2004106223A1 Carbon nanotube device, process for producing the same and carbon nanotube transcriptional body
12/09/2004	WO2004106010A1 Vacuum clamping detection method and vacuum clamping detector
12/09/2004	WO2004105995A1 Focusing an optical beam to two foci
12/09/2004	WO2004105968A2 Systems and methods for ultrasonic cleaning using phased transducer arrays
12/09/2004	WO2004087569A3 Thermal process for reducing the concentration of dinitrogen difluoride and dinitrogen tetrafluoride in nitrogen trifluoride
12/09/2004	WO2004084275A3 Method for making group iii nitride devices and devices produced thereby
12/09/2004	WO2004076166A3 Hydrogen diffusion barrier for a ferroelectric capacitor
12/09/2004	WO2004075252A3 Surface modification of silicon nitride for thick film silver metallization of solar cell
12/09/2004	WO2004074359A3 Flame retardant molding compositions containing group iva metal oxides
12/09/2004	WO2004072323A3 High reflectivity atmospheric pressure furnace for preventing contamination of a work piece
12/09/2004	WO2004066359A3 Apparatus and method for treating surfaces of semiconductor wafers using ozone
12/09/2004	WO2004059808A3 Methods of forming semiconductor devices including mesa structures and multiple passivation layers and related devices
12/09/2004	WO2004056678A3 Gripper and method for operating the same
12/09/2004	WO2004047149A3 Spatially-arranged chemical processing station
12/09/2004	WO2004046410A3 Method of electroless deposition of thin metal and dielectric films with temperature controlled on stages of film growth

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