Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2007
08/02/2007US20070175863 Single Wafer Etching Apparatus and Single Wafer Etching Method
08/02/2007US20070175862 Anisotropic etching agent composition used for manufacturing of micro-structures of silicon and etching method
08/02/2007US20070175861 Methods and apparatus for in-situ substrate processing
08/02/2007US20070175860 3d lithography with laser beam writer for making hybrid surfaces
08/02/2007US20070175856 Notch-Free Etching of High Aspect SOI Structures Using A Time Division Multiplex Process and RF Bias Modulation
08/02/2007US20070175838 Mini-environment pod device, an exposure apparatus and a device manufacturing method using the same
08/02/2007US20070175752 Anolyte for copper plating
08/02/2007US20070175747 Plasma processing method and apparatus thereof
08/02/2007US20070175656 Electrical component on a substrate and method for production thereof
08/02/2007US20070175588 High throughput plasma treatment system
08/02/2007US20070175587 Method of generating discharge plasma
08/02/2007US20070175586 Plasma Processing Apparatus And Plasma Processing Method
08/02/2007US20070175585 System and method for manufacturing process with fluid
08/02/2007US20070175501 Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method
08/02/2007US20070175500 Device and method for wet treating disc-shaped articles
08/02/2007US20070175499 Method for cleaning surfaces using parallel flow
08/02/2007US20070175396 Film-forming apparatus
08/02/2007US20070175395 Semiconductor device manufacturing equipment including a vacuum apparatus and a method of operating the same
08/02/2007US20070175393 Substrate processing apparatus, substrate processing method, and storage medium storing program for implementing the method
08/02/2007US20070175392 Multiple precursor dispensing apparatus
08/02/2007US20070175391 Gas supply system, substrate processing apparatus and gas supply method
08/02/2007US20070175332 Gas purifying device
08/02/2007US20070175329 Chemical filter
08/02/2007US20070175188 Exhaust gas collection device
08/02/2007US20070175104 Polishing slurry for silicon oxide, additive liquid and polishing method
08/02/2007US20070175062 Substrate processing system, substrate processing method, recording medium and software
08/02/2007DE4430483B4 MOS-Transistor, Halbeiterspeicherbauelement mit MOS-Transistoren und Herstellungsverfahren hierfür MOS-transistor semiconductor memory device including MOS transistors and manufacturing method thereof
08/02/2007DE4340976B4 Transistor mit einem ungleichmäßig dotierten Kanal und Verfahren zu seiner Herstellung Transistor having a non-uniformly doped channel and process for its preparation
08/02/2007DE19833245B4 Halbleiterlichtemissionseinrichtung mit blasenfreiem Gehäuse Semiconductor light-emitting device with bubble-free housing
08/02/2007DE19525576B4 Verfahren zur Herstellung eines Dünnfilmtransistors A method of manufacturing a thin film transistor
08/02/2007DE112005002118T5 Variable Verzögerungsschaltung, Makrozellendaten, logisches Verifizierungsverfahren, Prüfverfahren und elektronische Vorrichtung Variable delay circuit macro cell data, logic verification procedures, test methods and electronic device
08/02/2007DE112005001989T5 Kostengünstige Prozessierplattform mit hohem Durchsatz Cost Prozessierplattform high throughput
08/02/2007DE10359424B4 Umverdrahtungsplatte für Halbleiterbauteile mit engem Anschlussraster und Verfahren zur Herstellung derselben Rewiring for semiconductor devices with a narrow grid connection and method of making same
08/02/2007DE10339762B4 Chipstapel von Halbleiterchips und Verfahren zur Herstellung desselben The same chip stack of semiconductor chips and processes for making
08/02/2007DE10297535B4 Verfahren zur Herstellung eines Hochspannungs-Hochgeschwindigkeits-MOS-Transistors durch Ionen-Implantation A process for producing a high-voltage high-speed MOS transistor by ion implantation,
08/02/2007DE10252106B4 Schnappverschließvorrichtung für einen KGD-Träger Schnappverschließvorrichtung for a KGD-carrier
08/02/2007DE10242896B4 Probenvorverarbeitungsvorrichtung zur Röntgenfluoreszenzanalyse und Röntgenfluoreszenzspektrometervorrichtung Sample preprocessing for X-ray fluorescence analysis and X-ray fluorescence spectrometer device
08/02/2007DE10224417B4 Verfahren zur Klassifizierung von Fehlern des Layouts einer Halbleiterschaltung A process for the classification of errors of the layout of a semiconductor circuit
08/02/2007DE102007004120A1 Aqueous composition for polishing silicon dioxide and boron-phosphate-silicate glass on semiconductor wafers, contains polyacrylic acid, abrasive and polyvinyl-pyrrolidone
08/02/2007DE102006060887A1 Halbleiteranordnung mit gemischter Orientierung und Verfahren A semiconductor device with mixed orientation and methods
08/02/2007DE102006013246A1 Speicherkondensator für Halbleiterspeicherzellen und Verfahren zur Herstellung eines Speicherkondensators Storage capacitor for semiconductor memory cells, and methods for the preparation of a storage capacitor
08/02/2007DE102006010523B3 Verfahren zur Herstellung von planaren Isolierschichten mit positionsgerechten Durchbrüchen mittels Laserschneiden und entsprechend hergestellte Vorrichtungen A process for the production of planar insulating position with just apertures by means of laser cutting and devices correspondingly produced
08/02/2007DE102006007446B3 Device for uniform coating of substrate surface with liquid has moistening device for applying liquid in process volume to substrate surface, tumbling device for tilting holder, substrate relative to two axes in plane parallel to surface
08/02/2007DE102006007293A1 Verfahren zum Herstellen eines Quasi-Substratwafers und ein unter Verwendung eines solchen Quasi-Substratwafers hergestellter Halbleiterkörper A method for manufacturing a quasi-substrate wafer, and a semiconductor body produced using such a quasi-substrate wafer
08/02/2007DE102006004430A1 Verfahren und System für eine fortschrittliche Prozesssteuerung in einem Ätzsystem durch Gasflusssteuerung auf der Grundlage von CD-Messungen A method and system for an advanced process control in an etching system by the gas flow control on the basis of CD measurements
08/02/2007DE102006004429A1 Halbleiterbauelement mit einem Metallisierungsschichtstapel mit einem porösen Material mit kleinem ε mit einer erhöhten Integrität Semiconductor component with a metallization layer with a porous material with small ε with increased integrity
08/02/2007DE102006004428A1 Non-destructive metal delamination monitoring method e.g. for semiconductor devices, involves forming metal-comprising test plate in metallization layer stack of semiconductor device formed above substrate
08/02/2007DE102006004411A1 Evaluation method for assessing measurement data during the processing of semiconductors uses data filtering based on correlation
08/02/2007DE102006003990A1 Verfahren und Vorrichtung zum Aufbereiten bzw. Bearbeiten von Siliziummaterial Method and apparatus for processing or editing of silicon material
08/02/2007DE102006003931B3 Halbleiterbauteil mit oberflächenmontierbaren Außenkontakten und Verfahren zur Herstellung desselben Of the same semiconductor device with surface-mountable external contacts and methods for preparing
08/02/2007DE102006003607A1 Method for localized doping of solid substrates, e.g. silicon substrates, comprises spraying surface of substrate with stream of liquid containing dopant, surface being treated locally before or during spraying with laser beam
08/02/2007DE102006003305B3 Mold for semiconductor packaging by injection-, compression- or transfer molding, includes capillary extensions in mold wall to form test pieces revealing air inclusions
08/02/2007DE102006003129A1 Verfahren zur mechanischen Vereinzelung von Bauelementen mit Membranen sowie die entsprechend hergestellten Bauelemente Methods for mechanical separation of components with membranes as well as the components produced accordingly
08/02/2007DE102006002904A1 Bauelementanordnung und Verfahren zur Ermittlung der Temperatur in einem Halbleiterbauelement Component assembly and method for determining the temperature in a semiconductor device
08/02/2007DE102006002903A1 Treatment of oxygen-containing semiconductor wafer, comprises irradiating second side of wafer with high-energy particles to produce crystal defects in second semiconductor region of wafer, and heating wafer
08/02/2007DE102004057234B4 Substrathalter sowie Substrathalteeinrichtung Substrate holder and substrate holder
08/02/2007DE102004036156B4 Verfahren zur Herstellung eines Halbleiterspeicherbauelementes mit oberseitigen Bitleitungsanschlüssen A method of manufacturing a semiconductor memory device with upper-side bit line terminals
08/02/2007DE102004020833B4 Material mit niedriger Wärmeausdehnung und hoher Wärmeleitfähigkeit auf Kupferbasis sowie Verfahren zum Herstellen desselben Of the same material of low thermal expansion and high thermal conductivity copper-based as well as methods for preparing
08/02/2007DE102004006258B4 Verfahren zum Angleichen von zwei Messverfahren für die Messung von Strukturbreiten auf einem Substrat A method for matching of two measuring methods for measuring structure widths on a substrate
08/02/2007DE10153384B4 Halbleiterspeicherzelle, Verfahren zu deren Herstellung und Halbleiterspeichereinrichtung A semiconductor memory cell, process for their preparation and the semiconductor memory device
08/02/2007DE10143790B4 Elektronisches Bauteil mit wenigstens einem Halbleiterchip Electronic component with at least one semiconductor chip
08/02/2007DE10131276B4 Feldeffekttransistor und Verfahren zu seiner Herstellung Field effect transistor and method for its preparation
08/02/2007CA2636776A1 Method of manufacturing silicon carbide semiconductor device
08/01/2007EP1814370A1 Printed circuit board and its designing method and designing method of ic package terminal and its connecting method
08/01/2007EP1814166A1 Semiconductor light emitting element and production method therefor
08/01/2007EP1814162A1 Silicon carbide mos field-effect transistor and process for producing the same
08/01/2007EP1814154A1 Multilayer printed circuit board and multilayer printed circuit manufacturing method
08/01/2007EP1814152A1 Semiconductor integrated circuit wiring design system, semiconductor integrated circuit, and wiring design program
08/01/2007EP1814151A1 Method for manufacturing a surface mount semiconductor device
08/01/2007EP1814150A1 Coating liquid for formation of protective film for semiconductor processing, method for preparation thereof, and protective film for semiconductor processing provided therefrom
08/01/2007EP1814149A1 METHOD FOR ABRASING GaN SUBSTRATE
08/01/2007EP1814148A2 Floating-gate memory cell with an auxiliary gate
08/01/2007EP1814147A1 Lighting apparatus, exposure apparatus and micro device manufacturing method
08/01/2007EP1814146A1 Maintenance method, exposure method, exposure apparatus, and device producing method
08/01/2007EP1814145A1 Temperature regulation method and system for low flow rate liquid
08/01/2007EP1814144A1 Substrate processing method, exposure apparatus and method for manufacturing device
08/01/2007EP1814143A1 Exposure condition setting method, substrate processing device, and computer program
08/01/2007EP1814142A1 Substrate carrying device, substrate carrying method, and exposure device
08/01/2007EP1814122A1 Operating techniques for reducing effects of coupling between storage elements of a non-volatile memory in multiple-data states
08/01/2007EP1813990A1 Method for forming resist pattern
08/01/2007EP1813658A2 Polishing liquid for barrier layer
08/01/2007EP1813657A2 Metal-polishing liquid and chemical-mechanical polishing method using the same
08/01/2007EP1813655A1 Coating liquid for forming low dielectric constant amorphous silica coating film, method for preparing same, and low dielectric constant amorphous silica coating film obtained from same
08/01/2007EP1813641A1 A method for improving mechanical properties of polymer particles and its applications
08/01/2007EP1813388A1 Polishing tape and polishing method
08/01/2007EP1812972A1 Optical semiconductor device and method of manufacturing thereof
08/01/2007EP1812971A1 Semiconductor device and method for producing the same
08/01/2007EP1812970A1 Semiconductor device and methods for the production thereof
08/01/2007EP1812969A2 Amorphous oxide and field effect transistor
08/01/2007EP1812966A2 Trench capacitor with hybrid surface orientation substrate
08/01/2007EP1812965A2 Fluid storage and dispensing system including dynamic fluid monitoring of fluid storage and dispensing vessel
08/01/2007EP1812964A1 Transistor structure and method of manufacturing thereof
08/01/2007EP1812963A1 Planarising damascene structures
08/01/2007EP1812962A2 Ultraviolet assisted pore sealing of porous low k dielectric films
08/01/2007EP1812961A1 Recovery of hydrophobicity of low-k and ultra low-k organosilicate films used as inter metal dielectrics
08/01/2007EP1812960A1 Dry etching apparatuses and methods of forming an electric device using the same
08/01/2007EP1812959A2 Thermal management of dielectric components in a plasma discharge device
08/01/2007EP1812958A1 Systems and methods for creating crystallographic-orientation controlled poly-silicon films
08/01/2007EP1812957A1 Method and device for thermally treating substrates
08/01/2007EP1812956A1 Autofocus for high power laser diode based annealing system