Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2010
03/16/2010US7678628 Methods of fabricating nitride-based transistors with a cap layer and a recessed gate
03/16/2010US7678627 Process for producing thin film transistor having LDD region
03/16/2010US7678626 Method and system for forming a thin film device
03/16/2010US7678625 Methods of fabricating semiconductor devices including channel layers having improved defect density and surface roughness characteristics
03/16/2010US7678624 Semiconductor device and method for manufacturing same
03/16/2010US7678623 Staggered source/drain and thin-channel TFT structure and fabrication method thereof
03/16/2010US7678622 Semiconductor method and device with mixed orientation substrate
03/16/2010US7678621 Crystallization pattern and method for crystallizing amorphous silicon using the same
03/16/2010US7678620 Antifuse one time programmable memory array and method of manufacture
03/16/2010US7678619 Method of manufacturing a thin film transistor matrix substrate
03/16/2010US7678617 Universal laminator
03/16/2010US7678616 Thermal management method including a metallic layer directly on an integrated heat spreader and integrated circuit
03/16/2010US7678615 Semiconductor device with gel-type thermal interface material
03/16/2010US7678614 Thermal interface material and method for making the same
03/16/2010US7678613 Integrated circuit edge protection method and apparatus
03/16/2010US7678612 Method of manufacturing semiconductor device
03/16/2010US7678611 Spacer die structure and method for attaching
03/16/2010US7678610 Semiconductor chip package and method of manufacture
03/16/2010US7678609 Semiconductor package with redistributed pads
03/16/2010US7678608 Process for producing wiring circuit board
03/16/2010US7678607 Methods for forming resistive switching memory elements
03/16/2010US7678606 Phase change memory device and fabrication method thereof
03/16/2010US7678605 Method for chemical mechanical planarization of chalcogenide materials
03/16/2010US7678604 Method for manufacturing CMOS image sensor
03/16/2010US7678601 Method of forming an acceleration sensor
03/16/2010US7678600 Process for manufacturing a membrane of semiconductor material integrated in, and electrically insulated from, a substrate
03/16/2010US7678599 Process for the fabrication of an inertial sensor with failure threshold
03/16/2010US7678598 Method for manufacturing surface-emitting semiconductor laser
03/16/2010US7678597 Method of manufacturing semiconductor device including gallium-nitride semiconductor structure and a palladium contact
03/16/2010US7678595 Method for forming a light emitting apparatus
03/16/2010US7678594 Integrated optical device and fabrication method thereof
03/16/2010US7678593 Method of fabricating optical device using multiple sacrificial spacer layers
03/16/2010US7678592 LED housing and fabrication method thereof
03/16/2010US7678590 Organic electroluminescence device and method for manufacturing same
03/16/2010US7678589 Semiconductor device for providing capacitive semiconductor sensor and method for manufacturing capacitive semiconductor sensor
03/16/2010US7678588 Method for constructing module for optical critical dimension (OCD) and measuring method of module for optical critical dimension using the module
03/16/2010US7678586 Structure and method to prevent charge damage from e-beam curing process
03/16/2010US7678585 Magnetoresistive sensor module and method of manufacturing the same
03/16/2010US7678535 Method for fabricating semiconductor device with recess gate
03/16/2010US7678516 phase shifting; lithography
03/16/2010US7678513 phase shift masks; lithography
03/16/2010US7678510 photomasks; phase shifting
03/16/2010US7678509 Method of producing phase shift masks
03/16/2010US7678508 water-soluble dust-free protective film; photomasks; photoresists
03/16/2010US7678462 Spin-on-glass anti-reflective coatings for photolithography
03/16/2010US7678460 cap layer and a photoresist layer are each formed over the photopatternable layer; cap layer absorbs or reflects radiation and protects the photopatternable layer from a first wavelength of radiation used in patterning photoresist layer; photopatternable material is convertible to a SiO2 based material
03/16/2010US7678319 Mold and molding apparatus using the same
03/16/2010US7678288 Method and structure for manufacturing bonded substrates using multiple photolithography tools
03/16/2010US7678245 Method and apparatus for electrochemical mechanical processing
03/16/2010US7678241 Two types of film forming mechanisms in the same chamber so the second electrode thin film formed without taking out the substrate from the chamber after the first electrode thin film is formed; prevents contaminationby inert gas absorption; electrical properties; antipeeling agents
03/16/2010US7678226 Method and apparatus for an improved bellows shield in a plasma processing system
03/16/2010US7678225 Focus ring for semiconductor treatment and plasma treatment device
03/16/2010US7678211 Device and method for joining substrates
03/16/2010US7678200 Technique on ozone water for use in cleaning semiconductor substrate
03/16/2010US7678197 Susceptor device
03/16/2010US7678194 Method for providing gas to a processing chamber
03/16/2010US7677959 Multilayer polishing pad and method of making
03/16/2010US7677958 Retaining ring with flange for chemical mechanical polishing
03/16/2010US7677957 Polishing apparatus, method for providing and mounting a polishing pad in a polishing apparatus, and method for producing a substrate using the polishing apparatus
03/16/2010US7677956 Compositions and methods for dielectric CMP
03/16/2010US7677955 Grinding method for wafer
03/16/2010US7677874 Vacuum molding apparatus
03/16/2010US7677859 Substrate loading and uploading station with buffer
03/16/2010US7677858 Vertical heat treatment system and method of transferring process objects
03/16/2010US7677696 Liquid discharge head
03/16/2010US7677523 Gravity compensation device for a chip transfer apparatus
03/16/2010US7677429 Concave face wire bond capillary and method
03/16/2010US7677394 Wafer shipping container
03/16/2010US7677393 Wafer container and door with vibration dampening latching mechanism
03/16/2010CA2411606C Preparation method of a coating of gallium nitride
03/11/2010WO2010028304A2 Cmp system with wireless endpoint detection system
03/11/2010WO2010028269A2 Stable amorphous metal oxide semiconductor
03/11/2010WO2010028268A1 Coated substrates and semiconductor devices including the substrates
03/11/2010WO2010028180A2 Adjusting polishing rates by using spectrographic monitoring of a substrate during processing
03/11/2010WO2010028177A1 High sensitivity photodetectors, imaging arrays, and high efficiency photovoltaic devices produced using ion implantation and femtosecond laser irradiation
03/11/2010WO2010028171A1 Low leakage and/or low turn-on voltage schottky diode
03/11/2010WO2010028136A2 Probe block assembly
03/11/2010WO2010028112A2 Quantum dots, methods of making quantum dots, and methods of using quantum dots
03/11/2010WO2010028023A1 Wafer processing apparatus having a tunable electrical resistivity
03/11/2010WO2010027990A1 Junction termination extension with controllable doping profile and controllable width for high-voltage electronic devices
03/11/2010WO2010027962A2 Method of forming a nanoscale three-demensional pattern in a porous semiconductor
03/11/2010WO2010027897A1 Method of manufacturing wafer laminated body, device of manufacturing wafer laminated body, wafer laminated body, method of peeling support body, and method of manufacturing wafer
03/11/2010WO2010027841A2 High speed deposition of materials having low defect density
03/11/2010WO2010027727A2 Devices containing permanent charge
03/11/2010WO2010027715A1 Method for forming aluminum-doped metal carbonitride gate electrodes
03/11/2010WO2010027712A2 Laser material removal methods and apparatus
03/11/2010WO2010027669A2 In-situ chamber treatment and deposition process
03/11/2010WO2010027643A2 Carrier having integral detection and measurement of environmental parameters
03/11/2010WO2010027548A1 Power mosfet with a gate structure of different material
03/11/2010WO2010027406A2 Copper layer processing
03/11/2010WO2010027400A2 Post etch reactive plasma milling to smooth through substrate via sidewalls and other deeply etched features
03/11/2010WO2010027395A2 Backside illuminated image sensor with backside trenches
03/11/2010WO2010027232A2 Paste and manufacturing methods of a solar cell using the same
03/11/2010WO2010027178A2 Deposition apparatus and deposition method using the same
03/11/2010WO2010027145A1 Mems probe card and method of manufacturing same
03/11/2010WO2010027112A1 Method of manufacturing multi-level metal thin film and apparatus for manufacturing the same
03/11/2010WO2010027075A1 Wiring board and probe card
03/11/2010WO2010027073A1 Semiconductor fabrication device component and semiconductor fabrication device
03/11/2010WO2010027044A1 Substrate, substrate provided with epitaxial layer and methods for manufacturing the substrates
03/11/2010WO2010026998A1 Reflective mask blank for euv lithography and method for producing the same
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