H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2006
11/16/2006	US20060258097 Memory utilizing oxide-nitride nanolaminates
11/16/2006	US20060258096 Ultra high density flash memory
11/16/2006	US20060258095 High coupling memory cell
11/16/2006	US20060258094 Flash memory with metal-insulator-metal tunneling program and erase
11/16/2006	US20060258093 NAND memory arrays
11/16/2006	US20060258092 Semiconductor integrated circuit device and manufacturing method thereof
11/16/2006	US20060258091 Novel method for manufacturing a semiconductor device containing metal silicide regions
11/16/2006	US20060258090 Band-engineered multi-gated non-volatile memory device with enhanced attributes
11/16/2006	US20060258089 FLASH memory device and method of manufacture
11/16/2006	US20060258088 Capacitor arrangement in a semiconductor component and driving apparatus
11/16/2006	US20060258087 Methods of forming vertical transistor structures
11/16/2006	US20060258086 Methods of forming vertical transistor structures
11/16/2006	US20060258085 Methods of forming capacitors
11/16/2006	US20060258084 Vertical transistors
11/16/2006	US20060258083 Integrated circuit memory cells and methods of forming
11/16/2006	US20060258082 Structure Of Embedded Capacitors And Fabrication Method Thereof
11/16/2006	US20060258081 Method of forming a trench structure having one or more diodes embedded therein adjacent a PN junction
11/16/2006	US20060258080 Vertical diode, matrix position sensitive apparatus and manufacturing method of the same
11/16/2006	US20060258079 Thin film phase-change memory
11/16/2006	US20060258078 Atomic layer deposition of high-k metal oxides
11/16/2006	US20060258077 Formation of deep trench airgaps and related applications
11/16/2006	US20060258076 Method of manufacturing non-volatile semiconductor memory
11/16/2006	US20060258075 Gate material for semiconductor device fabrication
11/16/2006	US20060258074 Methods that mitigate excessive source/drain silicidation in full gate silicidation metal gate flows
11/16/2006	US20060258073 Method for forming a sige or sigec gate selectively in a complementary mis/mos fet device
11/16/2006	US20060258072 Tunneling field effect transistor using angled implants for forming asymmetric source/drain regions
11/16/2006	US20060258071 Methods of forming field effect transistors
11/16/2006	US20060258070 Organic thin film transistor, display device using the same and method of fabricating the same
11/16/2006	US20060258069 Semiconductor thin film, semiconductor device and manufacturing method thereof
11/16/2006	US20060258068 Method for manufacturing thin film transistor, electro-optical device, and electronic apparatus
11/16/2006	US20060258067 Device for protecting against electrostatic discharge
11/16/2006	US20060258066 Electrically stabilized integrated circuit
11/16/2006	US20060258065 Method of fabricating polysilicon film
11/16/2006	US20060258064 Method of forming poly-silicon thin film transistors
11/16/2006	US20060258063 Gettering of silicon on insulator using relaxed silicon germanium epitaxial proximity layers
11/16/2006	US20060258062 Plasma cvd method
11/16/2006	US20060258061 Multi-layered thin films, thin film transistor array panel including the same, and method of manufacturing the panel
11/16/2006	US20060258060 Gate controlled floating well vertical MOSFET
11/16/2006	US20060258059 Contact portion and manufacturing method thereof, thin film transistor array panel and manufacturing method thereof
11/16/2006	US20060258058 Surface-mounted device with leads
11/16/2006	US20060258057 Electronic part manufacturing method and base sheet
11/16/2006	US20060258056 Method for producing a chip panel by means of a heating and pressing process using a thermoplastic material
11/16/2006	US20060258055 Wiring board and method of manufacturing the same
11/16/2006	US20060258054 Method for producing free-standing carbon nanotube thermal pads
11/16/2006	US20060258053 Method for manufacturing electronic component-embedded printed circuit board
11/16/2006	US20060258052 Wafer level pre-packaged flip chip
11/16/2006	US20060258051 Method and system for solder die attach
11/16/2006	US20060258050 Module component and method for manufacturing the same
11/16/2006	US20060258049 Method of bonding solder pads of flip-chip package
11/16/2006	US20060258048 Integrated capacitor for wafer level packaging applications
11/16/2006	US20060258047 Method for laser cutting and method of producing function elements
11/16/2006	US20060258046 Method of producing a universal semiconductor housing with precrosslinked plastic embedding compounds
11/16/2006	US20060258045 Semiconductor device and method of fabricating the same
11/16/2006	US20060258044 Method of manufacturing a semiconductor device comprising stacked chips and a corresponding semiconductor device
11/16/2006	US20060258042 Integrated photodiode of the floating substrate type
11/16/2006	US20060258041 Method for manufacturing solid-state imaging device, and solid-state imaging device
11/16/2006	US20060258040 Microsensor with ferroelectric material and method for fabricating the same
11/16/2006	US20060258039 Integrated getter area for wafer level encapsulated microelectromechanical systems
11/16/2006	US20060258038 Piezoresistive sensing structure
11/16/2006	US20060258037 Method for producing a component having a semiconductor substrate and component
11/16/2006	US20060258036 Waveguide with reduced higher modes
11/16/2006	US20060258035 Method of repairing disconnection, method of manufacturing active matrix substrate by using thereof, and display device
11/16/2006	US20060258034 Thin film transistor, fabrication method thereof, liquid crystal display panel device having the same, and fabrication method thereof
11/16/2006	US20060258033 Active matrix substrate and method for fabricating the same
11/16/2006	US20060258032 Method for forming alignment layer of LCD
11/16/2006	US20060258031 Wafer-level electro-optical semiconductor manufacture fabrication method
11/16/2006	US20060258030 Mask holding structure, film forming method, electro-optic device manufacturing method, and electronic apparatus
11/16/2006	US20060258029 Surface-emitting type light-emitting diode and fabrication method thereof
11/16/2006	US20060258028 Color control by alteration of wavelength converting element
11/16/2006	US20060258027 Light-emitting diode, method for making light-emitting diode, integrated light-emitting diode and method for making integrated light-emitting diode, method for growing a nitride-based iii-v group compound semiconductor, light source cell unit, light-emitting diode backlight, and light-emitting diode display and electronic device
11/16/2006	US20060258026 Multi-wavelength semiconductor laser device and its manufacturing method
11/16/2006	US20060258025 Fabrication method of IC inlet, ID tag, ID tag reader and method of reading date thereof
11/16/2006	US20060258024 Method of inspecting integrated circuits during fabrication
11/16/2006	US20060258023 Method and system for improving integrated circuit manufacturing yield
11/16/2006	US20060258022 Method for the calibration of radio frequency generator output power
11/16/2006	US20060257985 Microbial nanowires, related systems and methods of fabrication
11/16/2006	US20060257908 Method for two- and three-dimensional microassembly of patterns and structures
11/16/2006	US20060257873 Chemical switching of nucleic acid circuit elements
11/16/2006	US20060257796 Bank structure, wiring pattern forming method, device, electro-optical device, and electronic apparatus
11/16/2006	US20060257792 Three dimensional topologies without multiple photolithography layers; mono-molecular layer enables very high spatial resolution; azomonochlorosilane initiator layer; radiating to selectively reduce density, polymerized monomers as a mask; miniature steps, slopes or surface variations; semiconductors
11/16/2006	US20060257786 Method for employing vertical acid transport for lithographic imaging applications
11/16/2006	US20060257755 Phase-shift photomask-blank, phase-shift photomask and fabrication method thereof
11/16/2006	US20060257753 Photomask and method thereof
11/16/2006	US20060257752 Phase shift mask for preventing haze
11/16/2006	US20060257659 Small particle size, narrow particle size distribution, spherical morphology and good crystallinity; for making electroluminescent display devices
11/16/2006	US20060257568 Vapor-phase growing unit
11/16/2006	US20060257553 Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method
11/16/2006	US20060257295 Apparatus and method for generating a chemical precursor
11/16/2006	US20060257233 Interface between conveyor and semiconductor process tool load port
11/16/2006	US20060257070 Optical interference display cell and method of making the same
11/16/2006	US20060256625 Semiconductor memory device
11/16/2006	US20060256614 High output nonvolatile magnetic memory
11/16/2006	US20060256609 Memory cell, memory using the memory cell, memory cell manuracturing method, and memory recording/reading method
11/16/2006	US20060256461 Magnetic memory device, write current driver circuit and write current driving method
11/16/2006	US20060256438 Micro corner cube array, method of making the micro corner cube array, and display device
11/16/2006	US20060256328 Apparatus and method for inspecting pattern
11/16/2006	US20060256327 System for Detecting Anomalies and/or Features of a Surface
11/16/2006	US20060256316 Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method
11/16/2006	US20060256315 Simulator of optical intensity distribution, computer implemented method for simulating the optical intensity distribution, method for collecting mask pattern, and computer program product for the simulator
11/16/2006	US20060256312 Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap without an explicit attenuation

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