Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2009
05/05/2009US7528051 Method of inducing stresses in the channel region of a transistor
05/05/2009US7528050 High performance field effect transistors on SOI substrate with stress-inducing material as buried insulator and methods
05/05/2009US7528049 Method for manufacturing bonded SOI wafer and bonded SOI wafer manufactured thereby
05/05/2009US7528048 Planar vertical resistor and bond pad resistor and related method
05/05/2009US7528047 Self-aligned split gate memory cell and method of forming
05/05/2009US7528046 Method for manufacturing semiconductor device
05/05/2009US7528045 MOS transistor and manufacturing methods thereof
05/05/2009US7528043 Scalable gate and storage dielectric
05/05/2009US7528042 Method for fabricating semiconductor devices having dual gate oxide layer
05/05/2009US7528041 Method of manufacturing semiconductor device that utilizes oxidation prevention film to form thick and thin gate insulator portions
05/05/2009US7528040 Methods of fabricating silicon carbide devices having smooth channels
05/05/2009US7528039 Method of fabricating flash memory
05/05/2009US7528038 Non-volatile two-transistor semiconductor memory cell and method for producing the same
05/05/2009US7528037 Flash memory having a high-permittivity tunnel dielectric
05/05/2009US7528036 Non-volatile semiconductor memory and method of making same, and semiconductor device and method of making device
05/05/2009US7528035 Vertical trench memory cell with insulating ring
05/05/2009US7528034 Method for forming ferroelectric capacitor, ferroelectric capacitor and electronic device
05/05/2009US7528033 Semiconductor device with a dummy gate and a method of manufacturing a semiconductor device with a dummy gate
05/05/2009US7528032 Method for manufacturing semiconductor device
05/05/2009US7528031 Semiconductor device and method for manufacturing the same
05/05/2009US7528030 Semiconductor device comprising at least one MOS transistor having an etch stop layer, and corresponding fabrication process
05/05/2009US7528029 Stressor integration and method thereof
05/05/2009US7528028 Super anneal for process induced strain modulation
05/05/2009US7528027 Structure and method for manufacturing device with ultra thin SOI at the tip of a V-shape channel
05/05/2009US7528026 Method for reducing silicide defects by removing contaminants prior to drain/source activation
05/05/2009US7528025 Nonplanar transistors with metal gate electrodes
05/05/2009US7528024 Dual work function metal gate integration in semiconductor devices
05/05/2009US7528023 Apparatus for crystallizing semiconductor with laser beams
05/05/2009US7528022 Method of forming fin field effect transistor using damascene process
05/05/2009US7528021 Thin film transistor array panel and method of manufacturing the same
05/05/2009US7528020 Method for forming thin film transistor
05/05/2009US7528019 Method of fabricating thin film transistor of thin film transistor liquid crystal display and method of fabricating liquid crystal display
05/05/2009US7528017 Method of manufacturing complementary diodes
05/05/2009US7528016 Semiconductor device and manufacturing method thereof
05/05/2009US7528015 Tunable antifuse element and method of manufacture
05/05/2009US7528014 Semiconductor device and method of manufacturing the same
05/05/2009US7528013 Method for fabricating high performance leadframe in electronic package
05/05/2009US7528012 Method for forming heat sinks on silicon on insulator wafers
05/05/2009US7528011 Semiconductor device and manufacturing method thereof
05/05/2009US7528010 Semiconductor component and method for producing the same
05/05/2009US7528009 Wafer-leveled chip packaging structure and method thereof
05/05/2009US7528008 Method of electrically connecting a microelectronic component
05/05/2009US7528007 Methods for assembling semiconductor devices and interposers
05/05/2009US7528006 Integrated circuit die containing particle-filled through-silicon metal vias with reduced thermal expansion
05/05/2009US7528005 Method of manufacturing chip size package semiconductor device without intermediate substrate
05/05/2009US7528002 Formation of nanowhiskers on a substrate of dissimilar material
05/05/2009US7528000 Method of fabricating optical device caps
05/05/2009US7527999 Cd1−xZnxS high performance TCR material for uncooled microbolometers used in infrared sensors and method of making same
05/05/2009US7527998 Method of manufacturing MEMS devices providing air gap control
05/05/2009US7527997 MEMS structure with anodically bonded silicon-on-insulator substrate
05/05/2009US7527996 Non-planar surface structures and process for microelectromechanical systems
05/05/2009US7527995 Method of making prestructure for MEMS systems
05/05/2009US7527994 Amorphous silicon thin-film transistors and methods of making the same
05/05/2009US7527993 Method and structure for fabricating smooth mirrors for liquid crystal on silicon devices
05/05/2009US7527992 Thin film transistor array panel and manufacturing method thereof
05/05/2009US7527991 Light emitting apparatus provided with fluorescent substance and semiconductor light emitting device, and method of manufacturing the same
05/05/2009US7527990 Solid state imaging device and producing method thereof
05/05/2009US7527989 Method for fabricating liquid crystal display panel
05/05/2009US7527988 Triode structure field emission display device using carbon nanotubes and method of fabricating the same
05/05/2009US7527987 Fast localization of electrical failures on an integrated circuit system and method
05/05/2009US7527986 Method for fabricating magnetic tunnel junction cell
05/05/2009US7527985 Method for manufacturing a resistor random access memory with reduced active area and reduced contact areas
05/05/2009US7527984 Semiconductor device
05/05/2009US7527983 Ferromagnetic material
05/05/2009US7527982 Manufacturing method of a semiconductor device including a crystalline insulation film made of perovskite type oxide
05/05/2009US7527918 Pattern forming method and method for manufacturing a semiconductor device
05/05/2009US7527909 Resist composition
05/05/2009US7527901 Exposing upper and side surfaces of phase shift pattern of mask, selectively forming a passivation layer, cleaning phase shift mask; repairing is carried out in the midst of a series of photolithographic exposure; photomask can be cleaned without damaging the phase shift pattern of the mask
05/05/2009US7527831 Method of making a molecule-surface interface
05/05/2009US7527827 Substrate processing apparatus and substrate processing method
05/05/2009US7527826 Coating a substrate surface with a sacrificial organic acid layer; and exposing it to a metal precursor and a reducing agent to deposit the metal or alloy and to remove completely the acid layer; excellent adhesion; forming integrated circuits
05/05/2009US7527822 Ferroelectric thin film formation composition, ferroelectric thin film and method of fabricating ferroelectric thin film
05/05/2009US7527743 Apparatus and method for etching insulating film
05/05/2009US7527723 Ion exchanger; surface smoothness; removal residues from workpiece
05/05/2009US7527722 Electrochemical mechanical planarization
05/05/2009US7527706 Plasma processing apparatus, process vessel for plasma processing apparatus and dielectric plate for plasma processing apparatus
05/05/2009US7527704 Forming a SiO2 layer on a silicon substrate; applying a heat-curable conductive adhesive layer; laminating the single crystal plate on the adhesive; heat curing; and polishing, polarizing and etching the crystal plate; fabrication of many electric or electronic devices including a microactuator
05/05/2009US7527698 Method and apparatus for removing a liquid from a surface of a substrate
05/05/2009US7527694 Substrate gripping apparatus
05/05/2009US7527690 Ferroelectric ceramic compound, a ferroelectric ceramic single crystal, and preparation processes thereof
05/05/2009US7527676 Unit for separating gas
05/05/2009US7527662 Resin structure and abrasive grains, wherein a critical surface tension of the resin is within a specified range; for chemical mechanical polishing; polishing efficiency, quality without any slurry
05/05/2009US7527658 Method of manufacturing displays and apparatus for manufacturing displays
05/05/2009US7527442 Process for forming resist pattern, and resist coating and developing apparatus
05/05/2009US7527205 Automated package dimensioning system
05/05/2009US7527188 Self-encapsulated silver alloys for interconnects
05/05/2009US7527141 System for transporting substrate carriers
05/05/2009US7527016 Plasma processing apparatus
05/05/2009US7526948 Device and method for detecting foreign material on the surface of plasma processing apparatus
05/05/2009US7526858 Apparatus for making electronic devices
05/05/2009CA2322595C Method of making an ohmic contact to p-type silicon carbide, comprising titanium carbide and nickel silicide
05/02/2009CA2609840A1 Micropillar array electrospray chip
04/2009
04/30/2009WO2009055834A2 Cyclic nucleation process
04/30/2009WO2009055572A2 Semiconductor structure and method of manufacture
04/30/2009WO2009055570A2 Semiconductor structure and method of manufacture
04/30/2009WO2009055565A2 Semiconductor structure and method of manufacture
04/30/2009WO2009055431A1 Plasma doping system with in-situ chamber condition monitoring
04/30/2009WO2009055384A1 Selective silicide formation using resist etch back
04/30/2009WO2009055340A1 Methods for forming a silicon oxide layer over a substrate
04/30/2009WO2009055317A2 Process for removing ion-implanted photoresist