| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 12/23/2004 | US20040256353 Method and system for deep trench silicon etch |
| 12/23/2004 | US20040256352 Embossed mask lithography |
| 12/23/2004 | US20040256351 Integration of ALD/CVD barriers with porous low k materials |
| 12/23/2004 | US20040256285 Reduced movement wafer box |
| 12/23/2004 | US20040256284 Cassette for storing a plurality of semiconductor wafers |
| 12/23/2004 | US20040256271 Container for the storage and transport of sensitive plate-like objects |
| 12/23/2004 | US20040256245 Moveable nozzle moves from a first to apply a stream of electrolyte to a first portion of the metal layer to a second position to apply the stream of electrolyte to a second portion when the wafer is rotated by the wafer chuck; shorter polishing time and uses less quantity of slurry |
| 12/23/2004 | US20040256244 Selective electrochemical etching method for two-dimensional dopant profiling |
| 12/23/2004 | US20040256238 Capable of increasing the in-plane uniformity of film thickness by making a more uniform electric field distribution over the entire surface to be processed, even if the substrate has a large area, and more uniformly controlling the speed |
| 12/23/2004 | US20040256237 Ion exchanger between a pair of electrodes and a section for supplying a liquid to the ion exchanger; can flatten or clean a workpiece, especially a semiconductor wafer, while eliminating or reducing a load upon a CMP treatment |
| 12/23/2004 | US20040256224 First electrode wafer of an interlayer dielectric having a feature, an underlayer on the layer, a barrier layer on the underlayer and a conductive layer in the feature and a second electrode; both electrodes immersed in an electrolyte and have a potential difference between them |
| 12/23/2004 | US20040256217 Coils for generating a plasma and for sputtering |
| 12/23/2004 | US20040256094 Baking system having a heat pipe |
| 12/23/2004 | US20040256047 Method for correcting surface shape |
| 12/23/2004 | US20040255985 Versatile system for wafer edge remediation |
| 12/23/2004 | US20040255984 Liquid-assisted cryogenic cleaning |
| 12/23/2004 | US20040255979 Load lock system for supercritical fluid cleaning |
| 12/23/2004 | US20040255978 Automated dense phase fluid cleaning system |
| 12/23/2004 | US20040255973 Method for cleaning semiconductor wafers |
| 12/23/2004 | US20040255868 Plasma etch resistant coating and process |
| 12/23/2004 | US20040255864 ICP antenna and plasma generating apparatus using the same |
| 12/23/2004 | US20040255863 Plasma process apparatus |
| 12/23/2004 | US20040255862 Reactor for producing reactive intermediates for low dielectric constant polymer thin films |
| 12/23/2004 | US20040255861 Chamber for uniform substrate heating |
| 12/23/2004 | US20040255860 Rapid thermal processing apparatus and methods |
| 12/23/2004 | US20040255858 Gas valve assembly and apparatus using the same |
| 12/23/2004 | US20040255856 Method and device for depositing a plurality of layers on a substrate |
| 12/23/2004 | US20040255854 Cvd apparatus and method of cleaning the cvd apparatus |
| 12/23/2004 | US20040255848 Coating apparatus, thin film forming method, thin film forming apparatus, and semiconductor device manufacturing method, electro-optic device and electronic instrument |
| 12/23/2004 | US20040255846 Method for fabricating a carrier substrate |
| 12/23/2004 | US20040255650 Capillary rise technique for the assessment of the wettability of particulate surfaces |
| 12/23/2004 | US20040255521 Polishing pad of CMP equipment for polishing a semiconductor wafer |
| 12/23/2004 | US20040255485 Vacuum processing apparatus and substrate transfer method |
| 12/23/2004 | US20040255458 Programmed material consolidation methods for fabricating semiconductor device components and conductive features thereof |
| 12/23/2004 | US20040255456 Method for manufacturing a chip carrier |
| 12/23/2004 | US20040255451 Broken die detect sensor |
| 12/23/2004 | US20040255442 Methods and apparatus for processing workpieces |
| 12/23/2004 | DE10359276A1 Halbleitervorrichtung mit Kondensator und Herstellungsverfahren für diese A semiconductor device having capacitor and production method for this |
| 12/23/2004 | DE10324100A1 Production process for a robust semiconductor element forms p and n regions and diffuses heavy metal atoms into an edge region |
| 12/23/2004 | DE10324081A1 DRAM memory storing charge at high density, has insulated nanotubes contacting electrode layer, with intervening filler in capacitor-forming configuration |
| 12/23/2004 | DE10323394A1 Connecting semiconductor chip or wafer sections, provides contact pin in recess between opposite faces which are pressed together to make local contact |
| 12/23/2004 | DE10323139A1 Verfahren und Vorrichtung zum Hochauflösenden Fehlerfinden und Klassifizieren Method and apparatus for high-resolution fault finding and classifying |
| 12/23/2004 | DE102004024612A1 Spannungserzeugungsschaltung Voltage generating circuit |
| 12/23/2004 | DE102004022376A1 Halbleitervorrichtung, Verfahren zum Herstellen einer Halbleitervorrichtung und Verfahren zum Auswerten des Herstellungsprozesses für eine Halbleitervorrichtung A semiconductor device, method for manufacturing a semiconductor device and method for evaluating the manufacturing process for a semiconductor device |
| 12/23/2004 | DE102004021157A1 Thin film transistor array substrate for liquid crystal display device, comprises thin film transistor including gate insulating layer and ohmic contact layer, where gate insulating layer includes gate insulating pattern |
| 12/23/2004 | DE102004017412A1 Elektrische Quantifizierung einer Verkürzung eines Leitbahnendes Electrical quantification of shortening a Leitbahnendes |
| 12/23/2004 | DE102004002901A1 Verfahren zur Fehleranalyse einer Halbleiterbaugruppe Method for fault analysis of a semiconductor package |
| 12/23/2004 | CA2513516A1 Field effect transistor |
| 12/23/2004 | CA2509257A1 Sacrificial template method of fabricating a nanotube |
| 12/22/2004 | EP1489839A2 Semiconductor integrated circuit apparatus |
| 12/22/2004 | EP1489666A1 Compound thin-film solar cell and process for producing the same |
| 12/22/2004 | EP1489663A2 Semiconductor device allowing modulation of a gain coefficient and a logic circuit provided with the same |
| 12/22/2004 | EP1489662A2 Bipolar junction transistor and method of manufacturing the same |
| 12/22/2004 | EP1489661A2 Bipolar junction transistor and methods of manufacturing the same |
| 12/22/2004 | EP1489660A1 Magnetic memory device and manufacturing method thereof |
| 12/22/2004 | EP1489658A2 Method for manufacturing semiconductor package |
| 12/22/2004 | EP1489657A1 Semiconductor chip mounting board, its manufacturing method, and semiconductor module |
| 12/22/2004 | EP1489656A2 Method of fabrication of an unbreakable disc-shaped object and corresponding semiconductor circuit |
| 12/22/2004 | EP1489655A1 Pick and place assembly for transporting a film |
| 12/22/2004 | EP1489654A1 LnCuO(S, Se, Te) MONOCRYSTALLINE THIN FILM, ITS MANUFACTURING METHOD, AND OPTICAL DEVICE OR ELECTRONIC DEVICE USING THE MONOCRYSTALLINE THIN FILM |
| 12/22/2004 | EP1489653A2 Method for fabricating a metallic oxide of high dielectric constant, metallic oxide of high dielectric constant, gate insulating film and semiconductor element |
| 12/22/2004 | EP1489652A2 Method of modifying a surface of a semiconductor wafer |
| 12/22/2004 | EP1489650A1 Polishing composition and method for forming wiring structure |
| 12/22/2004 | EP1489649A1 Double side polishing device for wafer and double side polishing method |
| 12/22/2004 | EP1489648A1 Process for selective formation of silicide on a semiconductor wafer |
| 12/22/2004 | EP1489647A2 Method of manufacturing a silicide |
| 12/22/2004 | EP1489646A1 Cvd apparatus and method of cleaning the cvd apparatus |
| 12/22/2004 | EP1489645A1 Cvd apparatus and method of cleaning the cvd apparatus |
| 12/22/2004 | EP1489643A2 Method and apparatus for ionized physical vapor deposition |
| 12/22/2004 | EP1489632A2 Adjustable resistor |
| 12/22/2004 | EP1489464A2 Method for reducing pattern dimension in a photoresist layer |
| 12/22/2004 | EP1489463A2 Method for reducing pattern dimension in a photoresist layer |
| 12/22/2004 | EP1489462A2 Immersion photolithography system comprising microchannel nozzles |
| 12/22/2004 | EP1489459A1 Positive resist composition and method of forming pattern using the same |
| 12/22/2004 | EP1489449A1 Spatial light modulator |
| 12/22/2004 | EP1489428A2 Flexible membrane probe and method of use thereof |
| 12/22/2004 | EP1489204A1 Electrochemical machine and electrochemical machining method |
| 12/22/2004 | EP1489203A1 ELECTROLYTIC COPPER PLATING METHOD, PHOSPHORUS−CONTAINING ANODE FOR ELECTROLYTIC COPPER PLATING, AND SEMICONDUCTOR WAFER PLATED USING THEM AND HAVING FEW PARTICLES ADHERING TO IT |
| 12/22/2004 | EP1489197A1 Method of manufacturing semiconductor device |
| 12/22/2004 | EP1488670A1 Method and apparatus for encapsulating semiconductor device |
| 12/22/2004 | EP1488524A2 Floating-gate analog circuit |
| 12/22/2004 | EP1488483A1 Tunable cavity resonator and method of fabricating same |
| 12/22/2004 | EP1488465A1 Semi-conductor structure comprising a switch element and an edge element |
| 12/22/2004 | EP1488464A1 Method for producing an soi field effect transistor and corresponding field effect transistor |
| 12/22/2004 | EP1488463A1 Biased, triple-well fully depleted soi structure, and various methods of making and operating same |
| 12/22/2004 | EP1488462A2 Strained fin fets structure and method |
| 12/22/2004 | EP1488461A1 Semiconductor device having a retrograde dopant profile in a channel region and method for fabricating the same |
| 12/22/2004 | EP1488460A1 Doped group iii-v nitride materials, and microelectronic devices and device precursor structures comprising same |
| 12/22/2004 | EP1488456A1 Active matrix display devices, and their manufacture |
| 12/22/2004 | EP1488454A2 Pixel current driver for organic light emitting diode displays |
| 12/22/2004 | EP1488453A1 Ion implantation of silicon oxide liner to prevent dopant out-diffusion from source/drain extensions |
| 12/22/2004 | EP1488452A2 A method for making nanoscale wires and gaps for switches and transistors |
| 12/22/2004 | EP1488451A1 Methods for manufacturing compound semiconductor and compound insulator using chemical reaction and diffusion by heating, compound semiconductor and compound insulator manufactured using the method, and photocell, electronic circuit, transistor, and memory using the same |
| 12/22/2004 | EP1488450A2 Methods of treating a silicon carbide substrate for improved epitaxial deposition and resulting structures and devices |
| 12/22/2004 | EP1488449A2 Component mounting method, component mounting apparatus, and ultrasonic bonding head |
| 12/22/2004 | EP1488448A2 Field-assisted fusion bonding |
| 12/22/2004 | EP1488443A1 Device for confinement of a plasma within a volume |
| 12/22/2004 | EP1488427A1 A volumetric data storage apparatus comprising a plurality of stacked matrix-addressable memory devices |
| 12/22/2004 | EP1488426A1 Method for producing a reference layer and an mram memory cell provided with said type of reference layer |
| 12/22/2004 | EP1488286A1 Ph buffered compositions for cleaning semiconductor substrates |