Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2009
04/23/2009WO2009051789A1 Method of forming conformal silicon layer for recessed source-drain
04/23/2009WO2009051763A2 Apparatus and methods for optimizing cleaning of patterned substrates
04/23/2009WO2009051716A2 Reconfigurable connections for stacked semiconductor devices
04/23/2009WO2009051663A2 Transistor device and method
04/23/2009WO2009051650A1 Gallium nitride semiconductor device on soi and process for making same
04/23/2009WO2009051631A1 Baw structure with reduced topographic steps and related method
04/23/2009WO2009051468A1 High speed linear pick-and-place
04/23/2009WO2009051467A1 High speed tray transfer system
04/23/2009WO2009051466A1 Perspective switching optical device for 3d semiconducter inspection
04/23/2009WO2009051465A1 Overhead traveling camera inspection system
04/23/2009WO2009051288A1 Temperature control system for semiconductor manufacturing equipment
04/23/2009WO2009051237A1 Remover liquid composition and method for removing resin layer by using the same
04/23/2009WO2009051199A1 Optical member cooling apparatus, lens barrel, exposure apparatus and device manufacturing method
04/23/2009WO2009051194A1 Membrane structure element and process for producing the same
04/23/2009WO2009051163A1 Semiconductor device and method for manufacturing the same
04/23/2009WO2009051105A1 Switching element and switching element manufacturing method
04/23/2009WO2009051087A1 Plasma film forming apparatus
04/23/2009WO2009051079A1 Electrostatic reinforcing apparatus
04/23/2009WO2009051041A1 Method of manufacturing display apparatus
04/23/2009WO2009051004A1 Electronic component mounting apparatus and mounting method
04/23/2009WO2009050966A1 Light transmission optical system, illumination optical system, exposure apparatus, and device manufacturing method
04/23/2009WO2009050958A1 High frequency plasma cvd apparatus, high frequency plasma cvd method and semiconductor thin film manufacturing method
04/23/2009WO2009050933A1 Glass substrate packing box
04/23/2009WO2009050891A1 Mounting structure
04/23/2009WO2009050871A1 Semiconductor device and method for manufacturing the same
04/23/2009WO2009050861A1 Nonvolatile memory element and its fabrication method, and nonvolatile semiconductor device using the nonvolatile memory element
04/23/2009WO2009050849A1 Substrate processing apparatus
04/23/2009WO2009050840A1 Insulating film forming method and semiconductor element
04/23/2009WO2009050787A1 Pressure-sensitive adhesive sheet for fixing electronic part and process for producing electronic part with the same
04/23/2009WO2009050786A1 Pressure-sensitive adhesive, pressure-sensitive adhesive sheet, multilayered pressure-sensitive adhesive sheet, and method for manufacturing electronic component
04/23/2009WO2009050785A1 Pressure-sensitive adhesive, pressure-sensitive adhesive sheet, multilayered pressure-sensitive adhesive sheet, and process for producing electronic part
04/23/2009WO2009050669A2 High voltage semiconductor device
04/23/2009WO2009050645A1 Method of manufacturing localized semiconductor-on-insulator (soi) structures in a bulk semiconductor wafer
04/23/2009WO2009050381A2 Method for heating a plate with a light stream
04/23/2009WO2009050379A1 Method for making a semi-conducting substrate located on an insulation layer
04/23/2009WO2009050207A1 Method for producing electrical interconnects and devices made thereof
04/23/2009WO2009049963A1 Semiconductor structures having improved contact resistance
04/23/2009WO2009049957A1 Composite element consisting of at least two semiconductor substrates, and production method
04/23/2009WO2009028890A3 Chamber cover
04/23/2009WO2009027625A3 Patterning method
04/23/2009WO2009023727A3 Automated contact alignment tool
04/23/2009WO2009023154A3 Systems configured to inspect a wafer
04/23/2009WO2009020773A3 Semiconductor structures including tight pitch contacts and methods to form same
04/23/2009WO2009017672A3 Wire saw process
04/23/2009WO2008106235A9 Trench mosgated device with deep trench between gate trenches
04/23/2009WO2008096211A4 Measurement of critical dimensions of semiconductor wafers
04/23/2009WO2008065652A3 Ros generation by nanoparticles, microbubbles and their use
04/23/2009WO2008048259A3 Wet processing using a fluid meniscus, apparatus and method
04/23/2009WO2008047240A3 Methods of making optical waveguide structures by way of molecular beam epitaxy
04/23/2009WO2007122585A3 Method of manufacturing a semiconductor device, semiconductor device obtained herewith, and slurry suitable for use in such a method
04/23/2009WO2007099475A3 Gas bubble storage
04/23/2009WO2007094824A3 Method for double-sided processing of thin film transistors
04/23/2009WO2007050736A3 Vertical structure semiconductor devices and method of fabricating the same
04/23/2009WO2007050579A3 Semiconductor device and method for providing a reduced surface area electrode
04/23/2009WO2007041595A3 Iii-nitride semiconductor fabrication
04/23/2009WO2007041040A3 Gate dielectric material having reduced metal content
04/23/2009WO2007035761A3 Planarization of metal layer over photoresist
04/23/2009WO2007033008A3 Removal of particle contamination on patterned silicon/silicon dioxide using dense fluid/chemical formulations
04/23/2009WO2007030709A3 METHOD FOR ENHANCING GROWTH OF SEMI-POLAR (Al, In,Ga,B)N VIA METALORGANIC CHEMICAL VAPOR DEPOSITION
04/23/2009WO2007030226A3 Backside thinned image sensor with integrated lens stack
04/23/2009WO2007027275A3 Interrupted deposition process for selective deposition of si-containing films
04/23/2009WO2007025199A3 Multi-level cleanspace fabricator elevator system
04/23/2009WO2007024341A3 Method of preparing a film layer-by-layer using plasma enhanced atomic layer deposition
04/23/2009WO2007021421A3 Low temperature formation of patterned epitaxial si containing films
04/23/2009WO2007015903A3 High voltage non punch through igbt for switch mode power supplies
04/23/2009WO2007014116A3 Electronic device including discontinuous storage elements
04/23/2009WO2007011739A3 Polymers with low band gaps and high charge mobility
04/23/2009WO2007002857A3 Structures and methods for forming shielded gate field effect transistors
04/23/2009WO2006130359A3 Light emitting nanowires for macroelectronics
04/23/2009WO2006122125A3 Magnetic assist manufacturing to reduce mold flash and assist with heat slug assembly
04/23/2009WO2006107514A3 Method of inhibiting copper corrosion during supercritical co2 cleaning
04/23/2009WO2006104980A3 Laser facet passivation
04/23/2009WO2006080999A3 Non-volatile nanocrystal memory and method therefor
04/23/2009WO2006078779A3 Methods for depositing tungsten layers employing atomic layer deposition techniques
04/23/2009WO2006060752A3 Wet etching of the edge and bevel of a silicon wafer
04/23/2009WO2006038974A3 A method and system for forming a feature in a high-k layer
04/23/2009WO2006029169A3 Grooved substrates for uniform underfilling solder ball assembled electronic devices
04/23/2009US20090106728 Routing methods for integrated circuit designs
04/23/2009US20090106531 Field programmable gate array and microcontroller system-on-a-chip
04/23/2009US20090106483 Secure personalization of memory-based electronic devices
04/23/2009US20090105990 Method for analyzing defect data and inspection apparatus and review system
04/23/2009US20090105980 Plasma processing apparatus and method for detecting status of said apparatus
04/23/2009US20090105867 Temperature control method, method of obtaining a temperature correction value, method of manufacturing a semiconductor device and substrate treatment apparatus
04/23/2009US20090105596 Transducer arrays for medical ultrasound and method of making the same
04/23/2009US20090104856 abrasion resistant; excellent in removal rate and in-plane uniformity; stable removal rate even when polishing a number of objects; irradiating sheet-shaped polymer molded article with an electron beam within an irradiation dose of 10 to 400 kGy; less processing time; 1,2-polybutadiene; cyclodextrin
04/23/2009US20090104850 Polishing pad
04/23/2009US20090104847 Polishing monitoring method and polishing apparatus
04/23/2009US20090104792 Semiconductor Device Producing Method
04/23/2009US20090104791 Methods for Forming a Silicon Oxide Layer Over a Substrate
04/23/2009US20090104790 Methods for Forming a Dielectric Layer Within Trenches
04/23/2009US20090104789 Method and system for improving dielectric film quality for void free gap fill
04/23/2009US20090104788 Method of producing insulator thin film, insulator thin film, method of manufacturing semiconductor device, and semiconductor device
04/23/2009US20090104787 Plasma nitriding method, method for manufacturing semiconductor device and plasma processing apparatus
04/23/2009US20090104786 Method of fabricating semiconductor device
04/23/2009US20090104785 Patterning method for light-emitting devices
04/23/2009US20090104784 Functional film containing structure and method of manufacturing functional film
04/23/2009US20090104783 Asher, Ashing Method and Impurity Doping Apparatus
04/23/2009US20090104782 Selective etching of silicon nitride
04/23/2009US20090104781 Plasma processing apparatus, ring member and plasma processing method
04/23/2009US20090104780 Method for manufacturing semicondcutor device