Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2010
03/30/2010US7687355 Method for manufacturing fin transistor that prevents etching loss of a spin-on-glass insulation layer
03/30/2010US7687354 Fabrication of a semiconductor device with stressor
03/30/2010US7687353 Ion implantation method for high voltage device
03/30/2010US7687352 Trench MOSFET and method of manufacture utilizing four masks
03/30/2010US7687351 Semiconductor device and method of manufacturing the same
03/30/2010US7687350 Method for manufacturing semiconductor memory device using asymmetric junction ion implantation
03/30/2010US7687349 Growth of silicon nanodots having a metallic coating using gaseous precursors
03/30/2010US7687348 Semiconductor device and method of producing the same
03/30/2010US7687347 Embedded flash memory devices on SOI substrates and methods of manufacture thereof
03/30/2010US7687346 Method of manufacturing a non-volatile NAND memory semiconductor integrated circuit
03/30/2010US7687345 Flash memory device and method of manufacturing the same
03/30/2010US7687344 Method for fabricating capacitor in semiconductor device
03/30/2010US7687343 Storage capacitor, a memory device and a method of manufacturing the same
03/30/2010US7687342 Method of manufacturing a memory device
03/30/2010US7687341 Method for fabricating semiconductor device
03/30/2010US7687340 Protect diodes for hybrid-orientation substrate structures
03/30/2010US7687339 Methods for fabricating FinFET structures having different channel lengths
03/30/2010US7687338 Method of reducing embedded SiGe loss in semiconductor device manufacturing
03/30/2010US7687337 Transistor with differently doped strained current electrode region
03/30/2010US7687336 Method of manufacturing a MOSFET structure
03/30/2010US7687335 Self aligned gate JFET structure and method
03/30/2010US7687334 Fabrication of large grain polycrystalline silicon film by nano aluminum-induced crystallization of amorphous silicon
03/30/2010US7687333 Method of fabricating thin film transistor and array substrate for liquid crystal display device including the same
03/30/2010US7687332 SOI circuit having reduced crosstalk interference and a method for forming the same
03/30/2010US7687331 Stacked semiconductor device and method of fabrication
03/30/2010US7687330 TFT-LCD pixel structure and manufacturing method thereof
03/30/2010US7687329 Gettering of silicon on insulator using relaxed silicon germanium epitaxial proximity layers
03/30/2010US7687328 Method of making a polycrystalline thin film, a mask pattern used in the same and a method of making a flat panel display device using the same
03/30/2010US7687327 Methods for manufacturing RFID tags and structures formed therefrom
03/30/2010US7687326 Semiconductor device and manufacturing method thereof
03/30/2010US7687325 Semiconductor device and manufacturing method thereof
03/30/2010US7687323 Surface-roughening method
03/30/2010US7687322 Method for removing semiconductor street material
03/30/2010US7687321 Method for manufacturing semiconductor device
03/30/2010US7687320 Manufacturing method for packaged semiconductor device
03/30/2010US7687319 Semiconductor device and manufacturing method thereof
03/30/2010US7687317 Semiconductor device having tape carrier with bendable region
03/30/2010US7687315 Stacked integrated circuit package system and method of manufacture therefor
03/30/2010US7687314 Electronic apparatus manufacturing method
03/30/2010US7687313 Method of fabricating a semiconductor multi package module having an inverted package stacked over ball grid array (BGA) package
03/30/2010US7687312 Method of manufacturing hybrid structure of multi-layer substrates
03/30/2010US7687311 Method for producing stackable dies
03/30/2010US7687310 Method for manufacturing phase change memory device which can stably form an interface between a lower electrode and a phase change layer
03/30/2010US7687309 CMOS-process-compatible programmable via device
03/30/2010US7687308 Method for fabricating carbon nanotube transistors on a silicon or SOI substrate
03/30/2010US7687307 Vacuum jacketed electrode for phase change memory element
03/30/2010US7687306 CMOS image sensor and method for manufacturing the same
03/30/2010US7687305 Image sensor and method for manufacturing the same
03/30/2010US7687304 Current-driven device using NiMn alloy and method of manufacture
03/30/2010US7687303 Method for determining via/contact pattern density effect in via/contact etch rate
03/30/2010US7687302 Frame shutter pixel with an isolated storage node
03/30/2010US7687301 Integrated device manufacturing process
03/30/2010US7687300 Method of dynamic temperature control during microcrystalline SI growth
03/30/2010US7687299 Semiconductor apparatus, solid state image pickup device using the same, and method of manufacturing them
03/30/2010US7687298 Microelectromechanical device with integrated conductive shield
03/30/2010US7687297 Forming a cantilever assembly for vertical and lateral movement
03/30/2010US7687296 Semiconductor device fabrication method
03/30/2010US7687295 Method for manufacturing optical semiconductor device
03/30/2010US7687293 Method for enhancing growth of semipolar (Al,In,Ga,B)N via metalorganic chemical vapor deposition
03/30/2010US7687292 Light emitting diode package with metal reflective layer and method of manufacturing the same
03/30/2010US7687291 Laser facet passivation
03/30/2010US7687290 Method for manufacturing semiconductor optical device
03/30/2010US7687289 Pixel structure and manufacturing method thereof
03/30/2010US7687288 Sealed lighting units
03/30/2010US7687286 Method and apparatus for determining the thickness of a dielectric layer
03/30/2010US7687285 Method for manufacturing ferroelectric memory
03/30/2010US7687284 Magnetic sensor and manufacturing method therefor
03/30/2010US7687283 Method of producing a semiconductor device having a magnetic layer formed thereon
03/30/2010US7687279 Evaluation method for chemical solution, qualification method for chemical solution and method for manufacturing semiconductor device
03/30/2010US7687228 Antireflection film composition and patterning process using the same
03/30/2010US7687007 devised for forming a structured nanoscale pattern on an object and having a layer which is anti-adhesive with regard to the object; stamp blank is provided with a structured pattern on a surface
03/30/2010US7686973 Silicon wafer etching method and apparatus, and impurity analysis method
03/30/2010US7686971 Plasma processing apparatus and method
03/30/2010US7686927 Methods and apparatus for controlled-angle wafer positioning
03/30/2010US7686926 A tantalum nitride/Ta barrier is first sputter deposited with high target power and wafer bias, argon etching is performed with even higher wafer bias. a flash step is applied with reduced target power and wafer bias; different magnetic field distributions
03/30/2010US7686918 Magnetron plasma processing apparatus
03/30/2010US7686917 Plasma processing system and apparatus and a sample processing method
03/30/2010US7686916 First peeling unit pulls adhesive tape along the direction across the sheet in a state stuck to the sheet to peel off the sheet at a predetermined peeling angle; 2nd peeling unit pulls adhesive tape in a state stuck to the end portion of such sheet to peel off the sheet at different peeling angle
03/30/2010US7686912 Method for bonding substrates and method for irradiating particle beam to be utilized therefor
03/30/2010US7686889 Susceptor for semiconductor manufacturing apparatus
03/30/2010US7686673 Working shape prediction method, working requirement determination method, working method, working system, method of manufacturing semiconductor device, computer program, and computer program storage medium
03/30/2010US7685895 Substrate inspection device, substrate inspection method, and recovery tool
03/30/2010US7685674 Exhaust gas treatment
03/30/2010CA2534609C In-line gas purity monitoring and control system
03/30/2010CA2513127C Method for producing microsystems
03/30/2010CA2330866C Method and apparatus for manufacturing semiconductor device
03/29/2010CA2639902A1 Improved dilute nitride devices
03/25/2010WO2010033924A2 Etch reactor suitable for etching high aspect ratio features
03/25/2010WO2010033904A2 Shutter disk for physical vapor deposition chamber
03/25/2010WO2010033889A2 Poly(arylene ether) composition and a covered conductor with flexible covering wall and large size conductor
03/25/2010WO2010033813A2 Formation of devices by epitaxial layer overgrowth
03/25/2010WO2010033792A1 Textured semiconductor light-emitting devices
03/25/2010WO2010033774A2 Bonding on silicon substrate having a groove
03/25/2010WO2010033761A2 Self-diagnostic semiconductor equipment
03/25/2010WO2010033723A2 Photonic milling using dynamic beam arrays
03/25/2010WO2010033713A2 Large batch production of thin photovoltaic modules
03/25/2010WO2010033712A2 Electrode system for large batch production of thin photovoltaic modules
03/25/2010WO2010033659A1 Cvd reactor with multiple processing levels and dual-axis motorized lift mechanism
03/25/2010WO2010033638A1 Thin group iv semiconductor structures
03/25/2010WO2010033454A1 Wafer holder for supporting a semiconductor wafer during a thermal treatment process