Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2007
08/23/2007WO2007095181A2 Method for forming molecular imprints
08/23/2007WO2007094957A1 Infinitely selective photoresist mask etch
08/23/2007WO2007094797A1 Method for making a neo-layer comprising embedded discrete components
08/23/2007WO2007094617A1 Transfer chamber for vacuum processing apparatus of substrate
08/23/2007WO2007094616A1 Load-lock chamber for vacuum processing of substrate
08/23/2007WO2007094612A1 Dicing die attachment film and method for packaging semiconductor using the same
08/23/2007WO2007094609A1 Gas exhaust apparatus
08/23/2007WO2007094599A1 Space transformer, manufacturing method of the space transformer and probe card having the space transformer
08/23/2007WO2007094501A1 Semiconductor device and manufacturing method thereof
08/23/2007WO2007094493A1 Photo field effect transistor and integrated photodetector using same
08/23/2007WO2007094474A1 Tertiary alcohol derivative, polymer compound and photoresist composition
08/23/2007WO2007094473A1 Tertiary alcohol derivative, polymer compound and photoresist composition
08/23/2007WO2007094470A1 Exposure apparatus, exposure method and method for manufacturing device
08/23/2007WO2007094443A1 Adjusting method, substrate treating method, substrate treating device, exposure device, inspection device, measurement inspection system, treating device, computer system, program, and information recording medium
08/23/2007WO2007094439A1 Sample dimension inspecting/measuring method and sample dimension inspecting/measuring apparatus
08/23/2007WO2007094437A1 Substrate processing apparatus, substrate processing method and recording medium
08/23/2007WO2007094436A1 Acid-dissociative group-containing compound and radiation-sensitive composition
08/23/2007WO2007094432A1 Ion implanting apparatus
08/23/2007WO2007094431A1 Exposure apparatus, exposing method, and device manufacturing method
08/23/2007WO2007094421A1 Schottky junction type semiconductor element and method for manufacturing same
08/23/2007WO2007094418A1 Process for producing semiconductor device
08/23/2007WO2007094416A1 Plasma processing apparatus and plasma processing method
08/23/2007WO2007094414A1 Exposure apparatus, exposing method, and device manufacturing method
08/23/2007WO2007094407A1 Exposure apparatus, exposing method, and device manufacturing method
08/23/2007WO2007094396A1 Photosensitive resin composition and pattern forming method using same
08/23/2007WO2007094324A1 Thin board container
08/23/2007WO2007094299A1 Processing liquid for resist substrate and method of processing resist substrate using the same
08/23/2007WO2007094244A1 Nano-sized ultrathin film dielectric, process for producing the same and nano-sized ultrathin film dielectric device
08/23/2007WO2007094235A1 Exposure method, exposure apparatus, photomask and photomask manufacturing method
08/23/2007WO2007094233A1 Soi substrate and method for manufacturing soi substrate
08/23/2007WO2007094232A1 Method for manufacturing soi substrate
08/23/2007WO2007094231A1 Method for manufacturing semiconductor substrate
08/23/2007WO2007094230A1 Method for manufacturing soi substrate
08/23/2007WO2007094229A1 Substrate treating method, and computer-readable storage medium
08/23/2007WO2007094213A1 Imprinting device and imprinting method
08/23/2007WO2007094198A1 Projection optical system, exposure device, exposure method, display manufacturing method, mask, and mask manufacturing method
08/23/2007WO2007094197A1 Protection device, mask, and exposure device
08/23/2007WO2007094192A1 Resist composition for immersion lithography and method for formation of resist pattern
08/23/2007WO2007094167A1 Circuit board and process for producing the same
08/23/2007WO2007094157A1 Substrate inspection device and substrate inspection method
08/23/2007WO2007094110A1 Semiconductor device and method for manufacturing the same
08/23/2007WO2007094044A1 Semiconductor device manufacturing method and semiconductor manufacturing apparatus
08/23/2007WO2007094034A1 Contact pusher, contact arm and electronic component testing apparatus
08/23/2007WO2007093966A1 Non-conductive planarization of substrate surface for mold cap
08/23/2007WO2007093931A1 Interconnect structure and method of manufacture
08/23/2007WO2007093390A1 Apparatus and method for the uniform coating of substrates
08/23/2007WO2007093350A1 Method for exchanging a semiconductor chip of a flip-chip module and a flip-chip module suitable therefor
08/23/2007WO2007093190A1 Electric contacts with a minimal contact surface for non-volatile memory cells
08/23/2007WO2007077171A3 Method and device for converting metallic precursors into chalcopyrite layers of cigss solar cells
08/23/2007WO2007076099A3 Microelectronic elements with compliant terminal mountings and methods for making the same
08/23/2007WO2007075727A3 Microelectronic packages and methods therefor
08/23/2007WO2007075369B1 Low temperature doped silicon layer formation
08/23/2007WO2007051110A3 Wire embedded bridge
08/23/2007WO2007011413A3 Carbon nanotube alignment method, apparatus and applicantions
08/23/2007WO2007001653A3 Reticle alignment technique
08/23/2007WO2006107383A3 Transitional dielectric layer to improve reliability and performance of high dielectric constant transistors
08/23/2007WO2006055937A8 Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical systems
08/23/2007WO2006055226A3 Nitrogen-containing field effect transistor gate stack containing a threshold voltage control layer formed via deposition of a metal oxide
08/23/2007WO2006044112A3 Integration of multiple gate dielectrics by surface protection
08/23/2007US20070198965 Simulation method and semiconductor device fabrication method
08/23/2007US20070198211 Selection of wavelengths for integrated circuit optical metrology
08/23/2007US20070197398 Copper film deposition method
08/23/2007US20070197147 Polishing system with spiral-grooved subpad
08/23/2007US20070197145 Polishing article with window stripe
08/23/2007US20070197141 Polishing apparatus with grooved subpad
08/23/2007US20070197134 Polishing article with integrated window stripe
08/23/2007US20070197133 Polishing article with integrated window stripe
08/23/2007US20070197132 Dechuck using subpad with recess
08/23/2007US20070197118 Method for Manufacturing Light Emitting Device
08/23/2007US20070197051 High power liquid dielectric switch
08/23/2007US20070197050 Systems and methods for manipulating liquid films on semiconductor substrates
08/23/2007US20070197049 Method for manufacturing semiconductor device
08/23/2007US20070197048 Semiconductor device and method of fabricating the same
08/23/2007US20070197047 Composition for forming insulation film, insulation film for semiconductor device, and fabrication method and semiconductor device thereof
08/23/2007US20070197046 Substrate processing method and substrate processing apparatus
08/23/2007US20070197045 Process for the Production of Highly-Textured, Band-Shaped, High-Temperature Superconductors
08/23/2007US20070197044 Rapid patterning of nanostructures
08/23/2007US20070197043 Method of manufacturing a semiconductor device and semiconductor device obtained by means of said method
08/23/2007US20070197042 Method of varying etch selectivities of a film
08/23/2007US20070197041 Processing method and plasma etching method
08/23/2007US20070197040 Plasma etching method, plasma etching apparatus, control program and computer-readable storage medium
08/23/2007US20070197039 Anisotropic etching method
08/23/2007US20070197038 Method for manufacturing semiconductor device
08/23/2007US20070197037 Surface preparation for gate oxide formation that avoids chemical oxide formation
08/23/2007US20070197036 Method for manufacturing electro-optic device
08/23/2007US20070197035 Wafer and method of producing the same
08/23/2007US20070197034 Semiconductor device having a sac through-hole
08/23/2007US20070197033 High aspect ratio contacts
08/23/2007US20070197032 Semiconductor device and method for fabricating the same
08/23/2007US20070197031 Methods for forming rhodium-containing layers such as platinum-rhodium barrier layers
08/23/2007US20070197030 Center pad type ic chip with jumpers, method of processing the same and multi chip package
08/23/2007US20070197029 Method for the selective removal of an unsilicided metal
08/23/2007US20070197028 Formation of boride barrier layers using chemisorption techniques
08/23/2007US20070197027 Formation of boride barrier layers using chemisorption techniques
08/23/2007US20070197026 Synthetic Resin Containers With High Gas-Barrier Property
08/23/2007US20070197025 Multi-chip device and method for manufacturing the same
08/23/2007US20070197024 Interconnect structure and method for semiconductor device
08/23/2007US20070197023 Entire encapsulation of Cu interconnects using self-aligned CuSiN film
08/23/2007US20070197022 Manufacture Of Cadmium Mercury Telluride
08/23/2007US20070197021 Semiconductor device including spacer with nitride/nitride/oxide structure and method for fabricating the same
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