Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2007
08/23/2007CA2642480A1 Apparatus and method for the uniform coating of substrates
08/22/2007EP1821344A2 Heterojunction transistors including energy barriers and related methods
08/22/2007EP1821341A1 Electric assembly with a wire-bonded circuit and method for manufacturing such an electric assembly
08/22/2007EP1821340A1 Bidirectional field-effect transistor and matrix converter
08/22/2007EP1821339A1 GaN crystal substrate and method of manufacturing the same, and method of manufacturing semiconductor device
08/22/2007EP1821338A1 Exposure apparatus, exposure method and device manufacturing method
08/22/2007EP1821337A1 Maintenance method, maintenance apparatus, exposure apparatus and device manufacturing method
08/22/2007EP1821336A1 Position measurement method, position control method, measurement method, loading method, exposure method, exoposure apparatus, and device production method
08/22/2007EP1821335A2 Wafer processing apparatus
08/22/2007EP1821146A1 Deposition of a protective layer by charged particle beam sputtering and processing of the layer by a charged particle beam
08/22/2007EP1820887A2 Gallium nitride crystal substrate and method of producing same
08/22/2007EP1820619A1 Mold and process for production of substrates having transferred micropatterns thereon
08/22/2007EP1820603A2 Wafer and method for producing the same
08/22/2007EP1820214A2 A method of forming an interconnect structure on an integrated circuit die
08/22/2007EP1820213A2 Multi-bit nanocrystal memory
08/22/2007EP1820212A1 Plt/pzt ferroelectric structure
08/22/2007EP1820211A1 Strained silicon, gate engineered fermi-fets
08/22/2007EP1820210A2 Contact doping and annealing systems and processes for nanowire thin films
08/22/2007EP1820209A1 Method of modifying surface area and electronic device
08/22/2007EP1820208A2 Electrostatic holding device having a number of supply sources
08/22/2007EP1820207A2 Method and device for etching substrates received in an etching solution
08/22/2007EP1820206A1 Thermode unit for semiconductor components
08/22/2007EP1820201A2 Method of correction for wafer crystal cut error in semiconductor processing
08/22/2007EP1819982A1 Electrical measurement of the thickness of a semiconductor layer
08/22/2007EP1819844A1 Method for forming anti-reflective coating
08/22/2007EP1819841A2 Scratch resistant coated glass article including layer(s) resistant to fluoride-based etchant(s), and method of making article using combustion cvd
08/22/2007EP1819478A2 Method and system for laser soft marking
08/22/2007EP1819476A1 Method and system for laser hard marking
08/22/2007EP1715961A4 Spin-on protective coatings for wet-etch processing of microelectronic substrates
08/22/2007EP1661185A4 Semiconductor component and method of manufacturing same
08/22/2007EP1547138B1 Methods for producing silicon nitride films and silicon oxynitride films by thermal chemical vapor deposition
08/22/2007EP1490909B1 Active matrix electroluminescent display devices and their manufacture
08/22/2007EP1459398A4 Methods of making electromechanical three-trace junctions devices
08/22/2007EP1459079B1 Probe card covering system and method
08/22/2007EP1376668B1 Microwave plasma process device, plasma ignition method, plasma forming method, and plasma process method
08/22/2007EP1356524B1 Esd protection devices
08/22/2007EP1275143B1 Process for forming electrical/mechanical connections
08/22/2007EP1190437B1 Plasma processing system and method for delivering RF power to a plasma processing chamber
08/22/2007EP1122342B1 Method for removing defects of single crystal material
08/22/2007EP0993685B1 Method for improving microloading while etching a substrate
08/22/2007EP0972301B1 Manufacturing a heterobipolar transistor and a laser diode on the same substrate
08/22/2007CN2938415Y Material receiving device of crystal fixing machine
08/22/2007CN2938404Y Test device for measuring PN junction current
08/22/2007CN2938395Y Glue-injection forming changer for axial dipolar
08/22/2007CN2938394Y Automatic adhering machine for support of electronic product
08/22/2007CN2936578Y Processing pad and substrate processing equipment including said processing pad
08/22/2007CN1333501C Semiconductor device and a method for the manufacture thereof
08/22/2007CN1333468C Power MOSFET with deep implanted junctions
08/22/2007CN1333466C Trenched semiconductor devices and their manufacture
08/22/2007CN1333465C Semiconductor device
08/22/2007CN1333464C Semiconductor integrated circuit device and its manufacturing method
08/22/2007CN1333463C Method for forming co-axial interconnect in CMOS process
08/22/2007CN1333462C Laminated sheet, method of manufacturing demiconductor and semiconductor part
08/22/2007CN1333459C 电路装置 Circuit device
08/22/2007CN1333458C Method for manufacturing a non-volatile memory device
08/22/2007CN1333457C Method for forming twin bit cell flash memory
08/22/2007CN1333456C Method for fabricating semiconductor device with fine patterns
08/22/2007CN1333455C Method for making semiconductor device
08/22/2007CN1333454C A silicon-on-insulator device with strain film and method for forming strain film
08/22/2007CN1333453C Method for positioning substratge relatively to supporting table and its equipment
08/22/2007CN1333452C A hollow microprobe using a mems technique and a method of manufacturing the same
08/22/2007CN1333451C System for brokering fault detection data
08/22/2007CN1333450C Electric connection end structure of embedded chip and its producing method
08/22/2007CN1333449C Semiconductor package piece
08/22/2007CN1333448C Sensing-detecting substrate of contact-type image sensing-detecting device and its processing method
08/22/2007CN1333447C Method for forming polysilicon layer and polysilicon film transistor
08/22/2007CN1333446C Laser equipment and laser annealing method
08/22/2007CN1333445C An oxide layer on a GAAS-based semiconductor structure and method of forming same
08/22/2007CN1333444C Copper chemical mechanical polishing solutions using sulfonated amphiprotic agents
08/22/2007CN1333443C Method for manufacturing semiconductor device
08/22/2007CN1333442C Plating system with remote secondary anode for semiconductor manufacturing
08/22/2007CN1333441C Nickel silicide with reduced interface roughness
08/22/2007CN1333440C Electrodes and their forming methods, thin film transistors, electronic circuits and display device therewith
08/22/2007CN1333439C Method for forming polycrystalline silicon film of polycrystalline silicon tft
08/22/2007CN1333438C Coaxial air intake for acquiring uniform wide-band gap semiconductor thin film
08/22/2007CN1333437C Mask with two-way alignment pattern
08/22/2007CN1333436C Process for making sub-lithographic photoresist features
08/22/2007CN1333435C Quasi aluminium nitride and quasi gallium nitride base growing substrate and method for growing on alumimium nitride ceramic sheet
08/22/2007CN1333434C Manufacturing method of semiconductor device, semiconductor device, circuit substrate and electronic equipment
08/22/2007CN1333433C Electrode wire structure for inhibiting coupled crosstalk between adjacent channels and method for manufacturing same
08/22/2007CN1333432C Producing method for thin-film transistor array baseplate
08/22/2007CN1333431C Method for fabricating semiconductor device
08/22/2007CN1333430C Crystallizing device, crystallizing method and used phase-shift mask and filter
08/22/2007CN1333429C Method and apparatus for alignment of carriers, carrier handlers and semiconductor handling equipment
08/22/2007CN1333406C Semiconductor integrated circuit and method for fabricating the same
08/22/2007CN1333379C Method for manufacturing an electro-optical device
08/22/2007CN1333308C Method for controlling accuracy and repeatability of an etch process
08/22/2007CN1333307C Over-coating composition for photoresist and process for forming photoresist pattern using the same
08/22/2007CN1333297C Semiconductor device
08/22/2007CN1333296C Semiconductor device
08/22/2007CN1333291C A method of forming a reflective electrode and a liquid crystal display device
08/22/2007CN1333290C Colour polymer dispersion liquid crystal display device and its manufacturing method
08/22/2007CN1333286C Panel display structure for preventing electrode wire from breaking
08/22/2007CN1333259C Test desk for high frequency characteristics of semiconductor laser chip with noncoplanar electrode
08/22/2007CN1333117C Method for developping directionally aligning zinc oxide nanometer rod array on silicon substrate
08/22/2007CN1333110C Electroplating method and electroplating device special for such electroplating method
08/22/2007CN1333106C Liquid material gasifying and supply device
08/22/2007CN1333030C Wafer machining adhesive tape, and its manufacturing method and using method
08/22/2007CN1332902C High thermal expansion glass and belt composition
08/22/2007CN101023717A 电极基板 The electrode substrate
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