Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2010
03/25/2010WO2010033448A2 Improved thin film scribe process
03/25/2010WO2010033434A2 Sidewall forming processes
03/25/2010WO2010033420A2 Methods for electron-beam induced deposition of material inside energetic-beam microscopes
03/25/2010WO2010033389A1 Managing thermal budget in annealing of substrates
03/25/2010WO2010033378A2 Method and apparatus for metal silicide formation
03/25/2010WO2010033318A2 Deposition systems, ald systems, cvd systems, deposition methods, als methods and cvd methods
03/25/2010WO2010033156A2 Barrier slurry for low-k dielectrics
03/25/2010WO2010033144A1 Method and apparatus for surface treatment of semiconductor substrates using sequential chemical applications
03/25/2010WO2010033122A1 Allotropic or morphologic change in silicon induced by electromagnetic radiation for resistance tuning of integrated circuits
03/25/2010WO2010033107A1 Pb-free solder bumps with improved mechanical properties
03/25/2010WO2010032978A2 Method for depositing amorphous silicon thin film by chemical vapor deposition
03/25/2010WO2010032910A1 Substrate-transferring device, substrate-processing apparatus having the same, and method of transferring substrate using the substrate-transferring device
03/25/2010WO2010032905A1 Micro-contact probe coated with nano-structure, and fabricating method thereof
03/25/2010WO2010032866A1 Semiconductor programmable device and signal transferring method in semiconductor programmable device
03/25/2010WO2010032865A1 Semiconductor programmable device and signal transferring method in semiconductor programmable device
03/25/2010WO2010032861A1 Semiconductor programmable device and control method therefor
03/25/2010WO2010032857A1 Pattern inspection device and method
03/25/2010WO2010032852A1 Ultraviolet light irradiation device
03/25/2010WO2010032839A1 Resist pattern coating agent and resist pattern formation method
03/25/2010WO2010032834A1 Organic semiconductor device, method for manufacturing organic semiconductor device, electronic device, electronic apparatus and composition for forming insulating layer
03/25/2010WO2010032796A1 Composition for forming side wall
03/25/2010WO2010032780A1 Metal clad body, circuit board and electronic part
03/25/2010WO2010032753A1 Aperture stop, optical system, exposure apparatus and electronic device manufacturing method
03/25/2010WO2010032751A1 Wafer tray, inspection device, and inspection method using the same
03/25/2010WO2010032750A1 Substrate processing apparatus and substrate placing table
03/25/2010WO2010032745A1 Temperature adjustment mechanism, and plasma treatment apparatus
03/25/2010WO2010032729A1 Method for manufacturing semiconductor device
03/25/2010WO2010032715A1 Polishing pad
03/25/2010WO2010032710A1 Substrate processing liquid and method for processing resist substrate using same
03/25/2010WO2010032708A1 Method for reducing temperature of substrate placing table, computer-readable storage medium, and substrate processing system
03/25/2010WO2010032703A1 Electrostatic chuck
03/25/2010WO2010032679A1 Material used for forming nickel-containing film and method for manufacturing the nickel-containing film
03/25/2010WO2010032673A1 Nickel-containing film‑formation material, and nickel-containing film‑fabrication method
03/25/2010WO2010032659A1 Disturbance detection circuit, semiconductor integrated circuit, disturbance detection method, and test method
03/25/2010WO2010032653A1 Well-structure anti-punch-through microwire device, and fabrication method thereof
03/25/2010WO2010032640A1 Display device
03/25/2010WO2010032639A1 Display device and manufacturing method of the same
03/25/2010WO2010032638A1 Display device
03/25/2010WO2010032631A1 Method of predicting fraction defective, program of predicting fraction defective, method of controlling semiconductor manufacturing device, and method of manufacturing semiconductor device
03/25/2010WO2010032629A1 Semiconductor device
03/25/2010WO2010032619A1 Display device
03/25/2010WO2010032616A1 Copper wiring surface protective liquid and method for manufacturing semiconductor circuit
03/25/2010WO2010032615A1 Inkjet image-drawing device
03/25/2010WO2010032611A1 Semiconductor device and method for manufacturing the same
03/25/2010WO2010032608A1 Molecular device, method for manufacturing the molecular device, integrated circuit device, method for manufacturing the integtrated circuit device, three-dimensional integrated circuit device, and method for manufacturing the three-dimensional integrated circuit device
03/25/2010WO2010032603A1 Semiconductor device and wireless tag using the same
03/25/2010WO2010032602A1 Semiconductor device
03/25/2010WO2010032589A1 Charge pump circuit and semiconductor integrated circuit
03/25/2010WO2010032585A1 Illumination optical system, photolithography apparatus and method for manufacturing device
03/25/2010WO2010032574A1 Magnetic recording element, magnetic memory cell, and magnetic random access memory
03/25/2010WO2010032573A1 Semiconductor device
03/25/2010WO2010032562A1 System and method for supporting finding of defect in object to be inspected
03/25/2010WO2010032547A1 Method and apparatus for forming polymerized film
03/25/2010WO2010032543A1 Surface treatment mask, process for producing the surface treatment mask, method for surface treatment, particle-containing film, and process for producing the particle-containing film
03/25/2010WO2010032529A1 Semiconductor device and method for manufacturing the same
03/25/2010WO2010032519A1 Motherboard, motherboard manufacturing method and device board
03/25/2010WO2010032499A1 Substrate processing device
03/25/2010WO2010032459A1 Film formation method, film formation device,piezoelectric film, piezoelectric device and liquid discharge device
03/25/2010WO2010032456A1 Semiconductor storage device and method for manufacturing semiconductor storage device
03/25/2010WO2010032431A1 Thin film transistor having crystalline indium oxide semiconductor film
03/25/2010WO2010032427A1 Component mounting apparatus and component mounting method
03/25/2010WO2010032423A1 Method for manufacturing iii nitride semiconductor light emitting element, iii nitride semiconductor light emitting element and lamp
03/25/2010WO2010032371A1 Band saw cutting device and method of cutting ingot
03/25/2010WO2010032366A1 Method for manufacturing laminated wafer
03/25/2010WO2010032355A1 Method for manufacturing flexible semiconductor device and multilayer film used therein
03/25/2010WO2010032350A1 Semiconductor device and method for manufacturing the same
03/25/2010WO2010032192A1 Electric component with under-bump metallization and integrated confinement structure
03/25/2010WO2010032174A1 Fin field effect transistor (finfet)
03/25/2010WO2010031845A1 Methods and systems for material bonding
03/25/2010WO2010031571A2 Production method and production device for strings
03/25/2010WO2010031307A1 A plasma treatment device
03/25/2010WO2010031215A1 Method for substantially uniform copper deposition onto semiconductor wafer
03/25/2010WO2010031203A1 High resistivity semiconductor resistance element
03/25/2010WO2010031192A1 Methods for manufacturing ultrasound transducers and other components
03/25/2010WO2010008967A3 Improvement of organic line width roughness with h2 plasma treatment
03/25/2010WO2010008824A3 Closed-loop control for effective pad conditioning
03/25/2010WO2010008754A3 Methods for forming an amorphous silicon film in display devices
03/25/2010WO2010008752A3 Gold-tin-indium solder for processing compatibility with lead-free tin-based solder
03/25/2010WO2010008211A3 Batch-type heat treatment device and heater used therein
03/25/2010WO2010005931A3 Capacitively-coupled electrostatic (cce) probe arrangement for detecting dechucking in a plasma processing chamber and methods thereof
03/25/2010WO2010002739A3 Flip chip assembly process for ultra thin substrate and package on package assembly
03/25/2010WO2009158378A3 Dual chamber megasonic cleaner
03/25/2010WO2009158193A3 Phase memorization for low leakage dielectric films
03/25/2010WO2009158117A3 Chemical modulation of electronic and magnetic properties of graphene
03/25/2010WO2009157969A3 High porosity superabrasive resin products and method of manufacture
03/25/2010WO2009155508A3 A platen for reducing particle contamination on a substrate and a method thereof
03/25/2010WO2009155498A3 Use of pattern recognition to align patterns in a downstream process
03/25/2010WO2009155352A3 Matching circuit for a complex radio frequency (rf) waveform
03/25/2010WO2009155221A3 Methods for controlling time scale of gas delivery into a processing chamber
03/25/2010WO2009154836A3 Methods for manufacturing high dielectric constant film
03/25/2010WO2009152008A3 Cmp pad identification and layer ratio modeling
03/25/2010WO2009151676A3 Method and circuit for efuse protection
03/25/2010WO2009149275A3 Improved multilayer electrostatic chuck wafer platen
03/25/2010WO2009131379A9 Polycrystalline silicon film, a thin-film transistor comprising the same, and a production method thereof
03/25/2010WO2009090098A3 Method and apparatus for producing a solar cell
03/25/2010US20100075576 Polishing state monitoring apparatus and polishing apparatus and method
03/25/2010US20100075510 Method for Pulsed plasma deposition of titanium dioxide film
03/25/2010US20100075509 Manufacturing method and manufacturing apparatus for semiconductor device
03/25/2010US20100075508 Method of fabricating a semiconductor device
03/25/2010US20100075507 Method of Fabricating a Gate Dielectric for High-K Metal Gate Devices
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