Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
11/2008
11/19/2008CN100435299C Method for preparing wiring placode
11/19/2008CN100435298C Wafer structure and bumping manufacturing process
11/19/2008CN100435297C 半导体装置及其制造方法 Semiconductor device and manufacturing method
11/19/2008CN100435296C Multi-bit non-volatile memory device and method therefor
11/19/2008CN100435295C Method for controlling number of crystal lattice defect at junctions
11/19/2008CN100435294C Process for producing oxide thin film and production apparatus therefor
11/19/2008CN100435293C Opening and contact-window formation
11/19/2008CN100435292C Non-selective etched process for GaAs/AlGaAs crystal material
11/19/2008CN100435291C Method for removing defect on back side of chip
11/19/2008CN100435290C Polishing composition and polishing method
11/19/2008CN100435289C Manufacturing method of silicon wafer
11/19/2008CN100435288C Process for producing silicon wafer
11/19/2008CN100435287C Method for removing wafer needle shape flaw and method for producing capacitor
11/19/2008CN100435286C Method of forming a nanocluster charge storage device
11/19/2008CN100435285C A method for preparing the nano-electrode with the negative electronic erosion-resisting agent
11/19/2008CN100435284C Semiconductor device with low contact resistance and method for fabricating the same
11/19/2008CN100435283C Method of making a vertical gate semiconductor device
11/19/2008CN100435282C Method for producing flash storage float grid
11/19/2008CN100435281C Method for preparing GaN base diluted magnetic semiconductor material
11/19/2008CN100435280C Semiconductor device, and method of manufacturing the same
11/19/2008CN100435279C Method for fabricating large area, self-supporting semiconductor material with wide forbidden band
11/19/2008CN100435278C Detachable substrate with controlled mechanical hold and method for prodn. thereof
11/19/2008CN100435277C Ge-based semiconductor structure and manufacturing method thereof
11/19/2008CN100435276C Vacuum processing apparatus
11/19/2008CN100435275C Semiconductor chip carrying adhesive tape/sheet, semiconductor chip carrier, semiconductor chip mounting method and semiconductor chip packaging body and method
11/19/2008CN100435274C Shower head of a wafer treatment apparatus having a gap controller
11/19/2008CN100435273C Plasma processing device and impedance adjusting method
11/19/2008CN100435272C Method for protecting etched structure in induction coupling plasma etching
11/19/2008CN100435271C Alignment method, method for manufacturing a semiconductor device, substrate for a semiconductor device, electronic equipment
11/19/2008CN100435270C Method and system to compensate for scanner system timing variability in a semiconductor wafer fabrication system
11/19/2008CN100435269C 处理系统 Processing System
11/19/2008CN100435268C Single crystal gallium nitride substrate, method for growing single crystal gallium nitride and method for mfg. substrate thereof
11/19/2008CN100435261C Low temperature formation method for electron emission chip comprising copper oxide or copper nanowire
11/19/2008CN100435241C Double-bit memory and a double-bit selected bit line decoding design and circuit
11/19/2008CN100435240C Semiconductor device
11/19/2008CN100435212C Method of manufacturing a magnetic head
11/19/2008CN100435180C Circuit board connection structure, method of forming, circuit board connection structure and display device
11/19/2008CN100435026C Developer-soluble metal alkoxide coatings for microelectronic applications
11/19/2008CN100435015C Liquid crystal display device and fabricating method thereof
11/19/2008CN100435012C Liquid crystal display device and fabrication method thereof
11/19/2008CN100435009C Liquid crystal display panel and fabricating method thereof
11/19/2008CN100435007C Liquid crystal display device and method of fabricating the same
11/19/2008CN100434961C Lighting optical device
11/19/2008CN100434568C Corrosion liquid for InGaP/ AIGaInP crystal material
11/19/2008CN100434196C Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof
11/18/2008US7454724 Method and apparatus distribution power suply pad of semiconductor integrated circuit
11/18/2008US7454720 Method for optimizing a layout of supply lines
11/18/2008US7454066 Extracting method of pattern contour, image processing method, searching method of pattern edge, scanning method of probe, manufacturing method of semiconductor device, pattern inspection apparatus, and program
11/18/2008US7454051 Method of manufacturing photo mask, mask pattern shape evaluation apparatus, method of judging photo mask defect corrected portion, photo mask defect corrected portion judgment apparatus, and method of manufacturing a semiconductor device
11/18/2008US7453728 Data storage system with enhanced reliability with respect to data destruction caused by reading-out of the data
11/18/2008US7453718 Digital data apparatuses and digital data operational methods
11/18/2008US7453672 Spin valve magnetoresistive device with conductive-magnetic material bridges in a dielectric or semiconducting layer alternatively of magnetic material
11/18/2008US7453570 Mark position measuring method and apparatus
11/18/2008US7453560 Method of evaluating optical element
11/18/2008US7453549 Reticle protection member, reticle carrying device, exposure device and method for carrying reticle
11/18/2008US7453531 LCD driving device having plural TFT channels connected in parallel with either increasing channel widths or decreasing channel distances from central part to edges of the device
11/18/2008US7453420 Display device with electrostatic discharge protection circuitry
11/18/2008US7453289 Transmission circuit, CMOS semiconductor device, and design method thereof
11/18/2008US7453272 Electrical open/short contact alignment structure for active region vs. gate region
11/18/2008US7453260 Testing circuits on substrate
11/18/2008US7453193 Electronic device containing a carbon nanotube
11/18/2008US7453160 Simplified wafer alignment
11/18/2008US7453154 Carbon nanotube via interconnect
11/18/2008US7453152 Device having reduced chemical mechanical planarization
11/18/2008US7453150 Three-dimensional face-to-face integration assembly
11/18/2008US7453147 Semiconductor device, its manufacturing method, and radio communication device
11/18/2008US7453146 High power MCM package with improved planarity and heat dissipation
11/18/2008US7453139 Compliant terminal mountings with vented spaces and methods
11/18/2008US7453138 Electronic circuit device and manufacturing method thereof
11/18/2008US7453135 Semiconductor device and method of manufacturing the same
11/18/2008US7453133 Silicide/semiconductor structure and method of fabrication
11/18/2008US7453124 Field effect transistor and fabrication method thereof
11/18/2008US7453123 Self-aligned planar double-gate transistor structure
11/18/2008US7453121 Body contact formation in partially depleted silicon on insulator device
11/18/2008US7453118 Non-volatile semiconductor memory device
11/18/2008US7453116 Semiconductor memory device and method of fabricating the same
11/18/2008US7453114 Segmented end electrode capacitor and method of segmenting an end electrode of a capacitor
11/18/2008US7453113 Ultra scalable high speed heterojunction vertical n-channel MISFETs and methods thereof
11/18/2008US7453112 Integrated circuit memory cells and methods of forming
11/18/2008US7453106 Semiconductor device with stress reducing trench fill containing semiconductor microparticles in shallow trench isolation
11/18/2008US7453103 Semiconductor constructions
11/18/2008US7453101 Semiconductor device with organic compound layer
11/18/2008US7453095 Light emitting device and manufacturing method thereof
11/18/2008US7453090 Semiconductor device including a semiconductor substrate formed with a shallow impurity region
11/18/2008US7453088 Electro-optical device and manufacturing method thereof
11/18/2008US7453087 Thin-film transistor and thin-film diode having amorphous-oxide semiconductor layer
11/18/2008US7453083 Negative differential resistance field effect transistor for implementing a pull up element in a memory cell
11/18/2008US7453072 Method for depositing a film using a charged particle beam, method for performing selective etching using the same, and charged particle beam equipment therefor
11/18/2008US7453063 Calibration substrate and method for calibrating a lithographic apparatus
11/18/2008US7453051 System and process for heating semiconductor wafers by optimizing absorption of electromagnetic energy
11/18/2008US7452830 Semiconductor devices and methods for manufacturing the same
11/18/2008US7452829 Plasma CVD method
11/18/2008US7452828 plural nanotubes mutually cross-link, formed in an arbitrary pattern on a surface of a base body; extremely fine and excellent in electrical characteristics
11/18/2008US7452827 Gas distribution showerhead featuring exhaust apertures
11/18/2008US7452826 Oxidation method and oxidation system
11/18/2008US7452825 Method of forming a mask structure and method of forming a minute pattern using the same
11/18/2008US7452824 Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
11/18/2008US7452823 Etching method and apparatus
11/18/2008US7452822 Via plug formation in dual damascene process
11/18/2008US7452821 Method for the formation of contact holes for a number of contact regions for components integrated in a substrate
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