Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2014
07/01/2014US8766372 Copper-filled trench contact for transistor performance improvement
07/01/2014US8766371 Semiconductor structure and method for manufacturing the same
07/01/2014US8766370 Single metal dual dielectric CMOS device
07/01/2014US8766369 Semiconductor device and method of manufacturing semiconductor device
07/01/2014US8766368 Semiconductor devices having double-layered metal contacts and methods of fabricating the same
07/01/2014US8766360 Insulative cap for borderless self-aligning contact in semiconductor device
07/01/2014US8766352 Semiconductor devices and method of manufacturing the same
07/01/2014US8766348 Semiconductor device with selectively located air gaps and method of fabrication
07/01/2014US8766347 Capacitors
07/01/2014US8766342 Electroless Cu plating for enhanced self-forming barrier layers
07/01/2014US8766341 Epitaxial growth of single crystalline MgO on germanium
07/01/2014US8766336 Method for depinning the fermi level of a semiconductor at an electrical junction and devices incorporating such junctions
07/01/2014US8766335 Semiconductor device
07/01/2014US8766334 Semiconductor device with low resistance gate electrode and method of manufacturing the same
07/01/2014US8766306 Transparent light emitting device with controlled emission
07/01/2014US8766301 Light extracting member
07/01/2014US8766300 Light emitting device, light emitting device package comprising the same and lighting system
07/01/2014US8766296 Highly efficient gallium nitride based light emitting diodes via surface roughening
07/01/2014US8766293 Light-emitting device and method for manufacturing the same
07/01/2014US8766285 Self-luminous display and method of manufacturing the same
07/01/2014US8766284 Stackable optoelectronics chip-to-chip interconnects and method of manufacturing
07/01/2014US8766280 Protective substrate for a device that collects or emits radiation
07/01/2014US8766278 Silicon carbide semiconductor device
07/01/2014US8766274 Thermal expansion engineering for polycrystalline aluminum nitride sintered bodies
07/01/2014US8766270 Pixel structure and manufacturing method thereof
07/01/2014US8766258 Authentication using graphene based devices as physical unclonable functions
07/01/2014US8766257 Test pad structure for reuse of interconnect level masks
07/01/2014US8766256 SiGe SRAM butted contact resistance improvement
07/01/2014US8766251 Functional material for printed electronic components
07/01/2014US8766237 Homo-material heterophased quantum well
07/01/2014US8766231 Nanoscale electronic device with barrier layers
07/01/2014US8766229 Electronic memory device
07/01/2014US8766228 Electrically actuated device and method of controlling the formation of dopants therein
07/01/2014US8766085 Photoelectric conversion device and method of manufacturing the same
07/01/2014US8765618 Annealing apparatus using two wavelengths of continuous wave laser radiation
07/01/2014US8765617 Method of manufacturing semiconductor device
07/01/2014US8765616 Zirconium-doped tantalum oxide films
07/01/2014US8765615 Quartz-based MEMS resonators and methods of fabricating same
07/01/2014US8765614 Method of forming a metal pattern and method of manufacturing a display substrate including the metal pattern
07/01/2014US8765613 High selectivity nitride etch process
07/01/2014US8765612 Double patterning process
07/01/2014US8765611 Etching process for semiconductors
07/01/2014US8765610 Method for manufacturing semiconductor device
07/01/2014US8765609 Deposit/etch for tapered oxide
07/01/2014US8765608 Methods for forming trenches
07/01/2014US8765607 Active tiling placement for improved latch-up immunity
07/01/2014US8765606 Silicon surface preparation
07/01/2014US8765605 Surface treatment for a fluorocarbon film
07/01/2014US8765604 Interconnection structure for an integrated circuit
07/01/2014US8765603 Method of forming a buffer layer
07/01/2014US8765601 Post deposition treatments for CVD cobalt films
07/01/2014US8765600 Contact structure for reducing gate resistance and method of making the same
07/01/2014US8765599 Semiconductor devices having dielectric caps on contacts and related fabrication methods
07/01/2014US8765598 Conductive structures, systems and devices including conductive structures and related methods
07/01/2014US8765597 Fluorine depleted adhesion layer for metal interconnect structure
07/01/2014US8765596 Atomic layer profiling of diffusion barrier and metal seed layers
07/01/2014US8765595 Thick on-chip high-performance wiring structures
07/01/2014US8765594 Method of fabricating semiconductor device allowing smooth bump surface
07/01/2014US8765593 Controlled collapse chip connection (C4) structure and methods of forming
07/01/2014US8765592 Multi-landing contact etching
07/01/2014US8765591 Semiconductor device having metal gate and manufacturing method thereof
07/01/2014US8765590 Insulative cap for borderless self-aligning contact in semiconductor device
07/01/2014US8765589 Semiconductor device manufacturing method
07/01/2014US8765588 Semiconductor process
07/01/2014US8765587 Method of manufacturing non-volatile memory devices
07/01/2014US8765586 Methods of forming metal silicide regions on semiconductor devices
07/01/2014US8765585 Method of forming a borderless contact structure employing dual etch stop layers
07/01/2014US8765584 Semiconductor device and manufacturing method therefor
07/01/2014US8765583 Angled multi-step masking for patterned implantation
07/01/2014US8765582 Method for extreme ultraviolet electrostatic chuck with reduced clamp effect
07/01/2014US8765581 Self-aligned cross-point phase change memory-switch array
07/01/2014US8765580 Method for fabricating semiconductor devices
07/01/2014US8765579 Semiconductor wafer processing method
07/01/2014US8765578 Edge protection of bonded wafers during wafer thinning
07/01/2014US8765577 Defect free strained silicon on insulator (SSOI) substrates
07/01/2014US8765576 Process for producing laminated substrate and laminated substrate
07/01/2014US8765575 Shallow trench forming method
07/01/2014US8765574 Dry etch process
07/01/2014US8765573 Air gap formation
07/01/2014US8765572 Method of fabricating semiconductor device
07/01/2014US8765571 Method of manufacturing a base substrate for a semi-conductor on insulator type substrate
07/01/2014US8765570 Manufacturable high-k DRAM MIM capacitor structure
07/01/2014US8765569 Molybdenum oxide top electrode for DRAM capacitors
07/01/2014US8765567 Nonvolatile memory elements
07/01/2014US8765565 Nonvolatile memory device and method for manufacturing same
07/01/2014US8765564 Methods of forming variable resistive memory devices
07/01/2014US8765563 Trench confined epitaxially grown device layer(s)
07/01/2014US8765562 Method for manufacturing silicon carbide semiconductor device
07/01/2014US8765561 Method for fabricating semiconductor device
07/01/2014US8765560 Method for manufacturing semiconductor device with multiple carbon and phosphorus ion implants
07/01/2014US8765559 Sophisticated gate electrode structures formed by cap layer removal with reduced loss of embedded strain-inducing semiconductor material
07/01/2014US8765558 Replacement gate CMOS
07/01/2014US8765557 Method for manufacturing silicon carbide semiconductor device
07/01/2014US8765556 Method of fabricating strained structure in semiconductor device
07/01/2014US8765555 Phase change memory cells and methods of forming phase change memory cells
07/01/2014US8765554 Compound semiconductor device and method for manufacturing the same
07/01/2014US8765553 Nonvolatile memory array having modified channel region interface
07/01/2014US8765552 Non-volatile storage having a connected source and well
07/01/2014US8765551 Non-volatile memory device having vertical structure and method of manufacturing the same
07/01/2014US8765550 N-channel erasable programmable non-volatile memory
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