Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2007
08/02/2007WO2007086021A1 Production of integrated circuits comprising semiconductor incompatible materials
08/02/2007WO2007086019A1 Production of integrated circuits comprising different components
08/02/2007WO2007086009A1 Nanowire tunneling transistor
08/02/2007WO2007086008A1 Tunneling transistor with barrier
08/02/2007WO2007085834A2 Etch stop structure
08/02/2007WO2007085774A1 Electronic module and a method of assembling such a module
08/02/2007WO2007085452A1 Process and device for the precision-processing of substrates by means of a laser coupled into a liquid stream, and use of same
08/02/2007WO2007085387A1 Method for treating an oxygen-containing semiconductor wafer, and semiconductor component
08/02/2007WO2007085095A1 Power-measured pulses for thermal trimming
08/02/2007WO2007070664A3 Memory cell having stressed layers
08/02/2007WO2007070356A3 Package using array capacitor core
08/02/2007WO2007067591A3 Solder deposition and thermal processing of thin-die thermal interface material
08/02/2007WO2007062096A3 Silicon-germanium hydrides and methods for making and using same
08/02/2007WO2007051070A3 Horizontal array stocker
08/02/2007WO2007040627A8 Wavelength-converting light-emitting devices
08/02/2007WO2007025277A3 Methods for dual metal gate complementary metal oxide semiconductor integration
08/02/2007WO2007000693A3 Semiconductor device and method of manufacturing such a device
08/02/2007WO2006138055A3 Method of curing hydrogen silses quioxane and densification in nano-scale trenches
08/02/2007WO2006130622A3 Growth of planar non-polar{1-1 0 0} m-plane gallium nitride with metalorganic chemical vapor deposition (mocvd)
08/02/2007WO2006125825A3 Method of forming conducting nanowires
08/02/2007US20070180324 Apparatus and program for process fault analysis
08/02/2007US20070179743 Methods and apparatus for data analysis
08/02/2007US20070179658 Substrate processing system capable of monitoring operation of substrate processing apparatus
08/02/2007US20070179238 Method for improving mechanical properties of polymer particles and its applications
08/02/2007US20070179005 Apparatus for opening and closing cover
08/02/2007US20070178812 Polishing pad and method for manufacture of semiconductor device using the same
08/02/2007US20070178748 Load-lock technique
08/02/2007US20070178727 Probe apparatus,wafer inspecting apparatus provided with the probe apparatus and wafer inspecting method
08/02/2007US20070178714 Method and system for high-speed precise laser trimming and scan lens for use therein
08/02/2007US20070178713 Method for forming a dielectric layer with an air gap, and a structure including the dielectric layer with the air gap
08/02/2007US20070178712 Planarization for Integrated Circuits
08/02/2007US20070178711 Semiconductor constructions, methods of patterning photoresist, and methods of forming semiconductor constructions
08/02/2007US20070178710 Method for sealing thin film transistors
08/02/2007US20070178709 Method of forming nanowires with a narrow diameter distribution
08/02/2007US20070178708 Vapor deposition system and vapor deposition method for an organic compound
08/02/2007US20070178707 Device manufacturing method and device
08/02/2007US20070178706 Cleaning solution for silicon surface and methods of fabricating semiconductor device using the same
08/02/2007US20070178705 Poly etch without separate oxide decap
08/02/2007US20070178704 Lithographic apparatus and device manufacturing method
08/02/2007US20070178703 Method for release of surface micromachined structures in an epitaxial reactor
08/02/2007US20070178702 Residue treatment system, residue treatment method, and method of manufacturing semiconductor device
08/02/2007US20070178701 Method of processing a substrate
08/02/2007US20070178700 Compositions and methods for CMP of phase change alloys
08/02/2007US20070178699 Method and system for advanced process control in an etch system by gas flow control on the basis of cd measurements
08/02/2007US20070178698 Substrate processing apparatus and fabrication process of a semiconductor device
08/02/2007US20070178697 Copper electrodeposition in microelectronics
08/02/2007US20070178696 Method for silicide formation on semiconductor devices
08/02/2007US20070178695 Methods of forming electrically conductive plugs and method of forming resistance variable elements
08/02/2007US20070178694 Pass through via technology for use during the manufacture of a semiconductor device
08/02/2007US20070178693 Interlayer interconnect of three-dimensional memory and method for manufacturing the same
08/02/2007US20070178692 Multi-step process for forming a barrier film for use in copper layer formation
08/02/2007US20070178691 Technique for non-destructive metal delamination monitoring in semiconductor devices
08/02/2007US20070178690 Semiconductor device comprising a metallization layer stack with a porous low-k material having an enhanced integrity
08/02/2007US20070178689 Gallium nitride based III-V group compund semiconductor device and method of producing the same
08/02/2007US20070178688 Method for forming multi-layer bumps on a substrate
08/02/2007US20070178687 Method of manufacturing semiconductor device and display device
08/02/2007US20070178686 Interconnect substrate, semiconductor device, and method of manufacturing the same
08/02/2007US20070178685 Method of increasing the etch selectivity in a contact structure of semiconductor devices
08/02/2007US20070178684 Method for producing conductor arrays on semiconductor devices
08/02/2007US20070178683 Semiconductive device fabricated using a two step approach to silicide a gate and source/drains
08/02/2007US20070178682 Damage-free sculptured coating deposition
08/02/2007US20070178681 Semiconductor device having a plurality of metal layers deposited thereon
08/02/2007US20070178680 Method for Manufacturing Simox Wafer
08/02/2007US20070178679 Methods of implanting ions and ion sources used for same
08/02/2007US20070178678 Methods of implanting ions and ion sources used for same
08/02/2007US20070178677 Locos self-aligned twin well with a co-planar silicon surface
08/02/2007US20070178676 Method of forming semiconductor multi-layered structure
08/02/2007US20070178675 Sintered semiconductor material
08/02/2007US20070178674 Laser annealing device and method for producing thin-film transistor
08/02/2007US20070178673 Silicon based nanospheres and nanowires
08/02/2007US20070178672 Laser irradiation method, laser irradiation apparatus and method for manufacturing semiconductor device
08/02/2007US20070178671 GaN bulk growth by Ga vapor transport
08/02/2007US20070178670 Methods for preparing crystalline films
08/02/2007US20070178669 Method of manufacturing semiconductor device and apparatus for processing substrate
08/02/2007US20070178668 Epitaxial wafer and method for producing epitaxial wafers
08/02/2007US20070178667 Wafer level chip scale package system
08/02/2007US20070178666 Integrated circuit system with waferscale spacer system
08/02/2007US20070178665 Systems And Methods For Forming Integrated Circuit Components Having Precise Characteristics
08/02/2007US20070178664 Shallow trench isolation structure and method of fabricating the same
08/02/2007US20070178663 Methods of forming a trench having side surfaces including a uniform slope
08/02/2007US20070178662 Method of forming isolation structures in a semiconductor manufacturing process
08/02/2007US20070178661 Method of forming a semiconductor isolation trench
08/02/2007US20070178660 Polish stop and sealing layer for manufacture of semiconductor devices with deep trench isolation
08/02/2007US20070178659 Process monitor mark and the method for using the same
08/02/2007US20070178658 Patterning and aligning semiconducting nanoparticles
08/02/2007US20070178657 Method of manufacturing a semiconductor device
08/02/2007US20070178656 Structure and method for hyper-abrupt junction varactors
08/02/2007US20070178655 Method for fabricating micrometer or nanometer channels
08/02/2007US20070178654 Metal capacitor including lower metal electrode having hemispherical metal grains
08/02/2007US20070178653 Apparatus and method for manufacturing flat display panel
08/02/2007US20070178652 Structure and method to form source and drain regions over doped depletion regions
08/02/2007US20070178651 Method for Preparing a Source Material for Ion Implantation
08/02/2007US20070178650 Heterojunction tunneling field effect transistors, and methods for fabricating the same
08/02/2007US20070178649 Double-gated non-volatile memory and methods for forming thereof
08/02/2007US20070178648 Different-voltage device manufactured by a cmos compatible process and high-voltage device used in the different-voltage device
08/02/2007US20070178647 Semiconductor devices having recessed structures and methods of forming the same
08/02/2007US20070178646 Method of forming a layer comprising epitaxial silicon
08/02/2007US20070178645 Method for manufacturing semiconductor device
08/02/2007US20070178644 Semiconductor device having an insulating layer and method of fabricating the same
08/02/2007US20070178643 Memory utilizing oxide-conductor nanolaminates
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