Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2010
03/16/2010US7679179 Castellation wafer level packaging of integrated circuit chips
03/16/2010US7679165 High brightness light emitting diode with a bidirectionally angled substrate
03/16/2010US7679152 Micromechanical device, micromechanical system, apparatus for adjusting sensitivity of a micromechanical device, method for producing a micromechanical device
03/16/2010US7679148 Semiconductor device, production method and production device thereof
03/16/2010US7679144 Semiconductor device and method for manufacturing the same
03/16/2010US7679141 High-quality SGOI by annealing near the alloy melting point
03/16/2010US7679134 FinFET device with multiple fin structures
03/16/2010US7679128 Semiconductor device and method of fabricating the same
03/16/2010US7679127 Semiconductor device and method of manufacturing the same
03/16/2010US7679123 Integrated circuit devices including a capacitor
03/16/2010US7679121 Ultra scalable high speed heterojunction vertical n-channel MISFETs and methods thereof
03/16/2010US7679120 Method for the production of a semiconductor substrate comprising a plurality of gate stacks on a semiconductor substrate, and corresponding semiconductor structure
03/16/2010US7679110 Electrochemical device and methods for producing the same
03/16/2010US7679087 Semiconductor active region of TFTs having radial crystal grains through the whole area of the region
03/16/2010US7679084 Thin film transistor array panel and method for fabricating the same
03/16/2010US7679030 Energy-efficient, laser-based method and system for processing target material
03/16/2010US7679028 Methods for producing uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors using sequential lateral solidification
03/16/2010US7678720 Glass ceramics comprising beta-quartz or beta-quartz solid solution
03/16/2010US7678715 Low wet etch rate silicon nitride film
03/16/2010US7678714 Method for manufacturing dynamic random access memory
03/16/2010US7678713 Energy beam treatment to improve packaging reliability
03/16/2010US7678712 Vapor phase treatment of dielectric materials
03/16/2010US7678711 Semiconductor device, and method and apparatus for manufacturing the same
03/16/2010US7678710 Method and apparatus for fabricating a high dielectric constant transistor gate using a low energy plasma system
03/16/2010US7678709 Method of forming low-temperature conformal dielectric films
03/16/2010US7678708 forming a metal oxide layer, preferably a dielectric layer, on a substrate, particularly a semiconductor substrate, using a vapor deposition process and ozone with one or more metal organo-amine precursor compounds
03/16/2010US7678707 Method of carbon nanotube modification
03/16/2010US7678706 Method of manufacturing a semiconductor device
03/16/2010US7678705 Plasma semiconductor processing system and method
03/16/2010US7678704 Method of making a contact in a semiconductor device
03/16/2010US7678703 Production method of polishing composition
03/16/2010US7678702 CMP composition of boron surface-modified abrasive and nitro-substituted sulfonic acid and method of use
03/16/2010US7678701 Flexible substrate with electronic devices formed thereon
03/16/2010US7678700 Silicon carbide polishing method utilizing water-soluble oxidizers
03/16/2010US7678699 Method of forming an insulating capping layer for a copper metallization layer by using a silane reaction
03/16/2010US7678698 Method of forming a semiconductor device with multiple tensile stressor layers
03/16/2010US7678697 Substrate, device, method of manufacturing device, method of manufacturing active matrix substrate, electro-optical apparatus and electronic apparatus
03/16/2010US7678696 Method of making through wafer vias
03/16/2010US7678695 Circuit substrate and method for fabricating the same
03/16/2010US7678694 Method for fabricating semiconductor device with silicided gate
03/16/2010US7678693 Exposure method for upper layer of hole of semiconductor device
03/16/2010US7678692 Fabrication method for a damascene bit line contact plug
03/16/2010US7678691 Method of making a semiconductor device having improved contacts
03/16/2010US7678690 Semiconductor device comprising a contact structure with increased etch selectivity
03/16/2010US7678689 Method of fabricating memory device
03/16/2010US7678688 Method for forming metal interconnection in image sensor
03/16/2010US7678687 Method for manufacturing semiconductor device and semiconductor device
03/16/2010US7678686 Semiconductor device having copper metal line and method of forming the same
03/16/2010US7678685 Interposer and method for producing the same and electronic device
03/16/2010US7678684 Semiconductor integrated circuit device
03/16/2010US7678683 Method of fabricating copper damascene and dual damascene interconnect wiring
03/16/2010US7678682 Ultraviolet assisted pore sealing of porous low k dielectric films
03/16/2010US7678681 Electronic component built-in substrate and method of manufacturing the same
03/16/2010US7678680 Semiconductor device with reduced contact resistance
03/16/2010US7678679 Vertical device with sidewall spacer, methods of forming sidewall spacers and field effect transistors, and patterning method
03/16/2010US7678678 Method to chemically remove metal impurities from polycide gate sidewalls
03/16/2010US7678676 Method for fabricating semiconductor device with recess gate
03/16/2010US7678675 Structure and method for a triple-gate transistor with reverse STI
03/16/2010US7678674 Memory cell dual pocket implant
03/16/2010US7678672 Carbon nanotube fabrication from crystallography oriented catalyst
03/16/2010US7678671 Method of forming epitaxial SiC using XPS characterization
03/16/2010US7678670 TEG removing method in manufacturing method for semiconductor chips
03/16/2010US7678669 Method for manufacturing semiconductor substrate
03/16/2010US7678668 Manufacturing method of SOI substrate and manufacturing method of semiconductor device
03/16/2010US7678667 Method of bonding MEMS integrated circuits
03/16/2010US7678666 Crystallization method of amorphous silicon for forming large grain with single pulse laser
03/16/2010US7678665 Deep STI trench and SOI undercut enabling STI oxide stressor
03/16/2010US7678664 Method for fabricating semiconductor device
03/16/2010US7678663 Non-volatile semiconductor memory device and method of manufacturing the same
03/16/2010US7678662 Memory cell having stressed layers
03/16/2010US7678661 Method of forming an insulating layer in a semiconductor device
03/16/2010US7678660 Capacitor device and method of manufacturing the same
03/16/2010US7678659 Method of reducing current leakage in a metal insulator metal semiconductor capacitor and semiconductor capacitor thereof
03/16/2010US7678658 Structure and method for improved SRAM interconnect
03/16/2010US7678657 System and method for manufacturing an emitter structure in a complementary bipolar CMOS transistor manufacturing process
03/16/2010US7678656 Method of fabricating an enhanced resurf HVPMOS device
03/16/2010US7678655 Spacer layer etch method providing enhanced microelectronic device performance
03/16/2010US7678654 Buried bitline with reduced resistance
03/16/2010US7678653 Method of fabricating a recess gate type transistor
03/16/2010US7678652 MOSFET-type semiconductor device, and method of manufacturing the same
03/16/2010US7678651 Method for fabricating semiconductor device
03/16/2010US7678650 Nonvolatile memory device and method of manufacturing the same
03/16/2010US7678649 Semiconductor device and manufacturing method thereof
03/16/2010US7678648 Subresolution silicon features and methods for forming the same
03/16/2010US7678646 Semiconductor device and manufacturing method of the same
03/16/2010US7678645 Formation of thin semiconductor layers by low-energy plasma enhanced chemical vapor deposition and semiconductor heterostructure devices
03/16/2010US7678644 Method and resulting structure for DRAM cell and peripheral transistor
03/16/2010US7678643 Method for manufacturing a CMOS image sensor
03/16/2010US7678642 Method for manufacturing phase change memory device using a patterning process
03/16/2010US7678640 Method of threshold voltage control in metal-oxide-semiconductor devices
03/16/2010US7678639 Inductor formed in an integrated circuit
03/16/2010US7678638 Metal gated ultra short MOSFET devices
03/16/2010US7678637 CMOS fabrication process
03/16/2010US7678636 Selective formation of stress memorization layer
03/16/2010US7678635 Method of producing a transistor
03/16/2010US7678634 Local stress engineering for CMOS devices
03/16/2010US7678632 MuGFET with increased thermal mass
03/16/2010US7678631 Formation of strain-inducing films
03/16/2010US7678630 Strained semiconductor device and method of making same
03/16/2010US7678629 Method for fabricating a recessed ohmic contact for a PHEMT structure
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