Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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12/06/2011 | US8071167 Surface pre-treatment for enhancement of nucleation of high dielectric constant materials |
12/06/2011 | US8071157 Improved thickness uniformity in spin coating; lithography; using an optical analyzer to control the coating thickness during processing |
12/06/2011 | US8071019 Methods for introduction of a reactive material into a vacuum chamber |
12/06/2011 | US8070992 Mold cleaning sheet and method of producing semiconductor devices using the same |
12/06/2011 | US8070975 Azeotrope-like composition of 2-chloro-1,1,1,2-tetrafluoropropane (HCFC-244bb) and hydrogen fluoride (HF) |
12/06/2011 | US8070971 Etch method |
12/06/2011 | US8070966 Group III-nitride layers with patterned surfaces |
12/06/2011 | US8070911 Capacitive coupling plasma processing apparatus |
12/06/2011 | US8070910 Shower head structure and treating device |
12/06/2011 | US8070909 Feedback control of chemical mechanical polishing device providing manipulation of removal rate profiles |
12/06/2011 | US8070880 Substrate processing apparatus |
12/06/2011 | US8070879 Apparatus and method for hybrid chemical processing |
12/06/2011 | US8070873 Medium temperature coating material for high speed turbomachinery and method of coating same |
12/06/2011 | US8070560 Polishing apparatus and method |
12/06/2011 | US8070408 Load lock chamber for large area substrate processing system |
12/06/2011 | US8070265 Heater stack in a micro-fluid ejection device and method for forming floating electrical heater element in the heater stack |
12/06/2011 | US8069817 Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses |
12/01/2011 | WO2011150311A1 Substrate supports for semiconductor applications |
12/01/2011 | WO2011150154A2 Apparatus and method for detaping an adhesive layer from the surface of ultra thin wafers |
12/01/2011 | WO2011149989A1 Circuit elements comprising ferroic materials |
12/01/2011 | WO2011149918A2 High surface resistivity electrostatic chuck |
12/01/2011 | WO2011149906A1 Smoothing method for semiconductor material and wafers produced by same |
12/01/2011 | WO2011149790A2 Component temperature control by coolant flow control and heater duty cycle control |
12/01/2011 | WO2011149770A2 Engineering boron-rich films lithographic mask applications |
12/01/2011 | WO2011149768A2 Self-aligned semiconductor devices with reduced gate-source leakage under reverse bias and methods of making |
12/01/2011 | WO2011149686A2 Ultrasonic acoustic emissions to detect substrate fracture |
12/01/2011 | WO2011149638A2 Selective etch for silicon films |
12/01/2011 | WO2011149616A2 Planarizing etch hardmask to increase pattern density and aspect ratio |
12/01/2011 | WO2011149587A1 Integrated circuit with finfets and mim fin capacitor |
12/01/2011 | WO2011149561A1 Through-silicon vias with low parasitic capacitance |
12/01/2011 | WO2011149541A1 Matched coefficient of thermal expansion for an electrostatic chuck |
12/01/2011 | WO2011149508A2 Apparatus and method for temperature control of a semiconductor substrate support |
12/01/2011 | WO2011149505A2 Resistance variable memory cell structures and methods |
12/01/2011 | WO2011149422A1 Method of packaging a wire-bonded integrated circuit |
12/01/2011 | WO2011149278A2 Large-area deposition device for gas-mixing prevention |
12/01/2011 | WO2011149215A2 Method for preparing polycrystalline silicon thin film |
12/01/2011 | WO2011149118A1 Forming method and crystallization method for an oxide semiconductor thin film using a liquid-phase process, and a method for forming semiconductor elements by using the same |
12/01/2011 | WO2011149029A1 Insulation pattern forming method and insulation pattern forming material for damascene process |
12/01/2011 | WO2011148985A1 Plasma etching method |
12/01/2011 | WO2011148973A1 Pressure sensor and method for manufacturing pressure sensor |
12/01/2011 | WO2011148944A1 Thin film magnetic device and method for manufacturing same |
12/01/2011 | WO2011148924A1 Film forming device |
12/01/2011 | WO2011148898A1 Method for regulating voltage characteristics of semiconductor storage cell, method for regulating voltage characteristics of semiconductor storage device, charge pump, and method for regulating voltage of charge pump |
12/01/2011 | WO2011148890A1 Organotantalum complex compound and method for producing same |
12/01/2011 | WO2011148843A1 Silicon carbide substrate and method for producing same |
12/01/2011 | WO2011148831A1 Method and apparatus for producing silicon nitride film |
12/01/2011 | WO2011148830A1 Silicon nitride film of semiconductor element, and method and apparatus for producing silicon nitride film |
12/01/2011 | WO2011148788A1 Laser annealing method and device |
12/01/2011 | WO2011148782A1 Substrate processing apparatus and temporary storage shelf |
12/01/2011 | WO2011148728A1 Display device and method for manufacturing same |
12/01/2011 | WO2011148716A1 Bake device |
12/01/2011 | WO2011148707A1 Process for production of organic semiconductor device |
12/01/2011 | WO2011148633A1 Traverse device and substrate processing device |
12/01/2011 | WO2011148629A1 Plasma processing device |
12/01/2011 | WO2011148614A1 Sintered oxide material, target comprising same, and oxide semiconductor thin film |
12/01/2011 | WO2011148583A1 Bus control device and control device for outputting instructions to the bus control device |
12/01/2011 | WO2011148560A1 Conveying method |
12/01/2011 | WO2011148559A1 Apparatus for separating semiconductor wafers |
12/01/2011 | WO2011148555A1 Method for measuring film thickness distribution of wafer having thin film |
12/01/2011 | WO2011148551A1 Method for driving non-volatile switching device |
12/01/2011 | WO2011148548A1 Apparatus for transferring flat board |
12/01/2011 | WO2011148547A1 Flat-plate conveying device |
12/01/2011 | WO2011148540A1 Probe structure, probe device, method for producing probe structure, and testing device |
12/01/2011 | WO2011148445A1 Semiconductor device and process for production thereof |
12/01/2011 | WO2011148444A1 Semiconductor device and method for manufacturing same |
12/01/2011 | WO2011148443A1 Field effect transistor |
12/01/2011 | WO2011148441A1 Method for manufacturing semiconductor device, and semiconductor device |
12/01/2011 | WO2011148435A1 Semiconductor device and process for production thereof |
12/01/2011 | WO2011148434A1 Semiconductor substrate, and process for production of solid-state imaging device using same |
12/01/2011 | WO2011148427A1 Mos-driven semiconductor device and method for manufacturing mos-driven semiconductor device |
12/01/2011 | WO2011148281A2 Closed chamber with fluid separation feature |
12/01/2011 | WO2011148273A1 Iii-nitride light-emitting device grown on a relaxed layer |
12/01/2011 | WO2011147820A1 Apparatus and method for loading and unloading, more particularly of a coating device |
12/01/2011 | WO2011147775A1 Apparatus and method for electrostatic discharge (esd) reduction |
12/01/2011 | WO2011147695A1 Stacked package structure for integrated circuits |
12/01/2011 | WO2011147670A1 Interconnect structure |
12/01/2011 | WO2011147256A1 Low schottky barrier semiconductor structure and method for forming the same |
12/01/2011 | WO2011147212A1 Semiconductor device and method for forming the same |
12/01/2011 | WO2011147063A1 Light-emitting device using ac |
12/01/2011 | WO2011147062A1 Semiconductor structure and method for manufacturing the same |
12/01/2011 | WO2011147061A1 Three dimension integrated circuit and manufacturing method thereof |
12/01/2011 | WO2011126748A3 Depositing conformal boron nitride films |
12/01/2011 | WO2011123792A3 Metal nitride containing film deposition using combination of amino-metal and halogenated metal precursors |
12/01/2011 | WO2011119113A8 Photoelectric transducer using iron silicide and aluminum and method for preparing the same |
12/01/2011 | WO2011097238A3 Fine droplet atomizer for liquid precursor vaporization |
12/01/2011 | WO2011096695A3 Process for creating an inspection program |
12/01/2011 | WO2011084575A3 Methods for forming nmos epi layers |
12/01/2011 | WO2011083162A3 Micro-electromechanical semiconductor component sensor |
12/01/2011 | WO2011080629A3 Improved ultrasonic cleaning fluid, method and apparatus |
12/01/2011 | WO2011073840A3 Device and process for liquid treatment of a wafer shaped article |
12/01/2011 | WO2010106533A4 A method and apparatus for accurate determination of parameters of a stack of thin films |
12/01/2011 | US20110294402 Eddy Current System for In-Situ Profile Measurement |
12/01/2011 | US20110294306 Controlled process and resulting device |
12/01/2011 | US20110294305 Antireflective Coating |
12/01/2011 | US20110294304 Method of manufacturing semiconductor device |
12/01/2011 | US20110294303 Confined process volume pecvd chamber |
12/01/2011 | US20110294302 Method for Fast Macropore Etching in n-Type Silicon |
12/01/2011 | US20110294301 Method of Preventing Premature Drying |
12/01/2011 | US20110294300 Selective etch for silicon films |
12/01/2011 | US20110294299 Method and apparatus for silicon oxide residue removal |