| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/08/2010 | DE102008047337A1 Verfahren zur Prüfung eines Testsubstrats in einem Prober unter definierten thermischen Bedingungen A method for testing of a test substrate in a Prober under defined thermal conditions |
| 04/08/2010 | DE102008037419A1 Vorrichtung und Verfahren zur Bestimmung der Position eines scheibenförmigen Objekts Apparatus and method for determining the position of a disc-shaped object |
| 04/08/2010 | DE102008035811B3 Feldeffekt-Transistor mit einem verformten Kanalgebiet, das durch eine Wasserstoff induzierte Gitterdeformation hervorgerufen wird und Verfahren zum Einbringen des Wasserstoffes Field effect transistor having a strained channel region, which is caused by hydrogen-induced lattice deformation and methods of incorporation of the hydrogen |
| 04/08/2010 | DE102007056590B4 Halbleiterbauelement mit einer nichtflüchtigen Speicherfunktion und Verfahren zu seiner Herstellung A semiconductor device having a nonvolatile memory function, and process for its preparation |
| 04/08/2010 | DE102007052167B4 Halbleiterbauelement und Verfahren zum Einstellen der Höhe einer Gateelektrode in dem Halbleiterbauelement A semiconductor device and method for adjusting the height of a gate electrode in the semiconductor device |
| 04/08/2010 | DE102007052050B4 Halbleiterbauelement und Verfahren zum Erhöhen der Ätzselektivität während der Strukturierung einer Kontaktstruktur des Halbleiterbauelements A semiconductor device and method for increasing the etch selectivity during the patterning of a contact structure of the semiconductor component |
| 04/08/2010 | DE102007020260B4 Verfahren zum Verbessern der Transistoreigenschaften von Feldeffekttransistoren durch eine späte tiefe Implantation in Verbindung mit einem diffusionsfreien Ausheizprozess A method for improving the transistor characteristics of field-effect transistors by a late deep implantation in combination with a diffusion anneal free |
| 04/08/2010 | DE102006062029B4 Verfahren zum Herstellen einer Halbleitervorrichtung A method of manufacturing a semiconductor device |
| 04/08/2010 | DE102006058814B4 Bearbeitungsvorrichtungen Processing devices |
| 04/08/2010 | DE102006056620B4 Halbleiterstruktur und Verfahren zu ihrer Herstellung Semiconductor structure and process for their preparation |
| 04/08/2010 | DE102006042617B4 Verfahren zur Erzeugung von lokalen Kontakten A process for the production of local contacts |
| 04/08/2010 | DE102006030257B4 Teststruktur zum Bestimmen der Eigenschaften von Halbleiterlegierungen in SOI-Transistoren mittels Röntgenbeugung Test structure for determining the properties of semiconductor alloys in SOI-transistors by means of X-ray diffraction |
| 04/08/2010 | DE102006022093B4 Verfahren und Vorrichtung zur Behandlung einer Halbleiterscheibe durch Ätzen Method and apparatus for treating a semiconductor wafer by etching, |
| 04/08/2010 | DE102005017642B4 Verfahren zur Inspektion eines Wafers Method for inspecting a wafer |
| 04/08/2010 | DE102005017632B4 Verfahren zur Modifikation der Oberfläche einer Probe mittels eines gepulsten Ionenstrahls oder mittels eines ionenstrahlgenerierten Teilchenstrahls mit homogen oder gaußförmig verteilter Stromdichte A method of modifying the surface of a sample by means of a pulsed ion beam or ion beam generated by a particle beam with homogeneously distributed, or Gaussian current density |
| 04/08/2010 | DE102004059453B4 Halbleitervorrichtung Semiconductor device |
| 04/08/2010 | DE102004040484B4 Auswählen eines Schreibstroms einer magnetischen Speicherzelle Selecting a write current to a magnetic memory cell |
| 04/08/2010 | DE102004035788B4 Verfahren zum Herstellen eines Isolierschicht-Bipolartransistors mit eingebauter Freilaufdiode A method of manufacturing an insulated gate bipolar transistor with a built-freewheeling diode |
| 04/08/2010 | DE102004022355B4 Halbleiterbaustein mit bidirektionalem Eingabe-/Ausgabeanschluss und zugehöriges Verfahren zum Ein- und Ausgeben von Daten Semiconductor device with bidirectional input / output port and associated method for inputting and outputting data |
| 04/08/2010 | DE10162074B4 BiCMOS-Struktur, Verfahren zu ihrer Herstellung und Bipolartransistor für eine BiCMOS-Struktur BiCMOS structure, processes for their preparation and bipolar transistor for a BiCMOS structure |
| 04/08/2010 | DE10103061B4 Verfahren zur Inspektion der Tiefe einer Öffnung in einer dielektrischen Materialschicht A method for inspection of the depth of an opening in a dielectric material layer |
| 04/08/2010 | DE10065454B4 Verfahren zur Herstellung eines Aluminiumoxidfilms zur Verwendung in einem Halbleitergerät A process for producing an aluminum oxide film for use in a semiconductor device |
| 04/08/2010 | CA2739410A1 Silicon carbide semiconductor device |
| 04/08/2010 | CA2739239A1 Wafer bonding device and wafer bonding method |
| 04/07/2010 | WO2011040012A1 Tunnel field effect transistor and method for manufacturing same |
| 04/07/2010 | EP2172977A1 Display device |
| 04/07/2010 | EP2172968A1 Testing apparatus |
| 04/07/2010 | EP2172967A1 Method for manufacturing silicon carbide |
| 04/07/2010 | EP2172966A1 Optical characteristic measuring method, optical characteristic adjusting method, exposing device, exposing method, and exposing device manufacturing method |
| 04/07/2010 | EP2172965A1 Optical characteristic measurement method, optical characteristic adjusting method, exposure device, exposure method, and exposure device manufacturing method |
| 04/07/2010 | EP2172964A2 Capacitor, semiconductor memory device, and method for manufacturing the same |
| 04/07/2010 | EP2172963A1 Method for measuring rotation angle of bonded wafer |
| 04/07/2010 | EP2172757A1 Method and device for recording physical parameters |
| 04/07/2010 | EP2172304A1 Polishing apparatus |
| 04/07/2010 | EP2171845A2 Method for forming an acoustic mirror with reduced metal layer roughness and related structure |
| 04/07/2010 | EP2171757A2 Normally-off integrated jfet power switches in wide bandgap semiconductors and methods of making |
| 04/07/2010 | EP2171753A1 Inhibition of copper dissolution for lead-free soldering |
| 04/07/2010 | EP2171752A2 Method for coating two elements hybridized by means of a soldering material |
| 04/07/2010 | EP2171750A1 Method for etching a layer of a silicon semiconductor substrate |
| 04/07/2010 | EP2171749A1 Transistor with differently doped strained current electrode region |
| 04/07/2010 | EP2171748A1 Epitaxial methods and templates grown by the methods |
| 04/07/2010 | EP2171747A1 Methods for producing improved epitaxial materials |
| 04/07/2010 | EP2171746A2 Method of manufacturing crystalline semiconductor thin film |
| 04/07/2010 | EP2171745A2 Structures of and methods for forming vertically aligned si wire arrays |
| 04/07/2010 | EP2171744A1 Apparatus and method for wet treatment of disc-like articles |
| 04/07/2010 | EP2171538A1 A method of making a secondary imprint on an imprinted polymer |
| 04/07/2010 | EP2170778A1 Method for removing foreign matter from glass substrate surface and method for processing glass substrate surface |
| 04/07/2010 | EP2170764A2 Methods of making hierarchical articles |
| 04/07/2010 | EP1897130B1 Transistor with improved tip profile and method of manufacture thereof |
| 04/07/2010 | EP1865090B1 Deep-pot-shaped copper sputtering target |
| 04/07/2010 | EP1774571B1 In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same |
| 04/07/2010 | EP1438753B1 Thin film transistor device and method of manufacturing same |
| 04/07/2010 | CN201436682U Chip package with inductance element |
| 04/07/2010 | CN201436680U Detachable electrostatic chuck with seal assembly |
| 04/07/2010 | CN201436147U Wafer grinding and cutting protection structure |
| 04/07/2010 | CN1977368B Soldering method, solder pellet for die bonding, method for manufacturing solder pellet for die bonding and electronic component |
| 04/07/2010 | CN1956221B Transistor with medium stress generation region and manufacturing method thereof |
| 04/07/2010 | CN1937217B Packaging structure and its packaging method |
| 04/07/2010 | CN1918698B Cleaning liquid for substrate for semiconductor device and cleaning method |
| 04/07/2010 | CN1848365B Method of manufacturing polysilicon thin film and method of manufacturing thin film transistor having the same |
| 04/07/2010 | CN1835242B Liquid crystal display device using thin-film transistor and method for manufacturing the same |
| 04/07/2010 | CN1825593B Semiconductor device |
| 04/07/2010 | CN1794089B Lithographic apparatus with two-dimensional alignment measurement arrangement and two-dimensional alignment measurement method |
| 04/07/2010 | CN1793999B 半导体集成电路 The semiconductor integrated circuit |
| 04/07/2010 | CN1706566B Ultraviolet cleaner |
| 04/07/2010 | CN1617034B 液晶显示器 LCD Monitor |
| 04/07/2010 | CN1573453B Display device and manufacturing method of the same |
| 04/07/2010 | CN1557024B Insulting gate Al Ga nitride/GaN HEMT |
| 04/07/2010 | CN1514306B Manufacturing method of photoetching equipment and device, and device obtained therefrom |
| 04/07/2010 | CN101692475A Combined encapsulating method for non-square LED chip |
| 04/07/2010 | CN101692463A Capacitor structure of mixed nano-crystal memory and preparation method thereof |
| 04/07/2010 | CN101692461A Nanometer electronic device based on semiconductor nano materials and preparation method thereof |
| 04/07/2010 | CN101692460A High dielectric constant membrane material with continuously adjustable forbidden bandwidth and preparation method thereof |
| 04/07/2010 | CN101692459A Novel perovskite manganese-based oxide film material and preparation method thereof |
| 04/07/2010 | CN101692455A SOI-based capacitor |
| 04/07/2010 | CN101692454A High pressure P-shaped metal oxide semiconductor tube of silicon-on-insulator |
| 04/07/2010 | CN101692450A HIMOS FLASH memory unit structure and manufacturing method thereof |
| 04/07/2010 | CN101692449A Method for parallel measurement of hot carrier injection effect |
| 04/07/2010 | CN101692448A Multi-chip LED centralized-encapsulated radiating structure and encapsulation technology thereof |
| 04/07/2010 | CN101692446A Organic electro-stimulation luminous element encapsulation and encapsulating method thereof |
| 04/07/2010 | CN101692442A Multilayer ceramic substrate, electronic component, and method of manufacturing multilayer ceramic substrate |
| 04/07/2010 | CN101692441A Packaging structure of printed circuit board |
| 04/07/2010 | CN101692440A Mixed crystal orientation strain silicon substrate and method for preparing same |
| 04/07/2010 | CN101692439A Manufacturing method for a plurality of groups of substrates of thin-film transistor |
| 04/07/2010 | CN101692438A Monolithic integrated manufacturing method for indium phosphide-based resonant tunneling diodes and high-electron-mobility transistors |
| 04/07/2010 | CN101692437A Method for selectively depositing diffusion barrier for copper interconnection |
| 04/07/2010 | CN101692436A Method for preparing mixed crystal orientation strain silicon substrate with insulated buried layer |
| 04/07/2010 | CN101692435A Etching and filling method of deep groove isolation structure of silicon-on-insulator |
| 04/07/2010 | CN101692434A Filling method of deep groove isolation structure of silicon-on-insulator |
| 04/07/2010 | CN101692433A Plasma etching machine and ejector pin thereof |
| 04/07/2010 | CN101692432A Combined push rod mechanism |
| 04/07/2010 | CN101692431A 翻转装置 Flip device |
| 04/07/2010 | CN101692430A Method for detecting random defects of silicon gate of CMOS process |
| 04/07/2010 | CN101692429A Solder precoating method |
| 04/07/2010 | CN101692428A Integrating method of hybrid integrated circuit with controllable working temperature |
| 04/07/2010 | CN101692427A Method of producing large gate width silicon carbide metal semiconductor filed-effect transistor (SiC MESFET) with intercellular balance resistors |
| 04/07/2010 | CN101692426A Method for preparing vertical double-diffusion MOS transistor |
| 04/07/2010 | CN101692425A Novel design method for ESD protection |
| 04/07/2010 | CN101692424A Vertical bipolar transistor and method for manufacturing same |
| 04/07/2010 | CN101692423A 等离子体蚀刻方法 The plasma etching method |