Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2006
11/21/2006US7138304 Method for forming thin film pattern, device and production method therefor, electro-optical apparatus and electronic apparatus, and production method for active matrix substrate
11/21/2006US7138303 Method for manufacturing a thin film transistor having high mobility and high on-current
11/21/2006US7138302 Method of fabricating an integrated circuit channel region
11/21/2006US7138301 Diode housing
11/21/2006US7138300 Structural design for flip-chip assembly
11/21/2006US7138299 Method of electrically connecting a microelectronic component
11/21/2006US7138298 Semiconductor chip with external connecting terminal
11/21/2006US7138297 Method of dividing a semiconductor wafer utilizing a laser dicing technique
11/21/2006US7138296 Board for manufacturing a BGA and method of manufacturing semiconductor device using thereof
11/21/2006US7138295 Method of information processing using three dimensional integrated circuits
11/21/2006US7138294 Circuit substrate device, method for producing the same, semiconductor device and method for producing the same
11/21/2006US7138293 Wafer level packaging technique for microdevices
11/21/2006US7138292 Apparatus and method of manufacture for integrated circuit and CMOS device including epitaxially grown dielectric on silicon carbide
11/21/2006US7138291 Methods of treating a silicon carbide substrate for improved epitaxial deposition and resulting structures and devices
11/21/2006US7138290 Methods of depositing silver onto a metal selenide-comprising surface and methods of depositing silver onto a selenium-comprising surface
11/21/2006US7138289 Technique for fabricating multilayer color sensing photodetectors
11/21/2006US7138288 Method for manufacturing small crystal resonator
11/21/2006US7138287 Reduced barrier photodiode/gate device structure for high efficiency charge transfer and reduced lag and method of formation
11/21/2006US7138286 Light-emitting semiconductor device using group III nitrogen compound
11/21/2006US7138285 Control of contact resistance in quantum well intermixed devices
11/21/2006US7138284 Method and apparatus for performing whole wafer burn-in
11/21/2006US7138283 Method for analyzing fail bit maps of wafers
11/21/2006US7138282 Correcting device, exposure apparatus, device production method, and device produced by the device production method
11/21/2006US7138281 Fabrication method of multisensors chips for detecting analytes
11/21/2006US7138220 Method for producing liquid crystal display apparatus
11/21/2006US7138218 Process for forming an ultra fine pattern using a bottom anti-reflective coating film containing an acid generator
11/21/2006US7138212 Method and apparatus for performing model-based layout conversion for use with dipole illumination
11/21/2006US7138192 Film of yttria-alumina complex oxide, a method of producing the same, a sprayed film, a corrosion resistant member, and a member effective for reducing particle generation
11/21/2006US7138158 Forming a dielectric layer using a hydrocarbon-containing precursor
11/21/2006US7138073 Slurry for chemical mechanical polishing for copper and method of manufacturing semiconductor device using the slurry
11/21/2006US7138072 making lubricating polishing solution by mixing nonabrasive solutions containing water and ammonia, with homopolymers and copolymers of acrylic acid crosslinked with polyoxyalkylene glycols
11/21/2006US7138068 forming multilayers of dielectric ceramic, electroconductive metals and circuit substrates, then perforating the ceramic, removing the ceramic and metal layer in the perforated region by etching, breaking and washing away the ceramic layer, to form capacitors integrated with multilayer circuit boards
11/21/2006US7138067 Methods and apparatus for tuning a set of plasma processing steps
11/21/2006US7138064 Semiconductor device and method of manufacturing the same
11/21/2006US7138040 Suppressing the generation of copper or copper oxide particles on anode, use a formed black film composed of copper phosphide and copper chloride formed on the anode surface due to electrolysis
11/21/2006US7138034 Electrode member used in a plasma treating apparatus
11/21/2006US7138030 In-line system and method for manufacturing liquid crystal display
11/21/2006US7138016 Semiconductor processing apparatus
11/21/2006US7138014 Electroless deposition apparatus
11/21/2006US7138013 Ceramic film and method of manufacturing the same, semiconductor device, and piezoelectric device
11/21/2006US7137874 Semiconductor wafer, polishing apparatus and method
11/21/2006US7137873 Grinding method for workpiece, jet guide means and jet regulation means used for the method
11/21/2006US7137868 Pad assembly for electrochemical mechanical processing
11/21/2006US7137865 Method and device for cutting single crystals, in addition to an adjusting device and a test method for determining a crystal orientation
11/21/2006US7137803 Fluid pressure imprint lithography
11/21/2006US7137557 Semiconductor device and an information management system therefore
11/21/2006US7137547 Process for forming electrical/mechanical connections
11/21/2006US7137546 Silicon tube formed of bonded staves
11/21/2006US7137427 Apparatus and method for fabricating bonded substrate
11/21/2006US7137353 Method and apparatus for an improved deposition shield in a plasma processing system
11/21/2006US7137352 Plasma processing system in which wafer is retained by electrostatic chuck
11/21/2006US7137336 Stamp having an antisticking layer and a method of forming of repairing such a stamp
11/21/2006US7137309 High precision gas bearing split-axis stage for transport and constraint of large flat flexible media during processing
11/21/2006US7137195 Method for mounting electronic parts onto a board
11/21/2006US7137193 Programmed material consolidation methods for fabricating printed circuit board
11/21/2006CA2261864C Integrated circuit device manufacture
11/17/2006CA2528751A1 Light-emitting device, method for making the same, and nitride semiconductor substrate
11/16/2006WO2006122317A2 Nanofabrication processes and devices for the controlled assembly of functionalized nanostructures
11/16/2006WO2006122252A2 Silicon carbide junction barrier schottky diodes with suppressed minority carrier injection
11/16/2006WO2006122184A2 Ethernet-powered particle counting system
11/16/2006WO2006122130A2 Power mosfet device structure for high frequency applications
11/16/2006WO2006122119A2 Method for resist strip in presence of regular low k and/or porous low k dielectric materials
11/16/2006WO2006122025A1 Process for minimizing electromigration in an electronic device
11/16/2006WO2006121824A1 Reticle alignment and overlay for multiple reticle process
11/16/2006WO2006121772A2 Ink jet application of carbon nanotubes
11/16/2006WO2006121744A1 Plasma generation and control using dual frequency rf signals
11/16/2006WO2006121716A1 Filling deep and wide openings with defect-free conductor
11/16/2006WO2006121600A2 Process and composition for conductive material removal by electrochemical mechanical polishing
11/16/2006WO2006121580A2 Compositions for the removal of post-etch and ashed photoresist residues and bulk photoresist
11/16/2006WO2006121566A2 Ultrascalable vertical mos transistor with planar contacts
11/16/2006WO2006121431A1 Mechanical oscillator for wafer scan with spot beam
11/16/2006WO2006121336A1 A method for forming ferroelectric thin films, the use of the method and a memory with a ferroelectric oligomer memory material
11/16/2006WO2006121298A1 Method for forming high-resolution pattern with direct writing means
11/16/2006WO2006121297A1 Method for forming high-resolution pattern and substrate having prepattern formed thereby
11/16/2006WO2006121162A1 Process for producing radiation-sensitive resin composition
11/16/2006WO2006121131A1 Plasma doping method and plasma doping apparatus
11/16/2006WO2006121129A1 Semiconductor device and method for manufacturing same
11/16/2006WO2006121117A1 Plasma cleaning method and film forming method
11/16/2006WO2006121096A1 Novel compound, polymer and radiation-sensitive resin composition
11/16/2006WO2006121082A1 Semiconductor device and method for manufacturing same
11/16/2006WO2006121068A1 Winding plasma cvd apparatus
11/16/2006WO2006121042A1 Method, device and program for creating power source model of semiconductor integrated circuit
11/16/2006WO2006121009A1 Projection optical system, exposure apparatus and exposure method
11/16/2006WO2006121008A1 Projection optical system, exposure apparatus and exposure method
11/16/2006WO2006121000A1 Nitride semiconductor element and production method therefor
11/16/2006WO2006120999A1 Method of producing nitride semiconductor element
11/16/2006WO2006120942A1 Plasma generating apparatus and plasma generating method
11/16/2006WO2006120927A1 Optical element driving apparatus, projection optical system, exposure apparatus and device manufacturing method
11/16/2006WO2006120904A1 Surface wave excitation plasma processing system
11/16/2006WO2006120897A1 Positive resist composition and method of forming resist pattern
11/16/2006WO2006120896A1 Positive resist composition and method for forming resist pattern
11/16/2006WO2006120886A1 Semiconductor device having elemental device part and method for manufacturing same
11/16/2006WO2006120866A1 Substrate storage container and method of producing the same
11/16/2006WO2006120845A1 Negative resist composition and method for forming resist pattern
11/16/2006WO2006120843A1 Plasma cleaning method, film forming method and plasma treatment apparatus
11/16/2006WO2006120796A1 Semiconductor device and method for manufacture thereof, and liquid crystal display device
11/16/2006WO2006120739A1 Semiconductor device and production method therefor
11/16/2006WO2006120727A1 Composition for copper wiring polishing and method of polishing surface of semiconductor integrated circuit
11/16/2006WO2006120722A1 Semiconductor device fabricating method
11/16/2006WO2006120228A1 Device for conveying wafers