H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2006
11/09/2006	WO2005114741A3 Semiconductor device having a spacer layer doped with slower diffusing atoms than substrate
11/09/2006	WO2005104213B1 COSMETIC FORMULATIONS COMPRISING ZnO NANOPARTICLES
11/09/2006	WO2005098930A3 Process for producing semi-conductor coated substrate
11/09/2006	WO2005098083A3 Miniature microwave plasma torch application and method of use thereof
11/09/2006	WO2005048302A3 Method for integrating pre-fabricated chip structures into functional electronic systems
11/09/2006	WO2005043587A3 Design methodology for multiple channel heterostructures in polar materials
11/09/2006	WO2005036593A3 Deposition of silicon-containing films from hexachlorodisilane
11/09/2006	US20060253823 Semiconductor integrated circuit and method for designing same
11/09/2006	US20060253822 Semiconductor integrated circuit and method for designing same
11/09/2006	US20060253225 Operational control device, operational control method, program and storage medium thereof, for a plurality of power consumption systems
11/09/2006	US20060252970 Reacting gas mixture containing pentafluoroethane and a compound having chlorine atom with hydrogen fluoride in the gaseous phase in the presence of a fluorination catalyst, reacting product with a fluorine gas
11/09/2006	US20060252904 2,6-di-tert-butyl-4-methyl phenol a free radical scavenger
11/09/2006	US20060252283 Substrate processing apparatus and sustrate processing method
11/09/2006	US20060252282 Laser thermal annealing of lightly doped silicon substrates
11/09/2006	US20060252281 Semiconductor device and gate structure having a composite dielectric layer and methods of manufacturing the same
11/09/2006	US20060252280 Semiconductor device, manufacture and evaluation methods for semiconductor device, and process condition evaluation method
11/09/2006	US20060252279 Systems and methods for forming metal oxides using metal diketonates and/or ketoimines
11/09/2006	US20060252278 Method for depositing porous films
11/09/2006	US20060252277 Methods of forming patterned photoresist layers over semiconductor substrates
11/09/2006	US20060252276 Method of fabricating memory device utilizing carbon nanotubes
11/09/2006	US20060252275 Gas delivery device method for improved deposition of dielectric material
11/09/2006	US20060252274 Semiconductor Device with Spacer Having Batch and Non-Batch Layers
11/09/2006	US20060252273 Strengthening the interface between dielectric layers and barrier layers with an oxide layer of varying composition profile
11/09/2006	US20060252272 Method of processing silicon wafer
11/09/2006	US20060252271 Atomic layer deposition using photo-enhanced bond reconfiguration
11/09/2006	US20060252270 LIthographic apparatus and device manufacturing method utilizing a flat panel display handler
11/09/2006	US20060252269 Silicon nitride etching methods
11/09/2006	US20060252268 Useful in chemical-mechanical polishing or chemical mechanical procedures; oxidizes copper and a material of the barrier layer at substantially the same rates
11/09/2006	US20060252267 Topology-selective oxide CMP
11/09/2006	US20060252266 Cmp process of high selectivity
11/09/2006	US20060252265 Etching high-kappa dielectric materials with good high-kappa foot control and silicon recess control
11/09/2006	US20060252264 Semiconductor device and manufacturing method thereof
11/09/2006	US20060252263 Aligned dummy metal fill and hole shapes
11/09/2006	US20060252262 Semiconductor structures having via structures between planar frontside and backside surfaces and methods of fabricating the same
11/09/2006	US20060252261 Laser irradiation apparatus and method for manufacturing semiconductor device
11/09/2006	US20060252260 Manufacturing method of semiconductor device
11/09/2006	US20060252259 Ion implantation of spin on glass materials
11/09/2006	US20060252258 Low temperature method for minimizing copper hillock defects
11/09/2006	US20060252257 Method of forming isolation structure of semiconductor device
11/09/2006	US20060252256 Method for removing post-etch residue from wafer surface
11/09/2006	US20060252255 Focused ion beam deposition
11/09/2006	US20060252254 Filling deep and wide openings with defect-free conductor
11/09/2006	US20060252253 Internal connection system for power semiconductors comprising large-area terminals
11/09/2006	US20060252252 Electroless deposition processes and compositions for forming interconnects
11/09/2006	US20060252251 Method of growing carbon nanotubes and method of manufacturing field emission device having the same
11/09/2006	US20060252250 Method of fabricating a dual-damascene copper structure
11/09/2006	US20060252249 Solder ball pad surface finish structure of circuit board and fabrication method thereof
11/09/2006	US20060252248 Method for fabricating electrically connecting structure of circuit board
11/09/2006	US20060252247 Processing apparatus for electroplating conductive bumps on organic circuit board
11/09/2006	US20060252246 Image sensor module and method thereof
11/09/2006	US20060252245 Fabrication method of under bump metallurgy structure
11/09/2006	US20060252244 Systems and methods for forming metal oxide layers
11/09/2006	US20060252243 Epitaxial film deposition system and epitaxial film formation method
11/09/2006	US20060252242 Reactive codoping of gaalinp compound semiconductors
11/09/2006	US20060252241 Nitride-encapsulated FET (NNCFET)
11/09/2006	US20060252240 Process for forming a dielectric on a copper-containing metallization and capacitor arrangement
11/09/2006	US20060252239 Implantation process in semiconductor fabrication
11/09/2006	US20060252238 Transistor with shallow germanium implantation region in channel
11/09/2006	US20060252237 Digital light valve
11/09/2006	US20060252236 Method for manufacturing a semiconductor device
11/09/2006	US20060252235 Fabrication method for crystalline semiconductor films on foreign substrates
11/09/2006	US20060252234 Hardenable pressure sensitive adhesive sheet for dicing/die-bonding and method for manufacturing semiconductor device
11/09/2006	US20060252233 Semiconductor device and its manufacturing method
11/09/2006	US20060252232 Circuit device and method of manufacturing thereof
11/09/2006	US20060252231 High Temperature and Chemical Resistant Process for Wafer Thinning and Backside Processing
11/09/2006	US20060252230 Method of fabricating wafer level package
11/09/2006	US20060252229 Integrated circuit on high performance chip
11/09/2006	US20060252228 Shallow trench isolation structure having reduced dislocation density
11/09/2006	US20060252227 SRAM cell having stepped boundary regions and methods of fabrication
11/09/2006	US20060252226 Integrated SOI fingered decoupling capacitor
11/09/2006	US20060252225 Method to create a metal pattern using a damascene-like process and associated structures
11/09/2006	US20060252224 Methods of forming pluralities of capacitors, and integrated circuitry
11/09/2006	US20060252223 Method for forming ferroelectric capacitor, ferroelectric capacitor and electronic device
11/09/2006	US20060252222 Method for fabricating a semiconductor component and semiconductor component
11/09/2006	US20060252221 Methods of forming hafnium-containing materials
11/09/2006	US20060252220 Method for controlling the top width of a trench
11/09/2006	US20060252219 Method of manufacturing a superjunction device
11/09/2006	US20060252218 Method for fabricating a MIM capacitor high-K dielectric for increased capacitance density and related structure
11/09/2006	US20060252217 Non-uniform ion implantation apparatus and method thereof
11/09/2006	US20060252216 Methods to improve the sige heterojunction bipolar device performance
11/09/2006	US20060252215 Multiple doping level bipolar junctions transistors and method for forming
11/09/2006	US20060252214 Bipolar transistor and fabricating method thereof
11/09/2006	US20060252213 Silicide process utilizing pre-amorphization implant and second spacer
11/09/2006	US20060252212 Method and device
11/09/2006	US20060252211 ATOMIC LAYER DEPOSITED NANOLAMINATES OF HfO2/ZrO2 FILMS AS GATE DIELECTRICS
11/09/2006	US20060252210 Method for fabricating semiconductor device and wire with silicide
11/09/2006	US20060252209 Semiconductor memory integrated circuit and its manufacturing method
11/09/2006	US20060252208 Flash memory with metal-insulator-metal tunneling program and erase
11/09/2006	US20060252207 Methods of forming programmable memory devices
11/09/2006	US20060252206 Single transistor vertical memory gain cell
11/09/2006	US20060252205 Nonvolatile Semiconductor Storage Device and Its Manufacturing Method
11/09/2006	US20060252204 Method of manufacturing a flash memory device
11/09/2006	US20060252203 Method of fabricating semiconductor device
11/09/2006	US20060252202 Process and apparatus for fabricating nano-floating gate memories and memory made thereby
11/09/2006	US20060252201 Capacitor constructions
11/09/2006	US20060252200 Semiconductor device and method of manufacturing thereof
11/09/2006	US20060252199 Gate of a Semiconductor Device and Method for Forming the Same
11/09/2006	US20060252198 Method of plasma etching a substrate
11/09/2006	US20060252197 Method for monitoring lateral encroachment of spacer process on a CD SEM
11/09/2006	US20060252196 Semiconductor device and method for producing same

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