Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2009
04/29/2009CN100483693C Semiconductor package and method for manufacturing the same
04/29/2009CN100483691C Flash memory device and a method of fabricating the same
04/29/2009CN100483690C Method for mfg. double layer polysilicon rewritable non-volatile memory
04/29/2009CN100483689C Method for preparing capacitor structure of semiconductor storage
04/29/2009CN100483688C Method for making flash memory
04/29/2009CN100483687C Metal gate transistor for cmos process and method for making
04/29/2009CN100483686C Double-extension manufacturing technique for double-pole suspending PNP pipe adopting phosphorus-buried technology
04/29/2009CN100483685C Method for manufacturing of cmos image sensor
04/29/2009CN100483684C Method for manufacturing semiconductor device having metal silicide layer
04/29/2009CN100483683C CMOS image sensor and manufacturing method thereof
04/29/2009CN100483682C Making and detection method of silicon base LCD chip base plate
04/29/2009CN100483681C Method for transmitting data in data processing and virtual integrated circuit manufacturing environment
04/29/2009CN100483680C Method for fabricating capacitor in semiconductor device
04/29/2009CN100483679C Method of reducing serial resistance between inductance in chip and antenna in chip
04/29/2009CN100483678C Semiconductor structure and method of forming the same
04/29/2009CN100483677C Method for preparing integrated circuit copper interconnecting line and barrier layer with ultrasonic chemistry
04/29/2009CN100483676C Production method of metal wiring structure
04/29/2009CN100483675C Method for forming double mosaic structure
04/29/2009CN100483674C Method for manufacturing inlaid structure
04/29/2009CN100483673C Forming method for contact hole
04/29/2009CN100483672C Fabrication method
04/29/2009CN100483671C Methods for forming semiconductor structures with buried isolation collars and semiconductor structures formed by these methods
04/29/2009CN100483670C Method for forming isolation structure of shallow plough groove
04/29/2009CN100483669C Method for manufacturing isolation structure of shallow plough groove
04/29/2009CN100483668C Forming method of shallow plow groove isolation structure
04/29/2009CN100483667C Method for forming shallow groove separation structure and shallow groove separation structure
04/29/2009CN100483666C Recycling of a wafer comprising a multi-layer structure after taking-off a thin layer
04/29/2009CN100483665C Semiconductor isolating structure and its forming method
04/29/2009CN100483664C Tcp handler, and method of detecting defective punching hole therefor
04/29/2009CN100483663C A method for making CDSEM calibration sample
04/29/2009CN100483662C Implementation method for 3D integrated circuit
04/29/2009CN100483661C Package method for preventing chip interference and its package structure
04/29/2009CN100483660C Semiconductor device, method and apparatus for testing same, and method for manufacturing semiconductor device
04/29/2009CN100483659C Manufacturing method for packaging structure
04/29/2009CN100483658C Mold compound cap in a flip chip multi-matrix array package and process of making same
04/29/2009CN100483657C Resin molding machine
04/29/2009CN100483656C Tape feeding apparatus for molding system and method having the same
04/29/2009CN100483655C Producing process for digital camera module
04/29/2009CN100483654C Preparation method of high-thermal conductivity electronic packaging shell with laser welding capacity
04/29/2009CN100483653C Process and integration scheme for fabricating conductive components through-vias and semiconductor components including conductive through-wafer vias
04/29/2009CN100483652C Groove power semiconductor device and its making method
04/29/2009CN100483651C Process for fabricating semiconductor device
04/29/2009CN100483650C Method for restraining edge breakdown of avalanche photodiode
04/29/2009CN100483649C Method for the creation of an integrated electronic circuit and integrated electronic circuit thus obtained
04/29/2009CN100483648C Semiconductor device and producing method and electroplating liquid
04/29/2009CN100483647C Method for depositing porous films
04/29/2009CN100483646C High-throughput HDP-CVD processes for advanced gapfill applications
04/29/2009CN100483645C Plasma treatment to improve adhesion of low k dielectrics
04/29/2009CN100483644C Semiconductor device and manufacturing method thereof
04/29/2009CN100483643C A new method for making low dielectric constant layer and its application
04/29/2009CN100483642C Manufacturing method for display device
04/29/2009CN100483641C Fine processing treatment agent and fine processing treatment method using same
04/29/2009CN100483640C Releasing method and releasing apparatus of work having adhesive tape
04/29/2009CN100483639C Method for manufacturing integrated circuit
04/29/2009CN100483638C Method of forming bank, method of forming film pattern, device, and electronic apparatus
04/29/2009CN100483637C Method of forming a metal layer using an intermittent precursor gas flow process
04/29/2009CN100483636C Atomic layer deposition methods
04/29/2009CN100483635C Semiconductor device grid preparation method and semiconductor device
04/29/2009CN100483634C Semiconductor device grids preparation method and semiconductor device
04/29/2009CN100483633C Fabricating method for semiconductor device
04/29/2009CN100483632C Method of manufacturing semiconductor device
04/29/2009CN100483631C Localized annealing of metal-silicon carbide ohmic contacts and devices so formed
04/29/2009CN100483630C Multiple mask and method for producing differently doped regions
04/29/2009CN100483629C Semiconductor device and method of manufacturing the same
04/29/2009CN100483628C Fabrication of crystalline materials over substrates
04/29/2009CN100483627C Gan substrate and method of fabricating the same, nitride semiconductor device and method of fabricating the same
04/29/2009CN100483626C P type doping method for cubic boron nitride thin film
04/29/2009CN100483625C Exposure apparatus, exposure method and device manufacturing method
04/29/2009CN100483624C Coater/developer and coating/developing method
04/29/2009CN100483623C Multilayer semiconductor integrated circuit, light shield used therefor and manufacturing method thereof
04/29/2009CN100483622C Method for controlling tantalumoxide embedded film resistor precision for anode oxidation process
04/29/2009CN100483621C Substrate processing apparatus and substrate processing method
04/29/2009CN100483620C Plasma processing device
04/29/2009CN100483619C Transfer substrate, transfer method, and organic electroluminescent device manufacturing method
04/29/2009CN100483618C Base plate processing device
04/29/2009CN100483617C Base plate processing device and base plate processing method
04/29/2009CN100483616C Forming method for thin film coated layer
04/29/2009CN100483615C Substrate processing device and substrate processing system
04/29/2009CN100483614C Apparatus for manufacturing substrate
04/29/2009CN100483613C Quantum point making method
04/29/2009CN100483612C Method of fabricating vertical structure compound semiconductor devices
04/29/2009CN100483611C Device and method for applying semiconductor chips to carriers
04/29/2009CN100483610C Conductive etch stop for etching a sacrificial layer
04/29/2009CN100483609C Method of manufacturing an active matrix substrate and an image display device using the same
04/29/2009CN100483566C Ferroelectric film, semiconductor device, ferroelectric film manufacturing method, and ferroelectric film manufacturing apparatus
04/29/2009CN100483558C Memory independent on testing group function and system for replacing fault stored word
04/29/2009CN100483544C Magnetic random access memory having a vertical write line
04/29/2009CN100483542C Nonvolatile memory cell and non-volatile semiconductor memory device
04/29/2009CN100483487C Image display apparatus using thin-film transistors
04/29/2009CN100483334C Method for executing model-based optical proximity correction
04/29/2009CN100483261C Method of forming photoresist pattern
04/29/2009CN100483258C Exposure pattern forming method
04/29/2009CN100483257C Method and system for imaging interference photoetching adopting white laser
04/29/2009CN100483254C Method for correcting exposure metering device by exposure critical energy value
04/29/2009CN100483251C Optical component keeper of exposure equipment
04/29/2009CN100483240C Process for manufacturing pixel structure of liquid crystal display
04/29/2009CN100483238C Manufacturing method for reflection mirror of silicon-based LCD device
04/29/2009CN100483237C Array substrate for ips-mode LCD device and method of fabricating the same
04/29/2009CN100483233C Pixel structure of panel display device and method for fabricating same
04/29/2009CN100483232C TFT LCD array substrate structure and its production method